JPS5386577A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS5386577A
JPS5386577A JP80777A JP80777A JPS5386577A JP S5386577 A JPS5386577 A JP S5386577A JP 80777 A JP80777 A JP 80777A JP 80777 A JP80777 A JP 80777A JP S5386577 A JPS5386577 A JP S5386577A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
parts
extching
faciliate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP80777A
Other languages
Japanese (ja)
Other versions
JPS6054776B2 (en
Inventor
Masao Tsuruoka
Komei Yatsuno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP80777A priority Critical patent/JPS6054776B2/en
Publication of JPS5386577A publication Critical patent/JPS5386577A/en
Publication of JPS6054776B2 publication Critical patent/JPS6054776B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Formation Of Insulating Films (AREA)

Abstract

PURPOSE: To faciliate etching of unnecessary glass parts and lower production cost by exposing the SiO2 of opening parts to oxygen plasma before extching the same.
COPYRIGHT: (C)1978,JPO&Japio
JP80777A 1977-01-10 1977-01-10 Manufacturing method for semiconductor devices Expired JPS6054776B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP80777A JPS6054776B2 (en) 1977-01-10 1977-01-10 Manufacturing method for semiconductor devices

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP80777A JPS6054776B2 (en) 1977-01-10 1977-01-10 Manufacturing method for semiconductor devices

Publications (2)

Publication Number Publication Date
JPS5386577A true JPS5386577A (en) 1978-07-31
JPS6054776B2 JPS6054776B2 (en) 1985-12-02

Family

ID=11483942

Family Applications (1)

Application Number Title Priority Date Filing Date
JP80777A Expired JPS6054776B2 (en) 1977-01-10 1977-01-10 Manufacturing method for semiconductor devices

Country Status (1)

Country Link
JP (1) JPS6054776B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6410248A (en) * 1987-07-03 1989-01-13 Fuji Xerox Co Ltd Method for removing resist in chrome photolithoetching

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6410248A (en) * 1987-07-03 1989-01-13 Fuji Xerox Co Ltd Method for removing resist in chrome photolithoetching

Also Published As

Publication number Publication date
JPS6054776B2 (en) 1985-12-02

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