JP7118558B2 - 被加工物の加工方法 - Google Patents
被加工物の加工方法 Download PDFInfo
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- JP7118558B2 JP7118558B2 JP2019005776A JP2019005776A JP7118558B2 JP 7118558 B2 JP7118558 B2 JP 7118558B2 JP 2019005776 A JP2019005776 A JP 2019005776A JP 2019005776 A JP2019005776 A JP 2019005776A JP 7118558 B2 JP7118558 B2 JP 7118558B2
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- JP
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- Prior art keywords
- grinding
- workpiece
- processing
- grinding wheel
- wheel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000003672 processing method Methods 0.000 title description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 53
- 238000000034 method Methods 0.000 claims description 21
- 230000001681 protective effect Effects 0.000 claims description 17
- 239000006061 abrasive grain Substances 0.000 claims description 15
- 230000007246 mechanism Effects 0.000 description 28
- 238000004140 cleaning Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 230000007723 transport mechanism Effects 0.000 description 2
- 201000004569 Blindness Diseases 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/0023—Other grinding machines or devices grinding machines with a plurality of working posts
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/0076—Other grinding machines or devices grinding machines comprising two or more grinding tools
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/005—Feeding or manipulating devices specially adapted to grinding machines
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
- B24B55/06—Dust extraction equipment on grinding or polishing machines
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/10—Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
Description
4 :基台
4a :開口
6 :搬送機構
8a :カセット
8b :カセット
10a :カセットテーブル
10b :カセットテーブル
12 :位置調整機構
14 :搬入機構
16 :ターンテーブル
18 :チャックテーブル
18a :保持面
20 :支持構造
22 :Z軸移動機構
24 :Z軸ガイドレール
26 :Z軸移動プレート
28 :Z軸ボールネジ
30 :Z軸パルスモータ
32 :固定具
34 :研削ユニット(加工ユニット)
36 :スピンドルハウジング
38 :スピンドル
40 :マウント
42a :研削ホイール
42b :研削ホイール
44a :ホイール基台
44b :ホイール基台
46a :研削砥石
46b :研削砥石
48 :研削水供給用ノズル
50 :搬出機構
52 :洗浄機構
11 :被加工物
11a :表面
11b :裏面
13 :分割予定ライン(ストリート)
15 :デバイス
21 :保護部材
21a :表面
21b :裏面
31 :研削水
Claims (4)
- 板状の被加工物を加工する際に用いられる被加工物の加工方法であって、
該被加工物の表面側に保護部材を貼着する保護部材貼着ステップと、
該被加工物の該表面側とは反対側の裏面側が露出するように、該保護部材を介して該被加工物の該表面側をチャックテーブルの保持面で保持する保持ステップと、
該チャックテーブルに保持された該被加工物の該裏面側に研削水供給用ノズルから研削水を供給しながら、砥粒を含む研削砥石が固定された研削ホイールを回転させて該研削砥石を該被加工物の該裏面側に接触させることで、該被加工物の該裏面側を研削して該被加工物を薄くする研削ステップと、
該研削ステップの後、該研削水供給用ノズルからの該研削水の供給を停止した状態で、該研削ホイールを回転させて該研削砥石を該被加工物の該裏面側に接触させることで、該被加工物又は該研削砥石を処理する処理ステップと、を備えることを特徴とする被加工物の加工方法。 - 該処理ステップでは、該被加工物の該裏面側の平坦性を高めることを特徴とする請求項1に記載の被加工物の加工方法。
- 該処理ステップでは、該研削砥石の性能を回復させることを特徴とする請求項1に記載の被加工物の加工方法。
- 該研削ステップの前に、該研削砥石に含まれる該砥粒よりも大きな砥粒を含む粗研削用の研削砥石を用いて該被加工物の該裏面側を研削する粗研削ステップを更に備えることを特徴とする請求項1から請求項3のいずれかに記載の被加工物の加工方法。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019005776A JP7118558B2 (ja) | 2019-01-17 | 2019-01-17 | 被加工物の加工方法 |
KR1020190172781A KR20200089600A (ko) | 2019-01-17 | 2019-12-23 | 피가공물의 가공 방법 |
SG10201913343PA SG10201913343PA (en) | 2019-01-17 | 2019-12-26 | Method of processing workpiece |
CN202010030425.2A CN111438580B (zh) | 2019-01-17 | 2020-01-13 | 被加工物的加工方法 |
