JPS53113478A - Mask for optical exposure and production of the same - Google Patents
Mask for optical exposure and production of the sameInfo
- Publication number
- JPS53113478A JPS53113478A JP2849177A JP2849177A JPS53113478A JP S53113478 A JPS53113478 A JP S53113478A JP 2849177 A JP2849177 A JP 2849177A JP 2849177 A JP2849177 A JP 2849177A JP S53113478 A JPS53113478 A JP S53113478A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- production
- same
- optical exposure
- sapphire substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE: To prevent the accumulation of charges when electron beams are radiated onto a sapphire substrate and achieve the reduction of exposure time by superposing a light layer composed of a doped Si layer and Cr oxide on the sapphire substrate.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2849177A JPS53113478A (en) | 1977-03-14 | 1977-03-14 | Mask for optical exposure and production of the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2849177A JPS53113478A (en) | 1977-03-14 | 1977-03-14 | Mask for optical exposure and production of the same |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53113478A true JPS53113478A (en) | 1978-10-03 |
Family
ID=12250126
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2849177A Pending JPS53113478A (en) | 1977-03-14 | 1977-03-14 | Mask for optical exposure and production of the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53113478A (en) |
-
1977
- 1977-03-14 JP JP2849177A patent/JPS53113478A/en active Pending
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