JPS5242375A - Process for production of semiconductor device - Google Patents

Process for production of semiconductor device

Info

Publication number
JPS5242375A
JPS5242375A JP11837475A JP11837475A JPS5242375A JP S5242375 A JPS5242375 A JP S5242375A JP 11837475 A JP11837475 A JP 11837475A JP 11837475 A JP11837475 A JP 11837475A JP S5242375 A JPS5242375 A JP S5242375A
Authority
JP
Japan
Prior art keywords
etching
production
semiconductor device
relation
semiconductor substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11837475A
Other languages
Japanese (ja)
Other versions
JPS5530293B2 (en
Inventor
Atsushi Ueno
Shigero Kuninobu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP11837475A priority Critical patent/JPS5242375A/en
Publication of JPS5242375A publication Critical patent/JPS5242375A/en
Publication of JPS5530293B2 publication Critical patent/JPS5530293B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Weting (AREA)

Abstract

PURPOSE: To make etching by providing a layer of a known etching rate in relation to an etching solution on an etching mask, thereby forming a constant etching depth on a semiconductor substrate.
COPYRIGHT: (C)1977,JPO&Japio
JP11837475A 1975-09-30 1975-09-30 Process for production of semiconductor device Granted JPS5242375A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11837475A JPS5242375A (en) 1975-09-30 1975-09-30 Process for production of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11837475A JPS5242375A (en) 1975-09-30 1975-09-30 Process for production of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5242375A true JPS5242375A (en) 1977-04-01
JPS5530293B2 JPS5530293B2 (en) 1980-08-09

Family

ID=14735111

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11837475A Granted JPS5242375A (en) 1975-09-30 1975-09-30 Process for production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5242375A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007227892A (en) * 2005-12-23 2007-09-06 Interuniv Micro Electronica Centrum Vzw Method of selectively epitaxially growing source/drain regions

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007227892A (en) * 2005-12-23 2007-09-06 Interuniv Micro Electronica Centrum Vzw Method of selectively epitaxially growing source/drain regions

Also Published As

Publication number Publication date
JPS5530293B2 (en) 1980-08-09

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