JP7096850B2 - レーザパルス繰返し周波数逓倍器 - Google Patents
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- H01S2301/00—Functional characteristics
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
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Description
Claims (10)
- 入力レーザパルスを受け取り、前記入力レーザパルスのパルス繰返し周波数の少なくとも2倍である出力パルス繰返し周波数を有する出力パルスを生成するためのレーザパルス繰返し周波数逓倍器であって、
第一および第二の曲面ミラーと、第一および第二のビームスプリッタと、光学キャビティを形成する少なくとも2つの折曲ミラーと、前記光学キャビティの外部に位置する直角プリズムと、を含むヘリオットセルを備え、
前記ヘリオットセルは、前記入力レーザパルスの各々が部分的に、前記光学キャビティ内部の第一のキャビティループに沿って送られ、次に、前記直角プリズムに到達し、さらに前記光学キャビティ内部の第二のキャビティループに沿って運ばれて、前記生成された出力パルスの1つとして前記光学キャビティから出射するように構成され、
前記第一及び第二の曲面ミラーは共通の曲率半径を有し、前記曲率半径と実質的に等しい距離だけ離隔されている、
ことを特徴とするレーザパルス繰返し周波数逓倍器。 - 請求項1に記載のレーザパルス繰返し周波数逓倍器において、
前記ヘリオットセルは、前記出力パルス繰返し周波数が、当初の入力レーザパルスの繰返し周波数の4倍であるように構成されることを特徴とするレーザパルス繰返し周波数逓倍器。 - 請求項1に記載のレーザパルス繰返し周波数逓倍器において、
前記ヘリオットセルは、前記入力レーザパルスの各々の少なくとも一部が、前記第一のキャビティループ上では前記第一および第二の曲面ミラーの第一部分によって反射されるように、前記第一のビームスプリッタによって方向づけられ、前記第二のキャビティループ上では前記第一および第二の曲面ミラーの第二部分によって反射されるように、前記第二のビームスプリッタによって方向づけられるように構成され、
前記ヘリオットセルが、前記第一のキャビティループに配置されたプリズムをさらに備え、
前記プリズム、前記少なくとも2つの折曲ミラー、および前記直角プリズムのうちの1つが、前記第一のキャビティループから出たレーザパルスを前記第二のキャビティループ内に逸らすように構成される、
ことを特徴とするレーザパルス繰返し周波数逓倍器。 - 請求項3に記載のレーザパルス繰返し周波数逓倍器において、
前記ヘリオットセルは、前記第一のキャビティループが、前記第二のキャビティループとは異なる平面内にあるように構成されることを特徴とするレーザパルス繰返し周波数逓倍器。 - 請求項4に記載のレーザパルス繰返し周波数逓倍器において、
前記第一のビームスプリッタが前記入力レーザパルスを受け取り、前記入力レーザパルスの各々のエネルギーの約3分の2を前記第一のキャビティループ内に反射することを特徴とするレーザパルス繰返し周波数逓倍器。 - 請求項1に記載のレーザパルス繰返し周波数逓倍器において、
前記第二のビームスプリッタが、約3分の1の反射率を有することを特徴とするレーザパルス繰返し周波数逓倍器。 - 請求項1に記載のレーザパルス繰返し周波数逓倍器において、
前記ヘリオットセルは、
前記入力レーザパルスの各々が前記第一のビームスプリッタに方向づけられ、
前記第一のビームスプリッタが、前記各々の入力レーザパルスの少なくとも第一の部分を、該第一の部分が前記第一のキャビティループ上では第一の平面において前記第一および第二の曲面ミラーによって反射され、その後、前記直角プリズムに向けられるように方向づけるように構成され、
前記直角プリズムが、前記第一の部分を前記第二のビームスプリッタに向けなおすように構成され、
前記第二のビームスプリッタが、前記第一の部分の各々の少なくとも第二の部分を、該第二の部分が前記第二のキャビティループ上では前記第一の平面とは異なる第二の平面において前記第一および第二の曲面ミラーによって反射されるように構成される、
ように構成されることを特徴とするレーザパルス繰返し周波数逓倍器。 - 請求項1に記載のレーザパルス繰返し周波数逓倍器において、
前記ヘリオットセルが、前記第一のビームスプリッタとともに第一の平面に配置されたビーム補償器およびプリズムのいずれかをさらに備え、
前記第二のビームスプリッタと前記少なくとも2つの折曲ミラーとが第二の平面に配置されている、
ことを特徴とするレーザパルス繰返し周波数逓倍器。 - 入力レーザパルスを受け取り、前記入力レーザパルスのパルス繰返し周波数の少なくとも2倍の出力パルス繰返し周波数を有する出力パルスを生成するための繰返し周波数逓倍器において、前記繰返し周波数逓倍器は、
少なくとも1つのビームスプリッタと、リングキャビティを形成する2つの光反射素子とを含み、
