JPH09314052A - Substrate having hydrophilicity or photocatalytic activity and its production - Google Patents
Substrate having hydrophilicity or photocatalytic activity and its productionInfo
- Publication number
- JPH09314052A JPH09314052A JP8137830A JP13783096A JPH09314052A JP H09314052 A JPH09314052 A JP H09314052A JP 8137830 A JP8137830 A JP 8137830A JP 13783096 A JP13783096 A JP 13783096A JP H09314052 A JPH09314052 A JP H09314052A
- Authority
- JP
- Japan
- Prior art keywords
- photocatalyst particles
- resin coating
- resin
- substrate
- modification layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 26
- 230000001699 photocatalysis Effects 0.000 title claims abstract description 18
- 238000004519 manufacturing process Methods 0.000 title claims description 18
- 239000011941 photocatalyst Substances 0.000 claims abstract description 85
- 239000002245 particle Substances 0.000 claims abstract description 83
- 229920005989 resin Polymers 0.000 claims abstract description 63
- 239000011347 resin Substances 0.000 claims abstract description 63
- 239000011248 coating agent Substances 0.000 claims abstract description 50
- 238000000576 coating method Methods 0.000 claims abstract description 48
- 239000000463 material Substances 0.000 claims abstract description 34
- 239000002904 solvent Substances 0.000 claims abstract description 20
- 238000000034 method Methods 0.000 claims abstract description 11
- 229920002050 silicone resin Polymers 0.000 claims abstract description 8
- 239000006087 Silane Coupling Agent Substances 0.000 claims abstract description 3
- 230000004048 modification Effects 0.000 claims description 30
- 238000012986 modification Methods 0.000 claims description 30
- 239000000725 suspension Substances 0.000 claims description 17
- 239000003973 paint Substances 0.000 claims description 14
- 230000008569 process Effects 0.000 claims description 3
- 238000006479 redox reaction Methods 0.000 abstract description 8
- 230000000694 effects Effects 0.000 abstract description 3
- 239000000356 contaminant Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 31
- 230000009471 action Effects 0.000 description 15
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 10
- 239000000126 substance Substances 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 8
- 238000000354 decomposition reaction Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 229920001296 polysiloxane Polymers 0.000 description 6
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 6
- 229910010413 TiO 2 Inorganic materials 0.000 description 5
- 239000004567 concrete Substances 0.000 description 4
- 230000001443 photoexcitation Effects 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 125000000962 organic group Chemical group 0.000 description 3
- -1 superoxide ions Chemical class 0.000 description 3
- 239000002344 surface layer Substances 0.000 description 3
- BVNZLSHMOBSFKP-UHFFFAOYSA-N (2-methylpropan-2-yl)oxysilane Chemical compound CC(C)(C)O[SiH3] BVNZLSHMOBSFKP-UHFFFAOYSA-N 0.000 description 2
- 241000280258 Dyschoriste linearis Species 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 2
- 230000005660 hydrophilic surface Effects 0.000 description 2
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000006722 reduction reaction Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 229920002379 silicone rubber Polymers 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 229910001887 tin oxide Inorganic materials 0.000 description 2
- KVENDAGPVNAYLY-UHFFFAOYSA-N tribromo(ethyl)silane Chemical compound CC[Si](Br)(Br)Br KVENDAGPVNAYLY-UHFFFAOYSA-N 0.000 description 2
- 238000009736 wetting Methods 0.000 description 2
- WZJUBBHODHNQPW-UHFFFAOYSA-N 2,4,6,8-tetramethyl-1,3,5,7,2$l^{3},4$l^{3},6$l^{3},8$l^{3}-tetraoxatetrasilocane Chemical compound C[Si]1O[Si](C)O[Si](C)O[Si](C)O1 WZJUBBHODHNQPW-UHFFFAOYSA-N 0.000 description 1
- JRGQKLFZSNYTDX-UHFFFAOYSA-N 3-(oxiran-2-ylmethoxy)propyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)CCCOCC1CO1 JRGQKLFZSNYTDX-UHFFFAOYSA-N 0.000 description 1
- HXLAEGYMDGUSBD-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propan-1-amine Chemical compound CCO[Si](C)(OCC)CCCN HXLAEGYMDGUSBD-UHFFFAOYSA-N 0.000 description 1
- MBNRBJNIYVXSQV-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propane-1-thiol Chemical compound CCO[Si](C)(OCC)CCCS MBNRBJNIYVXSQV-UHFFFAOYSA-N 0.000 description 1
- DOYKFSOCSXVQAN-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CCO[Si](C)(OCC)CCCOC(=O)C(C)=C DOYKFSOCSXVQAN-UHFFFAOYSA-N 0.000 description 1
- IKYAJDOSWUATPI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propane-1-thiol Chemical compound CO[Si](C)(OC)CCCS IKYAJDOSWUATPI-UHFFFAOYSA-N 0.000 description 1
- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 description 1
- LQMCVFDSKWCIGP-UHFFFAOYSA-N 3-[tris[(2-methylpropan-2-yl)oxy]silyl]propane-1-thiol Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)CCCS LQMCVFDSKWCIGP-UHFFFAOYSA-N 0.000 description 1
- WALYBSCHCQWCPC-UHFFFAOYSA-N 3-[tris[(2-methylpropan-2-yl)oxy]silyl]propyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C WALYBSCHCQWCPC-UHFFFAOYSA-N 0.000 description 1
- CJUFQURUUZMUOG-UHFFFAOYSA-N 3-tri(propan-2-yloxy)silylpropane-1-thiol Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)CCCS CJUFQURUUZMUOG-UHFFFAOYSA-N 0.000 description 1
- CHPNMYQJQQGAJS-UHFFFAOYSA-N 3-tri(propan-2-yloxy)silylpropyl 2-methylprop-2-enoate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)CCCOC(=O)C(C)=C CHPNMYQJQQGAJS-UHFFFAOYSA-N 0.000 description 1
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical compound CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 239000004944 Liquid Silicone Rubber Substances 0.000 description 1
- 241001024304 Mino Species 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- LVPNVHIDUOOXHW-UHFFFAOYSA-N [SiH4].C(CCCCCCCCCCCC)Br Chemical compound [SiH4].C(CCCCCCCCCCCC)Br LVPNVHIDUOOXHW-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- UWMGVIKSCFGFDR-UHFFFAOYSA-N benzyl(dibromo)silane Chemical compound Br[SiH](Br)CC1=CC=CC=C1 UWMGVIKSCFGFDR-UHFFFAOYSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- BAAAEEDPKUHLID-UHFFFAOYSA-N decyl(triethoxy)silane Chemical compound CCCCCCCCCC[Si](OCC)(OCC)OCC BAAAEEDPKUHLID-UHFFFAOYSA-N 0.000 description 1
