JPS554937A - Dry etching method - Google Patents

Dry etching method

Info

Publication number
JPS554937A
JPS554937A JP7698678A JP7698678A JPS554937A JP S554937 A JPS554937 A JP S554937A JP 7698678 A JP7698678 A JP 7698678A JP 7698678 A JP7698678 A JP 7698678A JP S554937 A JPS554937 A JP S554937A
Authority
JP
Japan
Prior art keywords
etching
etched
parts
covering
impinged
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7698678A
Other languages
English (en)
Other versions
JPS6350854B2 (ja
Inventor
Hiroshi Yano
Tetsuya Ogawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP7698678A priority Critical patent/JPS554937A/ja
Publication of JPS554937A publication Critical patent/JPS554937A/ja
Publication of JPS6350854B2 publication Critical patent/JPS6350854B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP7698678A 1978-06-27 1978-06-27 Dry etching method Granted JPS554937A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7698678A JPS554937A (en) 1978-06-27 1978-06-27 Dry etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7698678A JPS554937A (en) 1978-06-27 1978-06-27 Dry etching method

Publications (2)

Publication Number Publication Date
JPS554937A true JPS554937A (en) 1980-01-14
JPS6350854B2 JPS6350854B2 (ja) 1988-10-12

Family

ID=13621090

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7698678A Granted JPS554937A (en) 1978-06-27 1978-06-27 Dry etching method

Country Status (1)

Country Link
JP (1) JPS554937A (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4341616A (en) * 1980-01-25 1982-07-27 Mitsubishi Denki Kabushiki Kaisha Dry etching device
JPS6084762U (ja) * 1983-11-15 1985-06-11 愛三工業株式会社 内燃機関用混合気供給装置
JPS62279626A (ja) * 1986-05-27 1987-12-04 M Setetsuku Kk 半導体用基板に対する不純物のド−ピング方法
JPH04229619A (ja) * 1990-05-21 1992-08-19 Applied Materials Inc 化学的腐食から保護する作用をなす導電性コーティングをチャンバの内側金属面上に有するプラズマエッチング装置と、それを形成する方法
US8850715B2 (en) * 2006-09-07 2014-10-07 Eisenmann Ag Process and installation for drying articles

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52130288A (en) * 1976-04-26 1977-11-01 Hitachi Ltd Patterning method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52130288A (en) * 1976-04-26 1977-11-01 Hitachi Ltd Patterning method

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4341616A (en) * 1980-01-25 1982-07-27 Mitsubishi Denki Kabushiki Kaisha Dry etching device
JPS6084762U (ja) * 1983-11-15 1985-06-11 愛三工業株式会社 内燃機関用混合気供給装置
JPS62279626A (ja) * 1986-05-27 1987-12-04 M Setetsuku Kk 半導体用基板に対する不純物のド−ピング方法
JPH0516656B2 (ja) * 1986-05-27 1993-03-05 Emu Setetsuku Kk
JPH04229619A (ja) * 1990-05-21 1992-08-19 Applied Materials Inc 化学的腐食から保護する作用をなす導電性コーティングをチャンバの内側金属面上に有するプラズマエッチング装置と、それを形成する方法
US8850715B2 (en) * 2006-09-07 2014-10-07 Eisenmann Ag Process and installation for drying articles

Also Published As

Publication number Publication date
JPS6350854B2 (ja) 1988-10-12

Similar Documents

Publication Publication Date Title
FR2350687A1 (fr) Appareil pour produire des faisceaux d'electrons et d'ions de grande intensite
JPS554937A (en) Dry etching method
JPS5254897A (en) Plasma ion source for solid materials
JPS5449073A (en) Plasma processing unit
JPS5420657A (en) Sample processor for scanning electron microscope and its similar device
JPS5332677A (en) Electron beam exposure apparatus
JPS53116076A (en) Plasma processing method and its unit
JPS57192264A (en) Method of etching
JPS5496363A (en) Electrode forming method for semiconductor device
JPS5596681A (en) Method of fabricating semiconductor device
JPS57200566A (en) Method of working upon metal thin film
JPS5374470A (en) Measuring instrument for surface electric potential
JPS5625973A (en) Ion etching apparatus
JPS5477574A (en) Plasma treating apparatus
JPS53118980A (en) Exposing method of electron ray
JPS53114744A (en) Etching method
JPS5240961A (en) Color picture tube
JPS53135877A (en) Fixing apparatus for harmful gas, radioactive gas or the like
JPS5524365A (en) Pitch measuring device for rectangular hole of shadow mask for color braun tube
JPS5360162A (en) Electron beam irradiation device
JPS5662683A (en) Electron beam processing device
JPS5489486A (en) Slit of variable rectangular type electron beam exposure apparatus
JPS53148964A (en) Processing system for semiconductor element sample
JPS53116772A (en) Measuring method of evenness of implanted ions in ion implantation apparatu s
JPS5376668A (en) X-ray exposure method