JP6320309B2 - ペリクル収納容器 - Google Patents
ペリクル収納容器 Download PDFInfo
- Publication number
- JP6320309B2 JP6320309B2 JP2015007461A JP2015007461A JP6320309B2 JP 6320309 B2 JP6320309 B2 JP 6320309B2 JP 2015007461 A JP2015007461 A JP 2015007461A JP 2015007461 A JP2015007461 A JP 2015007461A JP 6320309 B2 JP6320309 B2 JP 6320309B2
- Authority
- JP
- Japan
- Prior art keywords
- pellicle
- storage container
- support means
- frame support
- pellicle frame
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67383—Closed carriers characterised by substrate supports
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Packaging Frangible Articles (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Mechanical Engineering (AREA)
Description
11 ペリクル収納容器本体
12 ペリクルフレーム支持手段
12a 段差部
12b 垂直面
12c テーパ面
13 板状ナット
14 ピン
15 ピン保持手段
16 ボルト
17 蓋体
20 ペリクル
21 ペリクルフレーム
22 マスク粘着層
23 マスク粘着層未塗布領域
24 ペリクル膜接着層
25 ペリクル膜
70 比較例のペリクル収納容器
71 比較例のペリクル収納容器本体
72 比較例のペリクルフレーム支持手段
a、b、c、d、e、f ペリクルフレーム支持手段
w1 ペリクルフレーム支持手段 段差部の長さ
w2 ペリクルフレーム支持手段 段差部の幅
Claims (4)
- マスク粘着層を保護するセパレータを用いない矩形のペリクルを収納するペリクル収納容器本体と、該ペリクル収納容器本体に嵌合して密閉する蓋体とを有するペリクル収納容器であって、前記ペリクル収納容器本体上には、外側が高くなった階段状を成すペリクルフレーム支持手段が設けられ、該ペリクルフレーム支持手段は、収納するペリクルの角部から各辺の全長に対して30%の範囲だけに配置されているとともに、前記階段状のペリクルフレーム支持手段の低い段には、ペリクルフレームのマスク粘着層未塗布領域が支持されることを特徴とするペリクル収納容器。
- 前記ペリクルフレーム支持手段は、収納するペリクルの辺中央部に近いほどペリクルの内側方向に寄せて配置されていることを特徴とする請求項1に記載のペリクル収納容器。
- マスク粘着層を保護するセパレータを用いない矩形のペリクルを収納するペリクル収納容器本体と、該ペリクル収納容器本体に嵌合して密閉する蓋体とを有するペリクル収納容器であって、前記ペリクル収納容器本体上には、外側が高くなった階段状を成すペリクルフレーム支持手段が設けられ、該ペリクルフレーム支持手段は、収納するペリクルの辺中央部に近いほどペリクルの内側方向に寄せて配置されているとともに、前記階段状のペリクルフレーム支持手段の低い段には、ペリクルフレームのマスク粘着層未塗布領域が支持されることを特徴とするペリクル収納容器。
- 前記ペリクルフレーム支持手段は、その表面が収納するペリクルのマスク粘着層に対して離型性を有することを特徴とする請求項1〜3の何れかに記載のペリクル収納容器。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015007461A JP6320309B2 (ja) | 2015-01-19 | 2015-01-19 | ペリクル収納容器 |
KR1020160000305A KR102544490B1 (ko) | 2015-01-19 | 2016-01-04 | 펠리클 수납 용기 |
TW105100860A TWI574100B (zh) | 2015-01-19 | 2016-01-13 | Piege film assembly container |
CN201610022706.7A CN105807560A (zh) | 2015-01-19 | 2016-01-14 | 防尘薄膜组件收纳容器 |
KR1020230075304A KR20230088663A (ko) | 2015-01-19 | 2023-06-13 | 펠리클 수납 용기 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015007461A JP6320309B2 (ja) | 2015-01-19 | 2015-01-19 | ペリクル収納容器 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016133585A JP2016133585A (ja) | 2016-07-25 |
JP6320309B2 true JP6320309B2 (ja) | 2018-05-09 |
Family
ID=56437828