- KQAHMVLQCSALSX-UHFFFAOYSA-N decyl(trimethoxy)silane Chemical compound CCCCCCCCCC[Si](OC)(OC)OC KQAHMVLQCSALSX-UHFFFAOYSA-N 0.000 description 1
- LILGYOCNANBWTO-UHFFFAOYSA-N decyl-tri(propan-2-yloxy)silane Chemical compound CCCCCCCCCC[Si](OC(C)C)(OC(C)C)OC(C)C LILGYOCNANBWTO-UHFFFAOYSA-N 0.000 description 1
- AGUMJWWZSTXCAM-UHFFFAOYSA-N decyl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CCCCCCCCCC[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C AGUMJWWZSTXCAM-UHFFFAOYSA-N 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- LIQOCGKQCFXKLF-UHFFFAOYSA-N dibromo(dimethyl)silane Chemical compound C[Si](C)(Br)Br LIQOCGKQCFXKLF-UHFFFAOYSA-N 0.000 description 1
- DBUGVTOEUNNUHR-UHFFFAOYSA-N dibromo(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Br)(Br)C1=CC=CC=C1 DBUGVTOEUNNUHR-UHFFFAOYSA-N 0.000 description 1
- OSXYHAQZDCICNX-UHFFFAOYSA-N dichloro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Cl)(Cl)C1=CC=CC=C1 OSXYHAQZDCICNX-UHFFFAOYSA-N 0.000 description 1
- GNEPOXWQWFSSOU-UHFFFAOYSA-N dichloro-methyl-phenylsilane Chemical compound C[Si](Cl)(Cl)C1=CC=CC=C1 GNEPOXWQWFSSOU-UHFFFAOYSA-N 0.000 description 1
- ZZNQQQWFKKTOSD-UHFFFAOYSA-N diethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)C1=CC=CC=C1 ZZNQQQWFKKTOSD-UHFFFAOYSA-N 0.000 description 1
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 1
- MNFGEHQPOWJJBH-UHFFFAOYSA-N diethoxy-methyl-phenylsilane Chemical compound CCO[Si](C)(OCC)C1=CC=CC=C1 MNFGEHQPOWJJBH-UHFFFAOYSA-N 0.000 description 1
- VGWJKDPTLUDSJT-UHFFFAOYSA-N diethyl dimethyl silicate Chemical compound CCO[Si](OC)(OC)OCC VGWJKDPTLUDSJT-UHFFFAOYSA-N 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 1
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
- CVQVSVBUMVSJES-UHFFFAOYSA-N dimethoxy-methyl-phenylsilane Chemical compound CO[Si](C)(OC)C1=CC=CC=C1 CVQVSVBUMVSJES-UHFFFAOYSA-N 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- MABAWBWRUSBLKQ-UHFFFAOYSA-N ethenyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)C=C MABAWBWRUSBLKQ-UHFFFAOYSA-N 0.000 description 1
- BQRPSOKLSZSNAR-UHFFFAOYSA-N ethenyl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)C=C BQRPSOKLSZSNAR-UHFFFAOYSA-N 0.000 description 1
- MYEJNNDSIXAGNK-UHFFFAOYSA-N ethyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CC)(OC(C)C)OC(C)C MYEJNNDSIXAGNK-UHFFFAOYSA-N 0.000 description 1
- ZVQNVYMTWXEMSF-UHFFFAOYSA-N ethyl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[Si](CC)(OC(C)(C)C)OC(C)(C)C ZVQNVYMTWXEMSF-UHFFFAOYSA-N 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 1
- DPTKSEHTOJHGOV-UHFFFAOYSA-N hexyl-tri(propan-2-yloxy)silane Chemical compound CCCCCC[Si](OC(C)C)(OC(C)C)OC(C)C DPTKSEHTOJHGOV-UHFFFAOYSA-N 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 230000005661 hydrophobic surface Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 125000005928 isopropyloxycarbonyl group Chemical group [H]C([H])([H])C([H])(OC(*)=O)C([H])([H])[H] 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- HLXDKGBELJJMHR-UHFFFAOYSA-N methyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](C)(OC(C)C)OC(C)C HLXDKGBELJJMHR-UHFFFAOYSA-N 0.000 description 1
- AHQDZKRRVNGIQL-UHFFFAOYSA-N methyl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[Si](C)(OC(C)(C)C)OC(C)(C)C AHQDZKRRVNGIQL-UHFFFAOYSA-N 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- DRRZZMBHJXLZRS-UHFFFAOYSA-N n-[3-[dimethoxy(methyl)silyl]propyl]cyclohexanamine Chemical compound CO[Si](C)(OC)CCCNC1CCCCC1 DRRZZMBHJXLZRS-UHFFFAOYSA-N 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- IHVVJLCVJNNCDK-UHFFFAOYSA-N octadecyl-tri(propan-2-yloxy)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OC(C)C)(OC(C)C)OC(C)C IHVVJLCVJNNCDK-UHFFFAOYSA-N 0.000 description 1
- SLYCYWCVSGPDFR-UHFFFAOYSA-N octadecyltrimethoxysilane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OC)(OC)OC SLYCYWCVSGPDFR-UHFFFAOYSA-N 0.000 description 1
- 150000002923 oximes Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- VPLNCHFJAOKWBT-UHFFFAOYSA-N phenyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)C1=CC=CC=C1 VPLNCHFJAOKWBT-UHFFFAOYSA-N 0.000 description 1
- 239000005054 phenyltrichlorosilane Substances 0.000 description 1
- 238000007539 photo-oxidation reaction Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- AIFMYMZGQVTROK-UHFFFAOYSA-N silicon tetrabromide Chemical compound Br[Si](Br)(Br)Br AIFMYMZGQVTROK-UHFFFAOYSA-N 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 description 1
- PCADGSDEFOMDNL-UHFFFAOYSA-N tri(propan-2-yloxy)-(3,3,3-trifluoropropyl)silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)CCC(F)(F)F PCADGSDEFOMDNL-UHFFFAOYSA-N 0.000 description 1
- MQVCTPXBBSKLFS-UHFFFAOYSA-N tri(propan-2-yloxy)-propylsilane Chemical compound CCC[Si](OC(C)C)(OC(C)C)OC(C)C MQVCTPXBBSKLFS-UHFFFAOYSA-N 0.000 description 1
- MLZOPJVPCGTFGS-UHFFFAOYSA-N tribromo(3,3,3-trifluoropropyl)silane Chemical compound FC(F)(F)CC[Si](Br)(Br)Br MLZOPJVPCGTFGS-UHFFFAOYSA-N 0.000 description 1
- BZAROSBWJASVBU-UHFFFAOYSA-N tribromo(ethenyl)silane Chemical compound Br[Si](Br)(Br)C=C BZAROSBWJASVBU-UHFFFAOYSA-N 0.000 description 1
- VRUFDMFAHKOFOT-UHFFFAOYSA-N tribromo(hexyl)silane Chemical compound CCCCCC[Si](Br)(Br)Br VRUFDMFAHKOFOT-UHFFFAOYSA-N 0.000 description 1
- KBSUPJLTDMARAI-UHFFFAOYSA-N tribromo(methyl)silane Chemical compound C[Si](Br)(Br)Br KBSUPJLTDMARAI-UHFFFAOYSA-N 0.000 description 1
- RCEOWKUMFSNHFM-UHFFFAOYSA-N tribromo(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](Br)(Br)Br RCEOWKUMFSNHFM-UHFFFAOYSA-N 0.000 description 1
- HPTIEXHGTPSFDC-UHFFFAOYSA-N tribromo(phenyl)silane Chemical compound Br[Si](Br)(Br)C1=CC=CC=C1 HPTIEXHGTPSFDC-UHFFFAOYSA-N 0.000 description 1
- RWRKNKVDHIEKHS-UHFFFAOYSA-N tribromo(propyl)silane Chemical compound CCC[Si](Br)(Br)Br RWRKNKVDHIEKHS-UHFFFAOYSA-N 0.000 description 1
- WEUBQNJHVBMUMD-UHFFFAOYSA-N trichloro(3,3,3-trifluoropropyl)silane Chemical compound FC(F)(F)CC[Si](Cl)(Cl)Cl WEUBQNJHVBMUMD-UHFFFAOYSA-N 0.000 description 1
