JP5701684B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP5701684B2 JP5701684B2 JP2011114579A JP2011114579A JP5701684B2 JP 5701684 B2 JP5701684 B2 JP 5701684B2 JP 2011114579 A JP2011114579 A JP 2011114579A JP 2011114579 A JP2011114579 A JP 2011114579A JP 5701684 B2 JP5701684 B2 JP 5701684B2
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- 239000004065 semiconductor Substances 0.000 title claims description 73
- 239000000758 substrate Substances 0.000 claims description 132
- 239000011229 interlayer Substances 0.000 claims description 15
- 238000002161 passivation Methods 0.000 claims description 13
- 239000010931 gold Substances 0.000 claims description 12
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 11
- 229910000679 solder Inorganic materials 0.000 claims description 9
- 229910052737 gold Inorganic materials 0.000 claims description 8
- 230000002093 peripheral effect Effects 0.000 claims description 3
- 238000000605 extraction Methods 0.000 claims 1
- 239000010408 film Substances 0.000 description 33
- 239000010410 layer Substances 0.000 description 33
- 239000010949 copper Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 239000012535 impurity Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 5
- 229910052721 tungsten Inorganic materials 0.000 description 5
- 239000010937 tungsten Substances 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000008186 active pharmaceutical agent Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000003111 delayed effect Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 229910021332 silicide Inorganic materials 0.000 description 2
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
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- 238000000926 separation method Methods 0.000 description 1
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- 239000013585 weight reducing agent Substances 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
- H01L29/42312—Gate electrodes for field effect devices
- H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
- H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
- H01L29/42372—Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the conducting layer, e.g. the length, the sectional shape or the lay-out
-
- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/417—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions carrying the current to be rectified, amplified or switched
- H01L29/41725—Source or drain electrodes for field effect devices
- H01L29/41758—Source or drain electrodes for field effect devices for lateral devices with structured layout for source or drain region, i.e. the source or drain region having cellular, interdigitated or ring structure or being curved or angular
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/423—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions not carrying the current to be rectified, amplified or switched
- H01L29/42312—Gate electrodes for field effect devices
- H01L29/42316—Gate electrodes for field effect devices for field-effect transistors
- H01L29/4232—Gate electrodes for field effect devices for field-effect transistors with insulated gate
- H01L29/42372—Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the conducting layer, e.g. the length, the sectional shape or the lay-out
