JPH0641745A - Vapor deposition method of aluminum on both surfaces of band-shaped substrate - Google Patents
Vapor deposition method of aluminum on both surfaces of band-shaped substrateInfo
- Publication number
- JPH0641745A JPH0641745A JP19733592A JP19733592A JPH0641745A JP H0641745 A JPH0641745 A JP H0641745A JP 19733592 A JP19733592 A JP 19733592A JP 19733592 A JP19733592 A JP 19733592A JP H0641745 A JPH0641745 A JP H0641745A
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- shaped substrate
- band
- aluminum
- strip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、コイル状に巻回された
帯状基板の両面にアルミニウムを蒸着させる方法に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for depositing aluminum on both sides of a strip-shaped substrate wound in a coil.
【０００２】[0002]
【従来の技術】従来、コイル状に巻回された帯状基板
（薄板コイル材）にアルミニウムを蒸着させる方法は、
図５に示すように、送り出しコイル４１から帯状基板４
２を繰り出して、タングステンボード４３上で通電加熱
されて蒸発されるアルミニウムターゲット４４上方の蒸
着経路を通過させ、巻取りリール４５に巻取ることによ
り、アルミニウムターゲット４４に臨む片面にアルミニ
ウムを蒸着させるものであり、帯状基板４２の両面にア
ルミニウムを蒸着させる場合には、片面の蒸着作業終了
後、残った片面をアルミニウムターゲット４４に臨むよ
うに蒸着経路を繰り出して移動させ蒸着作業を繰り返し
ていた。2. Description of the Related Art Conventionally, a method for depositing aluminum on a strip-shaped substrate (thin plate coil material) wound in a coil shape is
As shown in FIG. 5, the feeding coil 41 to the strip-shaped substrate 4
2 is fed out and passed through a vapor deposition path above an aluminum target 44 which is electrically heated on a tungsten board 43 to be vaporized, and wound on a take-up reel 45 to vapor-deposit aluminum on one surface facing the aluminum target 44. When aluminum is vapor-deposited on both surfaces of the belt-shaped substrate 42, after the vapor deposition work on one side is completed, the vapor deposition path is extended and moved so that the remaining one side faces the aluminum target 44, and the vapor deposition work is repeated.
【０００３】[0003]
【発明が解決しようとする課題】しかし、上記蒸着方法
では、両面を蒸着させる場合に時間と手間がかかり、作
業効率の悪いものであった。However, in the above vapor deposition method, it takes time and labor to vapor deposit both surfaces, and the work efficiency is poor.
【０００４】本発明は、上記問題点を解決して、短時間
に両面を蒸着させることができて、蒸着作業時間を大幅
に短縮でき両面が効率よく蒸着が行える帯状基板へのア
ルミニウム両面蒸着方法を提供することをを目的とす
る。The present invention solves the above-mentioned problems and allows both sides to be vapor-deposited in a short time, and the vapor deposition work time can be greatly shortened, so that both sides can be vapor-deposited efficiently. The purpose is to provide.
【０００５】[0005]
【課題を解決するための手段】上記問題点を解決するた
めに本発明の帯状基板へのアルミニウム両面蒸着方法
は、加熱蒸発されるターゲット上方の蒸着経路上で帯状
基板を長さ方向に送り出すに際し、帯状基板を９０度か
ら１８０度の範囲でねじって両面がターゲット側に向く
ようにするものである。In order to solve the above-mentioned problems, the aluminum double-sided vapor deposition method for a strip-shaped substrate of the present invention is performed when the strip-shaped substrate is sent in the longitudinal direction on the vapor deposition path above the target to be heated and vaporized. The belt-shaped substrate is twisted in the range of 90 ° to 180 ° so that both surfaces face the target side.
