JPH0347753B2 - - Google Patents

Info

Publication number
JPH0347753B2
JPH0347753B2 JP61024049A JP2404986A JPH0347753B2 JP H0347753 B2 JPH0347753 B2 JP H0347753B2 JP 61024049 A JP61024049 A JP 61024049A JP 2404986 A JP2404986 A JP 2404986A JP H0347753 B2 JPH0347753 B2 JP H0347753B2
Authority
JP
Japan
Prior art keywords
electrode
discharge
gas
tube
glass tube
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61024049A
Other languages
Japanese (ja)
Other versions
JPS62183581A (en
Inventor
Tadashi Imada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimada Rika Kogyo KK
Original Assignee
Shimada Rika Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimada Rika Kogyo KK filed Critical Shimada Rika Kogyo KK
Priority to JP2404986A priority Critical patent/JPS62183581A/en
Publication of JPS62183581A publication Critical patent/JPS62183581A/en
Publication of JPH0347753B2 publication Critical patent/JPH0347753B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/038Electrodes, e.g. special shape, configuration or composition

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Lasers (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)

Description

【発明の詳細な説明】 [発明の目的] (産業上の利用分野) この発明は高速軸流ガスレーザ発振器詳しくは
パルス放電時に安定な放電を得ることができる高
速軸流ガスレーザ発振器に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Application Field) The present invention relates to a high-speed axial flow gas laser oscillator, and more particularly, to a high-speed axial flow gas laser oscillator that can obtain stable discharge during pulse discharge.

(従来の技術) 従来から高速軸流ガスレーザの放電は第1電
極、第2電極のうちの一方の電極をグランド電位
あるいは低電位にし、他方の電極に高電圧を印加
することにより行われている。又、パルス放電は
高電圧の印加を開閉することにより放電をパルス
化することにより行われている。
(Prior art) Discharge of a high-speed axial gas laser has traditionally been performed by setting one of the first and second electrodes to ground potential or a low potential, and applying a high voltage to the other electrode. . Further, pulsed discharge is performed by pulsing the discharge by opening and closing the application of a high voltage.

一方、低電位あるいはグランド電位の電極近く
に高周波電極を設け、微弱な高周波放電によつて
イオンを発生させ、放電開始電圧を下げる技術も
従来存在した。
On the other hand, there has conventionally been a technique in which a high-frequency electrode is provided near an electrode at a low potential or ground potential, and ions are generated by a weak high-frequency discharge to lower the discharge starting voltage.

(発明が解決しようとする問題点) しかしこの従来の装置ではCW(連続放電)時
には良好なグロー放電を得ることができるが、パ
ルス放電時には一様な放電をさせるまでにはいた
らなかつた。
(Problems to be Solved by the Invention) However, with this conventional device, although it is possible to obtain a good glow discharge during CW (continuous discharge), it is not possible to achieve a uniform discharge during pulse discharge.

これはパルス放電の際、パルス幅ご短く、繰り
返しが遅いと、CWあるいは繰り返しの速いパル
スの場合に比べ、イオン化した分子の一部が高速
ガス流で運び去られ、分子が減少し、放電管内で
インピーダンスの低い一部分にかたよつてしまう
からであり、アーク状放電になりやすい欠点があ
つた。
This is because during pulse discharge, if the pulse width is short and the repetition is slow, some of the ionized molecules will be carried away by the high-speed gas flow than in the case of CW or fast repetition pulses, reducing the number of molecules inside the discharge tube. This is because the impedance is biased toward a portion with low impedance, and it has the disadvantage of being prone to arc-like discharge.

また、放電管近傍にグランド電位に近い金属が
あると静電容量を通じて電流が流れようとする
為、放電がその方向にかたむく現象が発生し、極
端にレーザのパワーが低下する現象も発生してい
た。
Additionally, if there is a metal near the discharge tube that is close to ground potential, current will tend to flow through the capacitance, causing the discharge to skew in that direction, which can lead to an extreme drop in laser power. Ta.

この発明はこれら従来の高速軸流ガスレーザ発
振器の欠点を除去することを目的とするものであ
り、パルス放電時にも安定した放電を得ることが
できる高速軸流ガスレーザ発振器を提供せんとす
るものである。
The purpose of this invention is to eliminate these drawbacks of conventional high-speed axial flow gas laser oscillators, and to provide a high-speed axial flow gas laser oscillator that can obtain stable discharge even during pulse discharge. .

