JPH05266457A - Magnetic recording body - Google Patents
Magnetic recording bodyInfo
- Publication number
- JPH05266457A JPH05266457A JP9388892A JP9388892A JPH05266457A JP H05266457 A JPH05266457 A JP H05266457A JP 9388892 A JP9388892 A JP 9388892A JP 9388892 A JP9388892 A JP 9388892A JP H05266457 A JPH05266457 A JP H05266457A
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- Prior art keywords
- film
- magnetic
- plating
- magnetic recording
- acid
- Prior art date
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- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、磁気ディスク、磁気ド
ラム等の磁気記録体に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic recording body such as a magnetic disk or a magnetic drum.
【０００２】[0002]
【従来の技術及び発明が解決しようとする課題】従来、
磁気ディスク等の磁気記録体を製造する場合、アルミニ
ウム等の非磁性基体上に非磁性皮膜を形成し、更にその
上に磁性皮膜を形成することが行われており、この場合
非磁性皮膜としては、比較的リン含量の高いＮｉ−Ｐ合
金皮膜が広く用いられている。2. Description of the Related Art Conventionally, the problems to be solved by the invention
When manufacturing a magnetic recording medium such as a magnetic disk, a non-magnetic film is formed on a non-magnetic substrate such as aluminum, and a magnetic film is further formed on it. Ni-P alloy coatings having a relatively high phosphorus content are widely used.
【０００３】このＮｉ−Ｐ合金皮膜は、主として次亜リ
ン酸塩を還元剤とする無電解ニッケルめっき浴を用いて
形成されるが、このＮｉ−Ｐ皮膜は均一析出性、高耐食
性、高硬度、高耐摩耗性等の利点を有するものの、２０
０℃以上の温度で熱処理されると容易に磁性を帯びると
いう問題がある。このため、無電解Ｎｉ−Ｐめっき浴中
の次亜リン酸イオン濃度を高めるなどしてＮｉ−Ｐ皮膜
中のＰ含量を高めることが行われているが、非磁性維持
の点でなお改善の余地がある。This Ni-P alloy film is formed mainly by using an electroless nickel plating bath containing hypophosphite as a reducing agent. The Ni-P film is uniformly deposited, has high corrosion resistance, and has high hardness. Although it has advantages such as high wear resistance,
There is a problem that when it is heat-treated at a temperature of 0 ° C. or higher, it is easily magnetized. For this reason, it has been attempted to increase the P content in the Ni-P coating by increasing the concentration of hypophosphite ions in the electroless Ni-P plating bath. There is room.
【０００４】磁気記録体の製造においては、Ｎｉ−Ｐ皮
膜を形成した後、磁性皮膜の形成にスパッタリング法に
より高温下（例えば３００℃）に長時間Ｎｉ−Ｐ皮膜が
曝される場合が多いが、このような場合、Ｎｉ−Ｐ皮膜
はそのリン含量を多くしても磁性を帯び易く、このため
高温，長時間の熱的条件下に置かれても、非磁性皮膜が
磁化され難く、非磁性を維持し得る磁気記録体が望まれ
ていた。In the production of a magnetic recording medium, after the Ni-P coating is formed, the Ni-P coating is often exposed to a high temperature (for example, 300 ° C.) for a long time by a sputtering method for forming the magnetic coating. In such a case, the Ni-P coating is likely to be magnetized even if its phosphorus content is increased, so that the non-magnetic coating is hard to be magnetized even if it is exposed to thermal conditions of high temperature for a long time. A magnetic recording body that can maintain magnetism has been desired.
