JPH10105076A - Near infrared shielding filter for electronic display - Google Patents
Near infrared shielding filter for electronic displayInfo
- Publication number
- JPH10105076A JPH10105076A JP8254881A JP25488196A JPH10105076A JP H10105076 A JPH10105076 A JP H10105076A JP 8254881 A JP8254881 A JP 8254881A JP 25488196 A JP25488196 A JP 25488196A JP H10105076 A JPH10105076 A JP H10105076A
- Authority
- JP
- Japan
- Prior art keywords
- transmittance
- filter
- infrared shielding
- electronic display
- wavelength
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【０００１】[0001]
【発明が属する技術分野】本発明は電子ディスプレイ用
フィルターに関する。さらに詳しくは近赤外線遮蔽機能
を付与した電子ディスプレイ用フィルターに関するもの
である。The present invention relates to a filter for an electronic display. More specifically, the present invention relates to an electronic display filter having a near-infrared shielding function.
【０００２】[0002]
【従来の技術】近年、プラズマ表示装置（ＰＤＰ）など
の電子ディスプレイの研究が盛んに行われている。これ
らのディスプレイには発光体から発生する近赤外線によ
る周辺機器の誤作動が問題として挙げられている。近赤
外線カットフィルターとしてはいくつか提案されている
が、それらは冷暖房効率改善の熱線カット材やセキュリ
ティーインクとして利用されてきた。しかし、周辺機器
の誤作動に着目した近赤外線遮蔽の利用はこれまで試み
られてこなかった。前記の近赤外線カットフイルターと
しては、例えば次の（１）〜（４）が挙げられる。 （１）特開昭６０−４３６０５号公報，（２）特開平６
−１９４５１７号公報，（３）特開平５−４２６２２号
公報，（４）特開平７−７０４８２号公報。特開昭６０
−４３６０５号公報ではアントラキノン化合物やナフタ
ロシアニン化合物を使用したものが提案されているが、
遮蔽波長域が７００〜９００ｎｍであり充分ではない。
近赤外線吸収色素を含んだ熱線遮断シートもいくつか提
案されている。例えば、特開平６−１９４５１７号では
極大遮蔽が波長６５０ｎｍ以上８００ｎｍ未満であるた
め１０００ｎｍ近辺の遮蔽が充分ではない。特開平５−
４２６２２号では１１００ｎｍの透過率が４０％以下に
なる光線選択透過性フィルムが提案されているが、８０
０〜１０００ｎｍの透過率についての記載がない。特開
平７−７０４８２号では赤外線カットオフ膜とその形成
材が提案されているが、波長８００ｎｍにおける透過率
が２０％以上と高くさらにその用途も金券等の偽造に対
する防止手段や冷暖房効率の改善である。また、近赤外
線カットフイルターを単独で用いる従来の方法では、波
長８００〜１０００ｎｍの透過率２０％以下、かつ可視
光線透過率５０％以上を達成するものは知られていな
い。一方、近赤外線遮蔽材が周辺機器の誤作動に有用で
あることが近年知られている。2. Description of the Related Art In recent years, research on electronic displays such as plasma display devices (PDPs) has been actively conducted. In these displays, malfunction of peripheral devices due to near-infrared rays generated from the luminous body is cited as a problem. Some near-infrared cut filters have been proposed, but they have been used as a heat ray cut material or a security ink for improving cooling and heating efficiency. However, the use of near-infrared shielding that focuses on malfunctions of peripheral devices has not been attempted so far. Examples of the near-infrared cut filter include the following (1) to (4). (1) JP-A-60-43605, (2) JP-A-Hei-6
JP-A-194517, (3) JP-A-5-42222, and (4) JP-A-7-70482. JP 60
No. 43605 discloses a device using an anthraquinone compound or a naphthalocyanine compound.
The shielding wavelength range is 700 to 900 nm, which is not sufficient.
Some heat ray shielding sheets containing near infrared absorbing dyes have also been proposed. For example, in Japanese Unexamined Patent Application Publication No. 6-194517, since the maximum shielding is at least 650 nm and less than 800 nm, the shielding around 1000 nm is not sufficient. Japanese Patent Laid-Open No. 5-
No. 42622 proposes a light-selective transmission film having a transmittance of 1100 nm of 40% or less.
There is no description about the transmittance from 0 to 1000 nm. Japanese Patent Application Laid-Open No. 7-70482 proposes an infrared cut-off film and a material for forming the same. However, the transmittance at a wavelength of 800 nm is as high as 20% or more, and the use thereof is also improved by means for preventing counterfeiting of bills and the like and improving cooling and heating efficiency. is there. Further, in a conventional method using a near-infrared cut filter alone, there is no known method which achieves a transmittance of 20% or less at a wavelength of 800 to 1000 nm and a visible light transmittance of 50% or more. On the other hand, it is recently known that a near-infrared shielding material is useful for malfunction of peripheral devices.
【０００３】[0003]
【発明が解決しようとする課題】本発明の第１の目的
は、電子ディスプレイによる周辺機器の誤作動等の防止
に有効な電子ディスプレイ用近赤外線遮蔽フィルターを
提供することにある。また本発明の第２の目的は、前記
の近赤外線遮蔽フィルターにさらに反射防止機能を付与
したフィルターを提供することにある。SUMMARY OF THE INVENTION It is a first object of the present invention to provide a near-infrared shielding filter for an electronic display, which is effective in preventing a malfunction of peripheral devices by the electronic display. A second object of the present invention is to provide a filter in which an anti-reflection function is further added to the near-infrared shielding filter.
