JPS5275268A - Method of diffusing impurity into semiconductor - Google Patents

Method of diffusing impurity into semiconductor

Info

Publication number
JPS5275268A
JPS5275268A JP15266475A JP15266475A JPS5275268A JP S5275268 A JPS5275268 A JP S5275268A JP 15266475 A JP15266475 A JP 15266475A JP 15266475 A JP15266475 A JP 15266475A JP S5275268 A JPS5275268 A JP S5275268A
Authority
JP
Japan
Prior art keywords
semiconductor
subjecting
substrate
diffusing impurity
group iii
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15266475A
Other languages
Japanese (ja)
Other versions
JPS5814741B2 (en
Inventor
Ginjiro Kanbara
Susumu Furuike
Toshio Matsuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP50152664A priority Critical patent/JPS5814741B2/en
Priority to US05/751,124 priority patent/US4102715A/en
Priority to DE2657415A priority patent/DE2657415C2/en
Priority to GB53080/76A priority patent/GB1581726A/en
Priority to FR7638415A priority patent/FR2335950A1/en
Publication of JPS5275268A publication Critical patent/JPS5275268A/en
Publication of JPS5814741B2 publication Critical patent/JPS5814741B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Local Oxidation Of Silicon (AREA)

Abstract

PURPOSE: To make possible simultaneous selective diffusion of an impurity of varying concentrations with ease on a substrate by subjecting a film containing on a substrate by subjecting a film containing a group III element or group III oxide via SiO2 film to ammonia treatment.
COPYRIGHT: (C)1977,JPO&Japio
JP50152664A 1975-12-19 1975-12-19 handout Expired JPS5814741B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP50152664A JPS5814741B2 (en) 1975-12-19 1975-12-19 handout
US05/751,124 US4102715A (en) 1975-12-19 1976-12-16 Method for diffusing an impurity into a semiconductor body
DE2657415A DE2657415C2 (en) 1975-12-19 1976-12-17 Method for diffusing foreign matter into a semiconductor substrate
GB53080/76A GB1581726A (en) 1975-12-19 1976-12-20 Method for diffusing an impurity into a semiconductor body
FR7638415A FR2335950A1 (en) 1975-12-19 1976-12-20 PROCESS FOR CARRYING OUT THE DIFFUSION OF AN IMPURITY IN A SEMICONDUCTOR BODY

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50152664A JPS5814741B2 (en) 1975-12-19 1975-12-19 handout

Publications (2)

Publication Number Publication Date
JPS5275268A true JPS5275268A (en) 1977-06-24
JPS5814741B2 JPS5814741B2 (en) 1983-03-22

Family

ID=15545377

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50152664A Expired JPS5814741B2 (en) 1975-12-19 1975-12-19 handout

Country Status (1)

Country Link
JP (1) JPS5814741B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3234588A1 (en) * 1982-09-17 1984-03-22 Siemens AG, 1000 Berlin und 8000 München Solid-state source to be used for diffusion on semiconductor material

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50152661A (en) * 1974-05-28 1975-12-08

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50152661A (en) * 1974-05-28 1975-12-08

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3234588A1 (en) * 1982-09-17 1984-03-22 Siemens AG, 1000 Berlin und 8000 München Solid-state source to be used for diffusion on semiconductor material
DE3234588C2 (en) * 1982-09-17 1990-05-17 Siemens Ag, 1000 Berlin Und 8000 Muenchen, De

Also Published As

Publication number Publication date
JPS5814741B2 (en) 1983-03-22

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