JP6641242B2 - 蒸着装置及び蒸発源 - Google Patents
蒸着装置及び蒸発源 Download PDFInfo
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- JP6641242B2 JP6641242B2 JP2016133685A JP2016133685A JP6641242B2 JP 6641242 B2 JP6641242 B2 JP 6641242B2 JP 2016133685 A JP2016133685 A JP 2016133685A JP 2016133685 A JP2016133685 A JP 2016133685A JP 6641242 B2 JP6641242 B2 JP 6641242B2
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- 238000001704 evaporation Methods 0.000 title claims description 141
- 230000008020 evaporation Effects 0.000 title claims description 108
- 239000000463 material Substances 0.000 claims description 35
- 230000002093 peripheral effect Effects 0.000 claims description 26
- 238000007740 vapor deposition Methods 0.000 claims description 19
- 238000009792 diffusion process Methods 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 14
- 238000001816 cooling Methods 0.000 claims description 11
- 230000008021 deposition Effects 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 6
- 238000007599 discharging Methods 0.000 claims description 3
- 230000004308 accommodation Effects 0.000 claims description 2
- 239000010408 film Substances 0.000 description 23
- 239000002245 particle Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000009825 accumulation Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/225—Oblique incidence of vaporised material on substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Description
M2=L2÷sinθ
M3=M2−M1
例えば、L2が40mm、θが40°の場合、M1は25.7mm、M2は62.2mm、M3は36.5mmとなる。
2a・2b 蒸発口部
3 蒸発源周辺部材
4 拡散部
5 材料収容部
6 ヒータ
7 リフレクタ
8 水冷板
9 防着板
Claims (14)
- 成膜材料が収容される容器と、前記容器の長手方向に沿って設けられる複数の蒸発口部と、前記容器の周囲に設けられる蒸発源周辺部材とを有する蒸発源を備え、前記蒸発口部から前記成膜材料を放出することで、基板上に蒸着膜を形成するように構成した蒸着装置であって、前記蒸発源周辺部材は、前記容器を加熱するヒータ、前記容器からの熱を反射するリフレクタ、前記容器の周囲に設けられる水冷板若しくは前記容器を囲む防着板であり、前記複数の蒸発口部のうち最も外側に設けられた一対の外側蒸発口部は、夫々前記容器の長手方向外側に向くように傾斜する開口端面を有し、前記容器及び前記蒸発源周辺部材が、前記開口端面を含む仮想平面より外側に突出せず前記仮想平面の内側に収まるように構成されていることを特徴とする蒸着装置。
- 前記容器には蒸発した前記成膜材料が拡散する拡散部が設けられ、この拡散部の容器の長手方向における幅は前記蒸発口部の配設幅より狭い幅に設定されていることを特徴とする請求項1に記載の蒸着装置。
- 前記外側蒸発口部を除くいずれかの蒸発口部は前記容器の長手方向外側に向くように傾斜する開口端面を有し、前記外側蒸発口部の開口端面の傾斜角度が最も大きくなるように設定されていることを特徴とする請求項1,2のいずれか1項に記載の蒸着装置。
- 前記蒸発口部の開口端面の傾斜角度は、これより内側の蒸発口部の開口端面の傾斜角度以上の角度に設定されていることを特徴とする請求項1〜3のいずれか1項に記載の蒸着装置。
- 前記外側蒸発口部の開口端面の傾斜角度は30°〜45°に設定されていることを特徴とする請求項1〜4のいずれか1項に記載の蒸着装置。
- 前記容器は、材料収容部と拡散部とで構成されていることを特徴とする請求項1〜5のいずれか1項に記載の蒸着装置。
- 前記材料収容部の幅は前記拡散部の幅より広い幅に設定されていることを特徴とする請求項6に記載の蒸着装置。