[発明の構成] (問題点を解決するための手段) この発明は、一方の端面を全反射鏡1、他方の
端面を半透過鏡2で閉塞した筒状のガラス管3の
全反射鏡1寄りの管壁にガス導入口4、半透過鏡
2寄りの管壁にガス排出口5を設け、前記ガス導
入口4内にグランド電位又は低電位に接続された
第2電極6を、ガス導入口4とガス排出口5の間
で、ガス排出口5寄りの管内周壁にマイナスの高
電圧が印加される第1電極7をそれぞれ位置さ
せ、更に第1電極7と第2電極6の間の外周壁に
ガラス管3を囲撓する様に一様な静電容量を有
し、第2電極6と同じ電位を持つた第3電極8を
設けることにより上記目的を達成せんとするもの
である。
[Structure of the Invention] (Means for Solving the Problems) This invention provides a total reflection mirror 1 of a cylindrical glass tube 3 whose one end face is closed with a total reflection mirror 1 and the other end face is closed with a semi-transmission mirror 2. A gas inlet 4 is provided in the tube wall closer to the semi-transparent mirror 2, and a gas outlet 5 is provided in the tube wall closer to the semi-transparent mirror 2, and a second electrode 6 connected to the ground potential or a low potential is connected to the gas inlet 4 to introduce the gas. Between the port 4 and the gas outlet 5, first electrodes 7 to which a negative high voltage is applied are placed on the inner circumferential wall of the tube near the gas outlet 5, and further between the first electrode 7 and the second electrode 6. The above objective is achieved by providing a third electrode 8 having a uniform capacitance and having the same potential as the second electrode 6 so as to surround the glass tube 3 on the outer peripheral wall. .

(作用) この発明におけるガスレーザ発振器の第3電極
はコンデンサに相当する働きをするものであり、
ガラス管の外周壁を同じ電位でとりまいており、
低電位に接続されることにより放電の電位に対
し、静電容量を持つている。そして、このガラス
管3内を第2電極から第1電極の方向に向かつて
混合ガスGを流し、第1電極に高圧パルスを印加
すると、第1電極から第3電極まではガラス管3
の中心にそつて細いアーク状の放電がおこるが第
3電極から第2電極までの間にはガラス管3の内
容積ほぼ全域にわたり一様なグロー放電が発生す
る。
(Function) The third electrode of the gas laser oscillator in this invention functions as a capacitor,
The outer peripheral wall of the glass tube is surrounded by the same potential.
By being connected to a low potential, it has a capacitance against the discharge potential. Then, when the mixed gas G flows through the glass tube 3 from the second electrode to the first electrode and a high voltage pulse is applied to the first electrode, the glass tube 3 from the first electrode to the third electrode
A thin arc-shaped discharge occurs along the center of the glass tube 3, but a uniform glow discharge occurs over almost the entire internal volume of the glass tube 3 between the third electrode and the second electrode.

従つて、このパルス放電時にアークが少なく、
かたよりのない一様なグロー放電を得ることがで
き、パルス放電の際に極端にパワーが低下するこ
ともなく、安定な放電を得ることが可能となる。
Therefore, there is less arcing during this pulse discharge,
It is possible to obtain a uniform glow discharge without any bias, and it is possible to obtain a stable discharge without an extreme drop in power during pulse discharge.

(実施例) 第1図はこの発明にかかる高速軸流ガスレーザ
発振器の断面図であり、一方の端面を全反射鏡
1、他方の端面を半透過鏡2で閉塞した筒状のガ
ラス管3の全反射鏡1寄りの管壁にはガス導入口
4が、半透過鏡2寄りの管壁にはガス排出口5が
それぞれ設けられており、ガラス管3内にCO2
N2、Heの混合ガスGを流通させる様になつてい
る。そして、前記ガス導入口4内には第2電極6
が位置されており、この第2電極6はグランド電
位又は低電位に接続されている。一方、ガス導入
口4とガス排出口5の間でガス排出口5寄りのガ
ラス管3の内周壁には第1電極7が位置してお
り、この第1電極7はマイナスの高電圧が印加さ
れている。
(Example) FIG. 1 is a cross-sectional view of a high-speed axial flow gas laser oscillator according to the present invention. A gas inlet 4 is provided in the tube wall closer to the total reflection mirror 1, and a gas outlet 5 is provided in the tube wall closer to the semi-transmissive mirror 2 .
A mixed gas G of N 2 and He is made to flow through it. A second electrode 6 is provided in the gas inlet 4.
is located, and this second electrode 6 is connected to ground potential or a low potential. On the other hand, a first electrode 7 is located on the inner peripheral wall of the glass tube 3 near the gas outlet 5 between the gas inlet 4 and the gas outlet 5, and a negative high voltage is applied to the first electrode 7. has been done.

なお、これらの配置は従来の高速軸流タイプの
ガスレーザ発振器と同じである。
Note that these arrangements are the same as those of a conventional high-speed axial flow type gas laser oscillator.

