JPS54156345A - Purification of metal plating waste water - Google Patents

Purification of metal plating waste water

Info

Publication number
JPS54156345A
JPS54156345A JP6613078A JP6613078A JPS54156345A JP S54156345 A JPS54156345 A JP S54156345A JP 6613078 A JP6613078 A JP 6613078A JP 6613078 A JP6613078 A JP 6613078A JP S54156345 A JPS54156345 A JP S54156345A
Authority
JP
Japan
Prior art keywords
added
waste water
solution
purification
metal plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6613078A
Other languages
Japanese (ja)
Other versions
JPS5642999B2 (en
Inventor
Mitsusaku Otsubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Plant Technologies Ltd
Original Assignee
Hitachi Plant Technologies Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Plant Technologies Ltd filed Critical Hitachi Plant Technologies Ltd
Priority to JP6613078A priority Critical patent/JPS54156345A/en
Publication of JPS54156345A publication Critical patent/JPS54156345A/en
Publication of JPS5642999B2 publication Critical patent/JPS5642999B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To provide a method of the purification of metal plating waste water, wherein to waste water containing EDTA, HCHO, Cu, etc. are added a mineral acid, an oxidizing agent, a ferrous salt and an alkali in this order so that organic contaminants in the waste water can be decomposed and removed with a higher elimination rate.
CONSTITUTION: In order to decompose and remove organic contaminants with a higher elimination rate from a chemical copper plating solution, which dose not mean a copper electroplating solution containing cyanide compounds, for example a chemical copper plating waste solution containing EDTA, HCHO, Cu, etc., a mineral acid, such as sulfuric acid is added to the waste solution to adjust its pH value to 1 to 2, the resulting precipitate is removed, then the filtrate (if desired, this filtrate is subjected to electrolysis to separate off copper for recovery) is added with an oxidizing agent such as hydrogen peroxide, oxidizing agents containing chlorine or the like to be subjected to oxidizing treatment and then is added with a ferrous salt, thereafter is added with an alkali (NaOH) to adjust its pH value to between 4 and 10 so that precipitation will be resulted, and a gas containing oxygen is introduced into the thus treated solution to floculate the precipitate to be removed.
COPYRIGHT: (C)1979,JPO&Japio
JP6613078A 1978-05-31 1978-05-31 Purification of metal plating waste water Granted JPS54156345A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6613078A JPS54156345A (en) 1978-05-31 1978-05-31 Purification of metal plating waste water

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6613078A JPS54156345A (en) 1978-05-31 1978-05-31 Purification of metal plating waste water

Publications (2)

Publication Number Publication Date
JPS54156345A true JPS54156345A (en) 1979-12-10
JPS5642999B2 JPS5642999B2 (en) 1981-10-08

Family

ID=13306969

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6613078A Granted JPS54156345A (en) 1978-05-31 1978-05-31 Purification of metal plating waste water

Country Status (1)

Country Link
JP (1) JPS54156345A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1502963A1 (en) * 2003-08-01 2005-02-02 Rohm and Haas Electronic Materials, L.L.C. Recovery of metals from azole containing waste fluid by ozonization and electrolysis
CN106396205A (en) * 2016-08-30 2017-02-15 盛隆资源再生(无锡)有限公司 Method for removing heavy metal by carrying out cyanide breaking on high-concentration cyanide wastewater
CN110615557A (en) * 2019-10-16 2019-12-27 镇江市和云工业废水处置有限公司 Treatment process of electroless copper plating wastewater
CN113620485A (en) * 2021-09-14 2021-11-09 万安裕维电子有限公司 Treatment method of PCB production waste liquid

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1502963A1 (en) * 2003-08-01 2005-02-02 Rohm and Haas Electronic Materials, L.L.C. Recovery of metals from azole containing waste fluid by ozonization and electrolysis
CN106396205A (en) * 2016-08-30 2017-02-15 盛隆资源再生(无锡)有限公司 Method for removing heavy metal by carrying out cyanide breaking on high-concentration cyanide wastewater
CN106396205B (en) * 2016-08-30 2019-06-14 盛隆资源再生(无锡)有限公司 A kind of method of high concentration cyanide wastewater broken cyanide removing heavy metals
CN110615557A (en) * 2019-10-16 2019-12-27 镇江市和云工业废水处置有限公司 Treatment process of electroless copper plating wastewater
CN113620485A (en) * 2021-09-14 2021-11-09 万安裕维电子有限公司 Treatment method of PCB production waste liquid

Also Published As

Publication number Publication date
JPS5642999B2 (en) 1981-10-08

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