JP7308831B2 - Ledダイの汚染を防止する方法 - Google Patents
Ledダイの汚染を防止する方法 Download PDFInfo
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- JP7308831B2 JP7308831B2 JP2020532779A JP2020532779A JP7308831B2 JP 7308831 B2 JP7308831 B2 JP 7308831B2 JP 2020532779 A JP2020532779 A JP 2020532779A JP 2020532779 A JP2020532779 A JP 2020532779A JP 7308831 B2 JP7308831 B2 JP 7308831B2
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- Prior art keywords
- layer
- barrier layer
- metal contact
- reflective
- led die
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- 238000000034 method Methods 0.000 title claims description 73
- 238000011109 contamination Methods 0.000 title description 15
- 229910052751 metal Inorganic materials 0.000 claims description 73
- 239000002184 metal Substances 0.000 claims description 73
- 230000004888 barrier function Effects 0.000 claims description 65
- 238000000151 deposition Methods 0.000 claims description 42
- 229920002120 photoresistant polymer Polymers 0.000 claims description 31
- 239000000463 material Substances 0.000 claims description 19
- 230000003746 surface roughness Effects 0.000 claims description 7
- 238000000059 patterning Methods 0.000 claims description 5
- 229910052709 silver Inorganic materials 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- 229910052790 beryllium Inorganic materials 0.000 claims description 2
- HZXMRANICFIONG-UHFFFAOYSA-N gallium phosphide Chemical compound [Ga]#P HZXMRANICFIONG-UHFFFAOYSA-N 0.000 claims description 2
- 238000007788 roughening Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 description 178
- 239000010408 film Substances 0.000 description 42
- 230000008569 process Effects 0.000 description 19
- 230000008021 deposition Effects 0.000 description 18
- 238000005530 etching Methods 0.000 description 11
- 238000012876 topography Methods 0.000 description 11
- 230000001681 protective effect Effects 0.000 description 9
- 230000004907 flux Effects 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000000407 epitaxy Methods 0.000 description 6
- 230000009467 reduction Effects 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 238000000137 annealing Methods 0.000 description 4
- 238000013461 design Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 229910005540 GaP Inorganic materials 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000005538 encapsulation Methods 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 231100000572 poisoning Toxicity 0.000 description 2
- 230000000607 poisoning effect Effects 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 206010011878 Deafness Diseases 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- AJGDITRVXRPLBY-UHFFFAOYSA-N aluminum indium Chemical compound [Al].[In] AJGDITRVXRPLBY-UHFFFAOYSA-N 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000012864 cross contamination Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 235000013619 trace mineral Nutrition 0.000 description 1
- 239000011573 trace mineral Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/40—Materials therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/44—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the coatings, e.g. passivation layer or anti-reflective coating
- H01L33/46—Reflective coating, e.g. dielectric Bragg reflector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0016—Processes relating to electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0025—Processes relating to coatings
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Led Devices (AREA)