更に、この第1電極7から第2電極6側へ約50
mm離れた位置の外周壁にはこのガラス管3を囲撓
する様に一様な静電容量を持つた円周状の第3電
極8が設けられている。
Furthermore, from this first electrode 7 to the second electrode 6 side, approximately 50
A circumferential third electrode 8 having a uniform capacitance is provided on the outer peripheral wall at a distance of mm so as to surround the glass tube 3.

この第3電極8はこの実施例においてはテフロ
ン被覆した導線を用いており、ガラス管3の外周
壁に2回巻き付けている。そして、この第3電極
8は前記第2電極6と接続されており、この第2
電極6と同じ電位を持つ様にされている。なお、
この第2電極6はガラス管3の外周を一様にとり
まくことができる導電性を有するリング等を用い
ても良い。
In this embodiment, the third electrode 8 is a conductor coated with Teflon, and is wound around the outer circumferential wall of the glass tube 3 twice. This third electrode 8 is connected to the second electrode 6, and this third electrode 8 is connected to the second electrode 6.
It is made to have the same potential as the electrode 6. In addition,
This second electrode 6 may be a conductive ring or the like that can uniformly surround the outer periphery of the glass tube 3.

第3電極8は第2図に示すこの実施例の等価回
路の通り、グランド電位あるいは低電位に接続さ
れ、放電の電位に対し、静電容量を持つており、
コンデンサに相当する働きを行う。従つて、パル
ス発振の際、スイツチ9を高速開閉すると、等価
である為、電流はバラスト抵抗10、放電インピ
ーダンス11だけでなく、第3電極8にも流れ、
この第3電極8の静電容量は放電をガラス管内一
ぱいに広げる役目をし、かたよりのない又、アー
クの少ない均一なグロー放電をさせることとな
る。
As shown in the equivalent circuit of this embodiment shown in FIG. 2, the third electrode 8 is connected to the ground potential or a low potential, and has a capacitance with respect to the discharge potential.
It performs a function equivalent to a capacitor. Therefore, when the switch 9 is opened and closed at high speed during pulse oscillation, the current flows not only through the ballast resistor 10 and the discharge impedance 11 but also through the third electrode 8 because it is equivalent.
The capacitance of the third electrode 8 serves to spread the discharge throughout the glass tube, resulting in a uniform glow discharge with no deviation and less arcing.

なお、CW発振の場合はスイツチ9は閉された
ままであり、電流はバラスト抵抗10、放電イン
ピーダンス11側のみを流れ、この第3電極8に
は流れない。従つて、このCW発振の際にはこの
第3電極8は何らの悪影響も与えない。
Note that in the case of CW oscillation, the switch 9 remains closed, and the current flows only through the ballast resistor 10 and discharge impedance 11 side, and does not flow through the third electrode 8. Therefore, during this CW oscillation, the third electrode 8 does not have any adverse effect.

[発明の効果] この発明に係るガスレーザー発振器は上述の通
り、ガラス管の外周壁にパルス放電との間に静電
容量を持たせた第3電極を設けたので、CW発振
に何ら悪影響を与えることなく、パルス放電の際
にはアークの少ないかたよりのない均一で安定な
グロー放電を発生させることができるすぐれた効
果を有する。
[Effects of the Invention] As mentioned above, the gas laser oscillator according to the present invention has the third electrode provided on the outer circumferential wall of the glass tube with a capacitance between it and the pulse discharge, so there is no adverse effect on CW oscillation. It has an excellent effect of generating a uniform and stable glow discharge with little arc and no bias during pulse discharge without giving any bias.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明に係る高速軸流ガスレーザ発
振器の一実施例の断面図、第2図はその等価回路
図である。 1……全反射鏡、2……半透過鏡、3……ガラ
ス管、4……ガス導入口、5……ガス排出口、6
……第2電極、7……第1電極、8……第3電
極、9……スイツチ、10……バラスト抵抗、1
1……放電インピーダンス、G……混合ガス。
FIG. 1 is a sectional view of an embodiment of a high-speed axial flow gas laser oscillator according to the present invention, and FIG. 2 is an equivalent circuit diagram thereof. 1... Totally reflecting mirror, 2... Semi-transmitting mirror, 3... Glass tube, 4... Gas inlet, 5... Gas outlet, 6
...Second electrode, 7...First electrode, 8...Third electrode, 9...Switch, 10...Ballast resistance, 1
1...Discharge impedance, G...Mixed gas.

