JPS5275268A - Method of diffusing impurity into semiconductor - Google Patents
Method of diffusing impurity into semiconductorInfo
- Publication number
- JPS5275268A JPS5275268A JP15266475A JP15266475A JPS5275268A JP S5275268 A JPS5275268 A JP S5275268A JP 15266475 A JP15266475 A JP 15266475A JP 15266475 A JP15266475 A JP 15266475A JP S5275268 A JPS5275268 A JP S5275268A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor
- subjecting
- substrate
- diffusing impurity
- group iii
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Local Oxidation Of Silicon (AREA)
Abstract
PURPOSE: To make possible simultaneous selective diffusion of an impurity of varying concentrations with ease on a substrate by subjecting a film containing on a substrate by subjecting a film containing a group III element or group III oxide via SiO2 film to ammonia treatment.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50152664A JPS5814741B2 (en) | 1975-12-19 | 1975-12-19 | handout |
US05/751,124 US4102715A (en) | 1975-12-19 | 1976-12-16 | Method for diffusing an impurity into a semiconductor body |
DE2657415A DE2657415C2 (en) | 1975-12-19 | 1976-12-17 | Method for diffusing foreign matter into a semiconductor substrate |
GB53080/76A GB1581726A (en) | 1975-12-19 | 1976-12-20 | Method for diffusing an impurity into a semiconductor body |
FR7638415A FR2335950A1 (en) | 1975-12-19 | 1976-12-20 | PROCESS FOR CARRYING OUT THE DIFFUSION OF AN IMPURITY IN A SEMICONDUCTOR BODY |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50152664A JPS5814741B2 (en) | 1975-12-19 | 1975-12-19 | handout |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5275268A true JPS5275268A (en) | 1977-06-24 |
JPS5814741B2 JPS5814741B2 (en) | 1983-03-22 |
Family
ID=15545377
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50152664A Expired JPS5814741B2 (en) | 1975-12-19 | 1975-12-19 | handout |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5814741B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3234588A1 (en) * | 1982-09-17 | 1984-03-22 | Siemens AG, 1000 Berlin und 8000 München | Solid-state source to be used for diffusion on semiconductor material |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50152661A (en) * | 1974-05-28 | 1975-12-08 |
-
1975
- 1975-12-19 JP JP50152664A patent/JPS5814741B2/en not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50152661A (en) * | 1974-05-28 | 1975-12-08 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3234588A1 (en) * | 1982-09-17 | 1984-03-22 | Siemens AG, 1000 Berlin und 8000 München | Solid-state source to be used for diffusion on semiconductor material |
DE3234588C2 (en) * | 1982-09-17 | 1990-05-17 | Siemens Ag, 1000 Berlin Und 8000 Muenchen, De |
Also Published As
Publication number | Publication date |
---|---|
JPS5814741B2 (en) | 1983-03-22 |
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