- HLWCOIUDOLYBGD-UHFFFAOYSA-N trichloro(decyl)silane Chemical compound CCCCCCCCCC[Si](Cl)(Cl)Cl HLWCOIUDOLYBGD-UHFFFAOYSA-N 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- ZOYFEXPFPVDYIS-UHFFFAOYSA-N trichloro(ethyl)silane Chemical compound CC[Si](Cl)(Cl)Cl ZOYFEXPFPVDYIS-UHFFFAOYSA-N 0.000 description 1
- LFXJGGDONSCPOF-UHFFFAOYSA-N trichloro(hexyl)silane Chemical compound CCCCCC[Si](Cl)(Cl)Cl LFXJGGDONSCPOF-UHFFFAOYSA-N 0.000 description 1
- PYJJCSYBSYXGQQ-UHFFFAOYSA-N trichloro(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](Cl)(Cl)Cl PYJJCSYBSYXGQQ-UHFFFAOYSA-N 0.000 description 1
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 1
- DOEHJNBEOVLHGL-UHFFFAOYSA-N trichloro(propyl)silane Chemical compound CCC[Si](Cl)(Cl)Cl DOEHJNBEOVLHGL-UHFFFAOYSA-N 0.000 description 1
- ZLGWXNBXAXOQBG-UHFFFAOYSA-N triethoxy(3,3,3-trifluoropropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC(F)(F)F ZLGWXNBXAXOQBG-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- FZMJEGJVKFTGMU-UHFFFAOYSA-N triethoxy(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OCC)(OCC)OCC FZMJEGJVKFTGMU-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- JIOBRIJHDZBWDE-UHFFFAOYSA-N tris[(2-methylpropan-2-yl)oxy]-(3,3,3-trifluoropropyl)silane Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)CCC(F)(F)F JIOBRIJHDZBWDE-UHFFFAOYSA-N 0.000 description 1
- WUSDGIZCXCUHAI-UHFFFAOYSA-N tris[(2-methylpropan-2-yl)oxy]-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)CCCOCC1CO1 WUSDGIZCXCUHAI-UHFFFAOYSA-N 0.000 description 1
- RXKYGZRLZACSIK-UHFFFAOYSA-N tris[(2-methylpropan-2-yl)oxy]-octadecylsilane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C RXKYGZRLZACSIK-UHFFFAOYSA-N 0.000 description 1
- KGOOITCIBGXHJO-UHFFFAOYSA-N tris[(2-methylpropan-2-yl)oxy]-phenylsilane Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)C1=CC=CC=C1 KGOOITCIBGXHJO-UHFFFAOYSA-N 0.000 description 1
- DIZPPYBTFPZSGK-UHFFFAOYSA-N tris[(2-methylpropan-2-yl)oxy]-propylsilane Chemical compound CCC[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C DIZPPYBTFPZSGK-UHFFFAOYSA-N 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Catalysts (AREA)
- Finishing Walls (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は親水性又は光触媒活
性(親水性及び光触媒活性の両機能を備えたものも含
む)を有する基材とその製造方法に関する。TECHNICAL FIELD The present invention relates to a substrate having hydrophilicity or photocatalytic activity (including one having both hydrophilicity and photocatalytic activity) and a method for producing the same.
【0002】[0002]
【従来の技術】TiO2などの光触媒粒子に光触媒粒子の
バンドギャップエネルギよりも高いエネルギの光(紫外
線等)を照射すると、光触媒粒子は表面に付着した物質
の分解作用と、表面の親水化(超親水化)作用を発揮す
る。 2. Description of the Related Art When photocatalyst particles such as TiO 2 are irradiated with light (ultraviolet rays, etc.) having an energy higher than the bandgap energy of the photocatalyst particles, the photocatalyst particles decompose the substances adhering to the surface and make the surface hydrophilic ( Exhibits superhydrophilicity.
【0003】物質の分解作用は、酸化還元反応に基づく
ものであり、光触媒粒子に紫外線等を照射すると、光励
起により電子−正孔対が生じ、このうち電子は表面酸素
を還元してスーパーオキサイドイオン(O2 -)を生成
し、正孔は表面水酸基を酸化して水酸ラジカル(・O
H)を生成し、これらの極めて反応性に富む活性種(O
2 -や・OH)の酸化還元反応によって表面に付着した物
質を分解するというものである。この分解作用を利用し
て、汚れ防止のために表面に光触媒粒子の層を形成した
先行技術が多数提案されている。The decomposition action of a substance is based on a redox reaction, and when photocatalyst particles are irradiated with ultraviolet rays or the like, electron-hole pairs are generated by photoexcitation, and among these electrons, surface oxygen is reduced and superoxide ions are generated. (O 2 − ) are generated, and the holes oxidize the surface hydroxyl groups to generate hydroxyl radicals (.O 2
H), and these highly reactive active species (O
2 - by redox reaction and · OH) is that of degrading substance attached to the surface. Many prior arts have been proposed in which a layer of photocatalyst particles is formed on the surface to prevent stains by utilizing this decomposition action.
【0004】一方、光触媒粒子の親水化作用は本発明者
らが最近新たに発見した事実であり、その理論的根拠は
完全には解明されていないが、光触媒効果によって水酸
基(OH-)が光触媒粒子の表面に化学吸着し、或いは
水酸基(OH-)が有機基と置換し、更にこの水酸基
(OH-)に空気中の水分子が物理吸着し、物理吸着水
が増加することによって表面の親水性が増し、超親水性
の表面が実現すると考えている。On the other hand, the hydrophilizing action of the photocatalyst particles is a fact newly discovered by the present inventors, and the theoretical basis thereof has not been completely clarified, but the photocatalytic effect causes a hydroxyl group (OH − ) to act as a photocatalyst. chemically adsorbed to the surface of the particle, or hydroxyl (OH -) is replaced with an organic group, further the hydroxyl (OH -) water molecules in the air is physically adsorbed to a hydrophilic surface by physically adsorbed water increases It is believed that the property will increase and a superhydrophilic surface will be realized.
【0005】具体例として、表面層がSi−O結合を有
するシリコーン樹脂からなる場合を例にとって説明する
と、光触媒粒子に光を照射する前は図1(a)に示すよ
うに、Si原子にアルキル基(R)が結合しているた
め、表面層は疎水性を示すが、光触媒粒子のバンドギャ
ップエネルギよりも高いエネルギの光を照射すると、図
1(b)に示すように、まず光触媒効果によって光触媒
粒子表面に水酸基(OH-)が化学吸着し、またシリコ
ーン樹脂のアルキル基(R)が水酸基(OH-)に置換
され、更にこの水酸基(OH-)に空気中の水分子が物
理吸着し、物理吸着水が増加することによって表面の親
水性が増し、超親水性の表面が実現されると考えられ
る。そして、光触媒粒子表面に水酸基(OH-)が化学
吸着する方が、アルキル基(R)が水酸基(OH-)に
置換されるよりも生じやすいため、樹脂塗料表面に光触
媒粒子の一部が露出する構造とした方が、より親水性を
発揮するものと考えられる。As a concrete example, the case where the surface layer is made of a silicone resin having a Si--O bond will be described. Before the photocatalyst particles are irradiated with light, as shown in FIG. Since the surface layer is hydrophobic because the group (R) is bonded, when the surface layer is irradiated with light having an energy higher than the band gap energy of the photocatalyst particles, as shown in FIG. hydroxyl photocatalyst particle surface (OH -) are chemically adsorbed, the alkyl groups in the silicone resin (R) is a hydroxyl group - is replaced by a further the hydroxyl (OH) - water molecules in the air is physically adsorbed (OH) It is considered that the increase in the amount of physically adsorbed water increases the hydrophilicity of the surface and realizes a superhydrophilic surface. The hydroxyl group on the photocatalyst particle surface (OH -) is better to chemical adsorption, an alkyl group (R) is a hydroxyl group (OH -) because prone than is replaced, the exposed part of the photocatalyst particles in the resin coating surface It is considered that the structure having the above structure exhibits more hydrophilicity.