【０００４】[0004]
【発明を解決するための手段】本発明者らは、上記課題
を解決するために鋭意検討した結果、電子ディスプレイ
用フィルターにおいて、波長８００〜１０００ｎｍの近
赤外線領域の透過率を特定にすることにより上記目的が
達成できることの知見を得て、本発明を完成した。すな
わち、本発明は、次の（１）〜（３）である。 （１）波長８００〜１０００ｎｍの近赤外線領域の透過
率が２０％以下であり、かつ可視光線透過率が５０％以
上であることを特徴とする電子ディスプレイ用近赤外線
遮蔽フィルター。 （２）波長８００〜９００ｎｍに極大遮蔽があり当該波
長の透過率が２０％以下の近赤外線遮蔽基材と、波長９
００〜１０００ｎｍに極大遮蔽があり当該波長の透過率
が２０％以下の近赤外線遮蔽基材とを組合せて用いる電
子ディスプレイ用近赤外線遮蔽フィルター。 （３）前記のフィルターの片面または両面に反射防止材
を付与した反射防止機能付電子ディスプレイ用近赤外線
遮蔽フィルター。Means for Solving the Problems As a result of intensive studies to solve the above-mentioned problems, the present inventors have specified a transmittance in a near-infrared region of a wavelength of 800 to 1000 nm in an electronic display filter. The present invention has been completed based on the finding that the above object can be achieved. That is, the present invention includes the following (1) to (3). (1) A near-infrared shielding filter for an electronic display, wherein the transmittance in the near infrared region having a wavelength of 800 to 1000 nm is 20% or less and the visible light transmittance is 50% or more. (2) a near-infrared shielding base material having a maximum shielding at a wavelength of 800 to 900 nm and a transmittance at the wavelength of 20% or less;
A near-infrared shielding filter for an electronic display which is used in combination with a near-infrared shielding base material having a maximum shielding at a wavelength of from 00 to 1000 nm and a transmittance at the wavelength of 20% or less. (3) A near-infrared shielding filter for an electronic display having an antireflection function, wherein an antireflection material is provided on one or both surfaces of the filter.
【０００５】[0005]
【発明の実施の形態】本発明でいう「電子ディスプレ
イ」とは、プラズマ表示装置（ＰＤＰ）、陰極線管（Ｃ
ＲＴ）、液晶表示装置（ＬＣＤ）、エレクトロ・ルミネ
センス（ＥＬ）、発光ダイオード（ＬＥＤ）、蛍光表示
管（ＶＦＤ）、フィールドエミッション（ＦＥＤ）など
を意味する。「遮蔽」とは、吸収、反射の一方または両
方で８００〜１０００ｎｍの透過率が２０％以下になる
ことを意味する。「電子ディスプレイ用フィルター」と
は、前記のディスプレイの画像表示部前面に装着するフ
ィルターを意味し、帯電防止、電磁波遮蔽、反射防止等
の機能がすでに付与されているものも含む。 「基材」
とは、以下に示す（１）〜（３）を単体または組合せた
ものを意味する。 （１）厚さ１μｍ〜２０ｍｍの基板で、この表面に例え
ばアンチグレア加工等の特殊加工を施すことは一向に構
わない。 （２）前記基板内に近赤外線遮蔽剤を含有したもの。 （３）前記基材の表面に近赤外線遮蔽層を設けたもので
ある。 ここでいう近赤外線遮蔽層とは、近赤外線遮蔽剤を蒸着
あるいは有機バインダーに溶解又は混合して塗布したも
のである。近赤外線遮蔽剤としては、例えば、インジウ
ム−錫酸化物（ＩＴＯ）、酸化インジウム、酸化錫、酸
化ケイ素、酸化アルミニウム、酸化亜鉛、酸化タングス
テン等の金属酸化物；フッ化アンチモン系有機化合物；
フタロシアニン系、アントラキノン系、ナフトキノン
系、シアニン系、ナフタロシアニン系、高分子縮合アゾ
系、ピロール系、フェニレンジアミニウム系等の有機色
素；ジチオール系、メルカプトナフトール系の有機金属
錯体などが挙げられる。DETAILED DESCRIPTION OF THE INVENTION An "electronic display" as used in the present invention includes a plasma display device (PDP) and a cathode ray tube (C).
