JP6261778B2 - 非対称ジオキシムエステル化合物及びその製造方法と応用 - Google Patents

非対称ジオキシムエステル化合物及びその製造方法と応用 Download PDF

Info

Publication number
JP6261778B2
JP6261778B2 JP2016572407A JP2016572407A JP6261778B2 JP 6261778 B2 JP6261778 B2 JP 6261778B2 JP 2016572407 A JP2016572407 A JP 2016572407A JP 2016572407 A JP2016572407 A JP 2016572407A JP 6261778 B2 JP6261778 B2 JP 6261778B2
Authority
JP
Japan
Prior art keywords
group
alkyl
substituted
groups
acyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2016572407A
Other languages
English (en)
Japanese (ja)
Other versions
JP2017520544A (ja
Inventor
ウェンチャオ チャオ
ウェンチャオ チャオ
ヨンリン ワン
ヨンリン ワン
チェンロン ワン
チェンロン ワン
チョンリー マー
チョンリー マー
リーシウ ヤオ
リーシウ ヤオ
ウェイチン フー
ウェイチン フー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Insight High Technology Beijing Co Ltd
Original Assignee
Insight High Technology Beijing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Insight High Technology Beijing Co Ltd filed Critical Insight High Technology Beijing Co Ltd
Publication of JP2017520544A publication Critical patent/JP2017520544A/ja
Application granted granted Critical
Publication of JP6261778B2 publication Critical patent/JP6261778B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/84Ketones containing a keto group bound to a six-membered aromatic ring containing ether groups, groups, groups, or groups
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32Oximes
    • C07C251/62Oximes having oxygen atoms of oxyimino groups esterified
    • C07C251/64Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
    • C07C251/66Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C249/00Preparation of compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C249/04Preparation of compounds containing nitrogen atoms doubly-bound to a carbon skeleton of oximes
    • C07C249/12Preparation of compounds containing nitrogen atoms doubly-bound to a carbon skeleton of oximes by reactions not involving the formation of oxyimino groups
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32Oximes
    • C07C251/34Oximes with oxygen atoms of oxyimino groups bound to hydrogen atoms or to carbon atoms of unsubstituted hydrocarbon radicals
    • C07C251/44Oximes with oxygen atoms of oxyimino groups bound to hydrogen atoms or to carbon atoms of unsubstituted hydrocarbon radicals with the carbon atom of at least one of the oxyimino groups being part of a ring other than a six-membered aromatic ring
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C319/00Preparation of thiols, sulfides, hydropolysulfides or polysulfides
    • C07C319/14Preparation of thiols, sulfides, hydropolysulfides or polysulfides of sulfides
    • C07C319/20Preparation of thiols, sulfides, hydropolysulfides or polysulfides of sulfides by reactions not involving the formation of sulfide groups
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/22Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and doubly-bound oxygen atoms bound to the same carbon skeleton
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/45Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms doubly-bound to the carbon skeleton
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/46Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms
    • C07C323/47Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having at least one of the nitrogen atoms, not being part of nitro or nitroso groups, further bound to other hetero atoms to oxygen atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D209/00Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56Ring systems containing three or more rings
    • C07D209/80[b, c]- or [b, d]-condensed
    • C07D209/94[b, c]- or [b, d]-condensed containing carbocyclic rings other than six-membered
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D307/00Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/77Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D307/78Benzo [b] furans; Hydrogenated benzo [b] furans
    • C07D307/82Benzo [b] furans; Hydrogenated benzo [b] furans with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the hetero ring
    • C07D307/83Oxygen atoms
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/02Printing inks
    • C09D11/10Printing inks based on artificial resins
    • C09D11/101Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Furan Compounds (AREA)
  • Indole Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Adhesives Or Adhesive Processes (AREA)
JP2016572407A 2014-06-09 2015-04-22 非対称ジオキシムエステル化合物及びその製造方法と応用 Active JP6261778B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CN201410253184.2A CN104910053B (zh) 2014-06-09 2014-06-09 不对称二肟酯化合物及其制造方法与应用
CN201410253184.2 2014-06-09
PCT/CN2015/077138 WO2015188661A1 (zh) 2014-06-09 2015-04-22 不对称二肟酯化合物及其制造方法与应用

Publications (2)

Publication Number Publication Date
JP2017520544A JP2017520544A (ja) 2017-07-27
JP6261778B2 true JP6261778B2 (ja) 2018-01-17

Family

ID=54079557

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016572407A Active JP6261778B2 (ja) 2014-06-09 2015-04-22 非対称ジオキシムエステル化合物及びその製造方法と応用

Country Status (5)

Country Link
JP (1) JP6261778B2 (zh)
KR (1) KR101883164B1 (zh)
CN (1) CN104910053B (zh)
TW (1) TWI495631B (zh)
WO (1) WO2015188661A1 (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108957950B (zh) * 2017-05-18 2022-06-07 常州强力先端电子材料有限公司 含芴氨基酮类光引发剂的uv光固化组合物
CN107163169B (zh) * 2017-05-25 2018-08-24 同济大学 一类香豆素并咔唑型肟酯类化合物及其制备方法和应用
CN109666088A (zh) * 2017-10-16 2019-04-23 北京英力科技发展有限公司 一种双酮肟酯化合物及其制造方法与应用
KR102335614B1 (ko) * 2018-03-21 2021-12-03 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 화상표시장치
CN112341359B (zh) * 2019-08-07 2022-05-06 常州强力电子新材料股份有限公司 芴肟酯类化合物,其制备方法及应用
CN114149517B (zh) * 2020-09-07 2022-12-30 常州强力电子新材料股份有限公司 含噻吩结构的肟酯光引发剂、制备方法及光敏树脂组合物
CN112521529B (zh) * 2020-11-24 2022-07-08 同济大学 一种led敏感二苯乙烯基肟酯型光引发剂及其制备和应用
WO2024070695A1 (ja) * 2022-09-26 2024-04-04 富士フイルム株式会社 着色組成物、膜、光学フィルタ、固体撮像素子および画像表示装置
CN115611782A (zh) * 2022-10-15 2023-01-17 瑞红(苏州)电子化学品股份有限公司 高产酸肟磺酸酯类光产酸剂及其抗蚀剂组合物应用