【０００５】[0005]
【課題を解決するための手段及び作用】本発明者らは、
上記要望に応えるため鋭意検討を行った結果、ニッケル
８２〜９０．９％、リン９〜１３％、モリブデン０．１
〜５％（％は重量％を示す。以下同様。）の非晶質Ｎｉ
−Ｐ−Ｍｏ合金皮膜を磁気記録体の非磁性皮膜として形
成することにより、この非磁性皮膜は例えば３００℃で
３時間熱処理しても磁性を帯びず、従って高温，長時間
の熱的条件下に置かれても、非磁性皮膜が磁化され難い
磁気記録体が可能になることを知見した。Means and Actions for Solving the Problems The present inventors have
As a result of earnestly studying in order to meet the above request, nickel 82-90.9%, phosphorus 9-13%, molybdenum 0.1
~ 5% (% indicates% by weight; the same shall apply hereinafter) of amorphous Ni
By forming the -P-Mo alloy film as the non-magnetic film of the magnetic recording medium, the non-magnetic film does not become magnetic even when heat-treated at 300 ° C for 3 hours, for example, and therefore under high temperature and long time thermal conditions. It has been found that a magnetic recording material in which a non-magnetic film is hard to be magnetized becomes possible even when placed in a magnetic disk.
【０００６】なお、従来より無電解Ｎｉ−Ｐ−Ｍｏめっ
き皮膜については種々の提案がある（特公昭５７−５４
５４５号公報、特開昭６２−６０８７８号及び特開平３
−９７８３５号公報）。しかし、これらのＮｉ−Ｐ−Ｍ
ｏ皮膜は、Ｍｏ含量が高く、通常Ｍｏ含量を１０％以上
として使用するもので、このようにＭｏ含量が高いと、
逆に皮膜中のリン含有量が低くなり、皮膜が非晶質から
結晶質に変化し、また浴の安定性が悪くなるという問題
があり、非磁性、耐食性という点で磁気記録体の非磁性
皮膜としては適当でない。Various proposals have been made for electroless Ni-P-Mo plating films (Japanese Patent Publication No. 57-54).
545, JP-A-62-60878 and JP-A-3.
-97835). However, these Ni-P-M
The o film has a high Mo content, and is usually used with a Mo content of 10% or more.
On the contrary, there is a problem that the phosphorus content in the film becomes low, the film changes from amorphous to crystalline, and the stability of the bath deteriorates. Not suitable as a film.
【０００７】ところが、Ｍｏ含量を少なくし、上記のよ
うにＭｏ含量が０．１〜５％となるようにＰ含量９〜１
３％のＮｉ−Ｐ合金皮膜中にＭｏを含有させた場合、Ｎ
ｉ−Ｐ皮膜の特性、特に高耐食性、高硬度、高耐摩耗性
という利点を保持し、しかも高温で長時間熱処理しても
磁性を帯び難く、非磁性を維持する非晶質のＮｉ−Ｐ−
Ｍｏ皮膜が得られ、かかるＮｉ−Ｐ−Ｍｏ皮膜を磁気記
録体の非磁性皮膜とすることにより、上述した本発明の
目的が有効に達成されることを知見し、本発明をなすに
至ったものである。However, the Mo content is reduced, and the P content is 9 to 1 so that the Mo content is 0.1 to 5% as described above.
When Mo is contained in a 3% Ni-P alloy film, N
Amorphous Ni-P that retains the properties of the i-P coating, especially the advantages of high corrosion resistance, high hardness, and high wear resistance, is hard to be magnetized even when heat-treated at high temperature for a long time, and maintains non-magnetism. −
It was found that an Mo film can be obtained, and that the above-mentioned object of the present invention can be effectively achieved by using such a Ni-P-Mo film as a non-magnetic film of a magnetic recording medium, resulting in the present invention. It is a thing.