【０００６】[0006]
【作用】上記構成によれば、蒸着経路上で、たとえば進
行方向に向かって左上から右下に４５度に傾けておいた
帯状基板を、途中で時計方向に９０度ねじって右上から
左下に４５度に傾けることにより、ターゲットに向く面
を反転させることができ、一度に帯状基板の両面に蒸着
させることができる。また、水平面に沿う帯状基板を途
中で１８０度ねじってターゲット側の面を反転させるこ
とにより、一度で帯状基板の両面に両面に蒸着させるこ
とができる。According to the above construction, on the vapor deposition path, for example, a strip-shaped substrate inclined 45 degrees from the upper left to the lower right in the traveling direction is twisted 90 degrees in the clockwise direction on the way to 45 from the upper right to the lower left. By tilting it at an angle, the surface facing the target can be inverted, and vapor deposition can be performed on both surfaces of the strip substrate at once. Also, by twisting the strip-shaped substrate along the horizontal plane 180 degrees midway and inverting the surface on the target side, vapor deposition can be performed on both sides of the strip-shaped substrate at one time.
【０００７】[0007]
【実施例】以下、本発明に係るアルミニウム両面蒸着装
置の第１実施例を図１および図２に基づいて説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS A first embodiment of an aluminum double-sided vapor deposition apparatus according to the present invention will be described below with reference to FIGS. 1 and 2.
【０００８】図１において、１は上下に排気口２を有す
る蒸着容器で、区画壁３により下部の蒸発室４と上部の
素材室５に区画され、蒸着容器１の内部は１０-4〜１０
-5torrの真空雰囲気に保持されている。In FIG. 1, reference numeral 1 denotes a vapor deposition container having upper and lower exhaust ports 2, which are partitioned by a partition wall 3 into a lower evaporation chamber 4 and an upper material chamber 5, and the interior of the vapor deposition container 1 is 10 -4 to 10 -10.
It is kept in a vacuum atmosphere of -5 torr.
【０００９】前記蒸発室４内には、ターゲット６である
アルミニウムを入れて加熱ヒーター７により加熱蒸発さ
せるターゲット容器８が配置されるとともに、ターゲッ
ト容器８の上方にアルミニウム蒸気を遮断可能なシャッ
ター９が開閉自在に配置されている。In the evaporation chamber 4, there is arranged a target container 8 in which aluminum as a target 6 is placed and heated and evaporated by a heater 7, and a shutter 9 capable of blocking aluminum vapor is provided above the target container 8. It is arranged to open and close freely.
【００１０】前記素材室５内には、回転装置（図示せ
ず）により矢印Ａ方向に回転されてロール状に巻回され
た素材ロール１１から帯状基板１２を送り出す素材送り
出し装置１３と、素材送り出し装置１３から区画壁３に
形成された蒸着窓１４に沿って蒸着経路を通って両面が
蒸着された帯状基板１２を、回転装置（図示せず）によ
り矢印Ｂ方向に回転されて製品ロール１５を形成する製
品巻取り装置１６が配設されている。前記素材送り出し
装置１３には、素材ロール１１から繰り出された帯状基
板１２を案内するガイドローラー１７と送りテーパーロ
ーラー１８が水平軸心回りに回転自在に支持され、また
製品巻取り装置１６には蒸着窓１４から送られてくる帯
状基板１５を受け取る受けテーパーローラー１９とガイ
ドローラー２０が水平軸心回りに回転自在に支持されて
いる。In the material chamber 5, a material feeding device 13 for feeding a belt-shaped substrate 12 from a material roll 11 wound in a roll by being rotated in a direction of an arrow A by a rotation device (not shown), and a material feeding device. The belt-shaped substrate 12 having both surfaces vapor-deposited from the device 13 along the vapor-deposition window 14 formed on the partition wall 3 is rotated in the direction of arrow B by a rotation device (not shown) to move the product roll 15 to the product roll 15. A product winding device 16 to be formed is provided. A guide roller 17 and a feed taper roller 18 for guiding the strip-shaped substrate 12 fed from the material roll 11 are rotatably supported by the material feeding device 13 about a horizontal axis, and vapor deposition is performed on the product winding device 16. A receiving taper roller 19 and a guide roller 20 that receive the belt-shaped substrate 15 sent from the window 14 are rotatably supported around a horizontal axis.
