JPH02281670A - High frequency excitation gas laser oscillation device - Google Patents
High frequency excitation gas laser oscillation deviceInfo
- Publication number
- JPH02281670A JPH02281670A JP10268089A JP10268089A JPH02281670A JP H02281670 A JPH02281670 A JP H02281670A JP 10268089 A JP10268089 A JP 10268089A JP 10268089 A JP10268089 A JP 10268089A JP H02281670 A JPH02281670 A JP H02281670A
- Authority
- JP
- Japan
- Prior art keywords
- discharge
- oscillation device
- laser oscillation
- gas laser
- high frequency
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000010355 oscillation Effects 0.000 title claims abstract description 18
- 230000005284 excitation Effects 0.000 title claims abstract description 6
- 239000002184 metal Substances 0.000 claims description 4
- 230000003287 optical effect Effects 0.000 claims description 3
- 239000003989 dielectric material Substances 0.000 claims description 2
- 230000002093 peripheral effect Effects 0.000 claims description 2
- 230000003247 decreasing effect Effects 0.000 claims 1
- 238000007599 discharging Methods 0.000 claims 1
- 238000011144 upstream manufacturing Methods 0.000 claims 1
- 230000007423 decrease Effects 0.000 abstract description 4
- 238000010521 absorption reaction Methods 0.000 abstract description 2
- 238000000034 method Methods 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 3
- 238000003754 machining Methods 0.000 description 2
- 230000030279 gene silencing Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
- H01S3/104—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/07—Construction or shape of active medium consisting of a plurality of parts, e.g. segments
- H01S3/073—Gas lasers comprising separate discharge sections in one cavity, e.g. hybrid lasers
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は放電管の軸方向と光軸方向が一致したガスレー
ザ発振装置に関するものであシ、特に最も容易にレーザ
ビーム横モードを可変できるようにした高周波励起ガス
レーザ発振装置に関するものである。[Detailed Description of the Invention] Industrial Field of Application The present invention relates to a gas laser oscillation device in which the axial direction of a discharge tube and the optical axis direction are coincident, and in particular, a gas laser oscillation device in which the transverse mode of the laser beam can be varied most easily. The present invention relates to a high frequency excitation gas laser oscillation device.
従来の技術
従来の高周波励起ガスレーザ発振装置は、第３図ａに示
すものであった。この図に於て、１はガラヌなどの誘電
体よシなる放電管であシ、２．３は前記放電管１の外周
面に密着して設けられた金属電極である。４は前記電極
２．３に接続された高周波電源であり、たとえば１３．
５６ ＭＨｚ 、２ＫＶの電圧を画電極２，３間に印加
している。５は前記電極２．３間にはさまれた放電管１
内の放電空間である。６は全反射鏡、７は部分反射鏡で
あり。2. Description of the Related Art A conventional high frequency excited gas laser oscillation device is shown in FIG. 3a. In this figure, numeral 1 is a discharge tube made of dielectric material such as galanium, and numerals 2 and 3 are metal electrodes provided in close contact with the outer peripheral surface of the discharge tube 1. 4 is a high frequency power source connected to the electrode 2.3, for example 13.
A voltage of 56 MHz and 2 KV is applied between the picture electrodes 2 and 3. 5 is a discharge tube 1 sandwiched between the electrodes 2 and 3.
This is the discharge space inside. 6 is a total reflection mirror, and 7 is a partial reflection mirror.
この全反射鏡６９部分反射鏡７は前記放電空間６の両端
に固定配置され、光弁振器を形成している。The total reflection mirror 69 and the partial reflection mirror 7 are fixedly arranged at both ends of the discharge space 6 and form a light valve oscillator.
８は前記部分反射鏡子より出力されるレーザビームであ
る。矢印９はレーザガフの流れる方向を示しており、第
３図に示すような軸流型レーザ装置の中を循環している
。１ｏは送気管であり、１１゜１２は前記放電空間５に
て放電及び送風機により温度上昇したレーザガフの温度
を下げるための熱交換器、１３はレーザガフを循環させ
るための送風機である。8 is a laser beam output from the partially reflecting mirror. Arrow 9 indicates the flow direction of the laser gaff, which circulates in the axial flow laser device as shown in FIG. 1o is an air pipe, 11° and 12 are heat exchangers for lowering the temperature of the laser gaff whose temperature has risen due to discharge and a blower in the discharge space 5, and 13 is a blower for circulating the laser gaff.
なお、送風機１３により放電区間６にて約１０゜ｍ／ｓ
ｅａ程度のガフ流を得る必要がある。In addition, the blower 13 generates a velocity of approximately 10°m/s in the discharge section 6.
It is necessary to obtain a gaff flow of about ea.