【０００８】従って、本発明は、非磁性基体上に非磁性
皮膜を形成し、その上に磁性皮膜を形成してなる磁気記
録体において、上記非磁性皮膜が、ニッケル８２〜９
０．９％、リン９〜１３％、モリブデン０．１〜５％の
組成の非晶質のＮｉ−Ｐ−Ｍｏ合金皮膜であることを特
徴とする磁気記録体を提供する。Therefore, according to the present invention, in a magnetic recording body comprising a non-magnetic substrate, a non-magnetic film formed thereon, and a magnetic film formed thereon, the non-magnetic film is nickel 82 to 9
Provided is a magnetic recording material, which is an amorphous Ni-P-Mo alloy film having a composition of 0.9%, phosphorus 9 to 13%, and molybdenum 0.1 to 5%.
【０００９】以下、本発明につき更に詳しく説明する
と、本発明の磁気記録体は、非磁性基体上に非磁性皮
膜、磁性皮膜を順次形成したものである。The present invention will be described in more detail below. The magnetic recording medium of the present invention comprises a non-magnetic substrate and a non-magnetic film and a magnetic film formed in this order.
【００１０】ここで、非磁性基体としては、アルミニウ
ム、アルミニウム合金等が用いられる。Here, aluminum, an aluminum alloy or the like is used as the non-magnetic substrate.
【００１１】また、本発明においては、上記非磁性皮膜
はＮｉ８２〜９０．９％、より好ましくは８５〜８７．
７％、Ｐ９〜１３％、より好ましくは１２〜１３％、Ｍ
ｏ０．１〜５％、より好ましくは０．３〜２％の組成の
非晶質Ｎｉ−Ｐ−Ｍｏ合金皮膜より形成される。Ｍｏ含
量が０．１％より少ないと非磁性特性が低下し、一方５
％を越えるとリン含量が低下し、この場合も非磁性特性
が低下する。Further, in the present invention, the non-magnetic film is made of Ni of 8 to 90.9%, more preferably 85 to 87.
7%, P9-13%, more preferably 12-13%, M
It is formed of an amorphous Ni-P-Mo alloy film having a composition of 0.1 to 5%, more preferably 0.3 to 2%. If the Mo content is less than 0.1%, the non-magnetic properties deteriorate, while 5
If it exceeds 0.1%, the phosphorus content decreases, and the nonmagnetic property also decreases in this case.
【００１２】また、Ｐ含量が９％より少ない場合も非磁
性特性が低下し、１３％を越えると皮膜の外観が悪くな
り、表面の粗度が悪くなる。Further, when the P content is less than 9%, the non-magnetic properties are deteriorated, and when it exceeds 13%, the appearance of the film is deteriorated and the surface roughness is deteriorated.
【００１３】この非晶質Ｎｉ−Ｐ−Ｍｏ合金皮膜を形成
する方法としては、無電解Ｎｉ−Ｐ−Ｍｏめっき浴を用
いた無電解めっき方法が好適に採用される。As a method for forming this amorphous Ni-P-Mo alloy film, an electroless plating method using an electroless Ni-P-Mo plating bath is preferably adopted.
【００１４】この場合、無電解Ｎｉ−Ｐ−Ｍｏめっき浴
は、水溶性ニッケル塩、水溶性モリブデン酸塩、次亜リ
ン酸又はその塩、それに錯化剤を含むものが用いられ、
その組成は上記皮膜組成のＮｉ−Ｐ−Ｍｏ皮膜が得られ
るものであればいずれのものでもよい。In this case, the electroless Ni-P-Mo plating bath contains a water-soluble nickel salt, a water-soluble molybdate, hypophosphorous acid or its salt, and a complexing agent therefor.
The composition thereof may be any as long as a Ni-P-Mo film having the above film composition can be obtained.
【００１５】更に具体的に説明すると、無電解Ｎｉ−Ｐ
−Ｍｏめっき浴において、水溶性ニッケル塩としては、
硫酸ニッケル、塩化ニッケル等が用いられ、めっき浴中
の濃度は、ニッケルとして２〜１０ｇ／ｌ、特に４〜８
ｇ／ｌとすることが好ましい。More specifically, electroless Ni-P
In the Mo plating bath, as the water-soluble nickel salt,
Nickel sulfate, nickel chloride or the like is used, and the concentration in the plating bath is 2 to 10 g / l as nickel, particularly 4 to 8
It is preferably g / l.