【００１１】そして、前記送りテーパーローラー１８と
受けテーパーローラー１９は、テーパー角が４５度に設
定されて大径部が逆位置となる点対称に配置され、さら
に送りテーパーローラー１８側と受けテーパーローラー
１９では帯状基板１２が中央で垂直となるように帯状基
板１２が９０度ねじられている。たとえば図２（ａ）に
示すように送りテーパーローラー１８により進行方向に
向かって左上から右下にα＝４５度に傾けた帯状基板１
２を、図２（ｂ）に示すように途中で垂直となるように
時計方向に９０度ねじって、図２（ｃ）に示すように右
上から左下にβ＝４５度に傾けることにより、アルミニ
ウム蒸気に晒される下面を反転させることができる。The feed taper roller 18 and the receiving taper roller 19 are arranged point-symmetrically so that the taper angle is set to 45 degrees and the large diameter portion is in the opposite position. Further, the feed taper roller 18 side and the receiving taper roller are arranged. In FIG. 19, the strip-shaped substrate 12 is twisted by 90 degrees so that the strip-shaped substrate 12 is vertical at the center. For example, as shown in FIG. 2A, the belt-shaped substrate 1 inclined by α = 45 degrees from the upper left to the lower right in the traveling direction by the feed taper roller 18.
2 is twisted clockwise by 90 degrees so that it becomes vertical in the middle as shown in FIG. 2 (b), and is tilted from upper right to lower left by β = 45 degrees as shown in FIG. 2 (c). The bottom surface exposed to steam can be inverted.
【００１２】上記構成において、素材送り出し装置１３
により素材ロール１１からガイドローラー１７と送りテ
ーパーローラー１８を介して矢印Ｃ方向に繰り出された
傾斜状態の帯状基板１２は、蒸着窓１４に沿う蒸着経路
で前半部で表面１２ａが下方に向いてターゲット容器８
から蒸発されたアルミニウム蒸気に晒され、表面１２ａ
にアルミニウム層Al1 が蒸着され、さらに中央部で９０
度捩じられることにより、今度は帯状基板１２の裏面１
２ｂがアルミニウム蒸気に晒されてアルミニウム層Al2
が蒸着される。そして受けテーパーローラー１９とガイ
ドローラー２０に案内されて製品ロール１５に巻き取ら
れる。In the above structure, the material feeding device 13
The strip-shaped substrate 12 in an inclined state fed out from the material roll 11 through the guide roller 17 and the feed taper roller 18 in the direction of arrow C by the target 12 with the surface 12a facing downward in the first half of the vapor deposition path along the vapor deposition window 14. Container 8
Exposed to aluminum vapor evaporated from the surface 12a
An aluminum layer Al 1 is vapor-deposited on the
By being twisted once, the back surface 1 of the strip substrate 12 is turned
2b is exposed to aluminum vapor and aluminum layer Al 2
Is deposited. Then, it is guided by the receiving taper roller 19 and the guide roller 20 and is wound around the product roll 15.
【００１３】上記構成によれば、一度の蒸着作業で帯状
基板１２の表面１２ａおよび裏面１２ｂにアルミニウム
蒸気をそれぞれ蒸着させることができ、しかもねじる角
度が９０度と少ないので、伸縮性の小さい帯状基板１２
にも適用できる。なお、帯状基板１２のねじり角が９０
度以下でも両面の蒸着は可能であるが、アルミニウム蒸
気に晒される帯状基板１２の傾斜角α，βが大きくなる
ので蒸着効率が低くなる。According to the above structure, aluminum vapor can be vapor-deposited on the front surface 12a and the back surface 12b of the belt-shaped substrate 12 by a single vapor deposition operation, and the twisting angle is as small as 90 degrees. 12
Can also be applied to. The twist angle of the strip substrate 12 is 90.
Although vapor deposition on both surfaces is possible even at a temperature of less than 100 degrees, vapor deposition efficiency becomes low because the inclination angles α and β of the strip substrate 12 exposed to aluminum vapor become large.
