JP6136599B2 - 強化ガラス及び強化ガラス板並びに強化用ガラス - Google Patents
強化ガラス及び強化ガラス板並びに強化用ガラス Download PDFInfo
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- 239000005341 toughened glass Substances 0.000 title claims description 136
- 239000005357 flat glass Substances 0.000 title description 3
- 239000011521 glass Substances 0.000 claims description 128
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 62
- 239000000203 mixture Substances 0.000 claims description 51
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 37
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 32
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 25
- 229910052708 sodium Inorganic materials 0.000 claims description 25
- 229910006404 SnO 2 Inorganic materials 0.000 claims description 13
- 239000007791 liquid phase Substances 0.000 claims description 11
- 239000006059 cover glass Substances 0.000 claims description 9
- 229910052744 lithium Inorganic materials 0.000 claims description 5
- 238000000465 moulding Methods 0.000 claims description 5
- 238000005342 ion exchange Methods 0.000 description 45
- 239000010410 layer Substances 0.000 description 39
- 238000000034 method Methods 0.000 description 38
- 238000005496 tempering Methods 0.000 description 29
- 238000007500 overflow downdraw method Methods 0.000 description 21
- 230000007423 decrease Effects 0.000 description 20
- 238000004031 devitrification Methods 0.000 description 19
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 18
- 150000003839 salts Chemical class 0.000 description 17
- 238000005728 strengthening Methods 0.000 description 16
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 14
- 229910052697 platinum Inorganic materials 0.000 description 9
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 8
- 239000013078 crystal Substances 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 230000035939 shock Effects 0.000 description 8
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 7
- 238000005520 cutting process Methods 0.000 description 6
- 230000003247 decreasing effect Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000001105 regulatory effect Effects 0.000 description 6
- 239000012535 impurity Substances 0.000 description 5
- 239000006060 molten glass Substances 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 238000005498 polishing Methods 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 5
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 4
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 description 4
- 238000007373 indentation Methods 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 230000003014 reinforcing effect Effects 0.000 description 4
- 230000003746 surface roughness Effects 0.000 description 4
- -1 B 2 O 3 Inorganic materials 0.000 description 3
- 238000003426 chemical strengthening reaction Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 229920001690 polydopamine Polymers 0.000 description 3
- 229910052596 spinel Inorganic materials 0.000 description 3
- 239000011029 spinel Substances 0.000 description 3
- 229910052845 zircon Inorganic materials 0.000 description 3
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- 238000005191 phase separation Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 2
- 238000009774 resonance method Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000007088 Archimedes method Methods 0.000 description 1
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 1
- 241000699670 Mus sp. Species 0.000 description 1
- 229910017493 Nd 2 O 3 Inorganic materials 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000003280 down draw process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000156 glass melt Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000005355 lead glass Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000007372 rollout process Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000004017 vitrification Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
- C03C21/001—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
- C03C21/002—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to perform ion-exchange between alkali ions
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B17/00—Forming molten glass by flowing-out, pushing-out, extruding or drawing downwardly or laterally from forming slits or by overflowing over lips
- C03B17/06—Forming glass sheets
- C03B17/064—Forming glass sheets by the overflow downdraw fusion process; Isopipes therefor
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B25/00—Annealing glass products
- C03B25/04—Annealing glass products in a continuous way
- C03B25/10—Annealing glass products in a continuous way with vertical displacement of the glass products
- C03B25/12—Annealing glass products in a continuous way with vertical displacement of the glass products of glass sheets
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
- C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/18—Compositions for glass with special properties for ion-sensitive glass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/048—Encapsulation of modules
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/048—Encapsulation of modules
- H01L31/0488—Double glass encapsulation, e.g. photovoltaic cells arranged between front and rear glass sheets
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- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K5/00—Casings, cabinets or drawers for electric apparatus
- H05K5/02—Details
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- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2204/00—Glasses, glazes or enamels with special properties
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
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- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31—Surface property or characteristic of web, sheet or block
- Y10T428/315—Surface modified glass [e.g., tempered, strengthened, etc.]
