JP7001987B2 - ガラス基板 - Google Patents
ガラス基板 Download PDFInfo
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- JP7001987B2 JP7001987B2 JP2017109939A JP2017109939A JP7001987B2 JP 7001987 B2 JP7001987 B2 JP 7001987B2 JP 2017109939 A JP2017109939 A JP 2017109939A JP 2017109939 A JP2017109939 A JP 2017109939A JP 7001987 B2 JP7001987 B2 JP 7001987B2
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- 239000011521 glass Substances 0.000 title claims description 139
- 239000000758 substrate Substances 0.000 title claims description 87
- 239000000203 mixture Substances 0.000 claims description 19
- 238000000465 moulding Methods 0.000 claims description 10
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 9
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 8
- 238000010583 slow cooling Methods 0.000 claims description 7
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 6
- 229910052796 boron Inorganic materials 0.000 claims description 4
- 229910052785 arsenic Inorganic materials 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 description 42
- 239000006060 molten glass Substances 0.000 description 24
- 238000000034 method Methods 0.000 description 23
- 230000007423 decrease Effects 0.000 description 17
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 16
- 238000002844 melting Methods 0.000 description 14
- 230000008018 melting Effects 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 238000002485 combustion reaction Methods 0.000 description 10
- 239000013078 crystal Substances 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 10
- 238000004031 devitrification Methods 0.000 description 9
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 8
- 238000007500 overflow downdraw method Methods 0.000 description 8
- 229910052760 oxygen Inorganic materials 0.000 description 8
- 229910052697 platinum Inorganic materials 0.000 description 8
- 239000002994 raw material Substances 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 239000006066 glass batch Substances 0.000 description 7
- 239000007791 liquid phase Substances 0.000 description 7
- 229910006404 SnO 2 Inorganic materials 0.000 description 6
- 229910052708 sodium Inorganic materials 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 3
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 3
- 238000005352 clarification Methods 0.000 description 3
- 239000008395 clarifying agent Substances 0.000 description 3
- 239000002274 desiccant Substances 0.000 description 3
- 239000002803 fossil fuel Substances 0.000 description 3
- 239000000446 fuel Substances 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 239000011733 molybdenum Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 2
- 239000002390 adhesive tape Substances 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- 239000011449 brick Substances 0.000 description 2
- 239000006059 cover glass Substances 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000011819 refractory material Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 229910018967 Pt—Rh Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 229910052661 anorthite Inorganic materials 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- GWWPLLOVYSCJIO-UHFFFAOYSA-N dialuminum;calcium;disilicate Chemical compound [Al+3].[Al+3].[Ca+2].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-] GWWPLLOVYSCJIO-UHFFFAOYSA-N 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000295 fuel oil Substances 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910001631 strontium chloride Inorganic materials 0.000 description 1