【0006】上記の説明で、物質の分解作用と親水化作
用とは全く別のものであることが明らかであるが、具体
的事例を示せば、TiO2でもアナターゼ型のTiO2は酸
化還元反応に基づく物質の分解作用を示すがルチル型の
TiO2は殆ど酸化還元反応に基づく物質の分解作用を示
さない。また光触媒のうちでも酸化錫も酸化還元反応に
基づく物質の分解作用を示さない。これらの光触媒粒子
は伝導帯のエネルギ準位が十分に高くないため還元反応
が進行せず、その結果、伝導帯に光励起された電子が過
剰となり、光励起により生じた電子−正孔対が酸化還元
反応に関与せずに再結合するためと考えられている。し
かしながら、これらルチル型TiO2及び酸化錫のいずれ
も親水化作用は示す。また、物質の分解作用を発揮する
には、光触媒層の厚みとして少なくとも100nm以上
必要であったが、親水化作用をを発揮するには、数nm
以上あれば可能である。これらの事実から光触媒による
物質の分解作用と親水化作用とは全く別のものであると
言える。[0006] In the above description, it is apparent that the decomposition and hydrophilization effect of a substance is completely different, if Shimese concrete examples, TiO 2 anatase even TiO 2 oxidation-reduction reaction However, rutile-type TiO 2 shows almost no decomposition action of the substance based on the redox reaction. Also, among the photocatalysts, tin oxide does not show a decomposition effect of a substance based on a redox reaction. In these photocatalyst particles, the energy level of the conduction band is not sufficiently high, so that the reduction reaction does not proceed. As a result, the electrons excited by the photoexcitation in the conduction band become excessive, and the electron-hole pairs generated by the photoexcitation are oxidized and reduced. It is believed that they recombine without participating in the reaction. However, both rutile TiO 2 and tin oxide exhibit a hydrophilizing action. Further, the photocatalytic layer needs to have a thickness of at least 100 nm or more in order to exhibit the decomposing action of the substance.
Above is possible. From these facts, it can be said that the decomposition action of the substance by the photocatalyst and the hydrophilization action are completely different.
【0007】[0007]
【発明が解決しようとする課題】上記の親水性又は光触
媒活性を発揮する光触媒層を基材の表面に形成する手段
としては、基材表面に光触媒粒子を含む懸濁液を塗布し
た後、焼成するのが一般的である。しかしながら、この
方法は基材が熱に弱い場合には採用することができな
い。また、基材が耐熱性であったとしても、基材表面に
形成された光触媒層は剥離しやすい場合もある。The means for forming the photocatalyst layer exhibiting hydrophilicity or photocatalytic activity on the surface of the substrate is as follows. It is common to do. However, this method cannot be adopted when the substrate is vulnerable to heat. Further, even if the base material has heat resistance, the photocatalyst layer formed on the surface of the base material may be easily peeled off.
【0008】そこで、樹脂塗料中に光触媒粒子を混合
し、この樹脂塗料を基材表面に塗布する方法が考えられ
る。しかしながら、この方法による場合には、光触媒粒
子が樹脂塗料中に埋没し、表面に光触媒粒子が露出しな
いため、光触媒の作用、特に表面の室内照明程度の弱い
励起波長照度における光酸化還元作用が十分に発揮され
ないことになる。Therefore, a method of mixing photocatalyst particles in the resin coating and applying the resin coating to the surface of the substrate can be considered. However, in the case of this method, the photocatalyst particles are buried in the resin coating and the photocatalyst particles are not exposed on the surface, so that the photocatalyst action, especially the photooxidation / reduction action at a weak excitation wavelength illuminance such as indoor illumination of the surface is sufficient. Will not be exhibited.
【0009】[0009]
【課題を解決するための手段】本発明は、粒子の表面が
濡れにくくなる(水との接触角が大きくなる)と比重が
1以上の粒子であっても液面に粒子が浮くことに着目
し、上記の課題を解決すべく本発明を成したものであ
る。The present invention focuses on the fact that when the surface of a particle becomes difficult to wet (the contact angle with water becomes large), the particle floats on the liquid surface even if it has a specific gravity of 1 or more. However, the present invention has been made to solve the above problems.
【0010】即ち、本発明に係る親水性又は光触媒活性
を有する基材は、基材表面に樹脂塗料膜が形成され、こ
の樹脂塗料膜の表面には、光触媒粒子がその一部を外気
に露出するように保持されている。ここで、光触媒粒子
の表面に濡れ性を調整する表面修飾層を形成した場合に
は、経時的に外気に露出する部分の表面修飾層は紫外線
等を照射することによって酸化還元反応を生じ、当該外
気に露出する部分の表面修飾層を分解し、光触媒粒子表
面を直接外気に露出することになる。That is, the substrate having hydrophilicity or photocatalytic activity according to the present invention has a resin coating film formed on the surface of the substrate, and the photocatalyst particles are partially exposed to the outside air on the surface of the resin coating film. Is held to. Here, when the surface modification layer for adjusting the wettability is formed on the surface of the photocatalyst particles, the surface modification layer in the portion exposed to the outside with time causes a redox reaction by irradiating with ultraviolet rays, The surface modification layer of the portion exposed to the outside air is decomposed and the surface of the photocatalyst particles is directly exposed to the outside air.
【0011】また、本発明に係る親水性又は光触媒活性
を有する基材の製造方法は、基材表面に樹脂塗料を塗布
する工程と、光触媒粒子の表面に前記樹脂塗料を構成す
る溶剤に対する光触媒粒子の濡れ性を調整する表面修飾
層を形成する工程と、この表面修飾層を形成した光触媒
粒子を前記樹脂塗料を構成する溶剤と同種の溶剤に分散
せしめて懸濁液を調製する工程と、基材表面に塗布した
前記未硬化の樹脂塗料上に前記懸濁液を塗布し光触媒粒
子の一部を外気に露出させ他の部分を樹脂塗料中に埋没
せしめる工程と、溶剤を除去して樹脂塗料を硬化せしめ
る工程と、光触媒粒子表面のうち樹脂塗料の表面から露
出している部分の表面修飾層を除去する工程とから構成
した。The method for producing a substrate having hydrophilicity or photocatalytic activity according to the present invention comprises a step of applying a resin coating on the surface of the substrate and photocatalyst particles for the solvent constituting the resin coating on the surface of the photocatalyst particles. A step of forming a surface modification layer for adjusting the wettability of, a step of dispersing the photocatalyst particles forming the surface modification layer in a solvent of the same kind as the solvent constituting the resin coating material to prepare a suspension, A step of applying the suspension on the uncured resin coating applied to the surface of the material and exposing a part of the photocatalyst particles to the outside air and burying the other part in the resin coating, and removing the solvent to remove the resin coating. And a step of removing the surface modification layer of the portion of the surface of the photocatalyst particle exposed from the surface of the resin coating material.
【0012】また、本発明に係る親水性又は光触媒活性
を有する基材の別の製造方法は、光触媒粒子の表面に樹
脂塗料を構成する溶剤に対する光触媒粒子の濡れ性を調
整する表面修飾層を形成する工程と、この表面修飾層を
形成した光触媒粒子を樹脂塗料中に分散せしめて懸濁液
を調製する工程と、基材表面に前記懸濁液を塗布し光触
媒粒子の一部を外気に露出させ他の部分を樹脂塗料中に
埋没せしめる工程と、溶剤を除去して樹脂塗料を硬化せ
しめる工程と、光触媒粒子表面のうち樹脂塗料の表面か
ら露出している部分の表面修飾層を除去する工程とから
構成した。Another method for producing a substrate having hydrophilicity or photocatalytic activity according to the present invention is to form a surface modification layer on the surface of the photocatalyst particles for adjusting the wettability of the photocatalyst particles with respect to the solvent constituting the resin coating material. And a step of preparing a suspension by dispersing the photocatalyst particles having the surface modification layer in a resin coating, and coating the suspension on the surface of the substrate to expose a part of the photocatalyst particles to the outside air. The step of burying other parts in the resin coating, the step of curing the resin coating by removing the solvent, and the step of removing the surface modification layer of the portion of the photocatalyst particle surface exposed from the surface of the resin coating. And consisted of
【0013】上記の基材の製造方法において、表面修飾
層によって樹脂塗料を構成する溶剤に対する光触媒粒子
の濡れ性は、10°〜80°に調整することが好まし
く、表面修飾層としては、例えばシランカップリング剤
等を挙げることができる。また、樹脂塗料としては比較
的低い温度で硬化可能なもの、例えば室温で硬化可能な
シリコーン樹脂等を挙げることができる。In the above-mentioned method for producing a substrate, the wettability of the photocatalyst particles to the solvent constituting the resin coating material by the surface modification layer is preferably adjusted to 10 ° to 80 °, and the surface modification layer is, for example, silane. A coupling agent etc. can be mentioned. The resin coating material may be one that can be cured at a relatively low temperature, such as a silicone resin that can be cured at room temperature.
