JPS5538057A - Electron beam device - Google Patents

Electron beam device

Info

Publication number
JPS5538057A
JPS5538057A JP11152478A JP11152478A JPS5538057A JP S5538057 A JPS5538057 A JP S5538057A JP 11152478 A JP11152478 A JP 11152478A JP 11152478 A JP11152478 A JP 11152478A JP S5538057 A JPS5538057 A JP S5538057A
Authority
JP
Japan
Prior art keywords
electron beams
location
cross
over
aperture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11152478A
Other languages
Japanese (ja)
Other versions
JPS5856946B2 (en
Inventor
Mamoru Nakasuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP11152478A priority Critical patent/JPS5856946B2/en
Publication of JPS5538057A publication Critical patent/JPS5538057A/en
Publication of JPS5856946B2 publication Critical patent/JPS5856946B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

PURPOSE: To obtain stable electron beams, by each compensating the variation of the intensity and the fluctuation of the locations of electron beams independently.
CONSTITUTION: The variation of a location of a cross-over image due to the fluctuation of location a of the cross-over of electron beams is detected by arranging an electrode 14 near an objective lens 8, and the variation of the location is compensated by driving a deflection coil 16 mounted at a position of an aperture 6. In this case, a location of electron beams on a target 9 does not change in the deflection of electron beams because the position of the aperture 6 functions as a fulcrum. The alteration of the distribution of the radiation anlges of electron beams is detected by means of an electrode 11, and the location of cross-over does not fluctuate because the electron beams are deflected by means of a deflection coil 13 while using the location a of cross-over as a fulcrum. Thus, the distribution of intensity at an aperture 3 is kept constant. A LaB6 cathode electron gun 1 can be employed because stable electron beams are further obtained.
COPYRIGHT: (C)1980,JPO&Japio
JP11152478A 1978-09-11 1978-09-11 electron beam equipment Expired JPS5856946B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11152478A JPS5856946B2 (en) 1978-09-11 1978-09-11 electron beam equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11152478A JPS5856946B2 (en) 1978-09-11 1978-09-11 electron beam equipment

Publications (2)

Publication Number Publication Date
JPS5538057A true JPS5538057A (en) 1980-03-17
JPS5856946B2 JPS5856946B2 (en) 1983-12-17

Family

ID=14563507

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11152478A Expired JPS5856946B2 (en) 1978-09-11 1978-09-11 electron beam equipment

Country Status (1)

Country Link
JP (1) JPS5856946B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014138175A (en) * 2013-01-18 2014-07-28 Nuflare Technology Inc Charged particle beam drawing apparatus, method for adjusting beam incident angle to sample surface, and charged particle beam drawing method

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63300934A (en) * 1987-05-31 1988-12-08 Nissan Jidosha Hanbai Kk Testing instrument for traveling of automobile

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014138175A (en) * 2013-01-18 2014-07-28 Nuflare Technology Inc Charged particle beam drawing apparatus, method for adjusting beam incident angle to sample surface, and charged particle beam drawing method
US9824849B2 (en) 2013-01-18 2017-11-21 Nuflare Technology, Inc. Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method
US10192712B2 (en) 2013-01-18 2019-01-29 Nuflare Technology, Inc. Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method
US11145483B2 (en) 2013-01-18 2021-10-12 Nuflare Technology, Inc. Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method

Also Published As

Publication number Publication date
JPS5856946B2 (en) 1983-12-17

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