RT), liquid crystal display (LCD), electroluminescence (EL), light emitting diode (LED), fluorescent display tube (VFD), field emission (FED) and the like. “Shielding” means that the transmittance at 800 to 1000 nm in one or both of absorption and reflection is 20% or less. The "filter for electronic display" means a filter to be mounted on the front surface of the image display unit of the display, and includes a filter to which functions such as antistatic, electromagnetic wave shielding, and antireflection are already provided. "Base material"
Means a single or a combination of the following (1) to (3). (1) With a substrate having a thickness of 1 μm to 20 mm, special processing such as anti-glare processing may be applied to this surface. (2) A substrate containing a near-infrared shielding agent in the substrate. (3) A near-infrared shielding layer is provided on the surface of the substrate. The near-infrared shielding layer referred to here is a layer obtained by applying a near-infrared shielding agent by vapor deposition or by dissolving or mixing the same in an organic binder. Examples of the near-infrared shielding agent include metal oxides such as indium-tin oxide (ITO), indium oxide, tin oxide, silicon oxide, aluminum oxide, zinc oxide, and tungsten oxide; antimony fluoride organic compounds;
Organic dyes such as phthalocyanine-based, anthraquinone-based, naphthoquinone-based, cyanine-based, naphthalocyanine-based, polymer-condensed azo-based, pyrrole-based, and phenylenediaminium-based organic dyes; dithiol-based and mercaptonaphthol-based organic metal complexes;
【０００６】有機バインダーとしては、例えばポリエチ
レン、ポリプロピレン等のポリオレフィン、ポリスチレ
ン、ポリ（α-メチルスチレン）等のポリスチレン系化
合物；スチレン−ブタジエン共重合体、スチレン−イソ
プレン共重合体、スチレン−マレイン酸共重合体、スチ
レン−マレイン酸エステル共重合体等のスチレン系共重
合体；ポリ塩化ビニル、ポリビニルアルコール、ポリ酢
酸ビニル等のポリビニル系化合物；ポリ（メタ）アクリ
ル酸メチル、ポリ（メタ）アクリル酸エチル、ポリ（メ
タ）アクリル酸プロピル、ポリ（メタ）アクリル酸ブチ
ル等のポリ（メタ）アクリル酸アルキル；ポリオキシメ
チレン、ポリエチレンオキシド等のポリエーテル；ポリ
エチレンサクシネート、ポリブチレンアジペート、ポリ
乳酸、ポリグリコール酸、ポリカプロラクトン、ポリエ
チレンテレフタレート等のポリエステル；セルロース、
デンプン、ゴム等の天然高分子；６−ナイロン、６，６
−ナイロン等のポリアミド；ポリウレタン、エポキシ樹
脂、ポリアクリル酸樹脂、ロジン、変性ロジン、テルペ
ン樹脂、フェノール樹脂、脂肪族又は脂環族炭化水素樹
脂、芳香族系石油樹脂、これらのハロゲン変性体などが
挙げられ、これらを単独で、あるいは２種以上混合して
使用する。Examples of the organic binder include polyolefins such as polyethylene and polypropylene; polystyrene compounds such as polystyrene and poly (α-methylstyrene); styrene-butadiene copolymer, styrene-isoprene copolymer and styrene-maleic acid copolymer. Styrene-based copolymers such as polymers and styrene-maleic acid ester copolymers; polyvinyl-based compounds such as polyvinyl chloride, polyvinyl alcohol, and polyvinyl acetate; poly (methyl (meth) acrylate, poly (meth) acrylate) Poly (meth) acrylates such as propyl poly (meth) acrylate and butyl poly (meth) acrylate; polyethers such as polyoxymethylene and polyethylene oxide; polyethylene succinate, polybutylene adipate, polylactic acid, polyglycol Acid, polycaprolactone, polyesters such as polyethylene terephthalate; cellulose,
Natural polymers such as starch and rubber; 6-nylon, 6,6
-Polyamides such as nylon; polyurethane, epoxy resin, polyacrylic acid resin, rosin, modified rosin, terpene resin, phenol resin, aliphatic or alicyclic hydrocarbon resin, aromatic petroleum resin, and halogen-modified products thereof. These may be used alone or as a mixture of two or more.
【０００７】基材としては、例えば、ガラス、ポリ塩化
ビニル、ポリエステル、ポリアクリル、ポリウレタン、
ポリオレフィン、ポリカーボネート、トリアセチルセル
ロース、ジアセテートセルロース、アセテートブチレー
トセルロース、ポリエーテルスルホン、ポリスルホン、
ポリエーテル、トリメチルペンテン、ポリエーテルケト
ン、ポリアクリロニトリル等が挙げられる。さらにこれ
らの基材に粘着加工、ハードコート加工等の公知の特殊
加工を施してもよい。波長８００〜９００ｎｍに極大遮
蔽がある近赤外線遮蔽剤と９００〜１０００ｎｍに極大
遮蔽がある近赤外線遮蔽剤とは同一あるい別々の基材に
含有または積層してよい。例えば、波長８００〜９００
ｎｍに極大遮蔽がある近赤外線遮蔽剤が基材内に含有
し、波長９００〜１０００ｎｍに極大遮蔽がある近赤外
線遮蔽剤が基材上に積層していてもよい。波長８００〜
１０００ｎｍの透過率が２０％を超えると機械の誤作動
を生じるので好ましくない。また、可視光線透過率が５
０％未満である場合にはディスプレイの映像が鮮明でな
くなるため好ましくない。より好ましくは、可視光線透
過率が６０％以上である。フィルターに付与される反射
防止材は従来から知られている反射防止機能を持つ物質
であれば何を使用してもよい。反射防止機能を有する物
質は、例えば無機物質として、酸化チタン、フッ化マグ
ネシウム、酸化アルミニウム、酸化シラン、酸化タンタ
ル、酸化イットリウム、酸化イッテルビウム、酸化ジル
コニウム、フッ化セリウム、酸化セリウム、フッ化ラン
タン等を用いて、基材上に蒸着することで反射防止層を
形成することができる。また有機物質としては、フッ素
系化合物、シラン化合物等を用いて薄膜として塗布後、
そのまま用いるかあるいは電子線、紫外線、熱などで硬
化し反射防止層を形成する。反射防止層は前述の物質を
単層で形成しても多層で形成してもよく、膜厚は基材、
膜の構成によって異なるが、一層あたり可視光波長と同
じ厚さもしくはそれ以下の厚さが好ましい。上記の基
材、近赤外線遮蔽層、反射防止材を組み合わせて本発明
の電子ディスプレイ用フィルターを製造するがその組合
せ順序は適宜選択されてよい。例えば、波長８００〜９
００ｎｍに極大遮蔽がある近赤外線遮蔽剤が含有した基
板の片面に波長９００〜１０００ｎｍに極大遮蔽がある
近赤外線遮蔽剤が含有する赤外線遮蔽層を有する基材を
貼り合わせ更にその上面と基材のもう一方の面に反射防
止層を有するプラスチック面を貼り合わせた形態のフィ
ルターでもよい。As the base material, for example, glass, polyvinyl chloride, polyester, polyacryl, polyurethane,