【0014】シリコーン樹脂としては、メチルトリクロ
ルシラン、メチルトリブロムシラン、メチルトリメトキ
シシラン、メチルトリエトキシシラン、メチルトリイソ
プロポキシシラン、メチルトリt−ブトキシシラン、エ
チルトリクロルシラン、エチルトリブロムシラン、エチ
ルトリメトキシシラン、エチルトリエトキシシラン、エ
チルトリイソプロポキシシラン、エチルトリt−ブトキ
シシラン、n−プロピルトリクロルシラン、n−プロピ
ルトリブロムシラン、n−プロピルトリメトキシシラ
ン、n−プロピルトリエトキシシラン、n−プロピルト
リイソプロポキシシラン、n−プロピルトリt−ブトキ
シシラン、n−ヘキシルトリクロルシラン、n−ヘキシ
ルトリブロムシラン、n−ヘキシルトリメトキシシラ
ン、n−ヘキシルトリエトキシシラン、n−ヘキシルト
リイソプロポキシシラン、n−ヘキシルトリt−ブトキ
シシラン、n−デシルトリクロルシラン、n−デシルト
リブロムシラン、n−デシルトリメトキシシラン、n−
デシルトリエトキシシラン、n−デシルトリイソプロポ
キシシラン、n−デシルトリt−ブトキシシラン、n−
オクタデシルトリクロルシラン、n−オクタデシルトリ
ブロムシラン、n−オクタデシルトリメトキシシラン、
n−オクタデシルトリエトキシシラン、n−オクタデシ
ルトリイソプロポキシシラン、n−オクタデシルトリt
−ブトキシシラン、フェニルトリクロルシラン、フェニ
ルトリブロムシラン、フェニルトリメトキシシラン、フ
ェニルトリエトキシシラン、フェニルトリイソプロポキ
シシラン、フェニルトリt−ブトキシシラン、テトラク
ロルシラン、テトラブロムシラン、テトラメトキシシラ
ン、テトラエトキシシラン、テトライソプロポキシシラ
ン、テトラブトキシシラン、ジメトキシジエトキシシラ
ン、ジメチルジクロルシラン、ジメチルジブロムシラ
ン、ジメチルジメトキシシラン、ジメチルジエトキシシ
ラン、ジフェニルジクロルシラン、ジフェニルジブロム
シラン、ジフェニルジメトキシシラン、ジフェニルジエ
トキシシラン、フェニルメチルジクロルシラン、フェニ
ルメチルジブロムシラン、フェニルメチルジメトキシシ
ラン、フェニルメチルジエトキシシラン、トリエトキシ
ヒドロシラン、トリブロムヒドロシラン、トリメトキシ
ヒドロシラン、イソプロポキシヒドロシラン、トリt−
ブトキシヒドロシラン、ビニルトリクロルシラン、ビニ
ルトリブロムシラン、ビニルトリメトキシシラン、ビニ
ルトリエトキシシラン、ビニルトリイソプロポキシシラ
ン、ビニルトリt−ブトキシシラン、トリフルオロプロ
ピルトリクロルシラン、トリフルオロプロピルトリブロ
ムシラン、トリフルオロプロピルトリメトキシシラン、
トリフルオロプロピルトリエトキシシラン、トリフルオ
ロプロピルトリイソプロポキシシラン、トリフルオロプ
ロピルトリt−ブトキシシラン、γ−グリシドキシプロ
ピルメチルジメトキシシラン、γ−グリシドキシプロピ
ルメチルジエトキシシラン、γ−グリシドキシプロピル
トリメトキシシラン、γ−グリシドキシプロピルトリエ
トキシシラン、γ−グリシドキシプロピルトリイソプロ
ポキシシラン、γ−グリシドキシプロピルトリt−ブト
キシシラン、γ−メタアクリロキシプロピルメチルジメ
トキシシラン、γ−メタアクリロキシプロピルメチルジ
エトキシシラン、γ−メタアクリロキシプロピルトリメ
トキシシラン、γ−メタアクリロキシプロピルトリイソ
プロポキシシラン、γ−メタアクリロキシプロピルトリ
t−ブトキシシラン、γ−アミノプロピルメチルジメト
キシシラン、γ−アミノプロピルメチルジエトキシシラ
ン、γ−アミノプロピルトリメトキシシラン、γ−アミ
ノプロピルトリエトキシシラン、γ−アミノプロピルト
リイソプロポキシシラン、γ−アミノプロピルトリt−
ブトキシシラン、γ−メルカプトプロピルメチルジメト
キシシラン、γ−メルカプトプロピルメチルジエトキシ
シラン、γ−メルカプトプロピルトリメトキシシラン、
γ−メルカプトプロピルトリエトキシシラン、γ−メル
カプトプロピルトリイソプロポキシシラン、γ−メルカ
プトプロピルトリt−ブトキシシラン、β−(3、4−
エポキシシクロヘキシル)エチルトリメトキシシラン、
β−(3、4−エポキシシクロヘキシル)エチルトリエ
トキシシラン、及びこれらの部分加水分解物若しくはこ
れらの混合物を使用することができる。Examples of the silicone resin include methyltrichlorosilane, methyltribromosilane, methyltrimethoxysilane, methyltriethoxysilane, methyltriisopropoxysilane, methyltri-t-butoxysilane, ethyltrichlorosilane, ethyltribromosilane, ethyltribromosilane. Methoxysilane, ethyltriethoxysilane, ethyltriisopropoxysilane, ethyltri-t-butoxysilane, n-propyltrichlorosilane, n-propyltribromosilane, n-propyltrimethoxysilane, n-propyltriethoxysilane, n-propyl Triisopropoxysilane, n-propyltri-t-butoxysilane, n-hexyltrichlorosilane, n-hexyltribromosilane, n-hexyltrimethoxysilane, n-hexyltri Tokishishiran, n- hexyl triisopropoxysilane, n- Hekishirutori t- butoxysilane, n- decyl trichlorosilane, n- tridecyl bromine silane, n- decyl trimethoxysilane, n-
Decyltriethoxysilane, n-decyltriisopropoxysilane, n-decyltri-t-butoxysilane, n-
Octadecyltrichlorosilane, n-octadecyltribromosilane, n-octadecyltrimethoxysilane,
n-octadecyltriethoxysilane, n-octadecyltriisopropoxysilane, n-octadecyltrit
-Butoxysilane, phenyltrichlorosilane, phenyltribromosilane, phenyltrimethoxysilane, phenyltriethoxysilane, phenyltriisopropoxysilane, phenyltri-t-butoxysilane, tetrachlorosilane, tetrabromosilane, tetramethoxysilane, tetraethoxy Silane, tetraisopropoxysilane, tetrabutoxysilane, dimethoxydiethoxysilane, dimethyldichlorosilane, dimethyldibromosilane, dimethyldimethoxysilane, dimethyldiethoxysilane, diphenyldichlorosilane, diphenyldibromosilane, diphenyldimethoxysilane, diphenyl Diethoxysilane, phenylmethyldichlorosilane, phenylmethyldibromosilane, phenylmethyldimethoxysilane, phenylmethyl Diethoxy silane, triethoxy hydrosilane, tri bromine hydrosilane, trimethoxy hydrosilane, isopropoxycarbonyl hydrosilane, tri t-
Butoxyhydrosilane, vinyltrichlorosilane, vinyltribromosilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltriisopropoxysilane, vinyltrit-butoxysilane, trifluoropropyltrichlorosilane, trifluoropropyltribromosilane, trifluoropropyl Trimethoxysilane,
Trifluoropropyltriethoxysilane, trifluoropropyltriisopropoxysilane, trifluoropropyltri-t-butoxysilane, γ-glycidoxypropylmethyldimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, γ-glycidoxy Propyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, γ-glycidoxypropyltriisopropoxysilane, γ-glycidoxypropyltrit-butoxysilane, γ-methacryloxypropylmethyldimethoxysilane, γ- Methacryloxypropylmethyldiethoxysilane, γ-methacryloxypropyltrimethoxysilane, γ-methacryloxypropyltriisopropoxysilane, γ-methacryloxypropyltrit-butoxysilane, γ- Mino propyl methyl dimethoxy silane, .gamma.-aminopropyl methyl diethoxy silane, .gamma.-aminopropyltrimethoxysilane, .gamma.-aminopropyltriethoxysilane, .gamma.-aminopropyl triisopropoxysilane, .gamma.-aminopropyl trimethoxy t-
Butoxysilane, γ-mercaptopropylmethyldimethoxysilane, γ-mercaptopropylmethyldiethoxysilane, γ-mercaptopropyltrimethoxysilane,
γ-mercaptopropyltriethoxysilane, γ-mercaptopropyltriisopropoxysilane, γ-mercaptopropyltri-t-butoxysilane, β- (3,4-
Epoxycyclohexyl) ethyltrimethoxysilane,
β- (3,4-epoxycyclohexyl) ethyltriethoxysilane, and their partial hydrolysates or mixtures thereof can be used.