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1180846A (en) * 1967-08-08 1970-02-11 Agfa Gevaert Nv Photopolymerisation of Ethylenically Unsaturated Organic Compounds
GB2029423A (en) * 1978-08-25 1980-03-19 Agfa Gevaert Nv Photo-polymerisable materials and recording method
US5223506A (en) * 1991-06-04 1993-06-29 Glaxo Inc. Cyclic antitumor compounds
EP0566445B1 (fr) * 1992-04-03 1996-02-07 Innothera Dérivés d'indane-1,3-dione et d'indane-1,2,3-trione, leurs procédés de préparation et leur application en thérapeutique
EP1395615B1 (en) * 2001-06-11 2009-10-21 Basf Se Oxime ester photoinitiators having a combined structure
WO2004050653A2 (en) * 2002-12-03 2004-06-17 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators with heteroaromatic groups
JP2007171320A (ja) * 2005-12-20 2007-07-05 Chisso Corp 感光性組成物およびそれを用いた表示素子
EP2144900B1 (en) * 2007-05-11 2015-03-18 Basf Se Oxime ester photoinitiators
JP5669386B2 (ja) * 2009-01-15 2015-02-12 富士フイルム株式会社 新規化合物、重合性組成物、カラーフィルタ、及びその製造方法、固体撮像素子、並びに、平版印刷版原版
JP5317879B2 (ja) * 2009-07-31 2013-10-16 富士フイルム株式会社 新規化合物、重合性組成物、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、並びに、平版印刷版原版
CN102492060B (zh) * 2011-11-28 2013-06-26 常州强力先端电子材料有限公司 一种二苯硫醚肟酯类光引发剂、其制备方法及应用
KR102026722B1 (ko) * 2012-03-22 2019-09-30 가부시키가이샤 아데카 신규 화합물 및 감광성 수지조성물
CN103998422B (zh) * 2013-09-02 2016-11-30 北京英力科技发展有限公司 环戊二酮肟酯及其应用
CN103833872B (zh) * 2014-03-18 2016-04-06 常州强力先端电子材料有限公司 一种双肟酯类光引发剂及其制备方法和应用
CN103819583B (zh) * 2014-03-18 2016-05-18 常州强力电子新材料股份有限公司 一种含硝基双肟酯类光引发剂及其制备方法和应用

Also Published As

Publication number Publication date
KR20170009966A (ko) 2017-01-25
TW201546034A (zh) 2015-12-16
CN104910053A (zh) 2015-09-16
TWI495631B (zh) 2015-08-11
KR101883164B1 (ko) 2018-07-30
JP2017520544A (ja) 2017-07-27
CN104910053B (zh) 2017-09-12
WO2015188661A1 (zh) 2015-12-17

Similar Documents

Publication Publication Date Title
JP6261778B2 (ja) 非対称ジオキシムエステル化合物及びその製造方法と応用
JP6196363B2 (ja) 新規なβ‐オキシムエステルフルオレン化合物、それを含む光重合開始剤及びフォトレジスト組成物
JP6328642B2 (ja) シクロペンタンジオンオキシムエステルとその応用
JP4902608B2 (ja) チオール化合物
TWI406847B (zh) 肟酯化合物及使用其之感光性樹脂組成物
JP6945074B2 (ja) トランス−トランス・ジケトキシム・エステル異性体、その製造方法および適用
TWI680118B (zh) 含有可聚合基團的芴肟酯類光引發劑、製備方法及其應用
CZ20004639A3 (cs) Fotosenzitivní pryskyřice
JP4218828B2 (ja) チオール化合物、光重合開始剤組成物および感光性組成物
JP2019044030A (ja) ペルオキシエステル基を有するチオキサントン誘導体を含有する重合性組成物およびその硬化物、当該硬化物の製造方法
JP2019523247A (ja) 高感度オキシムエステル光重合開始剤及びこれを含有する光重合組成物
TWI643835B (zh) 一種感光性樹脂組合物及其應用
JP2022078550A (ja) 新規な光重合開始剤及びこれらを用いた感光性樹脂組成物
KR101991838B1 (ko) 신규 1,3-벤조디아졸 베타-옥심 에스테르 화합물 및 이를 포함하는 조성물
KR102509606B1 (ko) 신규한 퀴놀리닐 베타 옥심에스테르 유도체 화합물, 이를 포함하는 광중합 개시제, 및 포토레지스트 조성물

Legal Events

Date Code Title Description
RD01 Notification of change of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7426

Effective date: 20170616

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20170616

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20170718

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20171017

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20171121

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20171212

R150 Certificate of patent or registration of utility model

Ref document number: 6261778

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250