Polyolefin, polycarbonate, triacetyl cellulose, diacetate cellulose, acetate butyrate cellulose, polyether sulfone, polysulfone,
Examples include polyether, trimethylpentene, polyetherketone, polyacrylonitrile, and the like. Further, these substrates may be subjected to known special processing such as adhesive processing and hard coating processing. The near-infrared shielding agent having a maximum shielding at a wavelength of 800 to 900 nm and the near-infrared shielding agent having a maximum shielding at 900 to 1000 nm may be contained or laminated on the same or separate substrates. For example, a wavelength of 800 to 900
A near-infrared shielding agent having a maximum shielding at nm may be contained in the substrate, and a near-infrared shielding agent having a maximum shielding at a wavelength of 900 to 1000 nm may be laminated on the substrate. Wavelength 800 ~
If the transmittance at 1000 nm exceeds 20%, a malfunction of the machine occurs, which is not preferable. In addition, the visible light transmittance is 5
If it is less than 0%, the image on the display will not be clear, which is not preferable. More preferably, the visible light transmittance is 60% or more. As the antireflection material applied to the filter, any substance having a conventionally known antireflection function may be used. Substances having an antireflection function include, for example, inorganic substances such as titanium oxide, magnesium fluoride, aluminum oxide, silane oxide, tantalum oxide, yttrium oxide, ytterbium oxide, zirconium oxide, cerium fluoride, cerium oxide, and lanthanum fluoride. When used, an antireflection layer can be formed by vapor deposition on a substrate. In addition, as an organic substance, after applying as a thin film using a fluorine compound, a silane compound, or the like,
It is used as it is or is cured by electron beam, ultraviolet ray, heat or the like to form an antireflection layer. The anti-reflection layer may be formed in a single layer or a multi-layer of the above-mentioned substance,
Although it depends on the structure of the film, the thickness of each layer is preferably equal to or less than the wavelength of visible light. The filter for an electronic display of the present invention is manufactured by combining the above-described base material, near-infrared shielding layer, and antireflection material, and the combination order may be appropriately selected. For example, a wavelength of 800 to 9
A substrate having an infrared shielding layer containing a near-infrared shielding agent having a maximum shielding at a wavelength of 900 to 1000 nm is attached to one surface of a substrate containing a near-infrared shielding agent having a maximum shielding at 00 nm. A filter having a form in which a plastic surface having an anti-reflection layer is bonded to the other surface may be used.
【０００８】上記の方法により作製した電子ディスプレ
イ用フィルターは画像表示部分の前面に装着が可能であ
り、装着方法は接着、はめ込み、ビス止めなどででき
る。また、固定せずにつり下げなどで脱着が可能な状態
でも使用可能である。画像表示装置との間隔は、完全に
密着させてもよく、画像が視認できる範囲内なら無制限
に離して配置することができる。また近赤外線遮蔽層や
反射防止材を設けている場合については、その層は視覚
者の方を向いていても、画像表示部分の方を向いていて
も構わない。The filter for an electronic display manufactured by the above method can be mounted on the front surface of the image display portion, and can be mounted by bonding, fitting, screwing, or the like. Further, it can be used even in a state where it can be detached by hanging or the like without being fixed. The space between the image display device and the image display device may be completely adhered to each other. When a near-infrared shielding layer or an anti-reflection material is provided, the layer may face the viewer or the image display portion.
【０００９】[0009]
【発明の効果】本発明の電子ディスプレイ用近赤外線遮
蔽フィルターは、単独の近赤外線遮蔽剤では十分な効果
が得られないものを適宜組み合わせ用いることにより波
長８００〜１０００ｎｍの広範囲で透過率が低く、また
可視光線領域での透過率が優れたものが得られる。ま
た、さらにそれらの機能に反射防止機能を付与して鮮明
な映像が得られ見やすくしたものである。したがって、
電子ディスプレイの周辺機器の近赤外線による誤動作の
可能性を低減することができる。The near-infrared shielding filter for an electronic display of the present invention has a low transmittance over a wide range of wavelengths of 800 to 1000 nm by appropriately combining those which cannot provide a sufficient effect with a single near-infrared shielding agent. Further, a material having excellent transmittance in the visible light region can be obtained. Further, an anti-reflection function is added to these functions to obtain a clear image and make it easy to see. Therefore,
It is possible to reduce the possibility of malfunction of the peripheral device of the electronic display due to near infrared rays.
