JPS5235980A - Manufacturing method of semiconductor device - Google Patents

Manufacturing method of semiconductor device

Info

Publication number
JPS5235980A
JPS5235980A JP11097675A JP11097675A JPS5235980A JP S5235980 A JPS5235980 A JP S5235980A JP 11097675 A JP11097675 A JP 11097675A JP 11097675 A JP11097675 A JP 11097675A JP S5235980 A JPS5235980 A JP S5235980A
Authority
JP
Japan
Prior art keywords
manufacturing
semiconductor device
finaite
pattern
semiconductor wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11097675A
Other languages
Japanese (ja)
Other versions
JPS6027180B2 (en
Inventor
Hisayuki Higuchi
Keijiro Uehara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP11097675A priority Critical patent/JPS6027180B2/en
Publication of JPS5235980A publication Critical patent/JPS5235980A/en
Publication of JPS6027180B2 publication Critical patent/JPS6027180B2/en
Expired legal-status Critical Current

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  • Weting (AREA)

Abstract

PURPOSE: To enable formation of finaite pattern with high precision on a semiconductor wafer by using composite films of which etching characteristics are respectively different.
COPYRIGHT: (C)1977,JPO&Japio
JP11097675A 1975-09-16 1975-09-16 Manufacturing method of semiconductor device Expired JPS6027180B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11097675A JPS6027180B2 (en) 1975-09-16 1975-09-16 Manufacturing method of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11097675A JPS6027180B2 (en) 1975-09-16 1975-09-16 Manufacturing method of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5235980A true JPS5235980A (en) 1977-03-18
JPS6027180B2 JPS6027180B2 (en) 1985-06-27

Family

ID=14549248

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11097675A Expired JPS6027180B2 (en) 1975-09-16 1975-09-16 Manufacturing method of semiconductor device

Country Status (1)

Country Link
JP (1) JPS6027180B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5454577A (en) * 1977-10-11 1979-04-28 Hitachi Ltd Material working method with photo resist
JPS5518096A (en) * 1978-07-27 1980-02-07 Nec Corp Manufacture of semiconductor device
US4728628A (en) * 1984-03-12 1988-03-01 British Telecommunications Public Limited Company Method of making ridge waveguide lasers
US5356513A (en) * 1993-04-22 1994-10-18 International Business Machines Corporation Polishstop planarization method and structure

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102388138B1 (en) * 2021-05-28 2022-04-19 주식회사 코클 Method, apparatus and program for providing matching information through acoustic information analysis

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5454577A (en) * 1977-10-11 1979-04-28 Hitachi Ltd Material working method with photo resist
JPS6238852B2 (en) * 1977-10-11 1987-08-20 Hitachi Ltd
JPS5518096A (en) * 1978-07-27 1980-02-07 Nec Corp Manufacture of semiconductor device
US4728628A (en) * 1984-03-12 1988-03-01 British Telecommunications Public Limited Company Method of making ridge waveguide lasers
US5356513A (en) * 1993-04-22 1994-10-18 International Business Machines Corporation Polishstop planarization method and structure
US5510652A (en) * 1993-04-22 1996-04-23 International Business Machines Corporation Polishstop planarization structure

Also Published As

Publication number Publication date
JPS6027180B2 (en) 1985-06-27

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