【００１６】また、水溶性モリブデン酸塩としては、モ
リブデン酸ナトリウム、モリブデン酸アンモニウム、モ
リブデン酸カリウム、モリブデン酸カルシウム、リンモ
リブデン酸、リンモリブデン酸アンモニウム等が用いら
れ、めっき浴中の濃度は０．０１〜５ｇ／ｌ、特に０．
０５〜１ｇ／ｌとすることが好ましい。モリブデン酸塩
の濃度が０．０１ｇ／ｌより低いとめっき皮膜中のモリ
ブデン含量が０．１％より少なくなり、一方５ｇ／ｌを
越えると、モリブデン含量が５％より多くなる場合が生
じる。As the water-soluble molybdate, sodium molybdate, ammonium molybdate, potassium molybdate, calcium molybdate, phosphomolybdic acid, ammonium phosphomolybdate, etc. are used, and the concentration in the plating bath is 0. 01-5 g / l, especially 0.
It is preferably from 05 to 1 g / l. If the concentration of molybdate is less than 0.01 g / l, the molybdenum content in the plating film is less than 0.1%, while if it exceeds 5 g / l, the molybdenum content may be more than 5%.
【００１７】次亜リン酸又はその塩としては、次亜リン
酸ナトリウム、次亜リン酸カリウム等が好適に使用さ
れ、めっき浴中の濃度は１０〜５０ｇ／ｌ、特に２０〜
４０ｇ／ｌとすることが好ましい。その量が少なすぎる
とめっき皮膜中のリン含量が９％より少なくなり、逆に
多すぎるとめっき皮膜中のリン含量が１３％より多くな
る場合が生じる。As the hypophosphorous acid or its salt, sodium hypophosphite, potassium hypophosphite, etc. are preferably used, and the concentration in the plating bath is 10 to 50 g / l, especially 20 to
It is preferably 40 g / l. If the amount is too small, the phosphorus content in the plating film will be less than 9%, and if it is too large, the phosphorus content in the plating film will be more than 13%.
【００１８】錯化剤としては、グリコール酸、乳酸、グ
ルコン酸、プロピオン酸等のモノカルボン酸、酒石酸、
リンゴ酸、コハク酸等のジカルボン酸、クエン酸等のト
リカルボン酸やそれらのナトリウム塩、カリウム塩、ア
ンモニウム塩などのカルボン酸類の１種を単独で又は２
種以上を組み合わせて使用し得るが、特にＮｉ−Ｐ−Ｍ
ｏ皮膜の非磁性特性が良好で、上記組成のＮｉ−Ｐ−Ｍ
ｏ皮膜を確実に形成し得る点から、錯化剤として、２種
以上のジカルボン酸又はその塩を併用すると共に、その
少なくとも１種をオキシジカルボン酸又はその塩とした
ものが好適である。この場合、特にオキシジカルボン酸
又はその塩とＯＨ基を含まないジカルボン酸又はその塩
とを併用することが非磁性特性、析出速度、浴安定性の
点から好ましいが、この際前者と後者の併用比率はモル
比として１０：１〜０．５：１、特に８：１〜１：１で
あることが、その併用効果をより有効に発揮させること
ができる点から推奨される。モノオキシジカルボン酸又
はその塩とポリオキシジカルボン酸又はその塩とを併用
することもできるが、この場合も上記と同様の比率で併
用することが好ましい。As the complexing agent, monocarboxylic acids such as glycolic acid, lactic acid, gluconic acid and propionic acid, tartaric acid,
Dicarboxylic acids such as malic acid and succinic acid, tricarboxylic acids such as citric acid, and carboxylic acids such as their sodium salts, potassium salts and ammonium salts, either alone or in combination with 2
Although more than one species may be used in combination, especially Ni-PM
o The non-magnetic property of the film is good, and the composition is Ni-PM
o From the viewpoint that a film can be reliably formed, it is preferable to use two or more kinds of dicarboxylic acids or salts thereof in combination as the complexing agent and use at least one of them as an oxydicarboxylic acid or salt thereof. In this case, it is particularly preferable to use a combination of oxydicarboxylic acid or a salt thereof and a dicarboxylic acid not containing an OH group or a salt thereof from the viewpoints of non-magnetic properties, deposition rate and bath stability. In this case, the former and the latter are used together. It is recommended that the molar ratio is 10: 1 to 0.5: 1, especially 8: 1 to 1: 1 from the viewpoint that the combined effect can be more effectively exhibited. The monooxydicarboxylic acid or its salt may be used in combination with the polyoxydicarboxylic acid or its salt, but in this case also, it is preferable to use them in the same ratio as above.
