JPS5235980A - Manufacturing method of semiconductor device - Google Patents
Manufacturing method of semiconductor deviceInfo
- Publication number
- JPS5235980A JPS5235980A JP11097675A JP11097675A JPS5235980A JP S5235980 A JPS5235980 A JP S5235980A JP 11097675 A JP11097675 A JP 11097675A JP 11097675 A JP11097675 A JP 11097675A JP S5235980 A JPS5235980 A JP S5235980A
- Authority
- JP
- Japan
- Prior art keywords
- manufacturing
- semiconductor device
- finaite
- pattern
- semiconductor wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Weting (AREA)
Abstract
PURPOSE: To enable formation of finaite pattern with high precision on a semiconductor wafer by using composite films of which etching characteristics are respectively different.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11097675A JPS6027180B2 (en) | 1975-09-16 | 1975-09-16 | Manufacturing method of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11097675A JPS6027180B2 (en) | 1975-09-16 | 1975-09-16 | Manufacturing method of semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5235980A true JPS5235980A (en) | 1977-03-18 |
JPS6027180B2 JPS6027180B2 (en) | 1985-06-27 |
Family
ID=14549248
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11097675A Expired JPS6027180B2 (en) | 1975-09-16 | 1975-09-16 | Manufacturing method of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6027180B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5454577A (en) * | 1977-10-11 | 1979-04-28 | Hitachi Ltd | Material working method with photo resist |
JPS5518096A (en) * | 1978-07-27 | 1980-02-07 | Nec Corp | Manufacture of semiconductor device |
US4728628A (en) * | 1984-03-12 | 1988-03-01 | British Telecommunications Public Limited Company | Method of making ridge waveguide lasers |
US5356513A (en) * | 1993-04-22 | 1994-10-18 | International Business Machines Corporation | Polishstop planarization method and structure |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102388138B1 (en) * | 2021-05-28 | 2022-04-19 | 주식회사 코클 | Method, apparatus and program for providing matching information through acoustic information analysis |
-
1975
- 1975-09-16 JP JP11097675A patent/JPS6027180B2/en not_active Expired
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5454577A (en) * | 1977-10-11 | 1979-04-28 | Hitachi Ltd | Material working method with photo resist |
JPS6238852B2 (en) * | 1977-10-11 | 1987-08-20 | Hitachi Ltd | |
JPS5518096A (en) * | 1978-07-27 | 1980-02-07 | Nec Corp | Manufacture of semiconductor device |
US4728628A (en) * | 1984-03-12 | 1988-03-01 | British Telecommunications Public Limited Company | Method of making ridge waveguide lasers |
US5356513A (en) * | 1993-04-22 | 1994-10-18 | International Business Machines Corporation | Polishstop planarization method and structure |
US5510652A (en) * | 1993-04-22 | 1996-04-23 | International Business Machines Corporation | Polishstop planarization structure |
Also Published As
Publication number | Publication date |
---|---|
JPS6027180B2 (en) | 1985-06-27 |
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