JPS52143772A - Alignment method of masks using special reference marks - Google Patents

Alignment method of masks using special reference marks

Info

Publication number
JPS52143772A
JPS52143772A JP6003676A JP6003676A JPS52143772A JP S52143772 A JPS52143772 A JP S52143772A JP 6003676 A JP6003676 A JP 6003676A JP 6003676 A JP6003676 A JP 6003676A JP S52143772 A JPS52143772 A JP S52143772A
Authority
JP
Japan
Prior art keywords
masks
alignment method
reference marks
special reference
patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6003676A
Other languages
Japanese (ja)
Other versions
JPS5931852B2 (en
Inventor
Hiroshi Nishizuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP51060036A priority Critical patent/JPS5931852B2/en
Publication of JPS52143772A publication Critical patent/JPS52143772A/en
Publication of JPS5931852B2 publication Critical patent/JPS5931852B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To achieve the reduction of preliminary exposure time by using patterns wherein a large number of small patterns of a quadrilateral are assembled and arrayed.
COPYRIGHT: (C)1977,JPO&Japio
JP51060036A 1976-05-26 1976-05-26 Photoresist exposure mask Expired JPS5931852B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51060036A JPS5931852B2 (en) 1976-05-26 1976-05-26 Photoresist exposure mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51060036A JPS5931852B2 (en) 1976-05-26 1976-05-26 Photoresist exposure mask

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP58183016A Division JPS5932893B2 (en) 1983-10-03 1983-10-03 Mask alignment method using special reference marks

Publications (2)

Publication Number Publication Date
JPS52143772A true JPS52143772A (en) 1977-11-30
JPS5931852B2 JPS5931852B2 (en) 1984-08-04

Family

ID=13130432

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51060036A Expired JPS5931852B2 (en) 1976-05-26 1976-05-26 Photoresist exposure mask

Country Status (1)

Country Link
JP (1) JPS5931852B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54111773A (en) * 1978-02-22 1979-09-01 Hitachi Ltd Semiconductor wafer
JPS5553439A (en) * 1978-10-16 1980-04-18 Fujitsu Ltd Dicing treatment method
JPS6453418A (en) * 1987-04-14 1989-03-01 Gen Signal Corp Wafer aligning system

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5962763U (en) * 1982-10-19 1984-04-25 川口　一尚 fruit support

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54111773A (en) * 1978-02-22 1979-09-01 Hitachi Ltd Semiconductor wafer
JPS5553439A (en) * 1978-10-16 1980-04-18 Fujitsu Ltd Dicing treatment method
JPS6453418A (en) * 1987-04-14 1989-03-01 Gen Signal Corp Wafer aligning system

Also Published As

Publication number Publication date
JPS5931852B2 (en) 1984-08-04

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