【００１４】図３，図４はアルミニウム両面蒸着装置の
第２実施例を示し、第１実施例と同一部材は同一の符号
を付し説明は省略する。この第２実施例は、帯状基板１
２を１８０度ねじるもので、帯状素材１２が水平状態で
アルミニウム蒸気に晒されるため、極めて効率よく蒸着
を行えるものである。すなわち、第１実施例の素材送り
出し装置１３の送りテーパーローラー１８と製品巻取り
装置１６の受けテーパーローラー１９が、それぞれ送り
平行ローラー３１と受け平行ローラー３２に変更され、
図４に示すように、受けテーパーローラー１９から繰り
出された帯状基板１２は、蒸着窓１４に沿う蒸着経路の
前半部で水平に保持されてその表面１２ａにアルミニウ
ム層Al1 が蒸着され、さらに中央部で１８０度捩じられ
ることにより帯状基板１２が反転され、水平に保持され
た帯状基板１２の裏面１２ｂにアルミニウム層Al2 が蒸
着されるように構成される。FIGS. 3 and 4 show a second embodiment of the aluminum double-sided vapor deposition apparatus. The same members as those in the first embodiment are designated by the same reference numerals and their description is omitted. In this second embodiment, the strip substrate 1
2 is twisted by 180 degrees, and since the strip-shaped material 12 is exposed to aluminum vapor in a horizontal state, vapor deposition can be performed extremely efficiently. That is, the feed taper roller 18 of the material feeding device 13 of the first embodiment and the receiving taper roller 19 of the product winding device 16 are changed to the feeding parallel roller 31 and the receiving parallel roller 32, respectively.
As shown in FIG. 4, the strip-shaped substrate 12 unrolled from the receiving taper roller 19 is horizontally held in the first half of the vapor deposition path along the vapor deposition window 14 and the aluminum layer Al 1 is vapor-deposited on the surface 12a thereof, and further in the center. The strip-shaped substrate 12 is turned upside down by being twisted by 180 degrees at the section, and the aluminum layer Al 2 is deposited on the back surface 12b of the strip-shaped substrate 12 held horizontally.
【００１５】したがって、この第２実施例によれば、タ
ーゲット容器８容器の上方の蒸着経路で帯状基板１２が
表面１２ａおよび裏面１２ｂともに水平状態でアルミニ
ウム蒸気に晒されるので、効果的に両面の蒸着を行うこ
とができる。Therefore, according to the second embodiment, the strip-shaped substrate 12 is exposed to the aluminum vapor in a horizontal state on both the front surface 12a and the rear surface 12b in the vapor deposition path above the target container 8 so that the vapor deposition on both surfaces is effectively performed. It can be performed.
【００１６】[0016]
【発明の効果】以上に述べたごとく本発明によれば、蒸
着経路上で帯状基板を９０度から１８０度の範囲でねじ
って両面をターゲット側に晒すので、一度に帯状基板の
両面を蒸着する事ができ、蒸着作業時間を大幅に短縮し
て効率よく蒸着が行うことができる。As described above, according to the present invention, since the strip-shaped substrate is twisted in the range of 90 to 180 degrees on the vapor deposition path to expose both sides to the target side, both sides of the strip-shaped substrate are vapor-deposited at one time. It is possible to perform the vapor deposition efficiently by significantly reducing the vapor deposition work time.
【図１】本発明に係るアルミニウム両面蒸着装置の第１
実施例の構成を示す正面断面図である。FIG. 1 is a first double sided aluminum deposition apparatus according to the present invention.
It is a front sectional view showing the composition of an example.
【図２】同アルミニウム両面蒸着装置における蒸着経路
上の帯状基板の姿勢を示し、（ａ）は図１に示すＩ−Ｉ
端面図、（ｂ）は図１に示すII−II端面図、（ｃ）は図
１に示すIII −III 端面図である。FIG. 2 shows a posture of a belt-shaped substrate on a vapor deposition path in the aluminum double-sided vapor deposition apparatus, (a) of which is II shown in FIG.
2 is an end view, FIG. 1B is an end view taken along the line II-II shown in FIG. 1, and FIG. 3C is a end view taken along the line III-III shown in FIG.
【図３】本発明に係るアルミニウム両面蒸着装置の第２
実施例の構成を示す正面断面図である。FIG. 3 is a second aluminum double-sided vapor deposition apparatus according to the present invention.
It is a front sectional view showing the composition of an example.
【図４】同アルミニウム両面蒸着装置における蒸着経路
上の帯状基板の姿勢を示し、（ａ）は図３に示すIV−IV
端面図、（ｂ）は図３に示すＶ−Ｖ端面図、（ｃ）は図
３に示すVI−VI端面図である。FIG. 4 shows a posture of a strip-shaped substrate on a vapor deposition path in the aluminum double-sided vapor deposition apparatus, and (a) shows IV-IV shown in FIG.
