JP6559151B2 - 表面保護用シート - Google Patents
表面保護用シート Download PDFInfo
- Publication number
- JP6559151B2 JP6559151B2 JP2016555258A JP2016555258A JP6559151B2 JP 6559151 B2 JP6559151 B2 JP 6559151B2 JP 2016555258 A JP2016555258 A JP 2016555258A JP 2016555258 A JP2016555258 A JP 2016555258A JP 6559151 B2 JP6559151 B2 JP 6559151B2
- Authority
- JP
- Japan
- Prior art keywords
- sheet
- surface protection
- adhesive
- wafer
- curable resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000001070 adhesive effect Effects 0.000 claims description 99
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- 239000010410 layer Substances 0.000 claims description 34
- 238000000034 method Methods 0.000 claims description 30
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- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 53
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- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 3
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- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
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- 229910003437 indium oxide Inorganic materials 0.000 description 1
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- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
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- OVHHHVAVHBHXAK-UHFFFAOYSA-N n,n-diethylprop-2-enamide Chemical compound CCN(CC)C(=O)C=C OVHHHVAVHBHXAK-UHFFFAOYSA-N 0.000 description 1
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- RXOHFPCZGPKIRD-UHFFFAOYSA-N naphthalene-2,6-dicarboxylic acid Chemical compound C1=C(C(O)=O)C=CC2=CC(C(=O)O)=CC=C21 RXOHFPCZGPKIRD-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
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- XKLJHFLUAHKGGU-UHFFFAOYSA-N nitrous amide Chemical compound ON=N XKLJHFLUAHKGGU-UHFFFAOYSA-N 0.000 description 1
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- 230000000704 physical effect Effects 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
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- 229920001289 polyvinyl ether Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- XRVCFZPJAHWYTB-UHFFFAOYSA-N prenderol Chemical compound CCC(CC)(CO)CO XRVCFZPJAHWYTB-UHFFFAOYSA-N 0.000 description 1
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- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- HKJYVRJHDIPMQB-UHFFFAOYSA-N propan-1-olate;titanium(4+) Chemical compound CCCO[Ti](OCCC)(OCCC)OCCC HKJYVRJHDIPMQB-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Adhesive Tapes (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Laminated Bodies (AREA)
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JP2014216544 | 2014-10-23 | ||
JP2014216544 | 2014-10-23 | ||
PCT/JP2015/079725 WO2016063917A1 (ja) | 2014-10-23 | 2015-10-21 | 表面保護用シート |
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JPWO2016063917A1 JPWO2016063917A1 (ja) | 2017-08-03 |
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JP (1) | JP6559151B2 (zh) |
TW (1) | TWI688477B (zh) |
WO (1) | WO2016063917A1 (zh) |
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JP6729050B2 (ja) * | 2016-06-22 | 2020-07-22 | 住友ベークライト株式会社 | 半導体素子保護用粘着テープおよび半導体素子保護用粘着テープの製造方法 |
SG11201900617YA (en) | 2016-07-26 | 2019-02-27 | Mitsui Chemicals Tohcello Inc | Method for manufacturing semiconductor device |
JP7055567B2 (ja) * | 2018-06-06 | 2022-04-18 | 株式会社ディスコ | テープ貼着装置 |
JP7317482B2 (ja) * | 2018-10-16 | 2023-07-31 | 株式会社ディスコ | ウエーハの加工方法 |
KR102193721B1 (ko) * | 2019-01-21 | 2020-12-21 | 주식회사 야스 | 점착척의 점착시트 보호 용 커버 필름 |
KR20210128382A (ko) * | 2019-02-26 | 2021-10-26 | 가부시기가이샤 디스코 | 이면 연삭용 점착 시트 및 반도체 웨이퍼의 제조 방법 |
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JP3499957B2 (ja) * | 1995-03-10 | 2004-02-23 | リンテック株式会社 | 帯電防止粘着シート |
JP2001196404A (ja) * | 2000-01-11 | 2001-07-19 | Fujitsu Ltd | 半導体装置及びその製造方法 |
JP4704225B2 (ja) * | 2006-01-30 | 2011-06-15 | 富士フイルム株式会社 | アルバム作成装置、アルバム作成方法、およびアルバム作成プログラム |
JP2007296751A (ja) * | 2006-04-28 | 2007-11-15 | Mitsubishi Plastics Ind Ltd | 樹脂積層体 |
JP2010177542A (ja) * | 2009-01-30 | 2010-08-12 | Lintec Corp | 帯電防止性粘着シート |
JP5788165B2 (ja) * | 2010-11-02 | 2015-09-30 | 三菱樹脂株式会社 | 難燃性樹脂フィルム及びそのフィルムの製造方法 |
JP2012216619A (ja) * | 2011-03-31 | 2012-11-08 | Lintec Corp | 表面保護用シート |
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2015
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- 2015-10-21 JP JP2016555258A patent/JP6559151B2/ja active Active
- 2015-10-22 TW TW104134629A patent/TWI688477B/zh active
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TW201630734A (zh) | 2016-09-01 |
JPWO2016063917A1 (ja) | 2017-08-03 |
TWI688477B (zh) | 2020-03-21 |
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