第３図すは第３図ａの放電空間５部分の放電管１及び電
極２．３の断面を示す図である。FIG. 3 is a diagram showing a cross section of the discharge tube 1 and the electrodes 2.3 in the discharge space 5 portion of FIG. 3a.
以上が従来の軸流型レーザ装置の構成であシ。The above is the configuration of a conventional axial flow laser device.
次にその動作について説明する。Next, its operation will be explained.
まず一対の金属電極２．３に高周波電源４から高周波高
電圧を印加し、放電空間６にグロー状の放電を発生させ
る。放電空間５を通過するレーザガフは、この放電エネ
ルギーを得て励起され、その励起されたレーザガフは全
反射鏡６および部分反射鏡７によシ形成された光共振器
で共振状態となり、部分反射鏡７からレーザビーム８が
出力される。このレーザビーム８がレーザ加工等の用途
に用いられる。特に、加工用途によっては、瞬時に横モ
ードを切り替えることが必要になる。First, a high frequency high voltage is applied from the high frequency power supply 4 to the pair of metal electrodes 2.3 to generate a glow-like discharge in the discharge space 6. The laser gaff passing through the discharge space 5 receives this discharge energy and is excited, and the excited laser gaff enters a resonant state in the optical resonator formed by the total reflection mirror 6 and the partial reflection mirror 7. A laser beam 8 is output from 7. This laser beam 8 is used for purposes such as laser processing. In particular, depending on the processing application, it is necessary to instantly switch the transverse mode.
発明が解決しようとする課題
上記の構成では、レーザビームの横モードハ放電管１の
管内径及び全反射鏡６１部分反射鏡７の曲率によって支
配される。Problems to be Solved by the Invention In the above configuration, the transverse mode of the laser beam is controlled by the tube inner diameter of the discharge tube 1 and the curvature of the total reflection mirror 61 and the partial reflection mirror 7.
従って、従来は瞬時に横モードを可変することが不可能
であった。Therefore, conventionally it has been impossible to change the transverse mode instantaneously.
この発明は、かかる課題を解決するためになされたもの
で、電気的に瞬時に横モードを可変できる高周波励起ガ
スレーザ発振装置を提供することを目的とする。The present invention was made to solve this problem, and an object of the present invention is to provide a high-frequency excitation gas laser oscillation device that can electrically change the transverse mode instantaneously.
課題を解決するための手段
本発明は、上記課題を解決するために放電管内の放電領
域を電気的に増減し、横モードを瞬時に変化可能な高周
波励起ガスレーザ発振装置としたものである。Means for Solving the Problems In order to solve the above problems, the present invention provides a high-frequency excited gas laser oscillation device that can electrically increase or decrease the discharge area within the discharge tube and instantly change the transverse mode.
作用
この発明における横モードを瞬時に切り替えることによ
シ、異なる加工作業間の時間損失が大幅られ、スイッチ
１１．１２により、電極２，３への電圧印加が制御され
る。例えば５図示したようにスイッチ１１をＯＦＦし、
スイ１．．チ１２をＯＮした場合と、スイッチ１１およ
び１２をＯＮした場合、各放電管１．１内のガフの吸収
により全体の利得が低下して出てくるレーザビームの横
モード形状が異なる。OPERATION By instantaneously switching the transverse mode according to the invention, the time loss between different machining operations is greatly reduced, and the voltage application to the electrodes 2, 3 is controlled by the switch 11, 12. For example, as shown in Figure 5, turn off the switch 11,
Sui 1. ．． When switch 12 is turned on, and when switches 11 and 12 are turned on, the overall gain decreases due to absorption by the gaff in each discharge tube 1.1, and the transverse mode shape of the emitted laser beam is different.
第２図は、電極２／ 、 ３／を傾斜させ、放電管軸方
向の電極間インピーダンヌに勾配をもたせ電気入力に応
じて放電領域を変化させ横モードを制御する実施例であ
る。この方法を用いても同様の効果が得られる。FIG. 2 shows an embodiment in which the electrodes 2/ and 3/ are tilted to create a gradient in the impedance between the electrodes in the axial direction of the discharge tube, thereby changing the discharge region in accordance with the electrical input and controlling the transverse mode. Similar effects can be obtained using this method.
発明の効果
以上のように、この発明によれば放電管内の放電領域を
電気的に制御することにより瞬時に横モード切り替え可
能な高周波励起ガスレーザ発振装置を提供でき、加工時
間を大幅に短縮可能となシランニングコストの安い経済
的なレーザ加工に優れた効果を発揮する。Effects of the Invention As described above, according to the present invention, it is possible to provide a high-frequency excited gas laser oscillation device that can instantly switch the transverse mode by electrically controlling the discharge area within the discharge tube, and it is possible to significantly shorten the machining time. It exhibits excellent effects in economical laser processing with low silencing costs.