【0015】シリコーン樹脂膜の良好な硬度と平滑性を
確保するためには、3次元架橋型シロキサンを10モル
%以上含有させるのが好ましい。更に良好な硬度と平滑
性を確保しながら樹脂膜の十分な可撓性を提供するため
には、2次元架橋型シロキサンを60モル%以下含有さ
せるのが好ましい。また、シリコーン分子の珪素原子に
結合した有機基が光励起により水酸基に置換される速度
を速めるには、シリコーン分子の珪素原子に結合する有
機基がn−プロピル基若しくはフェニル基からなるシリ
コーンを使用するのが好ましい。シロキサン結合を有す
るシリコーンに替えて、シラザン結合を有するオルガノ
ポリシラザン化合物を使用することもできる。In order to secure good hardness and smoothness of the silicone resin film, it is preferable to contain 10 mol% or more of the three-dimensional crosslinked siloxane. In order to provide sufficient flexibility of the resin film while securing good hardness and smoothness, it is preferable to contain 60 mol% or less of the two-dimensional crosslinked siloxane. In order to increase the rate at which the organic group bonded to the silicon atom of the silicone molecule is replaced with a hydroxyl group by photoexcitation, use is made of a silicone in which the organic group bonded to the silicon atom of the silicone molecule is an n-propyl group or a phenyl group. Is preferred. An organopolysilazane compound having a silazane bond can be used instead of the silicone having a siloxane bond.
【0016】また、本発明における基材とは、プラスチ
ック、タイル、木材、石、布、ガラス、陶磁器、金属、
コンクリート、セメント或いはこれらの組み合わせまた
はこれらの積層体等任意である。Further, the substrate in the present invention means plastic, tile, wood, stone, cloth, glass, ceramics, metal,
Concrete, cement, a combination thereof, a laminate of these, or the like is optional.
【0017】[0017]
【発明の実施の形態】以下に本発明の実施の形態を添付
図面に基づいて説明する。図2は本発明に係る基材の製
造方法を説明したブロック図であり、本発明にあっては
先ず酸化チタン等の光触媒粒子と室温程度の比較的低い
温度で硬化するシリコーン樹脂等の樹脂塗料とを用意す
る。Embodiments of the present invention will be described below with reference to the accompanying drawings. FIG. 2 is a block diagram for explaining the method for producing a base material according to the present invention. In the present invention, first, photocatalyst particles such as titanium oxide and a resin coating material such as a silicone resin that cures at a relatively low temperature around room temperature are used. And prepare.
【0018】光触媒粒子についてはシランカップリング
剤などにより表面修飾層を形成し、光触媒粒子表面に対
する前記樹脂塗料を構成する溶剤の濡れ角を10°〜8
0°に調整する。尚、濡れ角を10°〜80°としたの
は、10°未満では光触媒粒子が完全に樹脂塗料中に埋
没し、また80°を超えると光触媒粒子が完全に樹脂塗
料表面に浮いてしまい、簡単に剥離してしまうからであ
る。Regarding the photocatalyst particles, a surface modification layer is formed with a silane coupling agent or the like, and the wetting angle of the solvent constituting the resin coating with respect to the surface of the photocatalyst particles is 10 ° to 8 °.
Adjust to 0 °. The wetting angle is set to 10 ° to 80 °, when the angle is less than 10 °, the photocatalyst particles are completely embedded in the resin paint, and when the angle exceeds 80 °, the photocatalyst particles are completely floated on the resin paint surface. This is because they are easily peeled off.
【0019】次に、表面修飾層を形成した光触媒粒子を
樹脂塗料を構成する溶剤と同種の溶剤中に分散せしめて
懸濁液を調製し、この懸濁液を基材表面に塗布した未硬
化の樹脂塗料の上に塗布する。すると、図4に示すよう
に基材表面に塗布した未硬化の樹脂層の表面に、一部が
外気に露出した状態で光触媒粒子が保持される。Next, the photocatalyst particles having the surface modification layer formed thereon are dispersed in a solvent of the same kind as the solvent constituting the resin coating to prepare a suspension, and the suspension is applied to the surface of the substrate to be uncured. Apply on top of the resin paint. Then, as shown in FIG. 4, the photocatalyst particles are held on the surface of the uncured resin layer applied to the surface of the base material in a state where a part of the resin layer is exposed to the outside air.
【0020】また、光触媒粒子が保持された初期の段階
では、図5(a)に示すように光触媒粒子の表面は表面
修飾層にて覆われている。しかしながら、この外気に露
出する部分の表面修飾層は光触媒粒子の酸化還元作用に
よって経時的に分解され、最終的には図5(b)に示す
ように、光触媒粒子が露出し、露出した部分での親水性
及び分解作用が効果的に発揮されるようになる。尚、表
面修飾層の除去はアルカリ液で表面を洗浄するようにし
てもよい。In the initial stage where the photocatalyst particles are held, the surface of the photocatalyst particles is covered with the surface modification layer as shown in FIG. 5 (a). However, the surface modification layer of the portion exposed to the outside air is decomposed with time due to the redox action of the photocatalyst particles, and finally, as shown in FIG. 5B, the photocatalyst particles are exposed and the exposed portion is exposed. The hydrophilicity and the decomposing action of are effectively exhibited. The surface modification layer may be removed by washing the surface with an alkaline solution.
【0021】図3は本発明に係る基材の他の製造方法を
説明したブロック図であり、前記実施の態様が光触媒粒
子の懸濁液を作製した後に、これを未硬化の樹脂塗料上
に塗布したのに対し、この実施の態様にあっては、表面
修飾層を形成した光触媒粒子をそのまま樹脂塗料中に混
合し、これを基材表面塗布するようにしている。この方
法による場合には、多少樹脂塗料中に完全に埋没する光
触媒粒子が存在することになるが、工程が簡略化される
利点がある。FIG. 3 is a block diagram for explaining another method for producing a base material according to the present invention. After the suspension of photocatalyst particles is prepared in the above-mentioned embodiment, the suspension is applied onto an uncured resin coating. In contrast to the coating, in this embodiment, the photocatalyst particles on which the surface modification layer is formed are mixed as they are in the resin coating material, and this is applied to the surface of the base material. According to this method, photocatalyst particles that are completely buried in the resin coating will be present, but there is an advantage that the process is simplified.