- AHBGXTDRMVNFER-UHFFFAOYSA-L strontium dichloride Chemical compound [Cl-].[Cl-].[Sr+2] AHBGXTDRMVNFER-UHFFFAOYSA-L 0.000 description 1
- 229910052917 strontium silicate Inorganic materials 0.000 description 1
- QSQXISIULMTHLV-UHFFFAOYSA-N strontium;dioxido(oxo)silane Chemical compound [Sr+2].[O-][Si]([O-])=O QSQXISIULMTHLV-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B17/00—Forming molten glass by flowing-out, pushing-out, extruding or drawing downwardly or laterally from forming slits or by overflowing over lips
- C03B17/06—Forming glass sheets
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/02—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture in electric furnaces, e.g. by dielectric heating
- C03B5/027—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture in electric furnaces, e.g. by dielectric heating by passing an electric current between electrodes immersed in the glass bath, i.e. by direct resistance heating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K77/00—Constructional details of devices covered by this subclass and not covered by groups H10K10/80, H10K30/80, H10K50/80 or H10K59/80
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/42—Details of construction of furnace walls, e.g. to prevent corrosion; Use of materials for furnace walls
- C03B5/43—Use of materials for furnace walls, e.g. fire-bricks
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Geochemistry & Mineralogy (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Electrochemistry (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Glass Compositions (AREA)
- Electroluminescent Light Sources (AREA)
- Surface Treatment Of Glass (AREA)
Description
(1)薄型のガラス基板の生産性が高いこと、特に溶融性や清澄性が高いこと。
(2)LTPS・TFTや酸化物TFTの作製には、従来のアモルファスSi・TFTに比べて、熱処理温度が高温になる。よって、ガラス基板の熱収縮を低減するために、従来よりも耐熱性が高いこと。
Logη500 = 0.167×Ps-0.015×Ta-0.062×Ts-18.5
Ps:歪点(℃)
Ta:徐冷点(℃)
Ts:軟化点(℃)
A値 = Logη500 - [β―OH値(mm-1)] × [B2O3(質量%)]
β-OH値 = (1/X)log(T1/T2)
X:板厚(mm)
T1:参照波長3846cm-1における透過率(%)
T2:水酸基吸収波長3600cm-1付近における最小透過率(%)
Claims (10)
- ガラス組成中のAl 2 O 3 の含有量が18~22質量%、ROの含有量(MgO、CaO、SrO及びBaOの合量)が14~20質量%であり、
高温粘度102.5ポアズにおける温度が1650℃以下であり、
下記式で算出される500℃における推定粘度Logη500が26.0以上であり、
且つ下記式で算出されるA値が25.0以上であることを特徴とするガラス基板。
Logη500 = 0.167×Ps-0.015×Ta-0.062×Ts-18.5
Ps:歪点(℃)
Ta:徐冷点(℃)
Ts:軟化点(℃)
A値 = Logη500 - [β-OH値(mm-1)] × [B2O3(質量%)] - 上記式で算出されるA値が30.0~40.0であることを特徴とする請求項1に記載のガラス基板。
- β-OH値が0.20/mm以下であることを特徴とする請求項1又は2に記載のガラス基板。
- β-OH値が0.15/mm以下であることを特徴とする請求項1~3の何れかに記載のガラス基板。
- B2O3の含有量が2.0質量%未満であることを特徴とする請求項1~4に記載のガラス基板。
- ガラス組成として、質量%で、SiO2 55~65%、Al2O3 18~22%、B2O3 0~1%、Li2O+Na2O+K2O 0~0.1%未満、RO(MgO、CaO、SrO及びBaOの合量) 14~20%、MgO 1~6%、CaO 2~8%、SrO 0~2%、BaO 4~13%、As2O3 0~0.010%未満、Sb2O3 0~0.010%未満を含有することを特徴とする請求項1~5の何れかに記載のガラス基板。
- ガラス組成中のFe2O3の含有量が0.010質量%以下であることを特徴とする請求項1~6の何れかに記載のガラス基板。
- 液相温度が1300℃以下であることを特徴とする請求項1~7の何れかに記載のガラス基板。
- 板厚中央部に成形合流面を有することを特徴とする請求項1~8の何れかに記載のガラス基板。
- 有機ELデバイスの基板に用いることを特徴とする請求項1~9の何れかに記載のガラス基板。
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020197027046A KR20190139210A (ko) | 2017-04-27 | 2018-04-12 | 유리 기판 |
CN202210983759.0A CN115259660A (zh) | 2017-04-27 | 2018-04-12 | 玻璃基板 |
CN201880023944.7A CN110494402B (zh) | 2017-04-27 | 2018-04-12 | 玻璃基板 |
US16/607,393 US11427496B2 (en) | 2017-04-27 | 2018-04-12 | Glass substrate |
PCT/JP2018/015429 WO2018198804A1 (ja) | 2017-04-27 | 2018-04-12 | ガラス基板 |
TW107112916A TWI697462B (zh) | 2017-04-27 | 2018-04-16 | 玻璃基板與有機電致發光器件用基板 |
JP2021181818A JP7226508B2 (ja) | 2017-04-27 | 2021-11-08 | ガラス基板 |
US17/869,032 US20220363585A1 (en) | 2017-04-27 | 2022-07-20 | Glass substrate |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017087804 | 2017-04-27 | ||
JP2017087804 | 2017-04-27 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021181818A Division JP7226508B2 (ja) | 2017-04-27 | 2021-11-08 | ガラス基板 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018184332A JP2018184332A (ja) | 2018-11-22 |
JP7001987B2 true JP7001987B2 (ja) | 2022-01-20 |
Family
ID=64355426
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017109939A Active JP7001987B2 (ja) | 2017-04-27 | 2017-06-02 | ガラス基板 |
Country Status (5)
Country | Link |
---|---|
US (1) | US11427496B2 (ja) |
JP (1) | JP7001987B2 (ja) |
KR (1) | KR20190139210A (ja) |
CN (1) | CN110494402B (ja) |
TW (1) | TWI697462B (ja) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015056645A1 (ja) | 2013-10-17 | 2015-04-23 | 日本電気硝子株式会社 | 無アルカリガラス |
JP2016113361A (ja) | 2014-12-12 | 2016-06-23 | 日本電気硝子株式会社 | 無アルカリガラス |
WO2017122576A1 (ja) | 2016-01-12 | 2017-07-20 | 日本電気硝子株式会社 | ガラス |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101037988B1 (ko) * | 2006-05-25 | 2011-05-30 | 니폰 덴키 가라스 가부시키가이샤 | 무알칼리 유리 및 무알칼리 유리 기판 |
EP2639205B1 (en) * | 2010-11-08 | 2019-03-06 | Nippon Electric Glass Co., Ltd. | Alkali-free glass |
WO2013005401A1 (ja) * | 2011-07-01 | 2013-01-10 | AvanStrate株式会社 | フラットパネルディスプレイ用ガラス基板およびその製造方法 |
TWI469945B (zh) * | 2011-07-01 | 2015-01-21 | Avanstrate Inc | 平面顯示器用玻璃基板及其製造方法 |
CN107406302A (zh) | 2015-05-18 | 2017-11-28 | 日本电气硝子株式会社 | 无碱玻璃基板 |
JP6852962B2 (ja) * | 2015-06-02 | 2021-03-31 | 日本電気硝子株式会社 | ガラス |
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2017
- 2017-06-02 JP JP2017109939A patent/JP7001987B2/ja active Active
-
2018
- 2018-04-12 US US16/607,393 patent/US11427496B2/en active Active
- 2018-04-12 CN CN201880023944.7A patent/CN110494402B/zh active Active
- 2018-04-12 KR KR1020197027046A patent/KR20190139210A/ko not_active IP Right Cessation
- 2018-04-16 TW TW107112916A patent/TWI697462B/zh active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015056645A1 (ja) | 2013-10-17 | 2015-04-23 | 日本電気硝子株式会社 | 無アルカリガラス |
CN105452182A (zh) | 2013-10-17 | 2016-03-30 | 日本电气硝子株式会社 | 无碱玻璃 |
JP2016113361A (ja) | 2014-12-12 | 2016-06-23 | 日本電気硝子株式会社 | 無アルカリガラス |
WO2017122576A1 (ja) | 2016-01-12 | 2017-07-20 | 日本電気硝子株式会社 | ガラス |
Also Published As
Publication number | Publication date |
---|---|
JP2018184332A (ja) | 2018-11-22 |
KR20190139210A (ko) | 2019-12-17 |
TWI697462B (zh) | 2020-07-01 |
CN110494402B (zh) | 2022-09-06 |
US11427496B2 (en) | 2022-08-30 |
TW201843119A (zh) | 2018-12-16 |
CN110494402A (zh) | 2019-11-22 |
US20200131075A1 (en) | 2020-04-30 |
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