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- Liquid Crystal (AREA)
- Surface Treatment Of Glass (AREA)
Description
Tf=(T2×△L1−T1×△L2)/(△L1−△L2)
(1)ガラス組成として、質量%で、SiO2 50〜80%、Al2O3 10〜30%、B2O3 0〜6%、Li2O 0〜2%、Na2O 5〜25%を含有し、実質的にAs2O3、Sb2O3、PbO、及びFを含有しない。
(2)ガラス組成として、質量%で、SiO2 50〜80%、Al2O3 10〜30%、B2O3 0〜6%、Li2O 0〜1.7%、Na2O 5〜25%、SrO 0〜2%を含有し、実質的にAs2O3、Sb2O3、PbO、及びFを含有しない。
(3)ガラス組成として、質量%で、SiO2 50〜80%、Al2O3 10〜30%、B2O3 0〜6%、Li2O 0〜1.7%、Na2O 5〜25%、SrO 0〜2%、MgO+CaO+SrO+BaO 0〜9.9%、TiO2 0〜0.5%を含有し、実質的にAs2O3、Sb2O3、PbO、及びFを含有しない。
(4)ガラス組成として、質量%で、SiO2 50〜76%、Al2O3 16.0超〜30%、B2O3 0〜6%、Li2O 0〜1.7%、Na2O 7.0超〜25%、SrO 0〜2%、TiO2 0〜0.5%、ZrO2 0〜4%を含有し、実質的にAs2O3、Sb2O3、PbO、及びFを含有しない。
(5)ガラス組成として、質量%で、SiO2 50〜76%、Al2O3 16.0超〜30%、B2O3 0〜6%、Li2O 0〜1.0%未満、Na2O 7.0超〜25%、SrO 0〜2%、MgO+CaO+SrO+BaO 0〜9.9%、TiO2 0〜0.5%、ZrO2 0〜4%、P2O5 0〜1%を含有し、実質的にAs2O3、Sb2O3、PbO、及びFを含有しない。
(6)ガラス組成として、質量%で、SiO2 50〜76%、Al2O3 16.0超〜30%、B2O3 0〜6%、Li2O 0〜1.0%未満、Na2O 7.0超〜25%、SrO 0〜2%、MgO+CaO+SrO+BaO 0〜9.9%、TiO2 0〜0.5%、ZrO2 0〜4%、P2O5 0〜1%を含有し、モル%での計算値(MgO+CaO+SrO+BaO)/(Al2O3+B2O3)が0〜0.60であり、実質的にAs2O3、Sb2O3、PbO、及びFを含有しない。
(7)ガラス組成として、質量%で、SiO2 50〜76%、Al2O3 16.0超〜30%、B2O3 0〜6%、Li2O 0〜1.0%未満、Na2O 7.0超〜25%、SrO 0〜2%、MgO+CaO+SrO+BaO 0〜9.9%、TiO2 0〜0.5%、ZrO2 0〜4%、SnO2 0.2〜3%、P2O5 0〜1%を含有し、モル比(MgO+CaO+SrO+BaO)/(Al2O3+B2O3)が0〜0.60であり、実質的にAs2O3、Sb2O3、PbO、及びFを含有しない。
(8)ガラス組成として、質量%で、SiO2 50〜73%、Al2O3 16.0超〜30%、B2O3 0〜6%、Li2O 0〜1.0%未満、Na2O 7.0超〜25%、Li2O+Na2O+K2O 10〜30%、SrO 0〜2%、MgO+CaO+SrO+BaO 0〜9.9%、TiO2 0〜0.5%、ZrO2 0〜2%、SnO2 0.2〜3%、P2O5 0〜1%を含有し、モル比(MgO+CaO+SrO+BaO)/(Al2O3+B2O3)が0〜0.55であり、実質的にAs2O3、Sb2O3、PbO、及びFを含有しない。
Claims (19)
- 表面に圧縮応力層を有する強化ガラスであって、ガラス組成として、質量%で、SiO2 50〜80%、Al2O3 21〜30%、B2O3 0〜2%、Li2O 0〜2%、Na2O 5〜25%、K2O 0〜2%、MgO 0.5〜4%を含有し、実質的にAs2O3、Sb2O3、PbO、及びFを含有しないことを特徴とする強化ガラス。
- ガラス組成として、質量%で、SiO2 50〜80%、Al2O3 21〜30%、B2O3 0〜2%、Li2O 0〜1.7%、Na2O 7.0超〜25%、K2O 0〜2%、MgO 0.5〜4%、SrO 0〜2%を含有することを特徴とする請求項1に記載の強化ガラス。
