JP6173451B2 - 薄型偏光板及びその製造方法 - Google Patents
薄型偏光板及びその製造方法 Download PDFInfo
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- JP6173451B2 JP6173451B2 JP2015523044A JP2015523044A JP6173451B2 JP 6173451 B2 JP6173451 B2 JP 6173451B2 JP 2015523044 A JP2015523044 A JP 2015523044A JP 2015523044 A JP2015523044 A JP 2015523044A JP 6173451 B2 JP6173451 B2 JP 6173451B2
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- film
- polymer
- polyvinyl alcohol
- stretching
- polarizing plate
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Classifications
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- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
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- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
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Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Polarising Elements (AREA)
- Laminated Bodies (AREA)
- Shaping By String And By Release Of Stress In Plastics And The Like (AREA)
Description
厚さ60μmの熱可塑性ポリウレタン基材の両面に引力を通じてPVAフィルムを貼り付けて積層体を形成した後、湿式延伸工程を通じて薄型偏光子の製造実験を進行した。上記PVAフィルムは日本合成社のM3000 grade、30μmのPVAを使用した。上記PVAフィルムを25℃の純水溶液で膨潤(swelling)工程を15秒間経た後、0.3wt%濃度及び25℃のヨウ素溶液で60秒間染着工程を進行した。その後、ホウ酸1wt%、25℃溶液で15秒間洗浄工程を経た後、ホウ酸2.5wt%、52℃の溶液で7倍延伸工程を進行した。延伸後、5wt%のKI溶液で補色工程を経た後、80℃オーブンで5分間乾燥させた。乾燥後、PVAフィルムの厚さは6〜8μm程度だった。上記乾燥工程後、40μmのトリアセチルセルロース(TAC)フィルムを基材の両面に貼り付けられたPVA偏光子のそれぞれ一面に位置させ、PVA系水溶性接着剤を介してラミネーターで貼り合わせた後、80℃オーブンで5分間乾燥した。その後、一面にTACが積層されたPVA偏光子を基材の両面から剥離して、TACが一面に貼り付けられたPVA偏光子を確保した。そして、TACが貼り付けられていないPVA偏光子の他面に40μmのトリアセチルセルロース(TAC)フィルムを位置させ、PVA系水溶性接着剤を介してラミネーターで貼り合わせた後、80℃オーブンで5分間乾燥することでTAC/PVA/TAC構造の薄型偏光板を製造した。
PVAフィルム(日本合成社M−grade、平均重合度2400、平均ケン化度99mol%)を100℃純水に溶解させてPVA水溶液を形成した後、厚さ200μmのPET(MGC社 NOVA−Clear SG007 grade)上にリップコーターを用いてコーティングし、80℃オーブンで10分間乾燥して積層フィルムを形成した。このとき、上記PVAフィルムの厚さは10μmであった。上記積層フィルムを25℃純水溶液で膨潤(swelling)工程を15秒間経た後、0.3wt%濃度及び25℃ヨウ素溶液で60秒間染着工程を進行した。その後、ホウ酸1wt%、25℃溶液で15秒間洗浄工程を経た後、ホウ酸2.5wt%、52℃溶液で5.5倍延伸工程を進行した。延伸後5wt%のKI溶液で補色工程を経た後、80℃オーブンで5分間乾燥させた。しかし、延伸過程でPVAコーティング層が剥がれて薄型PVAフィルムを製造するのが不可能だった。図2には、比較例1の方法によって製造されたフィルム積層体の状態が示されている。