【0022】以下に具体的な実施例を挙げる。 (実施例1)コンクリート板に対し、オキシム1成分系
建築用縮重合型シリコーンゴムからなるコーティング剤
(東芝シリコーントスコート10)を、約0.5g/m
2程度の量となるように2回ローラ塗りし、この上にア
ミノキシシロキサンを架橋剤とする2成分型液状シリコ
ーンゴムからなるコーティング剤(東芝シリコーントス
コート80、溶媒トルエン)をローラ塗りで0.1g/
m2となるように塗布した。更にその上に光触媒粒子と
して酸化チタン(石原産業社製ST41)に1,3,
5,7テトラメチルシクロテトラシロキサンを気相接触
30分させたものを、トルエン中に懸濁したものを調製
し、これを乾燥後の酸化チタン量で0.3g/m2の量
で前記シリコーン塗膜表面にスプレー塗布した。この塗
布物に水をかけたところ、初期は撥水性で水玉ができた
が、これを屋外で暴露したところ、時間の経過とともに
撥水性が失われ親水化し、水玉が平坦化して濡れ性が向
上した。Specific examples will be described below. (Example 1) About 0.5 g / m of a coating agent (Toshiba Silicone Toscoat 10) consisting of a oxime one-component polycondensation type silicone rubber for construction was applied to a concrete plate.
Roll coat twice to make the amount of about 2 and then roll coat a coating agent (Toshiba Silicone Toscoat 80, solvent toluene) consisting of two-component liquid silicone rubber with aminoxysiloxane as a cross-linking agent. .1 g /
It was applied as a m 2. Furthermore, titanium oxide (ST41 manufactured by Ishihara Sangyo Co., Ltd.) 1,3
A suspension of 5,7 tetramethylcyclotetrasiloxane in a vapor phase for 30 minutes was prepared in toluene, and the suspension was dried to obtain 0.3 g / m 2 of the titanium oxide. It was spray-coated on the surface of the coating film. When water was applied to this coated product, water repellency initially formed polka dots, but when it was exposed outdoors, water repellency was lost over time and it became hydrophilic, and the polka dots became flat and wettability improved. did.
【0023】(実施例2)サイディング板として、ニチ
ハモエンサイディングM(MT300)シーラ処理無塗
装品に、水系アクリルエマルジョン塗料(日本ペイン
ト、HIビニレックス70)を適量塗布した。これにテ
トラエトキシシランとトリメトキシメチルシランとを
9:1となるように混合し水で希釈した水溶液に、光触
媒粒子として酸化チタン(石原産業社製ST41)を懸
濁した液を調製した。この後この懸濁液を固形分で0.
3g/m2となるようにスプレーして、硬化させた後、
pH10の水酸化ナトリウム溶液で洗浄し、光触媒粒子
表面の表面修飾層を除去した。酸化チタンの懸濁液を塗
布したものと、塗布しないものを共に屋外で暴露したと
ころ、酸化チタンの懸濁液を塗布したものは汚れがつき
にくく良好であった。(Example 2) As a siding plate, Nichihamo Ensiding M (MT300) sealer-treated unpainted product was coated with an appropriate amount of a water-based acrylic emulsion paint (Nihon Paint, HI Vinylex 70). A solution was prepared by suspending titanium oxide (ST41 manufactured by Ishihara Sangyo Co., Ltd.) as photocatalyst particles in an aqueous solution prepared by mixing tetraethoxysilane and trimethoxymethylsilane in a ratio of 9: 1 and diluting with water. After this time, this suspension was solids content of 0.
After spraying to 3 g / m 2 and curing,
It was washed with a sodium hydroxide solution having a pH of 10 to remove the surface modification layer on the surface of the photocatalyst particles. When both the titanium oxide suspension-coated and uncoated ones were exposed outdoors, the titanium oxide suspension-coated ones showed good stain resistance.
【0024】[0024]
【発明の効果】以上に説明した如く本発明に係る基材
は、表面に塗布した樹脂層表面から光触媒粒子の一部が
外気に露出しているので、光触媒粒子の親水化作用と汚
れ成分の分解作用を十分に発揮することができる。ま
た、光触媒粒子の他の部分は樹脂層中に埋没しているの
で、摩擦によって光触媒粒子が剥離しにくく、紫外線等
が照射される環境に基材を設置することで、長期間に亘
って親水化作用と汚れ成分の分解作用を維持することが
できる。As described above, in the base material according to the present invention, a part of the photocatalyst particles is exposed to the outside from the surface of the resin layer applied to the surface, so that the hydrophilicity of the photocatalyst particles and the contamination component are prevented. The decomposition action can be sufficiently exerted. Further, since the other parts of the photocatalyst particles are buried in the resin layer, the photocatalyst particles are less likely to peel off due to friction, and by installing the base material in an environment where ultraviolet rays or the like are radiated, it becomes hydrophilic over a long period of time. It is possible to maintain the chemical action and the decomposition action of the soil component.
【0025】特に、樹脂層として比較的低い温度、例え
ば室温程度で硬化する樹脂を選定すれば、耐熱性のない
基材に対しても簡単に親水性等を付与することができ
る。In particular, by selecting a resin that cures at a relatively low temperature, for example, about room temperature, as the resin layer, it is possible to easily impart hydrophilicity and the like even to a substrate having no heat resistance.
【0026】また、本発明に係る基材の製造方法によれ
ば、光触媒粒子の表面に表面修飾層を形成し、樹脂塗料
を構成する溶剤に対する光触媒粒子の濡れ性を調整する
ことで、硬化前の樹脂塗料の上に光触媒粒子を塗布、若
しくは硬化前の樹脂塗料に光触媒粒子を混合した場合
に、光触媒粒子の一部が樹脂層表面から浮くようにし、
更に浮き出た光触媒粒子の一部を覆う表面修飾層につい
ては、光触媒による酸化還元反応等で除去するようにし
たので、前記した構造の基材を容易に製造することがで
きる。Further, according to the method for producing a base material of the present invention, a surface modification layer is formed on the surface of the photocatalyst particles, and the wettability of the photocatalyst particles with respect to the solvent constituting the resin coating material is adjusted, so that before curing. When the photocatalyst particles are applied onto the resin paint of, or when the photocatalyst particles are mixed with the resin paint before curing, a part of the photocatalyst particles is allowed to float from the resin layer surface,
Further, since the surface modification layer that covers a part of the raised photocatalyst particles is removed by a redox reaction or the like using a photocatalyst, the base material having the above-described structure can be easily manufactured.
【図1】(a)は疎水性表面の概念図、(b)は親水性
表面の概念図1A is a conceptual diagram of a hydrophobic surface, and FIG. 1B is a conceptual diagram of a hydrophilic surface.
【図2】本発明に係る基材の製造方法を説明したブロッ
ク図FIG. 2 is a block diagram illustrating a method for manufacturing a base material according to the present invention.
【図3】本発明に係る基材の他の製造方法を説明したブ
ロック図FIG. 3 is a block diagram illustrating another method for manufacturing a base material according to the present invention.
【図4】本発明に係る基材の断面図FIG. 4 is a sectional view of a base material according to the present invention.
【図5】光触媒粒子の外気に露出する部分の表面修飾層
の除去過程を示す図FIG. 5 is a diagram showing a process of removing a surface modification layer of a portion of the photocatalyst particle exposed to the outside air.
Claims (7)
樹脂塗料膜の表面には、光触媒粒子がその一部を外気に
露出するように保持されていることを特徴とする親水性
又は光触媒活性を有する基材。1. A hydrophilic or a resin coating film is formed on the surface of a base material, and photocatalyst particles are held on the surface of the resin coating film so that a part of the photocatalyst particles is exposed to the outside air. A substrate having photocatalytic activity.