【００１９】上記錯化剤の配合量は適宜選定されるが、
水溶性ニッケル塩１モルに対し１〜７モル、特に２〜６
モルとすることが好ましい。The blending amount of the above complexing agent is appropriately selected,
1 to 7 mol, especially 2 to 6 mol per mol of water-soluble nickel salt
It is preferable that the amount is mol.
【００２０】なお、無電解Ｎｉ−Ｐ−Ｍｏのめっき浴に
は、鉛塩その他の安定剤、ｐＨ調整剤などの成分を添加
することができ、またそのｐＨは酸性、特にｐＨ４〜５
の範囲とすることが好ましい。Components such as lead salts and other stabilizers and pH adjusters can be added to the electroless Ni-P-Mo plating bath, and the pH is acidic, particularly pH 4-5.
It is preferable to set it as the range.
【００２１】このめっき浴を用いて非磁性基体上に非磁
性皮膜（上記組成のＮｉ−Ｐ−Ｍｏ非晶質皮膜）を形成
する場合は、非磁性基体を常法に従って前処理した後、
該めっき浴に浸漬すればよいが、めっき温度は通常７０
〜９５℃で行われる。また、めっきに際しては、スター
ラーによる撹拌、ポンプによる撹拌、被めっき物を揺動
させるなどの方法でめっき浴を適度に撹拌することが好
ましく、撹拌により確実に良好な耐熱非磁性のめっき皮
膜を得ることができる。When a non-magnetic film (a Ni-P-Mo amorphous film having the above composition) is formed on a non-magnetic substrate using this plating bath, the non-magnetic substrate is pretreated by a conventional method,
It may be immersed in the plating bath, but the plating temperature is usually 70
It is performed at ˜95 ° C. Further, during plating, it is preferable to appropriately stir the plating bath by stirring with a stirrer, stirring with a pump, shaking the object to be plated, etc., and reliably obtain a good heat-resistant non-magnetic plating film by stirring. be able to.
【００２２】なお、本発明において、この非磁性皮膜の
厚さは１〜３０μｍ、特に５〜１５μｍとすることが好
ましい。In the present invention, the thickness of the non-magnetic film is preferably 1 to 30 μm, particularly 5 to 15 μm.
【００２３】本発明の磁気記録体は、この非磁性皮膜を
形成後は、常法により表面研摩など通常の処理を行い、
次いでその上に磁性皮膜を形成する。この磁性皮膜とし
ては公知のものでよく、その形成法も公知の方法を採用
し得る。また、磁性皮膜上に保護膜を形成するなど、適
宜の後処理が採用し得る。After forming the non-magnetic film, the magnetic recording material of the present invention is subjected to ordinary treatment such as surface polishing by a conventional method,
Next, a magnetic film is formed on it. This magnetic film may be a known one, and a known method may be adopted for forming the magnetic film. Further, an appropriate post-treatment such as forming a protective film on the magnetic film can be adopted.