3 is an end view, FIG. 3B is a V-V end view shown in FIG. 3, and FIG. 3C is a VI-VI end view shown in FIG.
【図５】従来の蒸着方法を説明する概略構成図である。FIG. 5 is a schematic configuration diagram illustrating a conventional vapor deposition method.
１ 蒸着容器 ４ 蒸発室 ５ 素材室 ６ ターゲット ７ 加熱ヒーター ８ ターゲット容器 ９ シャッター 11 素材ロール 12 帯状基板 13 素材送り出し装置 14 蒸着窓 15 製品ロール 16 製品巻取り装置 17 ガイドローラー 18 送りテーパーローラー 19 受けテーパーローラー 20 ガイドローラー 31 送り平行ローラー 32 受け平行ローラー 1 Vapor Deposition Container 4 Evaporation Chamber 5 Material Chamber 6 Target 7 Heater 8 Target Container 9 Shutter 11 Material Roll 12 Band Substrate 13 Material Feeding Device 14 Vapor Deposition Window 15 Product Roll 16 Product Winding Device 17 Guide Roller 18 Feed Taper Roller 19 Receiving Taper Roller 20 Guide roller 31 Feed parallel roller 32 Receiver parallel roller
Claims (1)
路上で帯状基板を長さ方向に送り出すに際し、帯状基板
を９０度から１８０度の範囲でねじって両面がターゲッ
ト側に向くようにすることを特徴とする帯状基板へのア
ルミニウム両面蒸着方法。1. When the strip-shaped substrate is sent out in the lengthwise direction on the vapor deposition path above the target to be heated and vaporized, the strip-shaped substrate is twisted in the range of 90 ° to 180 ° so that both sides face the target side. A double-sided aluminum vapor deposition method on a strip substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19733592A JPH0641745A (en) | 1992-07-24 | 1992-07-24 | Vapor deposition method of aluminum on both surfaces of band-shaped substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19733592A JPH0641745A (en) | 1992-07-24 | 1992-07-24 | Vapor deposition method of aluminum on both surfaces of band-shaped substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0641745A true JPH0641745A (en) | 1994-02-15 |
Family
ID=16372762
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19733592A Pending JPH0641745A (en) | 1992-07-24 | 1992-07-24 | Vapor deposition method of aluminum on both surfaces of band-shaped substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0641745A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6547817B1 (en) | 1994-02-25 | 2003-04-15 | Cordis Corporation | Stent having a multiplicity of undulating longitudinals |
| US6896696B2 (en) | 1998-11-20 | 2005-05-24 | Scimed Life Systems, Inc. | Flexible and expandable stent |
| US8092512B2 (en) | 1994-08-12 | 2012-01-10 | Boston Scientific Scimed, Inc. | Nested stent |
| US8409446B2 (en) | 2009-08-21 | 2013-04-02 | Cummins Filtration Ip, Inc. | Automatic draining system to drain fluid from a filter |
-
1992
- 1992-07-24 JP JP19733592A patent/JPH0641745A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6547817B1 (en) | 1994-02-25 | 2003-04-15 | Cordis Corporation | Stent having a multiplicity of undulating longitudinals |
| US6716240B2 (en) | 1994-02-25 | 2004-04-06 | Cordis Corporation | Stent having a multiplicity of undulating longitudinals |
| US8157856B2 (en) | 1994-02-25 | 2012-04-17 | Fischell Robert | Stent having a multiplicity of undulating longitudinals |
| US8747452B2 (en) | 1994-02-25 | 2014-06-10 | Robert E. Fischell | Stent having a multiplicity of undulating longitudinals |
| US8092512B2 (en) | 1994-08-12 | 2012-01-10 | Boston Scientific Scimed, Inc. | Nested stent |
| US6896696B2 (en) | 1998-11-20 | 2005-05-24 | Scimed Life Systems, Inc. | Flexible and expandable stent |
| US8409446B2 (en) | 2009-08-21 | 2013-04-02 | Cummins Filtration Ip, Inc. | Automatic draining system to drain fluid from a filter |
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