JPS57210549A - Method of correction attendant on deflection - Google Patents

Method of correction attendant on deflection

Info

Publication number
JPS57210549A
JPS57210549A JP9392081A JP9392081A JPS57210549A JP S57210549 A JPS57210549 A JP S57210549A JP 9392081 A JP9392081 A JP 9392081A JP 9392081 A JP9392081 A JP 9392081A JP S57210549 A JPS57210549 A JP S57210549A
Authority
JP
Japan
Prior art keywords
corpuscular beam
charged corpuscular
deflection
marks
detector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9392081A
Other languages
Japanese (ja)
Inventor
Katsuhiro Kuroda
Masaru Miyazaki
Nobuo Shimazu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Nippon Telegraph and Telephone Corp filed Critical Hitachi Ltd
Priority to JP9392081A priority Critical patent/JPS57210549A/en
Publication of JPS57210549A publication Critical patent/JPS57210549A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147Arrangements for directing or deflecting the discharge along a desired path

Abstract

PURPOSE:To correct various aberrations attendant on deflection, by arranging at least eight marks in the vicinity of a deflecting field on the surface of irradiation, while irradiating a charged corpuscular beam to these marks, in reference to a charged corpuscular beam allied unit. CONSTITUTION:Marks 1-8 are added to the vicinity of a deflecting field in advance. When a charged corpuscular beam 11 is scanned on each mark, a secondary charged corpuscular beam is generated from the sample face and the incident beam falls in a detector 16. At this moment, the generating value of the charged corpuscular beam from the top of the mark and from the outside of it is different so that if the value is checked by the detector 16, relationships between this signal value to a deflector 14 and the mark position and the converged size of the charged corpuscular beam, etc., are made out. This operation is carried out by a measuring system 17. For example, each factor is found by a factorial determination system 18 with a minimal square-law, etc. On a basis of this factor, when deflection is carried out at a desirable position, a correction signal 20 is to be found by this factor and accurate correction comes achieved by the detector 21.
JP9392081A 1981-06-19 1981-06-19 Method of correction attendant on deflection Pending JPS57210549A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9392081A JPS57210549A (en) 1981-06-19 1981-06-19 Method of correction attendant on deflection

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9392081A JPS57210549A (en) 1981-06-19 1981-06-19 Method of correction attendant on deflection

Publications (1)

Publication Number Publication Date
JPS57210549A true JPS57210549A (en) 1982-12-24

Family

ID=14095890

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9392081A Pending JPS57210549A (en) 1981-06-19 1981-06-19 Method of correction attendant on deflection

Country Status (1)

Country Link
JP (1) JPS57210549A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61174629A (en) * 1985-01-28 1986-08-06 Hitachi Ltd Electron beam image drawing apparatus
JPS61177718A (en) * 1985-02-04 1986-08-09 Hitachi Ltd Electron beam lithography equipment
JPS632320A (en) * 1986-06-23 1988-01-07 Agency Of Ind Science & Technol Corerection for deflecting distortion in focused ion beam
JPS63150842A (en) * 1986-12-15 1988-06-23 Nichidenshi Tekunikusu:Kk Scanning electron microscope
JPH01130458A (en) * 1987-11-16 1989-05-23 Nichidenshi Tekunikusu:Kk Distortion correcting device for scanning electron microscope image
AT394086B (en) * 1988-03-22 1992-01-27 Roto Frank Eisenwaren ADJUSTABLE TAPE FOR WINDOW OR DOOR SHUTTERS

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61174629A (en) * 1985-01-28 1986-08-06 Hitachi Ltd Electron beam image drawing apparatus
JPS61177718A (en) * 1985-02-04 1986-08-09 Hitachi Ltd Electron beam lithography equipment
JPS632320A (en) * 1986-06-23 1988-01-07 Agency Of Ind Science & Technol Corerection for deflecting distortion in focused ion beam
JPS63150842A (en) * 1986-12-15 1988-06-23 Nichidenshi Tekunikusu:Kk Scanning electron microscope
JPH01130458A (en) * 1987-11-16 1989-05-23 Nichidenshi Tekunikusu:Kk Distortion correcting device for scanning electron microscope image
AT394086B (en) * 1988-03-22 1992-01-27 Roto Frank Eisenwaren ADJUSTABLE TAPE FOR WINDOW OR DOOR SHUTTERS

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