【００２４】ここで、本発明の上記非磁性皮膜は従来の
Ｎｉ−Ｐ皮膜より非磁性特性に優れ、例えば３００℃で
３時間熱処理されても非磁性を維持するので、磁性皮
膜、保護膜の形成にスパッタリング法を採用したり、特
開昭５６−１２４１１８号公報にあるように、加熱によ
り磁性を発生する薄膜を形成し、これを加熱して磁性皮
膜を形成したりするなど、非磁性皮膜形成後、２００℃
以上、特に２５０℃以上、場合によっては３００℃以上
の雰囲気となる工程、製造法を採用しても支障がない。Here, the non-magnetic coating of the present invention is superior to the conventional Ni-P coating in non-magnetic characteristics, and maintains non-magnetism even after being heat-treated at 300 ° C. for 3 hours, for example. A non-magnetic film is formed by employing a sputtering method or by forming a thin film that generates magnetism by heating and forming a magnetic film by heating as described in JP-A-56-124118. After forming, 200 ℃
As described above, there is no problem even if a process or a manufacturing method that creates an atmosphere of 250 ° C. or higher, and in some cases 300 ° C. or higher is adopted.
【００２５】また、本発明の非磁性皮膜は、Ｍｏ含量が
０．１〜５％と少ないので、実質的にＮｉ−Ｐ合金皮膜
と同等の特性、例えば高耐食性、高硬度、高耐摩耗性、
均一析出性等の利点を発揮する。Since the non-magnetic coating of the present invention has a small Mo content of 0.1 to 5%, it has substantially the same characteristics as the Ni-P alloy coating, such as high corrosion resistance, high hardness and high wear resistance. ,
Demonstrate advantages such as uniform precipitation.
【００２６】[0026]
【実施例】以下、実施例と比較例を示し、本発明を具体
的に説明するが、本発明は下記の実施例に制限されるも
のではない。EXAMPLES The present invention will be specifically described below by showing Examples and Comparative Examples, but the present invention is not limited to the following Examples.
【００２７】〔実施例１〜４，比較例〕下記組成の無電
解めっき浴を調製し、被めっきサンプルとして亜鉛置換
処理を施したアルミニウム板上にスターラー撹拌下にお
いて９０℃で１２０分間めっきを行い、約１５μｍ厚さ
のめっき皮膜を得た。次に、このめっき皮膜を電気オー
ブンを使用し、図１〜３に示す条件で空気中において熱
処理し、飽和磁束密度を測定した。結果を図１〜３に示
す。なお、モリブデン酸ナトリウム量を変化させた場合
の皮膜組成を表１に示す。[Examples 1 to 4 and Comparative Example] An electroless plating bath having the following composition was prepared, and a sample to be plated was plated on an aluminum plate subjected to zinc substitution treatment under stirring with a stirrer at 90 ° C. for 120 minutes. A plating film having a thickness of about 15 μm was obtained. Next, this plating film was heat-treated in air using an electric oven under the conditions shown in FIGS. 1 to 3 to measure the saturation magnetic flux density. The results are shown in FIGS. Table 1 shows the film composition when the amount of sodium molybdate was changed.
