JP7389543B2 - 窒化物半導体装置 - Google Patents
窒化物半導体装置 Download PDFInfo
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- JP7389543B2 JP7389543B2 JP2018070733A JP2018070733A JP7389543B2 JP 7389543 B2 JP7389543 B2 JP 7389543B2 JP 2018070733 A JP2018070733 A JP 2018070733A JP 2018070733 A JP2018070733 A JP 2018070733A JP 7389543 B2 JP7389543 B2 JP 7389543B2
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- nitride semiconductor
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- 239000004065 semiconductor Substances 0.000 title claims description 100
- 150000004767 nitrides Chemical class 0.000 title claims description 98
- 238000005468 ion implantation Methods 0.000 claims description 158
- 239000002019 doping agent Substances 0.000 claims description 53
- 239000013078 crystal Substances 0.000 claims description 52
- 230000007547 defect Effects 0.000 claims description 50
- 229910021478 group 5 element Inorganic materials 0.000 claims description 36
- 230000015556 catabolic process Effects 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 23
- 230000002093 peripheral effect Effects 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- 239000000758 substrate Substances 0.000 description 17
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 16
- 150000002500 ions Chemical class 0.000 description 12
- 229910052757 nitrogen Inorganic materials 0.000 description 10
- 230000001133 acceleration Effects 0.000 description 9
- 238000000137 annealing Methods 0.000 description 9
- 238000003917 TEM image Methods 0.000 description 8
- 230000001681 protective effect Effects 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 4
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000001004 secondary ion mass spectrometry Methods 0.000 description 4
- 239000007943 implant Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 2
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000002248 hydride vapour-phase epitaxy Methods 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 229910001425 magnesium ion Inorganic materials 0.000 description 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 238000000851 scanning transmission electron micrograph Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
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Description
特許文献1 特開2003-124515号公報
非特許文献1 Takuya Oikawa, Yusuke Saijo, Shigeki Kato, Tomoyoshi Mishima, and Tohru Nakamura, "Formation of definite GaN p-n junction by Mg-ion implantation to n--GaN epitaxial layers grown on a high-quality free-standing GaN substrate," Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 15 December 2015, Volume 365, Part A, Pages 168-170.
V族元素を多段でイオン注入する段階とを含んでよい。
Claims (10)
- エピタキシャル層と、
前記エピタキシャル層上にP型のドーパントおよびV族元素をイオン注入することで形成され、深さ方向に200nm以上連続して設けられ、1×1017cm-3以上であるP型のドーピング濃度を有するイオン注入層と
を備え、
前記イオン注入層は、前記エピタキシャル層と前記イオン注入層との界面から上面側に200nm以内の範囲に結晶欠陥が1×1016cm-3以下である領域を有し、
前記エピタキシャル層がN型を有し、
前記エピタキシャル層をN型領域とし、前記イオン注入層をP型領域とするPN接合を備え、
前記PN接合の耐圧が600V以上である
窒化物半導体装置。 - 前記イオン注入層は、1×1018cm-3以上であるP型のドーピング濃度を有する
請求項1に記載の窒化物半導体装置。 - 前記イオン注入層は、前記エピタキシャル層と前記イオン注入層との界面から上面側に100nm以内の範囲に結晶欠陥が1×1015cm-3以下である領域を有する
請求項1又は2に記載の窒化物半導体装置。 - 前記イオン注入層は、深さ方向にP型のドーパントのドーピング濃度が均一な領域を有する
請求項1から3のいずれか一項に記載の窒化物半導体装置。 - 前記イオン注入層をダイオードのP型領域とするPNダイオードである
請求項1から4のいずれか一項に記載の窒化物半導体装置。 - 前記イオン注入層をP型のウェル領域とする縦型GaNMOSFETである
請求項1から4のいずれか一項に記載の窒化物半導体装置。 - 前記イオン注入層を周辺耐圧構造のP型領域とした縦型GaNパワーデバイスである
請求項1から4のいずれか一項に記載の窒化物半導体装置。 - エピタキシャル層を形成する段階と、
前記エピタキシャル層上にP型のドーパントおよびV族元素をイオン注入して、前記エピタキシャル層上において、深さ方向に200nm以上連続して設けられ、1×1017cm-3以上のドーピング濃度を有するP型のイオン注入層を形成する段階と、
を備え、
前記イオン注入層は、前記エピタキシャル層と前記イオン注入層との界面から上面側に200nm以内の範囲に結晶欠陥が1×1016cm-3以下である領域を有し、
前記エピタキシャル層がN型を有し、
前記エピタキシャル層をN型領域とし、前記イオン注入層をP型領域とするPN接合を備え、
前記PN接合の耐圧が600V以上である
窒化物半導体装置の製造方法。 - 前記イオン注入層を形成する段階は、
P型のドーパントを多段でイオン注入する段階と、
V族元素を多段でイオン注入する段階と
を含む
請求項8に記載の窒化物半導体装置の製造方法。 - 前記イオン注入層を形成する段階は、Mg、Ca、ZnおよびBeの少なくとも1つをイオン注入する段階を含む
請求項8又は9に記載の窒化物半導体装置の製造方法。
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