- H01L29/4238—Gate electrodes for field effect devices for field-effect transistors with insulated gate characterised by the conducting layer, e.g. the length, the sectional shape or the lay-out characterised by the surface lay-out
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7833—Field effect transistors with field effect produced by an insulated gate with lightly doped drain or source extension, e.g. LDD MOSFET's; DDD MOSFET's
- H01L29/7835—Field effect transistors with field effect produced by an insulated gate with lightly doped drain or source extension, e.g. LDD MOSFET's; DDD MOSFET's with asymmetrical source and drain regions, e.g. lateral high-voltage MISFETs with drain offset region, extended drain MISFETs
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/16227—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the bump connector connecting to a bond pad of the item
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- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L24/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1306—Field-effect transistor [FET]
- H01L2924/13091—Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
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- Microelectronics & Electronic Packaging (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Computer Hardware Design (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Semiconductor Integrated Circuits (AREA)
- Wire Bonding (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Electrodes Of Semiconductors (AREA)
Description
4 N+型ドレイン層 5 ゲート絶縁膜 6 ゲート電極 7 層間絶縁膜
8 ソース電極 9 ドレイン電極 11 ゲート引き出し電極
12 パッシベーション膜 GE1,GE2 ゲート電極端部
G1,G11,G12,G2,G21,G22 ゲート接続電極
GXX,GX1〜GX5 ゲート接続電極 S1〜S5 ソース接続電極
D1〜D5 ドレイン接続電極 50 パワーMOSトランジスタ
100 半導体チップ 21 基板ソース配線 22 基板ドレイン配線
23 ゲート電極シャント用基板配線 21a 基板ソース裏面配線
22a 基板ドレイン裏面配線 24 はんだバンプ 25 突起電極
SH1〜SH5 ソース接続用基板電極 DH1〜DH5 ドレイン接続用基板電極 HG1,HG2,HGX1〜HGX5 ゲート接続用基板電極 200 BGA基板
201 BGA基板の表面 202 BGA基板の裏面
Claims (9)
- ゲート電極シャント用基板配線、基板ソース配線、及び基板ドレイン配線が形成された基板と、
Finger形状電極からなるソース電極とドレイン電極と、前記ソース電極と前記ドレイン電極の間を前記Finger形状電極の一方の端部から他方の端部まで延在するゲート電極と、前記ゲート電極上を被覆する層間絶縁膜に形成されたコンタクトホールを介して前記ゲート電極の両端部と接続される二つのゲート引き出し電極と、前記層間絶縁膜上を被覆するパッシベーション膜と、前記パッシベーション膜に形成された開口部に露出する、前記ゲート引き出し電極の一部であるゲート接続電極、前記ソース電極の一部であるソース接続電極、及び前記ドレイン電極の一部であるドレイン接続電極と、
前記ゲート接続電極、前記ソース接続電極、及び前記ドレイン接続電極上に形成された突起電極と、を備える半導体チップと、を具備し、前記基板の前記ゲート電極シャント用基板配線、前記基板ソース配線、及び前記基板ドレイン配線と、前記半導体チップの前記ゲート接続電極、前記ソース接続電極、及び前記ドレイン接続電極のそれぞれとが前記突起電極を介して接続されることを特徴とする半導体装置。 - ゲート電極シャント用基板配線、基板ソース配線、及び基板ドレイン配線が形成された基板と、
Finger形状電極からなるソース電極とドレイン電極と、前記ソース電極と前記ドレイン電極の間を前記Finger形状電極の一方の端部から他方の端部まで延在するゲート電極と、前記ゲート電極上を被覆する層間絶縁膜に形成されたコンタクトホールを介して前記ゲート電極の両端部及び前記ソース電極と前記ドレイン電極の間の複数のゲート電極と接続される複数のゲート引き出し電極と、前記層間絶縁膜上を被覆するパッシベーション膜と、該パッシベーション膜に形成された開口部に露出する、前記複数のゲート引き出し電極の一部となるゲート接続電極、前記ソース電極の一部となるソース接続電極、及び前記ドレイン電極の一部となるドレイン接続電極と、前記ゲート接続電極、前記ソース接続電極、及び前記ドレイン接続電極上に形成された突起電極と、を備える半導体チップと、を具備し、前記基板の前記ゲート電極シャント用基板配線、前記基板ソース配線、及び前記基板ドレイン配線と、前記半導体チップの前記ゲート接続電極、前記ソース接続電極、及び前記ドレイン接続電極のそれぞれとが前記突起電極を介して接続されることを特徴とする半導体装置。 - 前記突起電極が金バンプ電極であることを特徴とする請求項1または請求項2
に記載の半導体装置。 - 前記金バンプ電極が前記ゲート接続電極、前記ソース接続電極及び前記ドレイン接続電極に金線をワイヤボンドし、該金線の先端を切断することにより形成されることを特徴とする請求項3に記載の半導体装置。
- 前記突起電極がはんだバンプ電極であることを特徴とする請求項1または請求項2に記載の半導体装置。
- 前記半導体チップがWLP(Wafer Level Chip Size Package)であることを特徴とする請求項3または請求項5に記載の半導体装置。
- 前記基板が、該基板の裏面に該基板の表面の前記基板ソース配線、前記基板ドレイン配線とそれぞれ該基板に形成されたスルーホールを介して接続され、且つはんだバンプを備える基板ソース裏面配線、基板ドレイン裏面配線が形成されたBGA基板であることを特徴とする請求項1乃至請求項6のいずれかに記載の半導体装置。
