JPS51134071A - Method to eliminate crystal defects of silicon - Google Patents
Method to eliminate crystal defects of siliconInfo
- Publication number
- JPS51134071A JPS51134071A JP5719375A JP5719375A JPS51134071A JP S51134071 A JPS51134071 A JP S51134071A JP 5719375 A JP5719375 A JP 5719375A JP 5719375 A JP5719375 A JP 5719375A JP S51134071 A JPS51134071 A JP S51134071A
- Authority
- JP
- Japan
- Prior art keywords
- silicon
- crystal defects
- eliminate crystal
- eliminate
- monocrystals
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To easily eliminate and reduce the crystal defects existing in Si monocrystals.
COPYRIGHT: (C)1976,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5719375A JPS51134071A (en) | 1975-05-16 | 1975-05-16 | Method to eliminate crystal defects of silicon |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5719375A JPS51134071A (en) | 1975-05-16 | 1975-05-16 | Method to eliminate crystal defects of silicon |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS51134071A true JPS51134071A (en) | 1976-11-20 |
Family
ID=13048640
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5719375A Pending JPS51134071A (en) | 1975-05-16 | 1975-05-16 | Method to eliminate crystal defects of silicon |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51134071A (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5596641A (en) * | 1979-01-19 | 1980-07-23 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Method of fabricating silicon monocrystal wafer |
JPS5613737A (en) * | 1979-07-13 | 1981-02-10 | Hitachi Ltd | Manufacture of semiconductor device |
JPS60247935A (en) * | 1984-05-23 | 1985-12-07 | Toshiba Ceramics Co Ltd | Manufacture of semiconductor wafer |
JPS61183916A (en) * | 1985-02-08 | 1986-08-16 | Toshiba Corp | Manufacture of semiconductor substrate |
JPS62123098A (en) * | 1985-11-22 | 1987-06-04 | Toshiba Ceramics Co Ltd | Silicon single crystal |
JPH03123027A (en) * | 1989-10-05 | 1991-05-24 | Toshiba Ceramics Co Ltd | Cleaning process of silicon wafer |
JPH0636979A (en) * | 1992-03-27 | 1994-02-10 | Toshiba Corp | Semiconductor device |
JPH07165496A (en) * | 1994-09-05 | 1995-06-27 | Toshiba Ceramics Co Ltd | Production of silicon wafer |
JPH07165495A (en) * | 1994-09-02 | 1995-06-27 | Toshiba Ceramics Co Ltd | Silicon wafer |
US7659216B2 (en) | 2004-10-13 | 2010-02-09 | Shin-Etsu Handotai Co., Ltd. | Method for producing annealed wafer and annealed wafer |
-
1975
- 1975-05-16 JP JP5719375A patent/JPS51134071A/en active Pending
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS583375B2 (en) * | 1979-01-19 | 1983-01-21 | 超エル・エス・アイ技術研究組合 | Manufacturing method of silicon single crystal wafer |
JPS5596641A (en) * | 1979-01-19 | 1980-07-23 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Method of fabricating silicon monocrystal wafer |
JPS5613737A (en) * | 1979-07-13 | 1981-02-10 | Hitachi Ltd | Manufacture of semiconductor device |
JPS60247935A (en) * | 1984-05-23 | 1985-12-07 | Toshiba Ceramics Co Ltd | Manufacture of semiconductor wafer |
JPH0518254B2 (en) * | 1984-05-23 | 1993-03-11 | Toshiba Ceramics Co | |
JPS61183916A (en) * | 1985-02-08 | 1986-08-16 | Toshiba Corp | Manufacture of semiconductor substrate |
JPH0561240B2 (en) * | 1985-11-22 | 1993-09-03 | Toshiba Ceramics Co | |
JPS62123098A (en) * | 1985-11-22 | 1987-06-04 | Toshiba Ceramics Co Ltd | Silicon single crystal |
JPH03123027A (en) * | 1989-10-05 | 1991-05-24 | Toshiba Ceramics Co Ltd | Cleaning process of silicon wafer |
JPH0636979A (en) * | 1992-03-27 | 1994-02-10 | Toshiba Corp | Semiconductor device |
JPH07165495A (en) * | 1994-09-02 | 1995-06-27 | Toshiba Ceramics Co Ltd | Silicon wafer |
JPH07165496A (en) * | 1994-09-05 | 1995-06-27 | Toshiba Ceramics Co Ltd | Production of silicon wafer |
US7659216B2 (en) | 2004-10-13 | 2010-02-09 | Shin-Etsu Handotai Co., Ltd. | Method for producing annealed wafer and annealed wafer |
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