JPS5453629A - Resistance chemical plating method - Google Patents
Resistance chemical plating methodInfo
- Publication number
- JPS5453629A JPS5453629A JP11992777A JP11992777A JPS5453629A JP S5453629 A JPS5453629 A JP S5453629A JP 11992777 A JP11992777 A JP 11992777A JP 11992777 A JP11992777 A JP 11992777A JP S5453629 A JPS5453629 A JP S5453629A
- Authority
- JP
- Japan
- Prior art keywords
- salt
- chemical plating
- plating method
- plating bath
- printed substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/16—Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor
- H05K1/167—Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor incorporating printed resistors
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/48—Coating with alloys
- C23C18/50—Coating with alloys with alloys based on iron, cobalt or nickel
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0344—Electroless sublayer, e.g. Ni, Co, Cd or Ag; Transferred electroless sublayer
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemically Coating (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
PURPOSE: To obtain a resistance film with a high specific resistance value by treating a printed substrate with an alkaline chemical plating bath based on a Ni salt and/ or a Co salt, a Zn salt, a complexing agent, and a reducing agent.
CONSTITUTION: A printed substrate is treated with an alkaline chemical plating bath based on a Ni salt such as NiSO4 and/or a Co salt such as CoSO4, a Zn salt such as ZnSO4, a complexing agent such as citric acid (salt), and a reducing agent such as hypophosphorous acid (salt). The molar ratio of the Zn salt to the Ni and/ or Co salts is 0.1 or more. By ths method a plate film is obtd. having a specific resistance of about 3×10-3W2×10-1Ωcm
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11992777A JPS5453629A (en) | 1977-10-07 | 1977-10-07 | Resistance chemical plating method |
GB7839089A GB2006831A (en) | 1977-10-07 | 1978-10-03 | Depositing film resistors by electroless coating |
DE19782843582 DE2843582A1 (en) | 1977-10-07 | 1978-10-05 | METHOD FOR PRODUCING A RESISTANT LAYER BY ELECTRIC DEPOSITION |
NL7810123A NL7810123A (en) | 1977-10-07 | 1978-10-06 | PROCEDURE FOR DEPOSITING A FILM RESISTOR BY CURRENT PLATING. |
FR7828646A FR2405613A1 (en) | 1977-10-07 | 1978-10-06 | PROCESS FOR DEPOSITING A CIRCUIT RESISTOR PRINTED BY NON-GALVANIC VENEERING |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11992777A JPS5453629A (en) | 1977-10-07 | 1977-10-07 | Resistance chemical plating method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5453629A true JPS5453629A (en) | 1979-04-27 |
Family
ID=14773607
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11992777A Pending JPS5453629A (en) | 1977-10-07 | 1977-10-07 | Resistance chemical plating method |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS5453629A (en) |
DE (1) | DE2843582A1 (en) |
FR (1) | FR2405613A1 (en) |
GB (1) | GB2006831A (en) |
NL (1) | NL7810123A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5712592A (en) * | 1980-06-27 | 1982-01-22 | Hitachi Ltd | Method of metallizing sic board |
JPS58193354A (en) * | 1982-04-30 | 1983-11-11 | Hitachi Chem Co Ltd | Plating bath |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6818313B2 (en) * | 2002-07-24 | 2004-11-16 | University Of Dayton | Corrosion-inhibiting coating |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1508104A (en) * | 1965-06-28 | 1968-01-05 | Ibm | Acid corrosion |
GB1266729A (en) * | 1969-08-29 | 1972-03-15 | ||
NL7301044A (en) * | 1973-01-25 | 1974-07-29 |
-
1977
- 1977-10-07 JP JP11992777A patent/JPS5453629A/en active Pending
-
1978
- 1978-10-03 GB GB7839089A patent/GB2006831A/en not_active Withdrawn
- 1978-10-05 DE DE19782843582 patent/DE2843582A1/en active Pending
- 1978-10-06 FR FR7828646A patent/FR2405613A1/en active Pending
- 1978-10-06 NL NL7810123A patent/NL7810123A/en not_active Application Discontinuation
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5712592A (en) * | 1980-06-27 | 1982-01-22 | Hitachi Ltd | Method of metallizing sic board |
JPS6325720B2 (en) * | 1980-06-27 | 1988-05-26 | Hitachi Ltd | |
JPS58193354A (en) * | 1982-04-30 | 1983-11-11 | Hitachi Chem Co Ltd | Plating bath |
JPH0216390B2 (en) * | 1982-04-30 | 1990-04-17 | Hitachi Chemical Co Ltd |
Also Published As
Publication number | Publication date |
---|---|
GB2006831A (en) | 1979-05-10 |
DE2843582A1 (en) | 1979-04-12 |
FR2405613A1 (en) | 1979-05-04 |
NL7810123A (en) | 1979-04-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR870010216A (en) | Electroless Copper Plating and Plating Baths Used Here | |
JPS5453629A (en) | Resistance chemical plating method | |
JPS56271A (en) | Non-electrolytic copper plating solution | |
JPS5751276A (en) | Manufacture of anode for electrolyzing water | |
JPS57140891A (en) | Pretreating solution for silver plating | |
JPS575856A (en) | Plating method | |
JPS56136965A (en) | Plating method | |
GB1381243A (en) | Method for metallizing substrates | |
JPS5419430A (en) | Chemical copper plating solution | |
JPS55164067A (en) | Method for nonelectrolytic plating | |
JPS53144837A (en) | Electroless copper plating bath | |
JPS5770286A (en) | Plating bath composition and plating method | |
JPS56136966A (en) | Electroless plating method | |
JPS53146933A (en) | Chemical plating method | |
JPS5415433A (en) | Method of producing tin electro-plate | |
JPS547862A (en) | Electrode forming method | |
JPS5579892A (en) | Silver plating method | |
JPS53146936A (en) | Insulator plating method | |
JPS533064A (en) | Production of semiconductor device | |
JPS53144835A (en) | Electroless copper plating bath | |
JPS53101975A (en) | Treating method of semiconductor substrates | |
JPS53103936A (en) | Electroplating solution | |
JPS57188664A (en) | Electroless plating method for insulation substrate | |
JPS52146177A (en) | Preparation of semiconductor device | |
JPS5382279A (en) | Production of semiconductor device |