- 成膜材料が収容される容器と、前記容器の長手方向に沿って設けられる複数の蒸発口部と、前記容器の周囲に設けられる蒸発源周辺部材とを有する蒸発源であって、前記蒸発源周辺部材は、前記容器を加熱するヒータ、前記容器からの熱を反射するリフレクタ、前記容器の周囲に設けられる水冷板若しくは前記容器を囲む防着板であり、前記複数の蒸発口部のうち最も外側に設けられた一対の外側蒸発口部は、夫々前記容器の長手方向外側に向くように傾斜する開口端面を有し、前記容器及び前記蒸発源周辺部材が、前記開口端面を含む仮想平面より外側に突出せず前記仮想平面の内側に収まるように構成されていることを特徴とする蒸発源。
- 前記容器には蒸発した前記成膜材料が拡散する拡散部が設けられ、この拡散部の容器の長手方向における幅は前記蒸発口部の配設幅より狭い幅に設定されていることを特徴とする請求項8に記載の蒸発源。
- 前記外側蒸発口部を除くいずれかの蒸発口部は前記容器の長手方向外側に向くように傾斜する開口端面を有し、前記外側蒸発口部の開口端面の傾斜角度が最も大きくなるように設定されていることを特徴とする請求項8,9のいずれか1項に記載の蒸発源。
- 前記蒸発口部の開口端面の傾斜角度は、これより内側の蒸発口部の開口端面の傾斜角度以上の角度に設定されていることを特徴とする請求項8〜10のいずれか1項に記載の蒸発源。
- 前記外側蒸発口部の開口端面の傾斜角度は30°〜45°に設定されていることを特徴とする請求項8〜11のいずれか1項に記載の蒸発源。
- 前記容器は、材料収容部と拡散部とで構成されていることを特徴とする請求項8〜12のいずれか1項に記載の蒸発源。
- 前記材料収容部の幅は前記拡散部の幅より広い幅に設定されていることを特徴とする請求項13に記載の蒸発源。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016133685A JP6641242B2 (ja) | 2016-07-05 | 2016-07-05 | 蒸着装置及び蒸発源 |
KR1020170084996A KR102182869B1 (ko) | 2016-07-05 | 2017-07-04 | 증착 장치 및 증발원 |
CN201710539978.9A CN107574411B (zh) | 2016-07-05 | 2017-07-05 | 蒸镀装置及蒸发源 |
CN202110723236.8A CN113416930A (zh) | 2016-07-05 | 2017-07-05 | 蒸发源及成膜装置 |
KR1020200154533A KR102279411B1 (ko) | 2016-07-05 | 2020-11-18 | 증착 장치 및 증발원 |
KR1020210091561A KR102458193B1 (ko) | 2016-07-05 | 2021-07-13 | 증착 장치 및 증발원 |
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JP2016133685A JP6641242B2 (ja) | 2016-07-05 | 2016-07-05 | 蒸着装置及び蒸発源 |
Publications (3)
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JP2018003122A JP2018003122A (ja) | 2018-01-11 |
JP2018003122A5 JP2018003122A5 (ja) | 2019-02-07 |
JP6641242B2 true JP6641242B2 (ja) | 2020-02-05 |
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JP (1) | JP6641242B2 (ja) |
KR (3) | KR102182869B1 (ja) |
CN (2) | CN113416930A (ja) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
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JP6686069B2 (ja) * | 2018-05-29 | 2020-04-22 | キヤノントッキ株式会社 | 蒸発源装置、蒸着装置、および蒸着システム |
JP7179635B2 (ja) * | 2019-02-12 | 2022-11-29 | 株式会社アルバック | 蒸着源、真空処理装置、及び蒸着方法 |
KR20210061639A (ko) * | 2019-11-20 | 2021-05-28 | 캐논 톡키 가부시키가이샤 | 성막 장치, 이를 사용한 성막 방법 및 전자 디바이스 제조 방법 |
CN111378933B (zh) * | 2020-04-27 | 2022-04-26 | 京东方科技集团股份有限公司 | 蒸发源、蒸发源*** |
JP7242626B2 (ja) * | 2020-12-10 | 2023-03-20 | キヤノントッキ株式会社 | 成膜装置 |
JP7372288B2 (ja) | 2021-07-15 | 2023-10-31 | キヤノントッキ株式会社 | 成膜装置、成膜方法及び蒸発源 |
KR20230012415A (ko) | 2021-07-15 | 2023-01-26 | 캐논 톡키 가부시키가이샤 | 성막 장치, 성막 방법 및 증발원 유닛 |