前記少なくとも1つのビームスプリッタは、各入力レーザパルスの第一のエネルギー部分を、該第一のエネルギー部分が第一の時間に前記繰返し周波数逓倍器を出るように方向付けるように構成され、かつ、前記入力レーザパルスの第二のエネルギー部分を、該第二のエネルギー部分が前記2つの光反射素子の間で反射されて第二の時間に前記繰返し周波数逓倍器を出るように、前記リングキャビティへと方向付けるように構成され、
前記2つの光反射素子が、第一の曲面ミラーと第二の曲面ミラーとを含み、
前記少なくとも1つのビームスプリッタが、
前記第一及び第二のエネルギー部分を前記リングキャビティに方向付けるように構成された第一のビームスプリッタと、
前記入力レーザパルスの各々の前記第二のエネルギー部分を、該第二のエネルギー部分が、前記2つの光反射素子の間を少なくとも一度横切った後、前記繰返し周波数逓倍器から出るように方向付けるように構成された第二のビームスプリッタと、
を備え、
前記繰返し周波数逓倍器が、さらに、
前記リングキャビティに配置されたプリズムと、
前記リングキャビティに配置された少なくとも2つの折曲ミラーと、
前記リングキャビティの外部に位置する直角プリズムと、
を備え、
前記第一のビームスプリッタと前記プリズムとが、前記入力レーザパルスの各々の第一のエネルギー部分が前記リングキャビティ内部の第一のキャビティループに沿って送られるように構成され、
前記第二のビームスプリッタと前記少なくとも2つの折曲ミラーとが、前記入力レーザパルスの各々の第二のエネルギー部分が前記リングキャビティ内部の第二のキャビティループに沿って送られるように構成され、
前記直角プリズムが、前記第一のキャビティループを離れる前記第一のエネルギー部分を前記第二のキャビティループに方向付けるように構成される、
ことを特徴とするレーザパルス繰返し周波数逓倍器。 - 請求項9に記載のレーザパルス繰返し周波数逓倍器において、
前記第一のビームスプリッタは、前記入力レーザパルスの各々の前記第一のエネルギー部分を、該第一のエネルギー部分が、前記第一のキャビティループ上では第一の平面において前記第一および第二の曲面ミラーによって反射されるように方向づけるように構成され、
前記直角プリズムが、前記第一のキャビティループを離れる前記第一のエネルギー部分を前記第二のビームスプリッタに方向付けるように構成され、
前記第二のビームスプリッタが、前記第二のエネルギー部分を、該第二のエネルギー部分が、前記第二のキャビティループ上では、前記第一の平面とは異なる第二の平面において前記第一および第二の曲面ミラーによって反射されるように方向づけるように構成される、
ことを特徴とするレーザパルス繰返し周波数逓倍器。
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US201462015016P | 2014-06-20 | 2014-06-20 | |
US62/015,016 | 2014-06-20 | ||
US201462038471P | 2014-08-18 | 2014-08-18 | |
US62/038,471 | 2014-08-18 | ||
US14/596,738 US9525265B2 (en) | 2014-06-20 | 2015-01-14 | Laser repetition rate multiplier and flat-top beam profile generators using mirrors and/or prisms |
US14/596,738 | 2015-01-14 |
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US9525265B2 (en) * | 2014-06-20 | 2016-12-20 | Kla-Tencor Corporation | Laser repetition rate multiplier and flat-top beam profile generators using mirrors and/or prisms |
US9748729B2 (en) | 2014-10-03 | 2017-08-29 | Kla-Tencor Corporation | 183NM laser and inspection system |
CN104319615B (zh) * | 2014-11-02 | 2017-12-26 | 中国科学院光电技术研究所 | 一种基于双分束元件的准分子激光脉冲展宽装置 |
CN105932531B (zh) * | 2016-05-31 | 2018-08-21 | 中国科学院高能物理研究所 | 高重复频率激光脉冲生成和延迟时间校准方法 |
US10175555B2 (en) | 2017-01-03 | 2019-01-08 | KLA—Tencor Corporation | 183 nm CW laser and inspection system |
CN107966424B (zh) * | 2017-11-02 | 2020-06-30 | 浙江大学 | 一种基于反望远***和自由曲面反射的侧向成像方法及装置 |
CN111163941A (zh) * | 2017-11-23 | 2020-05-15 | 普罗科技有限公司 | 印刷电子***用激光装置及其工作方法 |
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