【００２８】浴組成 硫酸ニッケル（ニッケルとして） ６ ｇ／ｌ 次亜リン酸ナトリウム ３０ 〃 モリブデン酸ナトリウム ０〜１ 〃 リンゴ酸 １８ 〃 コハク酸 １６ 〃 安定剤 微 量 ｐＨ ４．５ なお、磁性測定条件は下記の通りである。 磁性測定条件 ：振動試料型磁力計（理研電子製ＢＨＶ−
５０型） 印加磁場２５００Ｏe 感度０．００５ＥＭＵ 試料 １×１ｃｍ 測定回数ｎ＝２[0028]Bath composition Nickel sulfate (as nickel) 6 g / l Sodium hypophosphite 30 〃 Sodium molybdate 0-1 〃 Malic acid 18 〃 Succinic acid 16 〃 Stabilizer Micro pH 4.5 The magnetic measurement conditions are as follows. is there. Magnetic measurement conditions : Vibration sample magnetometer (Riken Denshi BHV-
50 type) Applied magnetic field 2500Oe Sensitivity 0.005 EMU sample 1 × 1 cm Number of measurements n = 2
【００２９】[0029]
【表１】 [Table 1]
【００３０】表１及び図１〜３の結果より、本発明に係
るＮｉ−Ｐ−Ｍｏ合金めっき皮膜（非磁性皮膜）は、Ｍ
ｏを含まないＮｉ−Ｐ合金めっき皮膜に比較して非磁性
特性が優れ、従来のＮｉ−Ｐ皮膜では３００℃，２時間
の加熱で磁性化されるのに対し、非磁性が維持されるこ
とが認められる。From the results shown in Table 1 and FIGS. 1 to 3, the Ni-P-Mo alloy plating film (non-magnetic film) according to the present invention is M
Non-magnetic property is superior to Ni-P alloy plating film that does not contain o, and non-magnetic property is maintained while conventional Ni-P film is magnetized by heating at 300 ° C for 2 hours. Is recognized.
【００３１】而して、このようなＮｉ−Ｐ−Ｍｏ合金め
っき皮膜は、次いで表面を平滑に研摩した後、常法によ
り磁性皮膜が形成され、必要により保護膜が形成されて
磁気記録体が得られるものである。Then, the surface of the Ni-P-Mo alloy plating film is smoothed, and then a magnetic film is formed by a conventional method, and a protective film is formed if necessary to form a magnetic recording medium. Is what you get.
【００３２】[0032]
【発明の効果】本発明の磁気記録体は、その非磁性皮膜
が特定組成の非晶質のＮｉ−Ｐ−Ｍｏ合金皮膜であるこ
とにより、高温、長時間の熱的条件下におかれても、該
非磁性皮膜が磁化され難く、非磁性を維持し得るもので
ある。The non-magnetic film of the magnetic recording medium of the present invention is an amorphous Ni-P-Mo alloy film having a specific composition, so that it can be exposed to thermal conditions of high temperature and long time. Also, the non-magnetic film is hard to be magnetized and can maintain non-magnetism.
【図１】Ｎａ2ＭｏＯ4を種々の濃度で含むめっき浴から
得られためっき皮膜を３００℃で２時間熱処理した場合
におけるＮａ2ＭｏＯ4濃度と飽和磁束密度との関係を示
すグラフである。FIG. 1 is a graph showing the relationship between the Na 2 MoO 4 concentration and the saturation magnetic flux density when a plating film obtained from a plating bath containing Na 2 MoO 4 at various concentrations is heat-treated at 300 ° C. for 2 hours.
【図２】Ｎａ2ＭｏＯ4を０ｇ／ｌ又は０．３ｇ／ｌ含む
めっき浴から得られためっき皮膜を種々の温度で２時間
熱処理した場合における熱処理温度と飽和磁束密度との
関係を示すグラフである。FIG. 2 is a graph showing the relationship between the heat treatment temperature and the saturation magnetic flux density when a plating film obtained from a plating bath containing 0 g / l or 0.3 g / l of Na 2 MoO 4 is heat treated at various temperatures for 2 hours. Is.
【図３】Ｎａ2ＭｏＯ4を０ｇ／ｌ又は０．３ｇ／ｌ含む
めっき浴から得られためっき皮膜を３００℃で熱処理し
た場合における熱処理時間と飽和磁束密度との関係を示
すグラフである。FIG. 3 is a graph showing the relationship between heat treatment time and saturation magnetic flux density when a plating film obtained from a plating bath containing Na 2 MoO 4 of 0 g / l or 0.3 g / l is heat-treated at 300 ° C.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 斉藤 昌弘 大阪府枚方市出口１丁目５番１号 上村工 業株式会社開発技術研究所内 ─────────────────────────────────────────────────── ─── Continued Front Page (72) Inventor Masahiro Saito 1-5-1, Exit Hirakata-shi, Osaka Uemura Industrial Co., Ltd.