第１図は本発明の一実施例を示すガスレーザ発振装置の
回路図およびレーザビームの横モード形状を示す図、第
２図は本発明の他の実施例を示すガスレーザ発振装置の
回路図およびレーザビームの横モード形状を示す図、第
３図２Ｌは従来のガスレーザ発振装置の回路図、第３図
すは同要部断面図である。
１・・・・・・放電管−２，２’、３．３’・・山・電
極、４・・・・・・高周波電源、１１．１２・・・・・
・ヌイ・ンチ。
代理人の氏名 弁理士 粟 野 重 孝 ほか１名第
図
第
図
第
図
（ｂ）FIG. 1 is a circuit diagram of a gas laser oscillation device showing one embodiment of the present invention and a diagram showing the transverse mode shape of a laser beam, and FIG. 2 is a circuit diagram of a gas laser oscillation device and a laser beam showing another embodiment of the present invention. A diagram showing the transverse mode shape of a beam, FIG. 3 2L is a circuit diagram of a conventional gas laser oscillation device, and FIG. 3 is a sectional view of the same essential part. 1...Discharge tube-2, 2', 3.3'...Mountain/electrode, 4...High frequency power supply, 11.12...
・Nui Nchi. Name of agent: Patent attorney Shigetaka Awano and one other person Figure (b)
Claims (3)
スを流し、前記放電管の外周面に設けられた金属電極間
に高周波電圧を印加し、前記放電管内に高周波放電を発
生させ、この高周波放電をレーザ励起源として前記放電
管の軸方向にレーザビームを発生する高周波励起ガスレ
ーザ発振装置において、前記放電管内の高周波放電領域
を増減させることによりレーザビームの横モードを変化
可能としたことを特徴とする高周波励起ガスレーザ発振
装置。(1) A laser gas is caused to flow in the optical axis direction within a discharge tube made of a dielectric material, and a high frequency voltage is applied between metal electrodes provided on the outer peripheral surface of the discharge tube to generate a high frequency discharge within the discharge tube. A high-frequency excited gas laser oscillation device that generates a laser beam in the axial direction of the discharge tube using discharge as a laser excitation source, characterized in that the transverse mode of the laser beam can be changed by increasing or decreasing the high-frequency discharge area within the discharge tube. A high-frequency pumped gas laser oscillation device.
応じて放電する放電管数を電気信号により制御可能とし
た特許請求の範囲第１項記載の高周波励起ガスレーザ発
振装置。(2) A high-frequency excited gas laser oscillation device according to claim 1, wherein a plurality of discharge tubes are provided in the axial direction, and the number of discharge tubes discharging according to various transverse modes can be controlled by electric signals.
にむけて変化させた特許請求の範囲第１項記載の高周波
励起ガスレーザ発振装置。(3) The high frequency excited gas laser oscillation device according to claim 1, wherein the interval between the metal electrodes is changed from upstream to downstream of the gas in the discharge tube.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10268089A JPH02281670A (en) | 1989-04-21 | 1989-04-21 | High frequency excitation gas laser oscillation device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10268089A JPH02281670A (en) | 1989-04-21 | 1989-04-21 | High frequency excitation gas laser oscillation device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02281670A true JPH02281670A (en) | 1990-11-19 |
Family
ID=14333951
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10268089A Pending JPH02281670A (en) | 1989-04-21 | 1989-04-21 | High frequency excitation gas laser oscillation device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02281670A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000046891A1 (en) * | 1999-02-03 | 2000-08-10 | Trumpf Lasertechnik Gmbh | Laser with device for modifying the distribution of laser light intensity across the laser beam cross-section |
| US7173954B2 (en) * | 2002-12-10 | 2007-02-06 | Fanuc Ltd | Gas laser oscillation device |
| JP5653444B2 (en) * | 2010-09-17 | 2015-01-14 | 三菱電機株式会社 | Gas laser device |
-
1989
- 1989-04-21 JP JP10268089A patent/JPH02281670A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000046891A1 (en) * | 1999-02-03 | 2000-08-10 | Trumpf Lasertechnik Gmbh | Laser with device for modifying the distribution of laser light intensity across the laser beam cross-section |
| US6539045B1 (en) | 1999-02-03 | 2003-03-25 | Trumpf Lasertechnik Gmbh | Laser with device for modifying the distribution of laser light intensity across the laser beam cross-section |
| US7173954B2 (en) * | 2002-12-10 | 2007-02-06 | Fanuc Ltd | Gas laser oscillation device |
| EP1429432B2 (en) † | 2002-12-10 | 2012-11-28 | Fanuc Corporation | Gas laser oscillation device |
| JP5653444B2 (en) * | 2010-09-17 | 2015-01-14 | 三菱電機株式会社 | Gas laser device |
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