JPH01246107A - 超電導薄膜 - Google Patents

超電導薄膜

Info

Publication number
JPH01246107A
JPH01246107A JP63071633A JP7163388A JPH01246107A JP H01246107 A JPH01246107 A JP H01246107A JP 63071633 A JP63071633 A JP 63071633A JP 7163388 A JP7163388 A JP 7163388A JP H01246107 A JPH01246107 A JP H01246107A
Authority
JP
Japan
Prior art keywords
free
thin film
bao
superconducting
cuo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63071633A
Other languages
English (en)
Inventor
Takuo Takeshita
武下　拓夫
Tadashi Sugihara
杉原　忠
Shuichi Fujino
藤野　修一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Metal Corp
Original Assignee
Mitsubishi Metal Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Metal Corp filed Critical Mitsubishi Metal Corp
Priority to JP63071633A priority Critical patent/JPH01246107A/ja
Priority to EP89105239A priority patent/EP0334352B1/en
Priority to DE68915592T priority patent/DE68915592T2/de
Priority to KR1019890003741A priority patent/KR950001764B1/ko
Priority to US07/328,653 priority patent/US4929597A/en
Publication of JPH01246107A publication Critical patent/JPH01246107A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/45—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on copper oxide or solid solutions thereof with other oxides
    • C04B35/4504—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on copper oxide or solid solutions thereof with other oxides containing rare earth oxides
    • C04B35/4508—Type 1-2-3
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/80—Constructional details
    • H10N60/85—Superconducting active materials
    • H10N60/855—Ceramic superconductors
    • H10N60/857—Ceramic superconductors comprising copper oxide
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/901—Printed circuit
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/922—Static electricity metal bleed-off metallic stock
    • Y10S428/9265—Special properties
    • Y10S428/93—Electric superconducting
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/70—High TC, above 30 k, superconducting device, article, or structured stock
    • Y10S505/701—Coated or thin film device, i.e. active or passive
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/70—High TC, above 30 k, superconducting device, article, or structured stock
    • Y10S505/701—Coated or thin film device, i.e. active or passive
    • Y10S505/702—Josephson junction present
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/70—High TC, above 30 k, superconducting device, article, or structured stock
    • Y10S505/701—Coated or thin film device, i.e. active or passive
    • Y10S505/703—Microelectronic device with superconducting conduction line
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/70—High TC, above 30 k, superconducting device, article, or structured stock
    • Y10S505/704—Wire, fiber, or cable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49014—Superconductor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、薄膜改質処理のための焼鈍時に割れ発生の
ない超電導薄膜に関するものである。
〔従来の技術〕
従来、超電導薄膜が、例えばＹ、Ｓｃ、あるいは希土類
元素と、アルカリ土類金属と、Ｃｕの複合酸化物を主体
とする超電導セラミックスをターゲツト材として用い、
スパッタリング法や物理蒸る変質層が存在するので、こ
れを改質する目的で、これに酸素含有雰囲気中、８００
〜９５０℃の範囲内の所定温度に所定時間（通常１時間
）保持の条件で焼鈍を施すことによって形成されること
はよく知られるところである。
〔発明が解決しようとする課題〕
しかし、上記の従来法によって形成された超電導薄膜に
おいては、基体と薄膜の熱膨張係数が異ることに原因し
て、焼鈍時に割れが発生し易く、生産歩留の低いものと
なっている。
〔課題を解決するための手段〕
そこで、本発明者等は、上述のような観点から、焼鈍時
に割れ発生のない超電導薄膜を形成すべく研究を行なっ
た結果、超電導薄膜中に、分離遊離用の形で、Ｃｕ酸化
物（以下ＣｕＯで示す）およびＢａ酸化物（以下ＢａＯ
で示す）のうちのいずれか、あるいは両方を分布せしめ
ると、これらの分離遊離相が緩衝材として働き、基体と
薄膜の熱膨張係数の相異にもとづく割れ発生応力を十分
に吸収することから、焼鈍時に薄膜に割れが発生するこ
とがなくなるという知見を得たのである。
この発明は、上記知見にもとづいてなされたものであっ
て、超電導セラミックスの素地に、遊離ＣｕＯおよび遊
離ＢａＯのうちのいずれか、あるいは両方を０，１〜８
容量％の割合で分散分布せしめて、焼鈍時の割れ発生を
抑制した超電導薄膜に特徴を有するものである。
なお、この発明の超電導薄膜において、ＣｕＯおよびＢ
ａＯの分布割合を０．１〜８容量％に限定したのは、そ
の割合が０．１容量％未満では緩衝作用が弱く、割れ発
生を完全に抑制することができず、一方その割合が８容
量％を越えると、薄膜の超電導特性が低下するようにな
るという理由によるものである。
〔実　施　例〕
つぎに、この発明の超電導薄膜を実施例により具体的に
説明する。
原料粉末として、それぞれ５間の平均粒径を有し、かつ
第１表に示される組成の超電導セラミックス粉末、Ｃｕ
○粉末、およびＢａＯ粉末を用意し、これら原料粉末を
第１表に示される配合組成に配合し、混合した後、圧粉
体に成形し、これを大気中、８５０〜１０００℃の範囲
内の所定温度に３時間保持の条件で焼結して、直径：　
１００　ｍｍＸ厚さ５５ｍｍの寸法を有し、かつ配合組
成と実質的に同一・の組成を有し、遊離ＣｕＯおよび遊
離ＢａＯが超電導セラミックス素地中に分散分布した組
織のターゲツト材を成形し、ついで、これらのターゲツ
ト材を用い、スパッタリング法にて、高周波電力＋　２
００　Ｗ。
雰囲気圧力＝５刈０””３ｔｏｒｒ、 Ａ　ｒ　／　０２　：容量比で３／１、ターゲツト材と
基板間の距離：　９０ｍｍ。
基　　　板：　１０ｍｍ　Ｘ　１０ｍｍの平面寸法を有
するＭｇＯ（１００）重重結晶、 基板温度二６５０℃、 反応時間二８時間、 の条件で膜厚・２μｓの薄膜を形成し、引続いてこの薄
膜に、酸素ガス気流中、温度：９１Ｏ℃に１時間保持の
条件で焼鈍を施すことによって、第１表に示される成分
組成を有し、かつ超電導セラミックスの素地に、遊離Ｃ
ｕＯおよび遊離ＢａＯのうちのいずれか、あるいは両方
が分布した組織を有する本発明超電導薄膜１〜９をそれ
ぞれ形成した。
また、比較の目的で、ターゲツト材の製造時にＣｕＯ粉
末およびＢａＯ粉末を配合しない以外は同一の条件で、
すなわち遊離ＣｕＯおよび遊離ＢａＯが存在せず、超電
導セラミックスのみからなる従来超電導薄膜１〜５をそ
れぞれ形成した。
つぎに、この結果得られた各種の超電導薄膜について、
割れ発生の有無を観察し、さらに臨界電流値（Ｊ　ｃ）
と臨界温度（Ｔｃ）を測定し、第１表に示した。
〔発明の効果〕
第１表に示される結果から明らかなように、本発明超電
導薄膜１〜９は、いずれもすぐれた超電導特性を示し、
かつ遊離ＣｕＯおよび遊離ＢａＯの存在によって割れの
発生が皆無であるのに対して、従来超電導薄膜１〜５に
おいては、いずれも割れが発生しており、実用に供する
ことができないものであった。
上述のように、この発明の超電導薄膜は、すぐれた超電
導特性を保持した状態で、焼鈍後に割れ発生がなく、生
産歩留の向上に寄与するところ大なるものである。