Claims (1)
の上に磁性皮膜を形成してなる磁気記録体において、上
記非磁性皮膜が、ニッケル８２〜９０．９重量％、リン
９〜１３重量％、モリブデン０．１〜５重量％の組成の
非晶質のＮｉ−Ｐ−Ｍｏ合金皮膜であることを特徴とす
る磁気記録体。1. A magnetic recording material comprising a non-magnetic substrate, a non-magnetic film formed on the non-magnetic substrate, and the non-magnetic film formed on the non-magnetic substrate. A magnetic recording medium, which is an amorphous Ni-P-Mo alloy film having a composition of 13% by weight and molybdenum 0.1 to 5% by weight.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9388892A JP2848103B2 (en) | 1992-03-19 | 1992-03-19 | Magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9388892A JP2848103B2 (en) | 1992-03-19 | 1992-03-19 | Magnetic recording medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05266457A true JPH05266457A (en) | 1993-10-15 |
| JP2848103B2 JP2848103B2 (en) | 1999-01-20 |
Family
ID=14095023
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9388892A Expired - Fee Related JP2848103B2 (en) | 1992-03-19 | 1992-03-19 | Magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2848103B2 (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6341420B1 (en) | 2000-08-02 | 2002-01-29 | Static Control Components, Inc. | Method of manufacturing a developer roller |
| JP2012142060A (en) * | 2011-01-06 | 2012-07-26 | Fuji Electric Co Ltd | Substrate for magnetic recording medium and method for manufacturing the same |
| CN111206240A (en) * | 2020-01-17 | 2020-05-29 | 山东大学 | Method for obtaining passivation region of amorphous Ni-Mo-P coating in salt solution and application thereof |
| US20220389588A1 (en) * | 2019-11-20 | 2022-12-08 | Atotech Deutschland GmbH & Co. KG | Electroless nickel alloy plating baths, a method for deposition of nickel alloys, nickel alloy deposits and uses of such formed nickel alloy deposits |
| US11551713B2 (en) | 2020-08-03 | 2023-01-10 | Showa Denko K.K. | Base for magnetic recording medium, magnetic recording medium, and magnetic storage apparatus |
| US11551712B2 (en) | 2020-08-03 | 2023-01-10 | Showa Denko K.K. | Base for magnetic recording medium, magnetic recording medium, and magnetic storage apparatus |
-
1992
- 1992-03-19 JP JP9388892A patent/JP2848103B2/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6341420B1 (en) | 2000-08-02 | 2002-01-29 | Static Control Components, Inc. | Method of manufacturing a developer roller |
| JP2012142060A (en) * | 2011-01-06 | 2012-07-26 | Fuji Electric Co Ltd | Substrate for magnetic recording medium and method for manufacturing the same |
| US20220389588A1 (en) * | 2019-11-20 | 2022-12-08 | Atotech Deutschland GmbH & Co. KG | Electroless nickel alloy plating baths, a method for deposition of nickel alloys, nickel alloy deposits and uses of such formed nickel alloy deposits |
| CN111206240A (en) * | 2020-01-17 | 2020-05-29 | 山东大学 | Method for obtaining passivation region of amorphous Ni-Mo-P coating in salt solution and application thereof |
| US11551713B2 (en) | 2020-08-03 | 2023-01-10 | Showa Denko K.K. | Base for magnetic recording medium, magnetic recording medium, and magnetic storage apparatus |
| US11551712B2 (en) | 2020-08-03 | 2023-01-10 | Showa Denko K.K. | Base for magnetic recording medium, magnetic recording medium, and magnetic storage apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2848103B2 (en) | 1999-01-20 |
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