JP7047642B2 - 隔壁形成用感光性組成物、隔壁および表示素子 - Google Patents

隔壁形成用感光性組成物、隔壁および表示素子 Download PDF

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Publication number
JP7047642B2
JP7047642B2 JP2018132147A JP2018132147A JP7047642B2 JP 7047642 B2 JP7047642 B2 JP 7047642B2 JP 2018132147 A JP2018132147 A JP 2018132147A JP 2018132147 A JP2018132147 A JP 2018132147A JP 7047642 B2 JP7047642 B2 JP 7047642B2
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partition wall
mass
alkali
soluble resin
group
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Japanese (ja)
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JP2019046790A (ja
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康伸 鈴木
銘峰 蔡
克銘 盧
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JSR Corp
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JSR Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Electroluminescent Light Sources (AREA)
JP2018132147A 2017-09-05 2018-07-12 隔壁形成用感光性組成物、隔壁および表示素子 Ceased JP7047642B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017170609 2017-09-05
JP2017170609 2017-09-05

Publications (2)

Publication Number Publication Date
JP2019046790A JP2019046790A (ja) 2019-03-22
JP7047642B2 true JP7047642B2 (ja) 2022-04-05

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ID=65762093

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JP2018132147A Ceased JP7047642B2 (ja) 2017-09-05 2018-07-12 隔壁形成用感光性組成物、隔壁および表示素子

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Country Link
JP (1) JP7047642B2 (ko)
KR (1) KR20190026569A (ko)
TW (1) TW201912763A (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102624898B1 (ko) * 2018-07-05 2024-01-16 도레이 카부시키가이샤 수지 조성물, 차광막, 차광막의 제조 방법 및 격벽 구비 기판
JP7202283B2 (ja) * 2019-12-23 2023-01-11 株式会社タムラ製作所 感光性樹脂組成物
TWI732580B (zh) 2020-06-03 2021-07-01 新應材股份有限公司 感光性樹脂組成物、隔壁、光轉換層以及光發射裝置
TWI767248B (zh) 2020-06-10 2022-06-11 新應材股份有限公司 白色感光性樹脂組成物、白色隔壁、光轉換層以及光發射裝置
WO2024034384A1 (ja) * 2022-08-08 2024-02-15 ダウ・東レ株式会社 共変性分岐状オルガノポリシロキサン、それを含む高エネルギー線硬化性組成物およびその用途
CN115678558B (zh) * 2022-10-25 2023-08-29 昆明理工大学 掺杂镱铒稀土离子手性卤氧化铋及其制备方法

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001302870A (ja) 2000-04-25 2001-10-31 Jsr Corp Ｅｌ表示素子の隔壁形成用感放射線性樹脂組成物、隔壁およびｅｌ表示素子
WO2008133312A1 (ja) 2007-04-25 2008-11-06 Asahi Glass Company, Limited 感光性組成物、隔壁、ブラックマトリックス、カラーフィルタの製造方法
WO2010134550A1 (ja) 2009-05-20 2010-11-25 旭硝子株式会社 光学素子の製造方法
WO2012147626A1 (ja) 2011-04-28 2012-11-01 旭硝子株式会社 ネガ型感光性樹脂組成物、硬化膜、隔壁およびブラックマトリックスとその製造方法、カラーフィルタならびに有機ｅｌ素子
JP2012220860A (ja) 2011-04-13 2012-11-12 Daikin Ind Ltd ポジ型撥液レジスト組成物
WO2014084190A1 (ja) 2012-11-27 2014-06-05 富士フイルム株式会社 光硬化性組成物、転写材料、硬化物及びその製造方法、樹脂パターン製造方法、硬化膜、液晶表示装置、有機ｅｌ表示装置並びにタッチパネル表示装置
JP2014197525A (ja) 2013-03-06 2014-10-16 株式会社リコー 有機発光素子
JP2015008036A (ja) 2011-10-31 2015-01-15 シャープ株式会社 有機発光素子
WO2015012228A1 (ja) 2013-07-25 2015-01-29 東レ株式会社 タッチパネル用ネガ型感光性白色組成物、タッチパネル及びタッチパネルの製造方法
JP2015028619A (ja) 2013-07-30 2015-02-12 東友ファインケム株式会社 ディスプレイ装置の前面遮光層形成用感光性樹脂組成物
WO2016063943A1 (ja) 2014-10-24 2016-04-28 旭硝子株式会社 隔壁用硬化性組成物、隔壁、隔壁の製造方法、隔壁の修復方法、修復された隔壁、および光学素子

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6293914B2 (ja) 2014-09-30 2018-03-14 株式会社東芝 Ｌｅｄモジュール及び照明装置
KR102054030B1 (ko) * 2015-10-19 2020-01-08 주식회사 엘지화학 수지 조성물 및 이를 이용하여 제조된 블랙뱅크를 포함하는 디스플레이 장치

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001302870A (ja) 2000-04-25 2001-10-31 Jsr Corp Ｅｌ表示素子の隔壁形成用感放射線性樹脂組成物、隔壁およびｅｌ表示素子
WO2008133312A1 (ja) 2007-04-25 2008-11-06 Asahi Glass Company, Limited 感光性組成物、隔壁、ブラックマトリックス、カラーフィルタの製造方法
WO2010134550A1 (ja) 2009-05-20 2010-11-25 旭硝子株式会社 光学素子の製造方法
JP2012220860A (ja) 2011-04-13 2012-11-12 Daikin Ind Ltd ポジ型撥液レジスト組成物
WO2012147626A1 (ja) 2011-04-28 2012-11-01 旭硝子株式会社 ネガ型感光性樹脂組成物、硬化膜、隔壁およびブラックマトリックスとその製造方法、カラーフィルタならびに有機ｅｌ素子
JP2015008036A (ja) 2011-10-31 2015-01-15 シャープ株式会社 有機発光素子
WO2014084190A1 (ja) 2012-11-27 2014-06-05 富士フイルム株式会社 光硬化性組成物、転写材料、硬化物及びその製造方法、樹脂パターン製造方法、硬化膜、液晶表示装置、有機ｅｌ表示装置並びにタッチパネル表示装置
JP2014197525A (ja) 2013-03-06 2014-10-16 株式会社リコー 有機発光素子
WO2015012228A1 (ja) 2013-07-25 2015-01-29 東レ株式会社 タッチパネル用ネガ型感光性白色組成物、タッチパネル及びタッチパネルの製造方法
JP2015028619A (ja) 2013-07-30 2015-02-12 東友ファインケム株式会社 ディスプレイ装置の前面遮光層形成用感光性樹脂組成物
WO2016063943A1 (ja) 2014-10-24 2016-04-28 旭硝子株式会社 隔壁用硬化性組成物、隔壁、隔壁の製造方法、隔壁の修復方法、修復された隔壁、および光学素子

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TW201912763A (zh) 2019-04-01
KR20190026569A (ko) 2019-03-13
JP2019046790A (ja) 2019-03-22

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