JPS5472980A - Electron-beam drawing unit - Google Patents

Electron-beam drawing unit

Info

Publication number: JPS5472980A
Authority: JP; Japan
Prior art keywords: electron; lens; focusing; image; final
Prior art date: 1977-11-24
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

JP13994177A

Other languages

English (en)

Other versions

JPS5616536B2 (ja

Inventor

Susumu Ozasa

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Hitachi Ltd

Original Assignee

Hitachi Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1977-11-24

Filing date

1977-11-24

Publication date

1979-06-11

1977-11-24 Application filed by Hitachi Ltd filed Critical Hitachi Ltd

1977-11-24 Priority to JP13994177A priority Critical patent/JPS5472980A/ja

1978-11-21 Priority to US05/962,768 priority patent/US4199688A/en

1978-11-21 Priority to CA316,633A priority patent/CA1103813A/en

1978-11-22 Priority to FR7832894A priority patent/FR2410362A1/fr

1978-11-23 Priority to GB7845842A priority patent/GB2011125B/en

1978-11-24 Priority to DE19782850991 priority patent/DE2850991A1/de

1978-11-24 Priority to NLAANVRAGE7811577,A priority patent/NL173898C/xx

1979-06-11 Publication of JPS5472980A publication Critical patent/JPS5472980A/ja

1981-04-16 Publication of JPS5616536B2 publication Critical patent/JPS5616536B2/ja

Status Granted legal-status Critical Current

Links

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/21—Means for adjusting the focus
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration

Landscapes

Chemical & Material Sciences (AREA)
Analytical Chemistry (AREA)
Electron Beam Exposure (AREA)

JP13994177A 1977-11-24 1977-11-24 Electron-beam drawing unit Granted JPS5472980A (en)

Priority Applications (7)

Application Number	Priority Date	Filing Date	Title
JP13994177A JPS5472980A (en)	1977-11-24	1977-11-24	Electron-beam drawing unit
US05/962,768 US4199688A (en)	1977-11-24	1978-11-21	Apparatus for electron beam lithography
CA316,633A CA1103813A (en)	1977-11-24	1978-11-21	Apparatus for electron beam lithography
FR7832894A FR2410362A1 (fr)	1977-11-24	1978-11-22	Appareil de lithographie par faisceau electronique
GB7845842A GB2011125B (en)	1977-11-24	1978-11-23	Apparatus for electron beam lithograhy
DE19782850991 DE2850991A1 (de)	1977-11-24	1978-11-24	Elektronenstrahl-lithographieverfahren
NLAANVRAGE7811577,A NL173898C (nl)	1977-11-24	1978-11-24	Inrichting voor lithografie met behulp van een elektronenbundel.

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP13994177A JPS5472980A (en)	1977-11-24	1977-11-24	Electron-beam drawing unit

Publications (2)

Publication Number	Publication Date
JPS5472980A true JPS5472980A (en)	1979-06-11
JPS5616536B2 JPS5616536B2 (ja)	1981-04-16

Family

ID=15257230

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP13994177A Granted JPS5472980A (en)	1977-11-24	1977-11-24	Electron-beam drawing unit

Country Status (7)

Country	Link
US (1)	US4199688A (ja)
JP (1)	JPS5472980A (ja)
CA (1)	CA1103813A (ja)
DE (1)	DE2850991A1 (ja)
FR (1)	FR2410362A1 (ja)
GB (1)	GB2011125B (ja)
NL (1)	NL173898C (ja)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5621321A (en) *	1979-07-27	1981-02-27	Fujitsu Ltd	Automatically setting method of focus and exposure coefficient of electron beam exposure apparatus
US4376249A (en) *	1980-11-06	1983-03-08	International Business Machines Corporation	Variable axis electron beam projection system
US4417203A (en) *	1981-05-26	1983-11-22	International Business Machines Corporation	System for contactless electrical property testing of multi-layer ceramics
US4415851A (en) *	1981-05-26	1983-11-15	International Business Machines Corporation	System for contactless testing of multi-layer ceramics
US4568861A (en) *	1983-06-27	1986-02-04	International Business Machines Corporation	Method and apparatus for controlling alignment and brightness of an electron beam
NL8304217A (nl) *	1983-12-07	1985-07-01	Philips Nv	Automatisch instelbare electronenmicroscoop.
NL8702874A (nl) *	1987-12-01	1989-07-03	Philips Nv	Inspectie apparaat met gedigitaliseerde elektronen detectie.
CA1308203C (en) *	1989-06-01	1992-09-29	Nanoquest (Canada) Inc.	Magnification compensation apparatus
JPH11191529A (ja) *	1997-12-25	1999-07-13	Nikon Corp	荷電ビーム露光方法
US6781680B1 (en)	1999-03-26	2004-08-24	Kabushiki Kaisha Toshiba	Optical system adjusting method for energy beam apparatus
JP3946899B2 (ja) *	1999-03-26	2007-07-18	株式会社東芝	エネルギービーム装置における光学系の調整方法
JP3508622B2 (ja) *	1999-05-20	2004-03-22	株式会社日立製作所	電子ビーム描画装置および電子ビームを用いた描画方法
NL1015155C2 (nl) *	2000-05-11	2001-11-13	Tno	Elektronenstraallithografie.
US7095484B1 (en) *	2001-06-27	2006-08-22	University Of South Florida	Method and apparatus for maskless photolithography
US6764796B2 (en) *	2001-06-27	2004-07-20	University Of South Florida	Maskless photolithography using plasma displays
US7049049B2 (en)	2001-06-27	2006-05-23	University Of South Florida	Maskless photolithography for using photoreactive agents
US6998219B2 (en) *	2001-06-27	2006-02-14	University Of South Florida	Maskless photolithography for etching and deposition
WO2008021834A2 (en) *	2006-08-11	2008-02-21	The Regents Of The University Of California	High-resolution microscope using optical amplification

