JPS5538057A - Electron beam device - Google Patents
Electron beam deviceInfo
- Publication number
- JPS5538057A JPS5538057A JP11152478A JP11152478A JPS5538057A JP S5538057 A JPS5538057 A JP S5538057A JP 11152478 A JP11152478 A JP 11152478A JP 11152478 A JP11152478 A JP 11152478A JP S5538057 A JPS5538057 A JP S5538057A
- Authority
- JP
- Japan
- Prior art keywords
- electron beams
- location
- cross
- over
- aperture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electron Beam Exposure (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
PURPOSE: To obtain stable electron beams, by each compensating the variation of the intensity and the fluctuation of the locations of electron beams independently.
CONSTITUTION: The variation of a location of a cross-over image due to the fluctuation of location a of the cross-over of electron beams is detected by arranging an electrode 14 near an objective lens 8, and the variation of the location is compensated by driving a deflection coil 16 mounted at a position of an aperture 6. In this case, a location of electron beams on a target 9 does not change in the deflection of electron beams because the position of the aperture 6 functions as a fulcrum. The alteration of the distribution of the radiation anlges of electron beams is detected by means of an electrode 11, and the location of cross-over does not fluctuate because the electron beams are deflected by means of a deflection coil 13 while using the location a of cross-over as a fulcrum. Thus, the distribution of intensity at an aperture 3 is kept constant. A LaB6 cathode electron gun 1 can be employed because stable electron beams are further obtained.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11152478A JPS5856946B2 (en) | 1978-09-11 | 1978-09-11 | electron beam equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11152478A JPS5856946B2 (en) | 1978-09-11 | 1978-09-11 | electron beam equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5538057A true JPS5538057A (en) | 1980-03-17 |
JPS5856946B2 JPS5856946B2 (en) | 1983-12-17 |
Family
ID=14563507
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11152478A Expired JPS5856946B2 (en) | 1978-09-11 | 1978-09-11 | electron beam equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5856946B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014138175A (en) * | 2013-01-18 | 2014-07-28 | Nuflare Technology Inc | Charged particle beam drawing apparatus, method for adjusting beam incident angle to sample surface, and charged particle beam drawing method |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63300934A (en) * | 1987-05-31 | 1988-12-08 | Nissan Jidosha Hanbai Kk | Testing instrument for traveling of automobile |
-
1978
- 1978-09-11 JP JP11152478A patent/JPS5856946B2/en not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014138175A (en) * | 2013-01-18 | 2014-07-28 | Nuflare Technology Inc | Charged particle beam drawing apparatus, method for adjusting beam incident angle to sample surface, and charged particle beam drawing method |
US9824849B2 (en) | 2013-01-18 | 2017-11-21 | Nuflare Technology, Inc. | Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method |
US10192712B2 (en) | 2013-01-18 | 2019-01-29 | Nuflare Technology, Inc. | Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method |
US11145483B2 (en) | 2013-01-18 | 2021-10-12 | Nuflare Technology, Inc. | Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method |
Also Published As
Publication number | Publication date |
---|---|
JPS5856946B2 (en) | 1983-12-17 |
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