JPS5282083A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS5282083A
JPS5282083A JP15913275A JP15913275A JPS5282083A JP S5282083 A JPS5282083 A JP S5282083A JP 15913275 A JP15913275 A JP 15913275A JP 15913275 A JP15913275 A JP 15913275A JP S5282083 A JPS5282083 A JP S5282083A
Authority
JP
Japan
Prior art keywords
semiconductor device
production
layer
wiring
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15913275A
Other languages
Japanese (ja)
Inventor
Makoto Serigano
Kuniaki Makabe
Ryoji Abe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15913275A priority Critical patent/JPS5282083A/en
Publication of JPS5282083A publication Critical patent/JPS5282083A/en
Pending legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE: To eliminate the need for expansion of a window of connection of next layer and increase the scale of integration of a semiconductor device by forming wiring of a certain layer through selective anodization of an Al layer and forming Al2O3 around the wiring.
COPYRIGHT: (C)1977,JPO&Japio
JP15913275A 1975-12-27 1975-12-27 Production of semiconductor device Pending JPS5282083A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15913275A JPS5282083A (en) 1975-12-27 1975-12-27 Production of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15913275A JPS5282083A (en) 1975-12-27 1975-12-27 Production of semiconductor device

Publications (1)

Publication Number Publication Date
JPS5282083A true JPS5282083A (en) 1977-07-08

Family

ID=15686936

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15913275A Pending JPS5282083A (en) 1975-12-27 1975-12-27 Production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5282083A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57177540A (en) * 1981-04-24 1982-11-01 Fujitsu Ltd Forming method for multiple layer wiring
JPS61112356A (en) * 1984-08-23 1986-05-30 フエアチアイルド　カメラ　アンド　インストルメント　コ−ポレ−シヨン Formation of through conductor for ic
JPS61179556A (en) * 1986-01-16 1986-08-12 Hitachi Ltd Electrode wiring

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4985978A (en) * 1972-10-04 1974-08-17

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4985978A (en) * 1972-10-04 1974-08-17

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57177540A (en) * 1981-04-24 1982-11-01 Fujitsu Ltd Forming method for multiple layer wiring
JPS61112356A (en) * 1984-08-23 1986-05-30 フエアチアイルド　カメラ　アンド　インストルメント　コ−ポレ−シヨン Formation of through conductor for ic
JPS61179556A (en) * 1986-01-16 1986-08-12 Hitachi Ltd Electrode wiring

Similar Documents

Publication Publication Date Title
JPS528785A (en) Semiconductor device electrode structure
JPS5282083A (en) Production of semiconductor device
JPS53115173A (en) Production of semiconductor device
JPS53120383A (en) Production of semiconductor device
JPS5383467A (en) Production of semiconductor device
JPS51121272A (en) Manufacturing method for semiconductor devices
JPS51113478A (en) The manufacturing method of semiconductor device
JPS5279654A (en) Production of semiconductor device
JPS5276889A (en) Production of semiconductor device
JPS51123086A (en) Semicanductor device and its production process
JPS5279656A (en) Production of semiconductor device
JPS51112266A (en) Semiconductor device production method
JPS5223281A (en) Method of manufacturing semiconductor device
JPS52179A (en) Method of fabricating semiconductor
JPS5349972A (en) Manufacture of semiconductor device
JPS51138166A (en) Production method of semiconductor device
JPS52135689A (en) Production of semiconductor device
JPS51112292A (en) Semiconductor device
JPS51150286A (en) Production method of semiconductor device
JPS5394182A (en) Production of semiconductor device
JPS51111092A (en) Semiconductor manufacturing process
JPS51151089A (en) Manufacturing method of a semiconductor
JPS53121588A (en) Manufacture of integratd circuit device
JPS5325369A (en) Production of semiconductor device
JPS5226188A (en) Manufacturing method of aluminium wiring of semiconductor device