- ガラス組成として、質量%で、SiO2 50〜76%、Al2O3 21〜30%、B2O3 0〜2%、Li2O 0〜1.7%、Na2O 7.0超〜25%、K2O 0〜2%、MgO 0.5〜4%、SrO 0〜2%、TiO2 0〜4.5%を含有することを特徴とする請求項1に記載の強化ガラス。
- ガラス組成として、質量%で、SiO2 50〜76%、Al2O3 21〜30%、B2O3 0〜2%、Li2O 0〜1.7%、Na2O 7.0超〜25%、K2O 0〜2%、MgO 0.5〜4%、SrO 0〜2%、TiO2 0〜0.5%、ZrO2 0〜4%を含有することを特徴とする請求項1に記載の強化ガラス。
- ガラス組成として、質量%で、SiO2 50〜76%、Al2O3 21〜30%、B2O3 0〜2%、Li2O 0〜1.7%、Na2O 7.0超〜25%、K2O 0〜2%、MgO 0.5〜4%、SrO 0〜2%、TiO2 0〜0.5%、ZrO2 0〜4%、P2O5 0〜1%を含有し、モル比(MgO+CaO+SrO+BaO)/(Al2O3+B2O3)が0〜0.60であることを特徴とする請求項1に記載の強化ガラス。
- ガラス組成として、質量%で、SiO2 50〜76%、Al2O3 21〜30%、B2O3 0〜2%、Li2O 0〜1.0%未満、Na2O 7.0超〜25%、K2O 0〜2%、MgO 0.5〜4%、SrO 0〜2%、TiO2 0〜0.5%、ZrO2 0〜2%、SnO2 0.2〜3%、P2O5 0〜1%を含有し、モル比(MgO+CaO+SrO+BaO)/(Al2O3+B2O3)が0〜0.55であることを特徴とする請求項1に記載の強化ガラス。
- ガラス組成として、質量%で、SiO2 50〜73%、Al2O3 21〜30%、B2O3 0〜2%、Li2O 0〜1.0%未満、Na2O 7.0超〜25%、K2O 0〜2%、Li2O+Na2O+K2O 10〜30%、MgO 0.5〜4%、CaO 0〜4%、SrO 0〜2%、TiO2 0〜0.5%、ZrO2 0〜2%、SnO2 0.2〜3%、P2O5 0〜1%を含有し、モル比(MgO+CaO+SrO+BaO)/(Al2O3+B2O3)が0〜0.55であることを特徴とする請求項1に記載の強化ガラス。
- 圧縮応力層の圧縮応力値が300MPa以上で且つ1200MPa以下、圧縮応力層の厚みが10μm以上で且つ60μm以下であることを特徴とする請求項1〜7の何れか一項に記載の強化ガラス。
- 液相温度が1200℃以下であることを特徴とする請求項1〜8の何れか一項に記載の強化ガラス。
- 液相粘度が104.0dPa・s以上であることを特徴とする請求項1〜9の何れか一項に記載の強化ガラス。
- 104.0dPa・sにおける温度が1300℃以下であることを特徴とする請求項1〜10の何れか一項に記載の強化ガラス。
- 25〜380℃の温度範囲における熱膨張係数が100×10−7/℃以下であることを特徴とする請求項1〜11の何れか一項に記載の強化ガラス。
- 請求項1〜12の何れか一項に記載の強化ガラスからなることを特徴とする強化ガラス板。
- 長さ寸法が500mm以上、幅寸法が300mm以上、厚みが0.5〜2.0mmの強化ガラス板であって、圧縮応力層の圧縮応力値が300MPa以上で且つ1200MPa以下、圧縮応力層の厚みが10μm以上で且つ60μm以下であることを特徴とする請求項13に記載の強化ガラス板。
- ヤング率が65GPa以上であることを特徴とする請求項13又は14に記載の強化ガラス板。
- 内部に成形時の合流面を有することを特徴とする請求項13〜15の何れか一項に記載の強化ガラス板。
- 未研磨の表面を有することを特徴とする請求項16に記載の強化ガラス板。
- タッチパネルディスプレイに用いることを特徴とする請求項13〜17の何れか一項に記載の強化ガラス板。
- 携帯電話のカバーガラスに用いることを特徴とする請求項13〜17の何れか一項に記載の強化ガラス板。
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