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3576438A (en) *	1969-04-28	1971-04-27	Bell Telephone Labor Inc	Focus monitor for electron microscope including an auxiliary electron gun and focusing lens
US3644700A (en) *	1969-12-15	1972-02-22	Ibm	Method and apparatus for controlling an electron beam

1977
- 1977-11-24 JP JP13994177A patent/JPS5472980A/ja active Granted
1978
- 1978-11-21 CA CA316,633A patent/CA1103813A/en not_active Expired
- 1978-11-21 US US05/962,768 patent/US4199688A/en not_active Expired - Lifetime
- 1978-11-22 FR FR7832894A patent/FR2410362A1/fr active Granted
- 1978-11-23 GB GB7845842A patent/GB2011125B/en not_active Expired
- 1978-11-24 NL NLAANVRAGE7811577,A patent/NL173898C/xx not_active IP Right Cessation
- 1978-11-24 DE DE19782850991 patent/DE2850991A1/de not_active Withdrawn

Also Published As

Publication number	Publication date
JPS5616536B2 (ja)	1981-04-16
GB2011125A (en)	1979-07-04
CA1103813A (en)	1981-06-23
NL173898B (nl)	1983-10-17
FR2410362B1 (ja)	1981-05-29
NL7811577A (nl)	1979-05-28
NL173898C (nl)	1984-03-16
DE2850991A1 (de)	1979-05-31
GB2011125B (en)	1982-02-24
FR2410362A1 (fr)	1979-06-22
US4199688A (en)	1980-04-22

Publication	Publication Date	Title
JPS5472980A (en)	1979-06-11	Electron-beam drawing unit
GB2041639B (en)	1983-09-07	Electron beam lithography
US4021674A (en)	1977-05-03	Charged-particle beam optical apparatus for irradiating a specimen in a two-dimensional pattern
JPS5727551A (en)	1982-02-13	Electron microscope
US4158140A (en)	1979-06-12	Electron beam exposure apparatus
JPS5469075A (en)	1979-06-02	Electron beam drawing device
US4152599A (en)	1979-05-01	Method for positioning a workpiece relative to a scanning field or a mask in a charged-particle beam apparatus
JPS5767912A (en)	1982-04-24	Axis aligning method of electronic optical lens barrel
JPS57210549A (en)	1982-12-24	Method of correction attendant on deflection
JPS6415604A (en)	1989-01-19	Measuring apparatus for length by electron beam
JPS5546553A (en)	1980-04-01	Method of projecting electron beam
JPS6182428A (ja)	1986-04-26	電荷ビ−ム光学鏡筒のレンズ調整方法
JPS56125606A (en)	1981-10-02	Stereoscopic shape detector
JPS5467452A (en)	1979-05-30	Laser induced damage evaluator
JPS5454581A (en)	1979-04-28	Electron beam exposure apparatus
KR940000867A (ko)	1994-01-10	이차 이온 질량분석기
JPS56147437A (en)	1981-11-16	Electron beam exposure method
JPS5848042B2 (ja)	1983-10-26	電子線と材料の移動方向とのずれを検出する方法
JP2758979B2 (ja)	1998-05-28	マーク位置検出方法
JPS5382283A (en)	1978-07-20	Electronic gun for x-ray generation
JPS5651826A (en)	1981-05-09	Image drawing apparatus by electron beam
JPS64736A (en)	1989-01-05	Ion beam device
JPS5548929A (en)	1980-04-08	Method of drawing by electron beam
JPS5481063A (en)	1979-06-28	Electron-beam equipment
JPS55110044A (en)	1980-08-25	Electron beam projector