Claims (1)

【特許請求の範囲】[Claims] 1 一方の端面を全反射鏡1、他方の端面を半透
過鏡2で閉塞した筒状のガラス管3の全反射鏡1
寄りの管壁にガス導入口4、半透過鏡2寄りの管
壁にガス排出口5を設け、前記ガス導入口4内に
グランド電位又は低電位に接続された第2電極6
を、ガス導入口4とガス排出口5の間で、ガス排
出口5寄りの管内周壁にマイナスの高電圧が印加
される第1電極7をそれぞれ位置させ、更に第1
電極7と第2電極6の間に外周壁にガラス管3を
囲撓する様に一様な静電容量を有し、第2電極6
と同じ電位を持つた第3電極を設けたことを特徴
とする高速軸流ガスレーザ発振器。
1 Total reflection mirror 1 of a cylindrical glass tube 3 with one end face closed by a total reflection mirror 1 and the other end face closed with a semi-transmission mirror 2
A gas inlet 4 is provided in the tube wall closer to the semi-transparent mirror 2, a gas outlet 5 is provided in the tube wall closer to the semi-transparent mirror 2, and a second electrode 6 is connected to the ground potential or a low potential within the gas inlet 4.
A first electrode 7 to which a negative high voltage is applied to the inner circumferential wall of the tube near the gas outlet 5 is positioned between the gas inlet 4 and the gas outlet 5, and
A uniform capacitance is provided between the electrode 7 and the second electrode 6 so as to surround the glass tube 3 on the outer peripheral wall, and the second electrode 6
A high-speed axial flow gas laser oscillator characterized in that a third electrode having the same potential as that of the third electrode is provided.
JP2404986A 1986-02-07 1986-02-07 High-speed axial-flow gas laser oscillator Granted JPS62183581A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2404986A JPS62183581A (en) 1986-02-07 1986-02-07 High-speed axial-flow gas laser oscillator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2404986A JPS62183581A (en) 1986-02-07 1986-02-07 High-speed axial-flow gas laser oscillator

Publications (2)

Publication Number Publication Date
JPS62183581A JPS62183581A (en) 1987-08-11
JPH0347753B2 true JPH0347753B2 (en) 1991-07-22

Family

ID=12127614

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2404986A Granted JPS62183581A (en) 1986-02-07 1986-02-07 High-speed axial-flow gas laser oscillator

Country Status (1)

Country Link
JP (1) JPS62183581A (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4731421U (en) * 1971-04-20 1972-12-08
JPS4827662U (en) * 1971-08-02 1973-04-03
JPS5514759B2 (en) * 1976-04-12 1980-04-18
JPS6052070A (en) * 1983-09-01 1985-03-23 Mitsubishi Electric Corp Coaxial type laser oscillator
JPS61112389A (en) * 1984-11-07 1986-05-30 Nec Corp High speed axial flow type gas laser device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5514759U (en) * 1978-07-14 1980-01-30

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4731421U (en) * 1971-04-20 1972-12-08
JPS4827662U (en) * 1971-08-02 1973-04-03
JPS5514759B2 (en) * 1976-04-12 1980-04-18
JPS6052070A (en) * 1983-09-01 1985-03-23 Mitsubishi Electric Corp Coaxial type laser oscillator
JPS61112389A (en) * 1984-11-07 1986-05-30 Nec Corp High speed axial flow type gas laser device

Also Published As

Publication number Publication date
JPS62183581A (en) 1987-08-11

Similar Documents

Publication Publication Date Title
JPH0787255B2 (en) High frequency discharge excitation laser device
JP2983764B2 (en) Electrodeless low pressure discharge lamp
JPH0347753B2 (en)
JPS6358387B2 (en)
JPH02192607A (en) Discharge tube structure
JPS62262476A (en) High-speed axial-flow gas laser oscillator
JPS56138976A (en) Voiceless discharge gas laser device
JPH03156874A (en) Spark gap mechanism in which trigger is possible to perform
EP0048425B1 (en) Gas laser
JPH05154656A (en) Arc welding machine
US4750182A (en) Gas lasers
JPS6225911Y2 (en)
JPH0239870B2 (en)
JPS6489576A (en) Gas laser oscillator
JPS61230404A (en) Dielectric coaxial resonator
SU862800A1 (en) Chf pulse former
JPS55154790A (en) Silent discharge type gas laser
JPS5821891A (en) Noiseless discharge type carbon dioxide gas laser
JPH02281671A (en) Gas laser oscillation device
JPS62174985A (en) High-frequency excitation gas laser
JPS604284A (en) Rectangular gas laser oscillating device
JPS6052070A (en) Coaxial type laser oscillator
JPS62207007A (en) Microwave oscillator
JPH01128387A (en) Gap switch
JPS6016066Y2 (en) Gap device