【００１０】[0010]
【実施例】以下、実施例を用いて本発明を更に詳細に説
明する。基材および近赤外線遮蔽剤は市販のものを用
い、市販されていない既知のものについては適宜合成し
て使用した。なお、測定方法は次の機器による方法で行
った。 ＜透過率の測定＞日本分光社製の紫外分光光度計（Ｕｂ
ｅｓｔ ３５）を使用した。 ＜可視光線透過率の測定＞日本電色工業社製のカラーア
ンドカラーディファレンスメーター（ＭＯＤＥＬ１００
１ＤＰ）を使用した。 ＜反射率の測定＞日本分光社製の紫外分光光度計（Ｕｂ
ｅｓｔ ５０）を使用した。The present invention will be described in more detail with reference to the following examples. As the substrate and the near-infrared shielding agent, commercially available products were used, and known products not commercially available were appropriately synthesized and used. The measurement was performed by the following instrument. <Measurement of transmittance> UV spectrophotometer (Ub, manufactured by JASCO Corporation)
est 35) was used. <Measurement of visible light transmittance> Nippon Denshoku Industries Co., Ltd. color and color difference meter (MODEL100
1DP) was used. <Measurement of reflectance> UV spectrophotometer (Ub manufactured by JASCO Corporation)
est 50) was used.
【００１１】Ａ；近赤外線遮蔽基材の製造 製造例１ （ａ）近赤外線遮蔽色素（ＩＲＧ−０２２、フッ化アン
チモン系有機化合物、日本化薬（株）製）を０．１７重
量部、（ｂ）溶剤のクロロホルムを４０重量部、（ｃ）
ポリマーとして、バイロン３００（線状飽和ポリエステ
ル樹脂、東洋紡（株）製）を１７重量部はかり取り、こ
れらを溶解し近赤外線遮蔽層とし、厚さ１００μｍのポ
リエチレンテレフタレート（ＰＥＴ）フィルムにバーコ
ーターを使用して、乾燥膜厚で２０μｍ厚になるように
塗布し、近赤外線遮蔽層付ＰＥＴフィルムを作製した
（Ｆ−１と記す）。A: Production of Near-Infrared Shielding Substrate Production Example 1 (a) 0.17 parts by weight of a near-infrared shielding pigment (IRG-022, an antimony fluoride organic compound, manufactured by Nippon Kayaku Co., Ltd.) b) 40 parts by weight of chloroform as a solvent, (c)
As a polymer, 17 parts by weight of Byron 300 (linear saturated polyester resin, manufactured by Toyobo Co., Ltd.) is weighed, and these are dissolved to form a near-infrared shielding layer. A 100 μm thick polyethylene terephthalate (PET) film is coated with a bar coater. Then, it was applied to a dry film thickness of 20 μm to prepare a PET film with a near-infrared shielding layer (referred to as F-1).
【００１２】製造例２ （ａ）近赤外線遮蔽色素（ＭＩＲ−１０１、ビスジチオ
ベンジルニッケル、みどり化学（株）製）を０．１７重
量部、（ｂ）溶剤として、トルエンを５０重量部、
（ｃ）ポリマーとして、バイロン３００（線状飽和ポリ
エステル樹脂、東洋紡（株）製）を１７重量部はかり取
り、これらを溶解し近赤外線遮蔽層とし、厚さ８０μｍ
のトリアセチルセルロース（ＴＡＣ）フィルムにバーコ
ーターを使用して、乾燥膜厚で２０μｍ厚になるように
塗布し、近赤外線遮蔽層付ＴＡＣフィルムを作製した
（Ｆ−２と記す）Production Example 2 (a) 0.17 parts by weight of a near infrared shielding dye (MIR-101, bisdithiobenzyl nickel, manufactured by Midori Kagaku Co., Ltd.), (b) 50 parts by weight of toluene as a solvent,
(C) As a polymer, 17 parts by weight of Byron 300 (a linear saturated polyester resin, manufactured by Toyobo Co., Ltd.) was weighed, and these were dissolved to form a near-infrared shielding layer, and a thickness of 80 μm.
Using a bar coater, a TAC film with a near-infrared shielding layer was prepared using a bar coater to prepare a TAC film with a near-infrared shielding layer (referred to as F-2).
【００１３】製造例３ （ａ）近赤外線遮蔽色素として、Ｎ，Ｎ，Ｎ’，Ｎ’−
テトラキス（ｐ−ジ−ｎ−ブチルアミノフェニル）−ｐ
−フェニレンジアミニウムの過塩素酸塩を１重量部、
（ｂ）アルコール可溶性ラッカー（オレスターＮＬ ２
２９４Ｅ、三井東圧化学（株）製）を３００重量部と
し、これらを溶解し近赤外線遮蔽層とし、１００μｍの
ＰＥＴフィルムにバーコーターを使用して、乾燥膜厚で
５０μｍ厚になるように塗布し、近赤外線遮蔽層付ＰＥ
Ｔフィルムを作製した（Ｆ−３と記す）。Production Example 3 (a) N, N, N ', N'-
Tetrakis (p-di-n-butylaminophenyl) -p
1 part by weight of phenylenediamine perchlorate,
(B) Alcohol-soluble lacquer (Olester NL 2
294E, manufactured by Mitsui Toatsu Chemicals Co., Ltd.), 300 parts by weight, and dissolving them to form a near-infrared shielding layer. Using a bar coater on a 100 μm PET film, apply it to a dry film thickness of 50 μm. And PE with near infrared shielding layer
A T film was produced (denoted as F-3).
