JP7244476B2 - 希土類異方性ボンド磁性粉の作製方法 - Google Patents
希土類異方性ボンド磁性粉の作製方法 Download PDFInfo
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Description
(1)RTBH(ここで、前記RはNd又はPr/Ndであり、TはFeを含有する遷移金属である)を主成分とする原料粉末を作製するステップと、
(2)前記原料粉末にLa/Ce水素化物及び銅粉を加えて、混合物を作製するステップと、
(3)前記混合物を拡散熱処理して、希土類異方性ボンド磁性粉を得るステップと、
を含む希土類異方性ボンド磁性粉の作製方法を提供する。
(1)RTBH(ここで、前記RはNd又はPr/Ndであり、TはFeを含有する遷移金属である)を主成分とする原料粉末を作製するステップと、
(2)前記原料粉末にLa/Ce水素化物及び銅粉を加えて、混合物を作製するステップと、
(3)前記混合物を雰囲気拡散熱処理して、希土類異方性ボンド磁性粉を得るステップと、
を含む希土類異方性ボンド磁性粉の作製方法を提供する。
b.低速脱水素再結合段階:水素吸蔵不均化段階の終了後、炉内温度を800-900℃に維持し、炉内水素ガス圧を1-10kPaに調整し、10-60分間保温・保圧して低速脱水素再結合段階の処理を完了する。
c.完全脱水素段階:低速脱水素再結合段階の終了後、水素ガス圧を1Pa以下まで急速に真空引きして、完全脱水素段階を完了する。
d.冷却段階:完全脱水素段階の終了後、室温まで冷却し、RTBHを主成分とする原料粉末を得る。
粒度分布試験のパラメーターは、PSA-レーザ粒度分析計により測定され、
保磁力のパラメーターは、磁気性能測定計により測定され、
最大磁気エネルギー積は、磁気性能測定計により測定され、
残留磁気は、磁気性能測定計により測定される。
NdFeBHを主成分とする原料粉末は、以下のステップを有するHDDR法で作製されたものである。
PrNdFeBHを主成分とする原料粉末は、以下のステップを有するHDDR法で作製されたものである。
希土類異方性ボンド磁性粉の作製方法は、以下のステップを含む。
希土類異方性ボンド磁性粉の作製方法は、以下のステップを含む。
希土類異方性ボンド磁性粉の作製方法は、以下のステップを含む。
5.0wt%のLa/Ce水素化物及び5.0wt%の銅粉を加えて混合物を作製したこと以外は、実施例4の方法に従って、希土類異方性ボンド磁性粉を作製した。
4.0wt%のLa/Ce水素化物及び2.0wt%の銅粉を加えて混合物を作製したこと以外は、実施例4の方法に従って、希土類異方性ボンド磁性粉を作製した。
実施例3で作製された希土類異方性ボンド磁性粉と化学組成が完全に同一の希土類合金を用いて、実施例1の方法に従って希土類異方性ボンド磁性粉を作製した。
実施例4で作製された希土類異方性ボンド磁性粉と化学組成が完全に同一の希土類合金を用いて、実施例1の方法に従って希土類異方性ボンド磁性粉を作製した。
実施例5で作製された希土類異方性ボンド磁性粉と化学組成が完全に同一である希土類合金を用いて、実施例1の方法に従って希土類異方性ボンド磁性粉を作製した。
実施例1-2で作製されたRTBHを主成分とする原料粉末の平均粒度D50、保磁力、最大磁気エネルギー積、及び残留磁気をそれぞれ試験し、その結果を表1に示す。実施例3-8及び比較例1-3で作製された希土類異方性ボンド磁性粉の平均粒度D50、保磁力、最大磁気エネルギー積、及び残留磁気をそれぞれ試験し、その結果を表1に示す。試験中、磁性粉を磁場に配向させる必要があり、その配向が完全であることを確保するために、配向磁場は30kOe以上であり、この場合、磁性粉の磁化容易方向が外部磁場の方向に沿って平行に配列した。
上述したように、本発明は、保磁力を高めながらコストを低減できる希土類異方性ボンド磁性粉の作製方法を保護することを目的とする。
Claims (13)
- RTBHを主成分とする原料粉末を作製し、ここで、前記RはPrとNd、又はNdであり、TはFeを含有する遷移金属である、ステップ1と、
前記原料粉末にLa又はCeの水素化物及び銅粉を添加して、混合物を作製するステップ2と、
前記混合物を雰囲気拡散熱処理して、希土類異方性ボンド磁性粉を得るステップ3と、
を含むことを特徴とする、希土類異方性ボンド磁性粉の作製方法。 - ステップ1では、前記原料粉末の平均粒度D50がdであり、80μm≦d≦120μmであることを特徴とする、請求項1に記載の作製方法。
- ステップ1では、前記Rの含有量に占める原料粉末の重量割合は28.9wt%以下であることを特徴とする、請求項1に記載の作製方法。
- ステップ2では、前記添加するLaまたはCeの水素化物に占める原料粉末の重量割合は5wt%以下であることを特徴とする、請求項1に記載の作製方法。
- ステップ2では、前記添加する銅粉に占めるLaまたはCeの水素化物の重量割合がtであり、25wt%≦t≦100wt%であることを特徴とする、請求項1に記載の作製方法。
- ステップ2では、前記銅粉の平均粒度D50は10μm未満であることを特徴とする、請求項1に記載の作製方法。
- ステップ3では、前記雰囲気拡散熱処理は水素含有雰囲気での熱処理又は真空熱処理を含むことを特徴とする、請求項1~6のいずれか1項に記載の作製方法。
- 前記水素含有雰囲気での熱処理の条件は、水素ガス圧≦1kPa、焼鈍温度がT2であり、700℃≦T2≦900℃、焼鈍時間がt1であり、20min≦t1≦180minであることを特徴とする、請求項7に記載の作製方法。
- 前記真空熱処理の条件は、真空度≦5Pa、焼鈍温度がT2であり、700℃≦T2≦900℃、焼鈍時間がt1であり、20min≦t1≦180minであることを特徴とする、請求項7に記載の作製方法。
- ステップ3では、前記希土類異方性ボンド磁性粉の平均粒度D50がDであり、80μm≦D≦120μmであることを特徴とする、請求項1~6のいずれか1項に記載の作製方法。
- ステップ3では、前記希土類異方性ボンド磁性粉は粒界相及びR2T14B磁性相の結晶粒を含むことを特徴とする、請求項1~6のいずれか1項に記載の作製方法。
- 前記粒界相中のLaの含有量とR2T14B磁性相中のLaの含有量との比率は5より大きく、前記粒界相中のCeの含有量とR2T14B磁性相中のCeの含有量との比率は5より大きいことを特徴とする、請求項11に記載の作製方法。
- 前記粒界相中のCuの含有量とR2T14B磁性相中のCuの含有量との比率は10より大きいことを特徴とする、請求項11に記載の作製方法。
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