JPS5547379A - Manufacture of boron nitride coated film by chemical vapor deposition - Google Patents

Manufacture of boron nitride coated film by chemical vapor deposition

Info

Publication number
JPS5547379A
JPS5547379A JP12038978A JP12038978A JPS5547379A JP S5547379 A JPS5547379 A JP S5547379A JP 12038978 A JP12038978 A JP 12038978A JP 12038978 A JP12038978 A JP 12038978A JP S5547379 A JPS5547379 A JP S5547379A
Authority
JP
Japan
Prior art keywords
substrate
sec
boron nitride
coating
iron group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12038978A
Other languages
Japanese (ja)
Inventor
Takehiko Takahashi
Hideaki Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP12038978A priority Critical patent/JPS5547379A/en
Publication of JPS5547379A publication Critical patent/JPS5547379A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C23C16/342—Boron nitride

Abstract

PURPOSE:To form boron nitride coating having high purity and high density on a substrate contg. iron group metals at ordinary press. and at a temp. lower than that for conventional method, by introducing a reaction gas contg. NH3, BCl3 etc. on the substrate so as to metallize the substrate chemically. CONSTITUTION:A reaction gas is brought into contact with a heated substrate contg. iron group elements in respective ranges of flow rate of components, i.e., 0.2-3.0ml/sec. NH3 or N2H4, 0.5-1.0ml/sec. BCl3 or B2H6, 0.2-4.0ml/sec. H2, and 0.2-4.0ml/sec. inert gas such as Ar. Hereby a coating of hexagonal system crystals of boron nitride 2 mum in thickness are formed on the substrate by chemical metallizing. The thickness of the coating increases linearly with increase in the metallizing time to form a coating not smaller than 500mum in thickness. For the substrate is used an alloy or a cpd. including a single iron group element, e.g., iron, cobalt, or two or more members of iron group elements.
JP12038978A 1978-10-02 1978-10-02 Manufacture of boron nitride coated film by chemical vapor deposition Pending JPS5547379A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12038978A JPS5547379A (en) 1978-10-02 1978-10-02 Manufacture of boron nitride coated film by chemical vapor deposition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12038978A JPS5547379A (en) 1978-10-02 1978-10-02 Manufacture of boron nitride coated film by chemical vapor deposition

Publications (1)

Publication Number Publication Date
JPS5547379A true JPS5547379A (en) 1980-04-03

Family

ID=14784987

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12038978A Pending JPS5547379A (en) 1978-10-02 1978-10-02 Manufacture of boron nitride coated film by chemical vapor deposition

Country Status (1)

Country Link
JP (1) JPS5547379A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61149477A (en) * 1984-12-25 1986-07-08 Furukawa Mining Co Ltd Formation of boron nitride film
JPS61177372A (en) * 1985-01-31 1986-08-09 Kyocera Corp Production of boron nitride film
EP0200502A2 (en) 1985-04-30 1986-11-05 Konica Corporation Light-sensitive silver halide color photographic material
JPS62104779A (en) * 1985-10-31 1987-05-15 Toshiba Corp Rail shaft
CN109791876A (en) * 2016-05-12 2019-05-21 环球晶圆股份有限公司 Hexagonal boron nitride is directly formed on silicon substrate dielectric
CN110921637A (en) * 2018-09-20 2020-03-27 中国科学院上海微***与信息技术研究所 Preparation method of multilayer hexagonal boron nitride film
US20230125793A1 (en) * 2021-10-26 2023-04-27 William Marsh Rice University Method of making hexagonal boron nitride coatings and compositions and methods of using same
WO2023189258A1 (en) * 2022-03-31 2023-10-05 住友化学株式会社 Production method for hexagonal boron nitride thin film, laminate

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61149477A (en) * 1984-12-25 1986-07-08 Furukawa Mining Co Ltd Formation of boron nitride film
JPS61177372A (en) * 1985-01-31 1986-08-09 Kyocera Corp Production of boron nitride film
EP0200502A2 (en) 1985-04-30 1986-11-05 Konica Corporation Light-sensitive silver halide color photographic material
JPS62104779A (en) * 1985-10-31 1987-05-15 Toshiba Corp Rail shaft
CN109791876A (en) * 2016-05-12 2019-05-21 环球晶圆股份有限公司 Hexagonal boron nitride is directly formed on silicon substrate dielectric
CN109791876B (en) * 2016-05-12 2023-08-15 环球晶圆股份有限公司 Direct formation of hexagonal boron nitride on silicon-based dielectrics
CN110921637A (en) * 2018-09-20 2020-03-27 中国科学院上海微***与信息技术研究所 Preparation method of multilayer hexagonal boron nitride film
CN110921637B (en) * 2018-09-20 2022-09-23 中国科学院上海微***与信息技术研究所 Preparation method of multilayer hexagonal boron nitride film
US11679978B2 (en) 2018-09-20 2023-06-20 Shanghai Institute Of Microsystem And Information Technology, Chinese Academy Of Sciences Method for preparing multi-layer hexagonal boron nitride film
US20230125793A1 (en) * 2021-10-26 2023-04-27 William Marsh Rice University Method of making hexagonal boron nitride coatings and compositions and methods of using same
WO2023189258A1 (en) * 2022-03-31 2023-10-05 住友化学株式会社 Production method for hexagonal boron nitride thin film, laminate

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