JP5695221B2 - 焼結体及びアモルファス膜 - Google Patents

焼結体及びアモルファス膜 Download PDF

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Publication number
JP5695221B2
JP5695221B2 JP2013555698A JP2013555698A JP5695221B2 JP 5695221 B2 JP5695221 B2 JP 5695221B2 JP 2013555698 A JP2013555698 A JP 2013555698A JP 2013555698 A JP2013555698 A JP 2013555698A JP 5695221 B2 JP5695221 B2 JP 5695221B2
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Prior art keywords
powder
film
mgf
sintered body
less
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Japanese (ja)
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JPWO2014010383A1 (ja
Inventor
淳史 奈良
淳史 奈良
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JX Nippon Mining and Metals Corp
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JX Nippon Mining and Metals Corp
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
    • C04B35/457—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates based on tin oxides or stannates
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/64—Burning or sintering processes
    • C04B35/645—Pressure sintering
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3205—Alkaline earth oxides or oxide forming salts thereof, e.g. beryllium oxide
    • C04B2235/3206—Magnesium oxides or oxide-forming salts thereof
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3286—Gallium oxides, gallates, indium oxides, indates, thallium oxides, thallates or oxide forming salts thereof, e.g. zinc gallate
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3293—Tin oxides, stannates or oxide forming salts thereof, e.g. indium tin oxide [ITO]
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
    • C04B2235/34—Non-metal oxides, non-metal mixed oxides, or salts thereof that form the non-metal oxides upon heating, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3409—Boron oxide, borates, boric acids, or oxide forming salts thereof, e.g. borax
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
    • C04B2235/44—Metal salt constituents or additives chosen for the nature of the anions, e.g. hydrides or acetylacetonate
    • C04B2235/444—Halide containing anions, e.g. bromide, iodate, chlorite
    • C04B2235/445—Fluoride containing anions, e.g. fluosilicate
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/50—Constituents or additives of the starting mixture chosen for their shape or used because of their shape or their physical appearance
    • C04B2235/54—Particle size related information
    • C04B2235/5418—Particle size related information expressed by the size of the particles or aggregates thereof
    • C04B2235/5436—Particle size related information expressed by the size of the particles or aggregates thereof micrometer sized, i.e. from 1 to 100 micron

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Structural Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Physical Vapour Deposition (AREA)
  • Non-Insulated Conductors (AREA)
JP2013555698A 2012-07-13 2013-06-19 焼結体及びアモルファス膜 Active JP5695221B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2013555698A JP5695221B2 (ja) 2012-07-13 2013-06-19 焼結体及びアモルファス膜

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2012157716 2012-07-13
JP2012157716 2012-07-13
PCT/JP2013/066833 WO2014010383A1 (ja) 2012-07-13 2013-06-19 焼結体及びアモルファス膜
JP2013555698A JP5695221B2 (ja) 2012-07-13 2013-06-19 焼結体及びアモルファス膜

Publications (2)

Publication Number Publication Date
JP5695221B2 true JP5695221B2 (ja) 2015-04-01
JPWO2014010383A1 JPWO2014010383A1 (ja) 2016-06-20

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JP2013555698A Active JP5695221B2 (ja) 2012-07-13 2013-06-19 焼結体及びアモルファス膜

Country Status (5)

Country Link
JP (1) JP5695221B2 (ko)
KR (1) KR101485305B1 (ko)
CN (1) CN104487402B (ko)
TW (1) TWI549924B (ko)
WO (1) WO2014010383A1 (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017212362A1 (ja) * 2016-06-10 2017-12-14 株式会社半導体エネルギー研究所 スパッタリングターゲット、およびスパッタリングターゲットの作製方法
TWI754542B (zh) * 2016-07-11 2022-02-01 日商半導體能源研究所股份有限公司 濺射靶材及金屬氧化物
JP6637948B2 (ja) * 2017-11-27 2020-01-29 Ｊｘ金属株式会社 Ｉｚｏターゲット及びその製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005219982A (ja) * 2004-02-06 2005-08-18 Mitsubishi Heavy Ind Ltd 透光性導電材料
JP2013144818A (ja) * 2012-01-13 2013-07-25 Jx Nippon Mining & Metals Corp 低屈折率膜形成用イオンプレーティング用材料及び低屈折率膜

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20090018805A (ko) * 2006-06-08 2009-02-23 아사히 가라스 가부시키가이샤 투명 도전막 및 그 제조 방법, 그리고 그 제조에 사용되는 스퍼터링 타깃
JP5593612B2 (ja) 2006-06-08 2014-09-24 住友金属鉱山株式会社 酸化物焼結体、ターゲット、およびそれを用いて得られる透明導電膜、並びに透明導電性基材
EP2281919A4 (en) * 2008-06-03 2014-03-19 Jx Nippon Mining & Metals Corp SPUTTERING TARGET AND NOT CRYSTALLINE OPTICAL THIN FILM
KR20160098513A (ko) * 2008-07-08 2016-08-18 솔레라스 어드밴스드 코팅스 비브이비에이 제1 및 제2 상을 포함하는 산화물 스퍼터 타깃의 제조 방법
CN102216237B (zh) * 2008-11-20 2015-05-13 出光兴产株式会社 ZnO-SnO2-In2O3类氧化物烧结体及非晶质透明导电膜
CN102560391A (zh) * 2010-12-24 2012-07-11 海洋王照明科技股份有限公司 一种导电膜制备方法、导电膜及应用

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005219982A (ja) * 2004-02-06 2005-08-18 Mitsubishi Heavy Ind Ltd 透光性導電材料
JP2013144818A (ja) * 2012-01-13 2013-07-25 Jx Nippon Mining & Metals Corp 低屈折率膜形成用イオンプレーティング用材料及び低屈折率膜

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
JPN6013046776; Ｒ．ＦＥＲＲＡＮＴＥ: 'Ｖｅｒｙ-Ｈｉｇｈ-Ｔｒａｎｓｍｉｔｔａｎｃｅ　ＩＴＯ-ＭｇＦ２　Ｆｉｌｍｓ　ｗｉｔｈ　Ｔａｉｌｏｒａｂｌｅ　Ｃｏｎｄｕｃｔｉｖｉｔｙ' ３９ｔｈ　Ａｎｎｕａｌ　Ｔｅｃｈｎｉｃａｌ　Ｃｏｎｆｅｒｅｎｃｅ　Ｐｒｏｃｅｅｄｉｎｇｓ ｖｏｌ．３９, 1996, ｐｐ．２２２-２２５, Ｓｏｃｉｅｔｙ　ｏｆ　Ｖａｃｕｕｍ　Ｃｏａｔｅｒｓ *

Also Published As

Publication number Publication date
CN104487402B (zh) 2016-05-18
JPWO2014010383A1 (ja) 2016-06-20
WO2014010383A1 (ja) 2014-01-16
TWI549924B (zh) 2016-09-21
KR101485305B1 (ko) 2015-01-21
TW201410637A (zh) 2014-03-16
KR20140037948A (ko) 2014-03-27
CN104487402A (zh) 2015-04-01

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