PVAフィルム(日本合成社M−grade、平均重合度2400、平均ケン化度99mol%)を100℃純水に溶解させてPVA水溶液を形成した後、厚さ200μmのPET(MGC社 NOVA−Clear SG007 grade)上にリップコーターを用いてコーティングし、80℃オーブンで10分間乾燥して積層フィルムを形成した。このとき、上記PVAフィルムの厚さは10μmであった。上記積層フィルムを25℃のホウ酸1.0wt%水溶液で膨潤(swelling)工程を15秒間経た後、ヨウ素濃度0.3wt%及びホウ酸濃度3.0wt%、25℃のヨウ素溶液で60秒間染着工程を進行した。その後、ホウ酸1wt%、25℃溶液で15秒間洗浄工程を経た後、ホウ酸2.5wt%、60℃溶液で5.5倍延伸工程を進行した。延伸後、5wt%のKI溶液で補色工程を経た後、100℃オーブンで8分間乾燥させた。乾燥後、PVAフィルムの厚さは4〜4.5μm程度だった。上記乾燥工程後、40μmのトリアセチルセルロース(TAC)フィルムを基材両面に貼り付けられたPVA偏光子のそれぞれ一面に位置させ、PVA系水溶性接着剤を介してラミネーターで貼り合わせた後、80℃オーブンで5分間乾燥した。その後、一面にTACが積層されたPVA偏光子を基材の両面から剥離して、TACが一面に貼り付けられたPVA偏光子を確保した。そして、TACが貼り付けられていないPVA偏光子の他面に40μmのトリアセチルセルロース(TAC)フィルムを位置させ、PVA系水溶性接着剤を介してラミネーターで貼り合わせた後、80℃オーブンで5分間乾燥することで、TAC/PVA/TAC構造の薄型偏光板を製造した。製造された薄型偏光板の光特性は、JASCOのV−7100分光光度計で測定した。
基材を使用せず、実施例で使用した日本合成社のM3000 grade、30μmのPVAフィルムを実施例の工程条件と同一の延伸条件下で6倍単独延伸して、最終的に厚さ13μmの偏光素子を製造した。上記偏光素子の両面に40μmのトリアセチルセルロース(TAC)フィルムを位置させ、PVA系水溶性接着剤を介してラミネーターで貼り合わせた後、80℃オーブンで5分間乾燥することで、TAC/PVA/TAC構造の偏光板を製造した。
基材を使用せず、実施例で使用した日本合成社のM6000 grade、60μmのPVAフィルムを実施例の工程条件と同一の延伸条件下で6倍単独延伸して、最終的に厚さ22μmの一般の偏光素子を製造した。上記偏光素子の両面に40μmのトリアセチルセルロース(TAC)フィルムを位置させ、PVA系水溶性接着剤を介してラミネーターで貼り合わせた後、80℃オーブンで5分間乾燥することで、TAC/PVA/TAC構造の偏光板を製造した。
実施例1によって製造された薄型偏光板と比較例2によって製造された薄型偏光板の単体透過率(Ts)、直交透過率(Tc)、偏光度(DOP)、単体色相a、b及び直交色相a、bをJASCOのV−7100分光光度計で測定した。測定結果を下記表1に示す。
実施例、比較例3及び比較例4によって製造された偏光板のカール特性を肉眼で観察した。図3には、それぞれの偏光板を撮影した写真が示されている。図3を通じて、実施例によって製造された偏光板の場合、比較例3及び4によって製造された偏光板に比べてカールが少ないことを確認することができる。
上記実施例1及び比較例2によって製造された偏光子それぞれに対して、偏光子の幅方向に沿って等間隔で位置する10個の点で偏光度を測定した後、測定された偏光度の標準偏差の値を計算した。偏光度は、JASCOのV−7100分光光度計で測定した。測定結果を下記表2に示す。
純水にアセトアセチル基(5重量%)を含有するむポリビニルアルコール(平均重合度2000、ケン化度94%、日本合成社)を溶かして4重量%水溶液を製造した。ここにチタンアミン錯体架橋剤(製品名:TYZOR TE、デュポン社)をポリビニルアルコール100重量部当たり6.7重量部の比で添加して攪拌しながら混合して、接着剤Aを製造した。
厚さ40μmの熱可塑性ポリウレタン基材の両面に市販の固形分4重量%のポリビニルアルコール系接着剤(商品名:JC25、製造社:JAPAN VAM & POVAL Co.,Ltd)を塗布した後、日本合成社のM2000 grade、20μmのPVAフィルムを積層し、ラミネーターを通過させてフィルム積層体を形成した。製造されたフィルム積層体を25℃純水溶液で15秒間膨潤(swelling)させた後、0.3wt%濃度及び25℃のヨウ素溶液で60秒間染着する工程を進行した。その後、ホウ酸1wt%、25℃溶液で15秒間洗浄工程を経た後、ホウ酸2.5wt%、52℃溶液で7倍延伸工程を進行したが、延伸中に破断が発生した。
厚さ40μmの熱可塑性ポリウレタン基材の両面に市販の固形分4重量%のポリビニルアルコール系接着剤(商品名:JC25、製造社:JAPAN VAM & POVAL Co.,Ltd)を塗布した後、日本合成社のM2000 grade、20μmのPVAフィルムを積層し、ラミネーターを通過させてフィルム積層体を形成した。製造されたフィルム積層体を25℃純水溶液で15秒間膨潤(swelling)させた後、0.3wt%濃度及び25℃のヨウ素溶液で60秒間染着する工程を進行した。その後、ホウ酸1wt%、25℃溶液で15秒間洗浄工程を経た後、ホウ酸2.5wt%、52℃溶液で6倍延伸後、5wt%のKI溶液で補色工程を経た後、80℃オーブンで5分間乾燥させた。