TW109101299A TWI834798B (zh) | 2019-01-17 | 2020-01-15 | 被加工物的加工方法 |
US16/743,269 US11471991B2 (en) | 2019-01-17 | 2020-01-15 | Method of processing workpiece |
DE102020200540.0A DE102020200540A1 (de) | 2019-01-17 | 2020-01-17 | Verfahren zum bearbeiten eines werkstücks |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019005776A JP7118558B2 (ja) | 2019-01-17 | 2019-01-17 | 被加工物の加工方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2020110906A JP2020110906A (ja) | 2020-07-27 |
JP7118558B2 true JP7118558B2 (ja) | 2022-08-16 |
Family
ID=71402706
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019005776A Active JP7118558B2 (ja) | 2019-01-17 | 2019-01-17 | 被加工物の加工方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US11471991B2 (ja) |
JP (1) | JP7118558B2 (ja) |
KR (1) | KR20200089600A (ja) |
CN (1) | CN111438580B (ja) |
DE (1) | DE102020200540A1 (ja) |
SG (1) | SG10201913343PA (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP4144480B1 (de) * | 2021-09-01 | 2024-01-31 | Siltronic AG | Verfahren zum schleifen von halbleiterscheiben |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007173487A (ja) | 2005-12-21 | 2007-07-05 | Disco Abrasive Syst Ltd | ウエーハの加工方法および装置 |
JP2012151412A (ja) | 2011-01-21 | 2012-08-09 | Disco Abrasive Syst Ltd | 硬質基板の研削方法 |
JP2017181111A (ja) | 2016-03-28 | 2017-10-05 | 株式会社ディスコ | 被加工物の評価方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100550491B1 (ko) * | 2003-05-06 | 2006-02-09 | 스미토모덴키고교가부시키가이샤 | 질화물 반도체 기판 및 질화물 반도체 기판의 가공 방법 |
JP4464113B2 (ja) * | 2003-11-27 | 2010-05-19 | 株式会社ディスコ | ウエーハの加工装置 |
JP2007235069A (ja) * | 2006-03-03 | 2007-09-13 | Tokyo Seimitsu Co Ltd | ウェーハ加工方法 |
JP5406676B2 (ja) | 2009-11-10 | 2014-02-05 | 株式会社ディスコ | ウエーハの加工装置 |
JP6425505B2 (ja) * | 2014-11-17 | 2018-11-21 | 株式会社ディスコ | 被加工物の研削方法 |
JP2017056522A (ja) * | 2015-09-17 | 2017-03-23 | 株式会社ディスコ | 研削ホイール及び研削方法 |
JP6792363B2 (ja) * | 2016-07-22 | 2020-11-25 | 株式会社ディスコ | 研削装置 |
JP6856335B2 (ja) * | 2016-09-06 | 2021-04-07 | 株式会社ディスコ | 加工装置 |
JP6732382B2 (ja) * | 2016-10-12 | 2020-07-29 | 株式会社ディスコ | 加工装置及び被加工物の加工方法 |
-
2019
- 2019-01-17 JP JP2019005776A patent/JP7118558B2/ja active Active
- 2019-12-23 KR KR1020190172781A patent/KR20200089600A/ko not_active Application Discontinuation
- 2019-12-26 SG SG10201913343PA patent/SG10201913343PA/en unknown
-
2020
- 2020-01-13 CN CN202010030425.2A patent/CN111438580B/zh active Active
- 2020-01-15 US US16/743,269 patent/US11471991B2/en active Active
- 2020-01-17 DE DE102020200540.0A patent/DE102020200540A1/de active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007173487A (ja) | 2005-12-21 | 2007-07-05 | Disco Abrasive Syst Ltd | ウエーハの加工方法および装置 |
JP2012151412A (ja) | 2011-01-21 | 2012-08-09 | Disco Abrasive Syst Ltd | 硬質基板の研削方法 |
JP2017181111A (ja) | 2016-03-28 | 2017-10-05 | 株式会社ディスコ | 被加工物の評価方法 |
Also Published As
Publication number | Publication date |
---|---|
JP2020110906A (ja) | 2020-07-27 |
US20200230773A1 (en) | 2020-07-23 |
KR20200089600A (ko) | 2020-07-27 |
DE102020200540A1 (de) | 2020-07-23 |
CN111438580A (zh) | 2020-07-24 |
TW202042967A (zh) | 2020-12-01 |
US11471991B2 (en) | 2022-10-18 |
SG10201913343PA (en) | 2020-08-28 |
CN111438580B (zh) | 2023-09-19 |
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