- 前記BGA基板の裏面に前記ゲート電極シャント用基板配線が形成され、前記BGA基板の表面に該BGA基板に形成されたスルーホールを介して該ゲート電極シャント用基板配線と接続されるゲート接続用基板電極が形成されることを特徴とする請求項7に記載の半導体装置。
- 前記半導体チップは前記Finger形状電極からなる前記ソース電極、前記ドレイン電極を備えるパワーMOSトランジスタと、該パワーMOSトランジスタの制御回路、周辺回路からなる半導体集積回路であることを特徴とする請求項1乃至請求項8のいずれかに記載の半導体装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011114579A JP5701684B2 (ja) | 2011-05-23 | 2011-05-23 | 半導体装置 |
TW101113161A TW201248810A (en) | 2011-05-23 | 2012-04-13 | Semiconductor device |
KR1020120054067A KR101266695B1 (ko) | 2011-05-23 | 2012-05-22 | 반도체 장치 |
CN201210161920.2A CN102800703B (zh) | 2011-05-23 | 2012-05-23 | 半导体装置 |
US13/478,810 US8901653B2 (en) | 2011-05-23 | 2012-05-23 | Semiconductor device |
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JP2011114579A JP5701684B2 (ja) | 2011-05-23 | 2011-05-23 | 半導体装置 |
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JP2012244039A JP2012244039A (ja) | 2012-12-10 |
JP5701684B2 true JP5701684B2 (ja) | 2015-04-15 |
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US (1) | US8901653B2 (ja) |
JP (1) | JP5701684B2 (ja) |
KR (1) | KR101266695B1 (ja) |
CN (1) | CN102800703B (ja) |
TW (1) | TW201248810A (ja) |
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US9190393B1 (en) * | 2013-09-10 | 2015-11-17 | Delta Electronics, Inc. | Low parasitic capacitance semiconductor device package |
JP6310801B2 (ja) * | 2014-07-28 | 2018-04-11 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
WO2016175866A1 (en) * | 2015-04-30 | 2016-11-03 | Hewlett Packard Enterprise Development Lp | Identifying groups |
JP6374115B2 (ja) | 2015-08-07 | 2018-08-15 | シャープ株式会社 | 複合型半導体装置 |
FR3057394B1 (fr) * | 2016-10-10 | 2019-05-03 | Stmicroelectronics Sa | Dispositif de protection contre les decharges electrostatiques avec circuit de declenchement distribue |
JP6972686B2 (ja) * | 2017-06-15 | 2021-11-24 | 株式会社ジェイテクト | 半導体装置 |
US10084109B1 (en) * | 2017-12-11 | 2018-09-25 | Win Semiconductors Corp. | Semiconductor structure for improving the gate adhesion and Schottky stability |
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JP4364169B2 (ja) * | 2005-07-12 | 2009-11-11 | 島田理化工業株式会社 | Fetモジュールおよび誘導加熱用インバータ |
JP4800084B2 (ja) * | 2006-03-31 | 2011-10-26 | 住友電工デバイス・イノベーション株式会社 | 半導体装置およびその製造方法 |
US7768075B2 (en) * | 2006-04-06 | 2010-08-03 | Fairchild Semiconductor Corporation | Semiconductor die packages using thin dies and metal substrates |
CN100502003C (zh) * | 2006-11-29 | 2009-06-17 | 通嘉科技股份有限公司 | 半导体器件结构 |
WO2008153368A1 (en) * | 2007-06-15 | 2008-12-18 | Tae Pok Rhee | Manufacturing method of semiconductor power devices |
JP5165967B2 (ja) * | 2007-08-22 | 2013-03-21 | セイコーインスツル株式会社 | 半導体装置 |
JP2009260031A (ja) * | 2008-04-16 | 2009-11-05 | Sanyo Electric Co Ltd | 絶縁ゲート型半導体装置 |
JP5151878B2 (ja) * | 2008-09-30 | 2013-02-27 | 富士通株式会社 | 半導体装置 |
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- 2012-05-23 CN CN201210161920.2A patent/CN102800703B/zh active Active
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KR101266695B1 (ko) | 2013-05-28 |
KR20120130724A (ko) | 2012-12-03 |
CN102800703A (zh) | 2012-11-28 |
US20120299095A1 (en) | 2012-11-29 |
TW201248810A (en) | 2012-12-01 |
JP2012244039A (ja) | 2012-12-10 |
US8901653B2 (en) | 2014-12-02 |
CN102800703B (zh) | 2015-03-25 |
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