Claims (1)

    【特許請求の範囲】
  1. （１）超電導セラミックスの素地に、遊離Ｃｕ酸化物お
    よび遊離Ｂａ酸化物のうちのいずれか、あるいは両方を
    ０．１〜８容量％の割合で分散分布せしめてなる超電導
    薄膜。
JP63071633A 1988-03-25 1988-03-25 超電導薄膜 Pending JPH01246107A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP63071633A JPH01246107A (ja) 1988-03-25 1988-03-25 超電導薄膜
EP89105239A EP0334352B1 (en) 1988-03-25 1989-03-23 Superconductive Strip containing internal stressabsorber
DE68915592T DE68915592T2 (de) 1988-03-25 1989-03-23 Supraleitender Streifen mit internem Stressabsorber.
KR1019890003741A KR950001764B1 (ko) 1988-03-25 1989-03-24 초전도박막
US07/328,653 US4929597A (en) 1988-03-25 1989-03-27 Superconductor containing internal stress absorber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63071633A JPH01246107A (ja) 1988-03-25 1988-03-25 超電導薄膜

Publications (1)

Publication Number Publication Date
JPH01246107A true JPH01246107A (ja) 1989-10-02

Family

ID=13466248

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63071633A Pending JPH01246107A (ja) 1988-03-25 1988-03-25 超電導薄膜

Country Status (5)

Country Link
US (1) US4929597A (ja)
EP (1) EP0334352B1 (ja)
JP (1) JPH01246107A (ja)
KR (1) KR950001764B1 (ja)
DE (1) DE68915592T2 (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5170930A (en) * 1991-11-14 1992-12-15 Microelectronics And Computer Technology Corporation Liquid metal paste for thermal and electrical connections
US5445308A (en) * 1993-03-29 1995-08-29 Nelson; Richard D. Thermally conductive connection with matrix material and randomly dispersed filler containing liquid metal
US5328087A (en) * 1993-03-29 1994-07-12 Microelectronics And Computer Technology Corporation Thermally and electrically conductive adhesive material and method of bonding with same
JP3881732B2 (ja) * 1996-10-16 2007-02-14 財団法人国際超電導産業技術研究センター 酸化物超電導体複合体の製造方法
US6866128B2 (en) * 2003-02-20 2005-03-15 Bellsouth Intellectual Property Corporation Retractable anti-static devices and methods of using same

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60181964A (ja) * 1984-02-29 1985-09-17 Fujitsu Ltd 精算データ集計装置
JPS6198660A (ja) * 1984-10-12 1986-05-16 M K Seikou Kk 洗車場システム

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4952554A (en) * 1987-04-01 1990-08-28 At&T Bell Laboratories Apparatus and systems comprising a clad superconductive oxide body, and method for producing such body
EP0301689B1 (en) * 1987-07-27 1993-09-29 Ovonic Synthetic Materials Company, Inc. Method of stabilizing high tc superconducting material and the material so stabilized

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60181964A (ja) * 1984-02-29 1985-09-17 Fujitsu Ltd 精算データ集計装置
JPS6198660A (ja) * 1984-10-12 1986-05-16 M K Seikou Kk 洗車場システム

Also Published As

Publication number Publication date
DE68915592D1 (de) 1994-07-07
KR950001764B1 (ko) 1995-02-28
EP0334352B1 (en) 1994-06-01
DE68915592T2 (de) 1994-09-15
EP0334352A3 (en) 1989-11-29
US4929597A (en) 1990-05-29
EP0334352A2 (en) 1989-09-27
KR890015438A (ko) 1989-10-30

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