【００１４】製造例４ （ａ）近赤外線遮蔽色素として、ＣＹ−１０（シアニン
系化合物、日本化薬（株）製）を０．９重量部、（ｂ）
モノマーとして、ＫＡＹＡＲＡＤ ＤＰＨＡ（アクリル
系樹脂＝ジペンタエリスリトールヘキサアクリレート、
日本化薬（株）製）を３０重量部、ＮＫエステル Ａ−
４００（アクリル系モノマー＝ＰＥＧ４００ジアクリレ
ート、新中村化学工業（株）製）を７０重量部、（ｃ）
滑り剤として、ＡＯ−７０４（日本油脂（株）製）を
０．２重量部、（ｄ）添加剤として、ＢＹＫ−３０６
（ビックケミー・ジャパン製）を０．５重量部はかり取
り、これらを混合、溶解し近赤外線遮蔽層とし、厚さ８
０μｍのトリアセチルセルロース（ＴＡＣ）フィルムに
バーコーターを使用して、乾燥膜厚で１０μｍ厚になる
ように塗布し、１２５ｋＶ，７．５Ｍｒａｄの電子線で
硬化を行い、近赤外線遮蔽層付ＴＡＣフィルムを作製し
た（Ｆ−４と記す）。Production Example 4 (a) 0.9% by weight of CY-10 (cyanine compound, manufactured by Nippon Kayaku Co., Ltd.) as a near-infrared shielding dye, (b)
As a monomer, KAYARAD DPHA (acrylic resin = dipentaerythritol hexaacrylate,
30 parts by weight of Nippon Kayaku Co., Ltd.), NK ester A-
70 (acrylic monomer = PEG400 diacrylate, manufactured by Shin-Nakamura Chemical Co., Ltd.), 70 parts by weight, (c)
0.2 parts by weight of AO-704 (manufactured by NOF Corporation) as a slipping agent, and BYK-306 as an additive (d)
Weigh 0.5 parts by weight (manufactured by Big Chemie Japan), mix and dissolve them to form a near-infrared shielding layer.
Using a bar coater, a 0 μm triacetyl cellulose (TAC) film is applied to a dry film thickness of 10 μm, cured with an electron beam of 125 kV, 7.5 Mrad, and a TAC film with a near infrared shielding layer is applied. Was prepared (referred to as F-4).
【００１５】製造例５ （ａ）メタクリル樹脂１００重量部を加熱溶解し、
（ｂ）錫ドープ酸化インジウム（ＩＴＯ）の微粉末（平
均粒径０．０５μｍ）を分散させ、厚さ２ｍｍのアクリ
ル板を押し出し成型した（Ｓ−５と記す）。Production Example 5 (a) 100 parts by weight of a methacrylic resin were dissolved by heating.
(B) Fine powder of tin-doped indium oxide (ITO) (average particle size: 0.05 μm) was dispersed, and an acrylic plate having a thickness of 2 mm was extruded (denoted as S-5).
【００１６】Ｂ． 近赤外線遮蔽フィルターの作製 実施例１ ガラス板に製造例１で得たフィルムＦ−１と製造例４で
得たフィルムＦ−４を貼り合わせ、フィルターを作製し
た。このフィルターの波長８００〜１０００ｎｍの透過
率と可視光線透過率の測定を行った。結果を表１に示し
た。B. Production of Near-Infrared Shielding Filter Example 1 The film F-1 obtained in Production Example 1 and the film F-4 obtained in Production Example 4 were bonded to a glass plate to produce a filter. The transmittance of this filter at a wavelength of 800 to 1000 nm and the transmittance of visible light were measured. The results are shown in Table 1.
【００１７】実施例２ ガラス板に製造例３で得たＴＡＣフィルムＦ−３と製造
例４のフィルムＦ−４を貼り合わせ、フィルターを作製
した。このフィルターの波長８００〜１０００ｎｍの透
過率と可視光線透過率の測定を行った。結果を表１に示
した。Example 2 A TAC film F-3 obtained in Production Example 3 and a film F-4 obtained in Production Example 4 were bonded to a glass plate to prepare a filter. The transmittance of this filter at a wavelength of 800 to 1000 nm and the transmittance of visible light were measured. The results are shown in Table 1.
【００１８】実施例３ グリーンラルＳＰ（近赤外線遮蔽機能付ガラス、セント
ラル硝子（株）製）に製造例１で得たフィルムＦ−１を
貼り合わせ、フィルターを作製した。このフィルターの
波長８００〜１０００ｎｍの透過率と可視光線透過率の
測定を行った。結果を表１に示した。Example 3 A film was prepared by laminating the film F-1 obtained in Production Example 1 on Green Lal SP (glass with near-infrared shielding function, manufactured by Central Glass Co., Ltd.). The transmittance of this filter at a wavelength of 800 to 1000 nm and the transmittance of visible light were measured. The results are shown in Table 1.
【００１９】実施例４ グリーンラルＳＰ（近赤外線遮蔽機能付ガラス、セント
ラル硝子（株）製）に製造例２で得たフィルムＦ−２を
貼り合わせ、フィルターを作製した。このフィルターの
波長８００〜１０００ｎｍの透過率と可視光線透過率の
測定を行った。結果を表１に示した。Example 4 A film was prepared by laminating the film F-2 obtained in Production Example 2 on Green Lal SP (glass with near-infrared shielding function, manufactured by Central Glass Co., Ltd.). The transmittance of this filter at a wavelength of 800 to 1000 nm and the transmittance of visible light were measured. The results are shown in Table 1.