を有する基材において、前記光触媒粒子の樹脂塗料膜中
に埋設された部分の表面には光触媒粒子の濡れ性を調整
する表面修飾層が残っていることを特徴とする親水性又
は光触媒活性を有する基材。2. The hydrophilic or photocatalytically active base material according to claim 1, wherein the surface of the portion of the photocatalyst particles embedded in the resin coating film has a surface modification layer for adjusting the wettability of the photocatalyst particles. A substrate having hydrophilicity or photocatalytic activity characterized by remaining.
光触媒粒子の表面に前記樹脂塗料を構成する溶剤に対す
る光触媒粒子の濡れ性を調整する表面修飾層を形成する
工程と、この表面修飾層を形成した光触媒粒子を前記樹
脂塗料を構成する溶剤と同種の溶剤に分散せしめて懸濁
液を調製する工程と、基材表面に塗布した前記未硬化の
樹脂塗料上に前記懸濁液を塗布し光触媒粒子の一部を外
気に露出させ他の部分を樹脂塗料中に埋没せしめる工程
と、溶剤を除去して樹脂塗料を硬化せしめる工程と、光
触媒粒子表面のうち樹脂塗料の表面から露出している部
分の表面修飾層を除去する工程とからなる親水性又は光
触媒活性を有する基材の製造方法。3. A step of applying a resin coating on the surface of a base material,
The step of forming a surface modification layer for adjusting the wettability of the photocatalyst particles to the solvent constituting the resin coating material on the surface of the photocatalyst particles, and the photocatalyst particles forming the surface modification layer are the same kind as the solvent constituting the resin coating material. Dispersing in a solvent to prepare a suspension, and coating the suspension on the uncured resin coating applied on the surface of the base material to expose a part of the photocatalyst particles to the outside air and resin the other part. Hydrophilicity consisting of a step of burying in the paint, a step of curing the resin paint by removing the solvent, and a step of removing the surface modification layer of the portion of the photocatalyst particle surface exposed from the surface of the resin paint A method for producing a substrate having photocatalytic activity.
溶剤に対する光触媒粒子の濡れ性を調整する表面修飾層
を形成する工程と、この表面修飾層を形成した光触媒粒
子を樹脂塗料中に分散せしめて懸濁液を調製する工程
と、基材表面に前記懸濁液を塗布し光触媒粒子の一部を
外気に露出させ他の部分を樹脂塗料中に埋没せしめる工
程と、溶剤を除去して樹脂塗料を硬化せしめる工程と、
光触媒粒子表面のうち樹脂塗料の表面から露出している
部分の表面修飾層を除去する工程とからなる親水性又は
光触媒活性を有する基材の製造方法。4. A step of forming a surface modification layer on the surface of the photocatalyst particles for adjusting the wettability of the photocatalyst particles with respect to a solvent constituting the resin paint, and the photocatalyst particles having the surface modification layer dispersed in the resin paint. A step of preparing a suspension by applying the suspension to the surface of the base material, exposing a part of the photocatalyst particles to the outside air and burying the other part in a resin coating, and removing the solvent to remove the resin. A process to cure the paint,
A method for producing a substrate having hydrophilicity or photocatalytic activity, which comprises a step of removing a surface modification layer on a portion of the surface of the photocatalyst particles exposed from the surface of the resin coating material.
又は光触媒活性を有する基材の製造方法において、前記
表面修飾層によって樹脂塗料を構成する溶剤に対する光
触媒粒子の濡れ性は、10°〜80°に調整することを
特徴とする親水性又は光触媒活性を有する基材の製造方
法。5. The method for producing a substrate having hydrophilicity or photocatalytic activity according to claim 3 or 4, wherein the wettability of the photocatalyst particles with respect to the solvent constituting the resin coating by the surface modification layer is 10 °. A method for producing a base material having hydrophilicity or photocatalytic activity, which is characterized by adjusting to -80 °.
又は光触媒活性を有する基材の製造方法において、前記
樹脂塗料はシリコーン樹脂であり、前記表面修飾層はシ
ランカップリング剤からなることを特徴とする親水性又
は光触媒活性を有する基材の製造方法。6. The method for producing a hydrophilic or photocatalytically active substrate according to claim 3 or 4, wherein the resin coating material is a silicone resin, and the surface modification layer comprises a silane coupling agent. A method for producing a substrate having hydrophilicity or photocatalytic activity, the method comprising:
又は光触媒活性を有する基材の製造方法において、前記
樹脂塗料は室温で硬化するものであることを特徴とする
親水性又は光触媒活性を有する基材の製造方法。7. The method for producing a substrate having hydrophilic or photocatalytic activity according to claim 3 or 4, wherein the resin paint is cured at room temperature. A method of manufacturing a substrate having:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8137830A JPH09314052A (en) | 1996-05-31 | 1996-05-31 | Substrate having hydrophilicity or photocatalytic activity and its production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8137830A JPH09314052A (en) | 1996-05-31 | 1996-05-31 | Substrate having hydrophilicity or photocatalytic activity and its production |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH09314052A true JPH09314052A (en) | 1997-12-09 |
Family
ID=15207844
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8137830A Pending JPH09314052A (en) | 1996-05-31 | 1996-05-31 | Substrate having hydrophilicity or photocatalytic activity and its production |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH09314052A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1008873A1 (en) * | 1998-12-09 | 2000-06-14 | Dai Nippon Printing Co., Ltd. | Color filter and process for producing the same |
WO2003101615A1 (en) * | 2002-06-03 | 2003-12-11 | Asahi Kasei Kabushiki Kaisha | Photocatalyst composition |
JP2004105883A (en) * | 2002-09-19 | 2004-04-08 | Asahi Kasei Chemicals Corp | Photocatalyst body |
US7030058B1 (en) | 1998-11-20 | 2006-04-18 | Asahi Kasei Kabushiki Kaisha | Modified photocatalyst sol |
JP2007245028A (en) * | 2006-03-16 | 2007-09-27 | Mitsuboshi Belting Ltd | Material having photocatalytic function and its preparing method |
-
1996
- 1996-05-31 JP JP8137830A patent/JPH09314052A/en active Pending
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7030058B1 (en) | 1998-11-20 | 2006-04-18 | Asahi Kasei Kabushiki Kaisha | Modified photocatalyst sol |
EP1752217A2 (en) | 1998-11-20 | 2007-02-14 | Asahi Kasei Kabushiki Kaisha | Sol of a modified photocatalyst |
EP1752218A2 (en) | 1998-11-20 | 2007-02-14 | Asahi Kasei Kabushiki Kaisha | Sol of a modified photocatalyst |
EP1008873A1 (en) * | 1998-12-09 | 2000-06-14 | Dai Nippon Printing Co., Ltd. | Color filter and process for producing the same |
US6450635B1 (en) | 1998-12-09 | 2002-09-17 | Dai Nippon Printing Co., Ltd | Color filter and process for producing the same |
US6554420B2 (en) | 1998-12-09 | 2003-04-29 | Dai Nippon Printing Co., Ltd. | Color filter and process for producing the same |
EP1521106A1 (en) * | 1998-12-09 | 2005-04-06 | Dai Nippon Printing Co., Ltd. | Color filter and process for producing the same |
WO2003101615A1 (en) * | 2002-06-03 | 2003-12-11 | Asahi Kasei Kabushiki Kaisha | Photocatalyst composition |
CN1301795C (en) * | 2002-06-03 | 2007-02-28 | 旭化成株式会社 | Photocatalyst composition |
US7211543B2 (en) | 2002-06-03 | 2007-05-01 | Asahi Kasei Kabushiki Kaisha | Photocatalyst composition |
JP2004105883A (en) * | 2002-09-19 | 2004-04-08 | Asahi Kasei Chemicals Corp | Photocatalyst body |
JP2007245028A (en) * | 2006-03-16 | 2007-09-27 | Mitsuboshi Belting Ltd | Material having photocatalytic function and its preparing method |
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