JP7291197B2 (ja) * | 2021-07-15 | 2023-06-14 | キヤノントッキ株式会社 | 成膜装置、成膜方法及び蒸発源ユニット |
JP7509809B2 (ja) | 2022-01-28 | 2024-07-02 | キヤノントッキ株式会社 | 蒸発源ユニット、成膜装置及び成膜方法 |
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JP2004169066A (ja) * | 2002-11-18 | 2004-06-17 | Sony Corp | 蒸着装置 |
KR100687007B1 (ko) * | 2005-03-22 | 2007-02-26 | 세메스 주식회사 | 유기전계 발광 소자 제조에 사용되는 유기 박박 증착 장치 |
JP2010195034A (ja) * | 2009-02-02 | 2010-09-09 | Ricoh Co Ltd | インクジェット記録装置 |
KR20120061394A (ko) * | 2010-12-03 | 2012-06-13 | 삼성모바일디스플레이주식회사 | 증발원 및 유기물 증착 방법 |
KR20130073407A (ko) * | 2011-12-23 | 2013-07-03 | 주식회사 원익아이피에스 | 외부 가열용기를 포함하는 고온 증발원 |
US9698347B2 (en) * | 2012-08-02 | 2017-07-04 | Joled Inc. | Organic EL display panel and method for manufacturing same |
KR102046440B1 (ko) * | 2012-10-09 | 2019-11-20 | 삼성디스플레이 주식회사 | 증착 장치 및 이를 이용한 유기 발광 표시장치의 제조방법 |
KR102046441B1 (ko) * | 2012-10-12 | 2019-11-20 | 삼성디스플레이 주식회사 | 증착 장치 및 이를 이용한 유기 발광 표시장치의 제조방법 |
CN104099571A (zh) * | 2013-04-01 | 2014-10-15 | 上海和辉光电有限公司 | 蒸发源组件和薄膜沉积装置和薄膜沉积方法 |
CN104099570B (zh) * | 2013-04-01 | 2016-10-05 | 上海和辉光电有限公司 | 单点线性蒸发源*** |
KR101599505B1 (ko) * | 2014-01-07 | 2016-03-03 | 주식회사 선익시스템 | 증착장치용 증발원 |
CN105177507B (zh) * | 2015-09-08 | 2017-08-11 | 京东方科技集团股份有限公司 | 蒸镀坩埚及蒸镀设备 |
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2016
- 2016-07-05 JP JP2016133685A patent/JP6641242B2/ja active Active
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2017
- 2017-07-04 KR KR1020170084996A patent/KR102182869B1/ko active IP Right Grant
- 2017-07-05 CN CN202110723236.8A patent/CN113416930A/zh active Pending
- 2017-07-05 CN CN201710539978.9A patent/CN107574411B/zh active Active
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2020
- 2020-11-18 KR KR1020200154533A patent/KR102279411B1/ko active IP Right Grant
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2021
- 2021-07-13 KR KR1020210091561A patent/KR102458193B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
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KR20210090600A (ko) | 2021-07-20 |
KR20180005129A (ko) | 2018-01-15 |
KR102458193B1 (ko) | 2022-10-25 |
KR102182869B1 (ko) | 2020-11-25 |
KR102279411B1 (ko) | 2021-07-19 |
KR20200132814A (ko) | 2020-11-25 |
CN113416930A (zh) | 2021-09-21 |
CN107574411A (zh) | 2018-01-12 |
CN107574411B (zh) | 2021-06-29 |
JP2018003122A (ja) | 2018-01-11 |
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