【００２０】実施例５ グリーンラルＳＰ（近赤外線遮蔽機能付ガラス、セント
ラル硝子製）に製造例３で得たフィルムＦ−３を貼り合
わせ、フィルターを作製した。このフィルターの波長８
００〜１０００ｎｍの透過率と可視光線透過率の測定を
行った。結果を表１に示した。Example 5 The film F-3 obtained in Production Example 3 was bonded to Green Lal SP (glass with near-infrared shielding function, manufactured by Central Glass) to produce a filter. Wavelength 8 of this filter
The transmittance of 00 to 1000 nm and the transmittance of visible light were measured. The results are shown in Table 1.
【００２１】実施例６ 製造例５で得たアクリル板Ｓ−５と製造例１で得たフィ
ルムＦ−１を貼り合わせ、フィルターを作製した。この
フィルターの波長８００〜１０００ｎｍの透過率と可視
光線透過率の測定を行った。結果を表１に示した。Example 6 The acrylic plate S-5 obtained in Production Example 5 and the film F-1 obtained in Production Example 1 were bonded together to produce a filter. The transmittance of this filter at a wavelength of 800 to 1000 nm and the transmittance of visible light were measured. The results are shown in Table 1.
【００２２】実施例７ 製造例５で得たアクリル板Ｓ−５と製造例２で得たフィ
ルムＦ−２と製造例３で得たフィルムＦ−３を貼り合わ
せ、フィルターを作製した。このフィルターの波長８０
０〜１０００ｎｍの透過率と可視光線透過率の測定を行
った。結果を表１に示した。Example 7 The acrylic plate S-5 obtained in Production Example 5, the film F-2 obtained in Production Example 2, and the film F-3 obtained in Production Example 3 were laminated to produce a filter. Wavelength of this filter 80
The transmittance of 0 to 1000 nm and the transmittance of visible light were measured. The results are shown in Table 1.
【００２３】実施例８ 製造例５で得たアクリル板Ｓ−５と製造例３で得たフィ
ルムＦ−３と製造例４で得たフィルムＦ−４を貼り合わ
せ、フィルターを作製した。このフィルターの波長８０
０〜１０００ｎｍの透過率と可視光線透過率の測定を行
った。結果を表１に示した。Example 8 The acrylic plate S-5 obtained in Production Example 5, the film F-3 obtained in Production Example 3, and the film F-4 obtained in Production Example 4 were laminated to produce a filter. Wavelength of this filter 80
The transmittance of 0 to 1000 nm and the transmittance of visible light were measured. The results are shown in Table 1.
【００２４】比較例１ ガラス板のみの波長８００〜１０００ｎｍの透過率と可
視光線透過率の測定を行った。結果を表１に示した。Comparative Example 1 The transmittance of a glass plate alone at a wavelength of 800 to 1000 nm and the transmittance of visible light were measured. The results are shown in Table 1.
【００２５】比較例２ グリーンラルＳＰのみの波長８００〜１０００ｎｍの透
過率と可視光線透過率の測定を行った。結果を表１に示
した。Comparative Example 2 The transmittance of green lar SP alone at a wavelength of 800 to 1000 nm and the transmittance of visible light were measured. The results are shown in Table 1.
【００２６】比較例３ 製造例５で得たアクリル板の波長８００〜１０００ｎｍ
の透過率と可視光線透過率の測定を行った。結果を表１
に示した。Comparative Example 3 The wavelength of the acrylic plate obtained in Production Example 5 was 800 to 1000 nm.
And the transmittance of visible light were measured. Table 1 shows the results
It was shown to.
【００２７】実施例９ 実施例５で得たフィルターの両面にリアルックＨＰ（反
射防止フィルム、日本油脂（株）製）を貼り合わせた。
このフィルターの波長８００〜１０００ｎｍの透過率と
可視光線透過率と表面反射率を測定した。結果を表２に
示した。Example 9 Realoc HP (Anti-reflection film, manufactured by NOF Corporation) was attached to both sides of the filter obtained in Example 5.
The transmittance of this filter at a wavelength of 800 to 1000 nm, the transmittance of visible light, and the surface reflectance were measured. The results are shown in Table 2.
【００２８】実施例１０ 実施例５で得たフィルターの両面にアークトップ（反射
防止フィルム、旭硝子（株）製）を貼り合わせた。この
フィルターの波長８００〜１０００ｎｍの透過率と可視
光線透過率と表面反射率を測定した。結果を表２に示し
た。Example 10 Arc top (Anti-reflection film, manufactured by Asahi Glass Co., Ltd.) was attached to both sides of the filter obtained in Example 5. The transmittance of this filter at a wavelength of 800 to 1000 nm, the transmittance of visible light, and the surface reflectance were measured. The results are shown in Table 2.
【００２９】実施例１１ 実施例６で得たフィルターの両面にリアルックＨＰ（反
射防止フィルム、日本油脂（株）製）を貼り合わせた。
このフィルターの波長８００〜１０００ｎｍの透過率と
可視光線透過率と表面反射率を測定した。結果を表２に
示した。Example 11 Realoc HP (Anti-reflection film, manufactured by NOF Corporation) was bonded to both sides of the filter obtained in Example 6.
The transmittance of this filter at a wavelength of 800 to 1000 nm, the transmittance of visible light, and the surface reflectance were measured. The results are shown in Table 2.
