JPS53113478A - Mask for optical exposure and production of the same - Google Patents

Mask for optical exposure and production of the same

Info

Publication number
JPS53113478A
JPS53113478A JP2849177A JP2849177A JPS53113478A JP S53113478 A JPS53113478 A JP S53113478A JP 2849177 A JP2849177 A JP 2849177A JP 2849177 A JP2849177 A JP 2849177A JP S53113478 A JPS53113478 A JP S53113478A
Authority
JP
Japan
Prior art keywords
mask
production
same
optical exposure
sapphire substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2849177A
Other languages
Japanese (ja)
Inventor
Katsumi Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP2849177A priority Critical patent/JPS53113478A/en
Publication of JPS53113478A publication Critical patent/JPS53113478A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE: To prevent the accumulation of charges when electron beams are radiated onto a sapphire substrate and achieve the reduction of exposure time by superposing a light layer composed of a doped Si layer and Cr oxide on the sapphire substrate.
COPYRIGHT: (C)1978,JPO&Japio
JP2849177A 1977-03-14 1977-03-14 Mask for optical exposure and production of the same Pending JPS53113478A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2849177A JPS53113478A (en) 1977-03-14 1977-03-14 Mask for optical exposure and production of the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2849177A JPS53113478A (en) 1977-03-14 1977-03-14 Mask for optical exposure and production of the same

Publications (1)

Publication Number Publication Date
JPS53113478A true JPS53113478A (en) 1978-10-03

Family

ID=12250126

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2849177A Pending JPS53113478A (en) 1977-03-14 1977-03-14 Mask for optical exposure and production of the same

Country Status (1)

Country Link
JP (1) JPS53113478A (en)

Similar Documents

Publication Publication Date Title
GB2003660A (en) Deposition of material on a substrate
JPS5321576A (en) Mask for x-ray exposure
JPS53113478A (en) Mask for optical exposure and production of the same
JPS5431282A (en) Pattern formation method
JPS5399772A (en) Optical mask
JPS5360177A (en) Photo mask
JPS5220764A (en) Manufacturing system of mesa type semi-conductor unit
JPS5346700A (en) Exposuring method for resist
JPS51113466A (en) Chromium mask negative plate
JPS53107274A (en) Forming method of patterns
JPS5429975A (en) Photo mask
JPS5357973A (en) Preparation of photo mask
JPS5330277A (en) Mask for x-ray exposure
JPS545659A (en) Manufacture of semiconductor device
JPS53128277A (en) Projection exposure method for negative resist
JPS53117385A (en) Exposure mask for patterning
JPS5351973A (en) Photo mask
JPS6486144A (en) Method for patterning resist
JPS5255867A (en) Exposure method
JPS53145477A (en) Electron beam exposure method
JPS52101991A (en) Preparation of silicon target
JPS5379387A (en) Optical mask
JPS536572A (en) Optical mask
JPS53136965A (en) Pattern formation method for manufacture of electron beam mask
JPS543470A (en) Etching method