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015007461A Active JP6320309B2 (ja) | 2015-01-19 | 2015-01-19 | ペリクル収納容器 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6320309B2 (ja) |
KR (2) | KR102544490B1 (ja) |
CN (1) | CN105807560A (ja) |
TW (1) | TWI574100B (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102172217B1 (ko) * | 2018-07-31 | 2020-10-30 | 주식회사 시엠테크놀로지 | 펠리클 수납용기 및 이를 이용한 파티클 제거 방법 |
CN213444112U (zh) * | 2019-10-03 | 2021-06-15 | 凸版印刷株式会社 | 蒸镀掩模用盒体 |
TWI767515B (zh) * | 2020-05-14 | 2022-06-11 | 家登精密工業股份有限公司 | 提供有效密封之用於容納基板的容器 |
US20220102177A1 (en) * | 2020-09-30 | 2022-03-31 | Gudeng Precision Industrial Co., Ltd. | Reticle pod with antistatic capability |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4697701A (en) * | 1986-05-30 | 1987-10-06 | Inko Industrial Corporation | Dust free storage container for a membrane assembly such as a pellicle and its method of use |
JPH06208221A (ja) * | 1993-01-12 | 1994-07-26 | Fujitsu Ltd | ペリクルケース |
JP2855044B2 (ja) * | 1993-04-19 | 1999-02-10 | 信越化学工業株式会社 | ペリクル収納容器 |
JP4478558B2 (ja) * | 2004-12-08 | 2010-06-09 | 大日本印刷株式会社 | 大型ペリクルの搬送方法、搬送用治具及びペリクルケース |
JP2007025183A (ja) * | 2005-07-15 | 2007-02-01 | Shin Etsu Polymer Co Ltd | ペリクル用収納容器 |
JP2007047238A (ja) * | 2005-08-08 | 2007-02-22 | Shin Etsu Polymer Co Ltd | ペリクル用収納容器 |
JP4614845B2 (ja) * | 2005-08-11 | 2011-01-19 | 信越ポリマー株式会社 | ペリクル用収納容器 |
JP4955449B2 (ja) * | 2007-05-10 | 2012-06-20 | 信越化学工業株式会社 | ペリクル収納容器 |
JP5051840B2 (ja) * | 2007-11-22 | 2012-10-17 | 信越化学工業株式会社 | ペリクル収納容器内にペリクルを保管する方法 |
JP2011034020A (ja) * | 2009-08-06 | 2011-02-17 | Shin-Etsu Chemical Co Ltd | ペリクル収納容器 |
JP5528190B2 (ja) * | 2010-04-23 | 2014-06-25 | 信越化学工業株式会社 | ペリクル収納容器 |
KR200469200Y1 (ko) * | 2010-05-10 | 2013-09-26 | 아사히 가세이 이-매터리얼즈 가부시키가이샤 | 펠리클 수납 용기 |
JP5684752B2 (ja) * | 2012-03-29 | 2015-03-18 | 信越化学工業株式会社 | ペリクル収納容器 |
JP5864399B2 (ja) * | 2012-10-22 | 2016-02-17 | 信越化学工業株式会社 | ペリクル収納容器 |
-
2015
- 2015-01-19 JP JP2015007461A patent/JP6320309B2/ja active Active
-
2016
- 2016-01-04 KR KR1020160000305A patent/KR102544490B1/ko active IP Right Grant
- 2016-01-13 TW TW105100860A patent/TWI574100B/zh active
- 2016-01-14 CN CN201610022706.7A patent/CN105807560A/zh active Pending
-
2023
- 2023-06-13 KR KR1020230075304A patent/KR20230088663A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
TW201635010A (zh) | 2016-10-01 |
CN105807560A (zh) | 2016-07-27 |
KR20160089276A (ko) | 2016-07-27 |
TWI574100B (zh) | 2017-03-11 |
KR20230088663A (ko) | 2023-06-20 |
KR102544490B1 (ko) | 2023-06-16 |
JP2016133585A (ja) | 2016-07-25 |
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