- Electrodes Of Semiconductors (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
Description
この出願は、2017年12月14日に出願された米国非仮出願第15/842,391号、及び2018年1月31日に出願された欧州特許出願第18154461.0号の利益を主張し、それらの内容は、参照によって本明細書に援用される。
Claims (17)
- ウェハを提供するステップであって、
前記ウェハは、エピタキシー層と、該エピタキシー層の上の誘電体層と、該誘電体層内の少なくとも1つのビアと、該少なくとも1つのビア内の金属コンタクトとを含む、
提供するステップと、
前記金属コンタクト及び前記金属コンタクトに隣接する前記誘電体層の部分に亘って障壁層を堆積させるステップと、
前記誘電体層及び前記障壁層の表面全体に亘って反射層を堆積させるステップと、を含む、
方法。 - 前記反射層は、前記反射層の側縁が前記障壁層の側縁に直接的に当接するように堆積させられる、請求項1に記載の方法。
- 前記反射層の粗面化された表面が46.0nm~50.0nmの間の表面粗さを有するように、前記反射層を粗面化するステップを更に含む、請求項1に記載の方法。
- 前記障壁層を堆積させるステップは、
前記少なくとも1つのビアに隣接しない領域において前記誘電体層の上にフォトレジスト層をパターン化させるステップと、
前記金属コンタクト、前記誘電体層及び前記フォトレジスト層の露出させられた部分に亘って前記障壁層を堆積させるステップと、
前記フォトレジスト層及び前記フォトレジスト層をオーバーレイする前記障壁層の領域を除去するステップと、を含む、
請求項1に記載の方法。 - 前記フォトレジスト層及び前記障壁層の前記領域を除去するステップは、前記フォトレジスト層及び前記障壁層の前記領域のリフトオフを行うステップを含む、請求項4に記載の方法。
- 前記金属コンタクト及び前記金属コンタクトに隣接する前記誘電体層の前記部分に亘って前記障壁層を堆積させる前に前記金属コンタクトの上に別の障壁層を堆積させるステップを更に含む、請求項1に記載の方法。
- エピタキシャル層と、
該エピタキシャル層に亘る誘電体層であって、少なくとも1つのビアを確定する誘電体層と、
前記少なくとも1つのビア内の金属コンタクトと、
該金属コンタクト及び該金属コンタクトに隣接する前記誘電体層の部分に亘る障壁層と、
前記誘電体層及び前記障壁層の全表面に亘る反射層と、を含む、
デバイス。 - 前記反射層の側縁が、前記障壁層の側縁に直接的に当接する、請求項7に記載のデバイス。
- 前記反射層は、隣接する金属コンタクトの間の領域において前記誘電体層と接触する、請求項7に記載のデバイス。
- 前記金属コンタクトは、金ベリリウム(AuBe)化合物を含む、請求項7に記載のデバイス。
- 前記反射層の頂面が、46.0nm~50.0nmの間の表面粗さを有する、請求項7に記載のデバイス。
- 前記金属コンタクトと前記障壁層との間に別の障壁層を更に含む、請求項7に記載のデバイス。
- 前記反射層は、Ag及びAlのうちの1つを含む、請求項7に記載のデバイス。
- 当該デバイスは、発光ダイオード(LED)デバイスである、請求項7に記載のデバイス。
- 当該デバイスは、発光ダイオード(LED)デバイスのウェハである、請求項7に記載のデバイス。
- 前記エピタキシャル層は、少なくとも1つのリン化ガリウム(GaP)材料を含む、請求項7に記載のデバイス。
- 前記反射層は、前記障壁層と直接的に接触する、請求項7に記載のデバイス。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15/842,391 US10522708B2 (en) | 2017-12-14 | 2017-12-14 | Method of preventing contamination of LED die |
US15/842,391 | 2017-12-14 | ||
EP18154461 | 2018-01-31 | ||
EP18154461.0 | 2018-01-31 | ||
PCT/US2018/065404 WO2019118695A1 (en) | 2017-12-14 | 2018-12-13 | Method of preventing contamination of led die |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2021507516A JP2021507516A (ja) | 2021-02-22 |
JP7308831B2 true JP7308831B2 (ja) | 2023-07-14 |
Family
ID=64901120
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020532779A Active JP7308831B2 (ja) | 2017-12-14 | 2018-12-13 | Ledダイの汚染を防止する方法 |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP3724931B1 (ja) |
JP (1) | JP7308831B2 (ja) |
KR (1) | KR102375792B1 (ja) |
CN (1) | CN111684611B (ja) |
TW (2) | TWI824147B (ja) |
WO (1) | WO2019118695A1 (ja) |
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2018
- 2018-12-13 KR KR1020207020163A patent/KR102375792B1/ko active IP Right Grant
- 2018-12-13 JP JP2020532779A patent/JP7308831B2/ja active Active
- 2018-12-13 EP EP18826905.4A patent/EP3724931B1/en active Active
- 2018-12-13 CN CN201880089499.4A patent/CN111684611B/zh active Active
- 2018-12-13 WO PCT/US2018/065404 patent/WO2019118695A1/en unknown
- 2018-12-14 TW TW109116050A patent/TWI824147B/zh active
- 2018-12-14 TW TW107145195A patent/TWI696299B/zh active
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Also Published As
Publication number | Publication date |
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JP2021507516A (ja) | 2021-02-22 |
EP3724931B1 (en) | 2023-02-15 |
CN111684611B (zh) | 2024-02-06 |
TW202040837A (zh) | 2020-11-01 |
WO2019118695A1 (en) | 2019-06-20 |
CN111684611A (zh) | 2020-09-18 |
TW201937752A (zh) | 2019-09-16 |
TWI824147B (zh) | 2023-12-01 |
TWI696299B (zh) | 2020-06-11 |
EP3724931A1 (en) | 2020-10-21 |
KR102375792B1 (ko) | 2022-03-17 |
KR20200090919A (ko) | 2020-07-29 |
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