【００３０】実施例１２ 実施例５のフィルターの表面反射率を測定した。結果を
表２に示した。 実施例１３ 実施例６のフィルターの表面反射率を測定した。結果を
表２に示した。Example 12 The surface reflectance of the filter of Example 5 was measured. The results are shown in Table 2. Example 13 The surface reflectance of the filter of Example 6 was measured. The results are shown in Table 2.
【００３１】[0031]
【表１】 [Table 1]
【００３２】[0032]
【表２】 [Table 2]
【００３３】表１の結果から、本発明の実施例１〜８の
フイルターは、比較例１〜３と比べ、波長８００〜１０
００ｎｍの近赤外線波長領域で透過率２０％以下であ
り、かつ可視光線透過率５０％以上を示すことがわか
る。また、表２より本発明の反射防止機能を付与した実
施例９〜１１は、反射防止機能を付与していない実施例
１２、１３に比べて可視光線透過率が高く、また最低反
射率が低いことがわかる。From the results shown in Table 1, it can be seen that the filters of Examples 1 to 8 of the present invention have wavelengths of 800 to 10 in comparison with Comparative Examples 1 to 3.
It can be seen that the transmittance is 20% or less and the visible light transmittance is 50% or more in the near infrared wavelength region of 00 nm. Further, from Table 2, Examples 9 to 11 in which the anti-reflection function of the present invention is provided have higher visible light transmittance and lower lowest reflectance than Examples 12 and 13 in which the anti-reflection function is not provided. You can see that.
Claims (3)
の透過率が２０％以下であり、かつ可視光線透過率が５
０％以上であることを特徴とする電子ディスプレイ用近
赤外線遮蔽フィルター。1. The transmittance in the near infrared region having a wavelength of 800 to 1000 nm is 20% or less, and the visible light transmittance is 5%.
A near-infrared shielding filter for an electronic display, which is at least 0%.
当該波長の透過率が２０％以下の近赤外線遮蔽基材と、
９００〜１０００ｎｍに極大遮蔽があり当該波長の透過
率が２０％以下の近赤外線遮蔽基材とを組合せて用いる
請求項１に記載の電子ディスプレイ用近赤外線遮蔽フィ
ルター。2. A near-infrared shielding base material having a maximum shielding at a wavelength of 800 to 900 nm and a transmittance at the wavelength of 20% or less;
The near-infrared shielding filter for an electronic display according to claim 1, wherein the near-infrared shielding filter for an electronic display is used in combination with a near-infrared shielding base material having a maximum shielding at 900 to 1000 nm and a transmittance at the wavelength of 20% or less.
両面に反射防止材を付与した反射防止機能付電子ディス
プレイ用近赤外線遮蔽フィルター。3. A near-infrared shielding filter for an electronic display having an anti-reflection function, wherein an anti-reflection material is provided on one or both surfaces of the filter according to claim 2.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25488196A JP3689998B2 (en) | 1996-09-26 | 1996-09-26 | Near-infrared shielding filter for plasma display |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25488196A JP3689998B2 (en) | 1996-09-26 | 1996-09-26 | Near-infrared shielding filter for plasma display |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH10105076A true JPH10105076A (en) | 1998-04-24 |
| JP3689998B2 JP3689998B2 (en) | 2005-08-31 |
Family
ID=17271137
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| JP2000007871A (en) * | 1998-06-23 | 2000-01-11 | Kureha Chem Ind Co Ltd | Resin composition and its production, optical filter and device equipped with the same, and athermanous filter, optical fiber and glass lens |
| JP2002006102A (en) * | 2000-06-19 | 2002-01-09 | Nof Corp | Near-infrared ray shielding and reflection reducing material and its use |
| US6542292B2 (en) | 1999-12-20 | 2003-04-01 | Toyo Boseki Kabushiki Kaisha | Infrared absorption filter |
| WO2006078053A1 (en) * | 2005-01-20 | 2006-07-27 | Lintec Corporation | Reflection preventing film |
| KR100732176B1 (en) * | 2000-11-28 | 2007-06-25 | 오리온피디피주식회사 | plasma display panel with a filter function added to black stripes |
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1996
- 1996-09-26 JP JP25488196A patent/JP3689998B2/en not_active Expired - Fee Related
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| US6542292B2 (en) | 1999-12-20 | 2003-04-01 | Toyo Boseki Kabushiki Kaisha | Infrared absorption filter |
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| JP2006201463A (en) * | 2005-01-20 | 2006-08-03 | Lintec Corp | Antireflection film |
| WO2006078053A1 (en) * | 2005-01-20 | 2006-07-27 | Lintec Corporation | Reflection preventing film |
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| WO2015166873A1 (en) * | 2014-05-01 | 2015-11-05 | 富士フイルム株式会社 | Infrared sensor, near-infrared absorbent composition, photosensitive resin composition, compound, near-infrared absorbent filter, and imaging device |
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| JPWO2015166873A1 (en) * | 2014-05-01 | 2017-04-20 | 富士フイルム株式会社 | Infrared sensor, near infrared absorbing composition, photosensitive resin composition, compound, near infrared absorbing filter, and imaging device |
| CN106461830B (en) * | 2014-05-01 | 2019-08-27 | 富士胶片株式会社 | Infrared sensor, near-infrared absorbing composition, photosensitive polymer combination, compound and its application |
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