GB1328451A - Depositing a metal layer on a substrate - Google Patents

Depositing a metal layer on a substrate

Info

Publication number
GB1328451A
GB1328451A GB1328451DA GB1328451A GB 1328451 A GB1328451 A GB 1328451A GB 1328451D A GB1328451D A GB 1328451DA GB 1328451 A GB1328451 A GB 1328451A
Authority
GB
United Kingdom
Prior art keywords
substrate
vapour
depositing
metal layer
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Philips Components Ltd
Original Assignee
Mullard Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mullard Ltd filed Critical Mullard Ltd
Publication of GB1328451A publication Critical patent/GB1328451A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material

Abstract

1328451 Coating with metals by decomposition of a vapour MULLARD Ltd 6 March 1972 [26 March 1971] 7918/71 Heading C7F A metal e.g. W, Mo or Re, is deposited on a substrate of e.g. W, Mo or W-Mo by reducing a stream of the metal oxide vapour, water vapour and inert gas by means of a reducing gas, e. g. hydrogen. The metal oxide vapour may be formed by passing water vapour over the metal. The substrate may be heated to 650 to 1400‹ C by e.g. H.F. heating.
GB1328451D 1971-03-26 1971-03-26 Depositing a metal layer on a substrate Expired GB1328451A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB791871 1971-03-26

Publications (1)

Publication Number Publication Date
GB1328451A true GB1328451A (en) 1973-08-30

Family

ID=9842295

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1328451D Expired GB1328451A (en) 1971-03-26 1971-03-26 Depositing a metal layer on a substrate

Country Status (1)

Country Link
GB (1) GB1328451A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2391288A1 (en) * 1977-05-18 1978-12-15 Siemens Ag PROCESS FOR THE REALIZATION OF THIN LAYERS OF METALS RESISTANT TO HIGH TEMPERATURES SUCH AS TUNGSTENE, MOLYBDENE, RHENIUM OR OSMIUM

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2391288A1 (en) * 1977-05-18 1978-12-15 Siemens Ag PROCESS FOR THE REALIZATION OF THIN LAYERS OF METALS RESISTANT TO HIGH TEMPERATURES SUCH AS TUNGSTENE, MOLYBDENE, RHENIUM OR OSMIUM
US4198449A (en) * 1977-05-18 1980-04-15 Siemens Aktiengesellschaft Method for the preparation of thin films of high-temperature-resistant metals such as tungsten, molybdenum, rhenium or osmium

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees