JP6897906B2 - 化合物、これを含む色材組成物およびこれを含む樹脂組成物 - Google Patents

化合物、これを含む色材組成物およびこれを含む樹脂組成物 Download PDF

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JP6897906B2
JP6897906B2 JP2019557750A JP2019557750A JP6897906B2 JP 6897906 B2 JP6897906 B2 JP 6897906B2 JP 2019557750 A JP2019557750 A JP 2019557750A JP 2019557750 A JP2019557750 A JP 2019557750A JP 6897906 B2 JP6897906 B2 JP 6897906B2
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JP2020517791A (ja
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パク、ジョンホ
チョイ、サンガ
リー、ダミ
ジン ヤン、スン
ジン ヤン、スン
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エルジー・ケム・リミテッド
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D215/00—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems
    • C07D215/02—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom
    • C07D215/16—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D215/20—Oxygen atoms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2019557750A 2018-02-26 2019-02-01 化合物、これを含む色材組成物およびこれを含む樹脂組成物 Active JP6897906B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR1020180023013A KR102237127B1 (ko) 2018-02-26 2018-02-26 화합물, 이를 포함하는 색재 조성물 및 이를 포함하는 수지 조성물
KR10-2018-0023013 2018-02-26
PCT/KR2019/001440 WO2019164157A1 (ko) 2018-02-26 2019-02-01 화합물, 이를 포함하는 색재 조성물 및 이를 포함하는 수지 조성물

Publications (2)

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JP2020517791A JP2020517791A (ja) 2020-06-18
JP6897906B2 true JP6897906B2 (ja) 2021-07-07

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JP2019557750A Active JP6897906B2 (ja) 2018-02-26 2019-02-01 化合物、これを含む色材組成物およびこれを含む樹脂組成物

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JP (1) JP6897906B2 (ko)
KR (1) KR102237127B1 (ko)
CN (1) CN110546139B (ko)
WO (1) WO2019164157A1 (ko)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4266094A1 (en) 2020-12-16 2023-10-25 FUJIFILM Corporation Composition, membrane, optical filter, solid image pickup element, image display apparatus, and infrared ray sensor
EP4266093A1 (en) 2020-12-17 2023-10-25 FUJIFILM Corporation Composition, film, optical filter, solid-state imaging element, image display device, and infrared sensor

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06145146A (ja) * 1992-11-06 1994-05-24 Chisso Corp オキシネイト誘導体
KR20010009058A (ko) 1999-07-07 2001-02-05 성재갑 감광성 수지 조성물
JP5037265B2 (ja) * 2004-10-06 2012-09-26 オリヱント化学工業株式会社 着色樹脂組成物及び配合着色剤
CN104777714B (zh) * 2014-01-14 2020-04-17 三星Sdi株式会社 感光性树脂组合物和使用其的滤色片
KR101688011B1 (ko) * 2014-01-14 2016-12-20 제일모직주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
JP6145146B2 (ja) * 2015-09-28 2017-06-07 ヤマハ発動機株式会社 鞍乗型電動車両
JP6737111B2 (ja) * 2015-09-29 2020-08-05 三菱ケミカル株式会社 キノフタロン系化合物、キノフタロン系化合物を含むインク及び該インクを含むディスプレイ
TWI682924B (zh) * 2015-11-24 2020-01-21 南韓商Ｌｇ化學股份有限公司 化合物、含有其的彩色組成物、樹脂組成物、感光性材料、彩色濾光片及顯示器裝置
JP6720675B2 (ja) * 2016-04-27 2020-07-08 東洋インキＳｃホールディングス株式会社 キノフタロン化合物、該キノフタロン化合物を用いた顔料分散剤、カラーフィルタ用着色組成物及びカラーフィルタ
JP6862706B2 (ja) * 2016-07-27 2021-04-21 東洋インキＳｃホールディングス株式会社 固体撮像素子用緑色着色組成物および固体撮像素子用カラーフィルタ
KR102131992B1 (ko) * 2017-04-13 2020-07-08 주식회사 엘지화학 화합물 및 이를 포함한 감광성 수지 조성물

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Publication number Publication date
KR102237127B1 (ko) 2021-04-06
KR20190102531A (ko) 2019-09-04
CN110546139A (zh) 2019-12-06
WO2019164157A1 (ko) 2019-08-29
JP2020517791A (ja) 2020-06-18
CN110546139B (zh) 2023-05-09

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