A:ポリビニルアルコール系フィルム
B:基材フィルム
MD:縦延伸方向
Claims (10)
- 未延伸基材フィルム上に引力又は接着剤を用いて未延伸ポリビニルアルコール系フィルムを貼り付けてフィルム積層体を形成するステップ;
前記フィルム積層体を延伸するステップ;
前記延伸されたフィルム積層体のポリビニルアルコール系フィルム上に第1保護フィルムを貼り付けるステップ;及び
前記第1保護フィルムが貼り付けられたポリビニルアルコール系フィルムと基材フィルムとを分離させるステップを含み、
前記フィルム積層体を延伸するステップは、20℃ないし85℃の温度で、7倍ないし15倍の延伸倍率で、湿式延伸で行われ、
前記フィルム積層体の延伸後に、延伸されたポリビニルアルコール系フィルムと延伸された基材フィルムとの間の貼付力は、0.1ないし2N/2cmであり、
前記未延伸ポリビニルアルコール系フィルムは、厚さが10μmないし60μmであり、
前記フィルム積層体を延伸するステップは、ポリビニルアルコール系フィルムの厚さが10μm以下になるように行われ、
前記基材フィルムは、ポリウレタンフィルムである、薄型偏光板の製造方法。 - 前記接着剤は、アセトアセチル基を含有するポリビニルアルコール系樹脂及びアミン系金属化合物架橋剤を含む接着剤である請求項1に記載の薄型偏光板の製造方法。
- 前記フィルム積層体を延伸するステップは、ホウ酸濃度1重量%ないし5重量%のホウ酸水溶液で行われる請求項1に記載の薄型偏光板の製造方法。
- 前記保護フィルムが貼り付けられたポリビニルアルコール系フィルムと基材フィルムとを分離させるステップは、2N/2cm以下の剥離力を加えて行われる請求項1に記載の薄型偏光板の製造方法。
- 前記フィルム積層体を延伸するステップの前に、前記フィルム積層体にヨウ素及び二色性染料のうち少なくとも一つを染着させるステップをさらに含む請求項1に記載の薄型偏光板の製造方法。
- 前記フィルム積層体を延伸するステップの後に、延伸されたフィルム積層体を乾燥するステップをさらに含む請求項1に記載の薄型偏光板の製造方法。
- 前記保護フィルムが貼り付けられたポリビニルアルコール系フィルムと基材フィルムとを分離させるステップの後に、前記ポリビニルアルコール系フィルムの保護フィルムが貼り付けられていない面に第2保護フィルムを貼り付けるステップをさらに含む請求項1に記載の薄型偏光板の製造方法。
- 前記保護フィルムが貼り付けられたポリビニルアルコール系フィルムと基材フィルムとを分離させるステップの後に、前記ポリビニルアルコール系フィルムの保護フィルムが貼り付けられていない面に粘着層を形成するステップをさらに含む請求項1に記載の薄型偏光板の製造方法。
- 前記第1保護フィルムは、ポリエステル系重合体、スチレン系重合体、セルロース系重合体、ポリエーテルスルホン系重合体、ポリカーボネート系重合体、アクリル系重合体、ポリオレフィン系重合体、ポリアミド系重合体、ポリイミド系重合体、スルホン系重合体、ポリエーテルスルホン系重合体、ポリエーテルエーテルケトン系重合体、ポリフェニレンスルフィド系重合体、ビニルアルコール系重合体、塩化ビニリデン系重合体、ビニルブチラール系重合体、アリレート系重合体、ポリオキシメチレン系重合体、エポキシ系重合体及びこれら重合体の混合物からなる群より選択された1種以上で製造される請求項1に記載の薄型偏光板の製造方法。
- 前記第2保護フィルムは、ポリエステル系重合体、スチレン系重合体、セルロース系重合体、ポリエーテルスルホン系重合体、ポリカーボネート系重合体、アクリル系重合体、ポリオレフィン系重合体、ポリアミド系重合体、ポリイミド系重合体、スルホン系重合体、ポリエーテルスルホン系重合体、ポリエーテルエーテルケトン系重合体、ポリフェニレンスルフィド系重合体、ビニルアルコール系重合体、塩化ビニリデン系重合体、ビニルブチラール系重合体、アリレート系重合体、ポリオキシメチレン系重合体、エポキシ系重合体及びこれら重合体の混合物からなる群より選択された1種以上で製造される請求項7に記載の薄型偏光板の製造方法。
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TW201506468A (zh) | 2015-02-16 |
TWI525352B (zh) | 2016-03-11 |
KR20140147010A (ko) | 2014-12-29 |
KR101555782B1 (ko) | 2015-09-24 |
US10048417B2 (en) | 2018-08-14 |
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