JP5599988B2 - 薄膜トランジスタ基板及びその製造方法 - Google Patents
薄膜トランジスタ基板及びその製造方法 Download PDFInfo
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- JP5599988B2 JP5599988B2 JP2009142157A JP2009142157A JP5599988B2 JP 5599988 B2 JP5599988 B2 JP 5599988B2 JP 2009142157 A JP2009142157 A JP 2009142157A JP 2009142157 A JP2009142157 A JP 2009142157A JP 5599988 B2 JP5599988 B2 JP 5599988B2
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- 239000000758 substrate Substances 0.000 title claims description 107
- 239000010409 thin film Substances 0.000 title claims description 66
- 238000004519 manufacturing process Methods 0.000 title description 32
- 238000005192 partition Methods 0.000 claims description 121
- 239000010408 film Substances 0.000 claims description 103
- 239000004065 semiconductor Substances 0.000 claims description 39
- 239000011368 organic material Substances 0.000 claims description 32
- 230000001681 protective effect Effects 0.000 claims description 31
- 230000004888 barrier function Effects 0.000 claims description 13
- 238000000034 method Methods 0.000 description 32
- 239000004973 liquid crystal related substance Substances 0.000 description 15
- 239000000463 material Substances 0.000 description 10
- 239000000126 substance Substances 0.000 description 9
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 8
- 229910052581 Si3N4 Inorganic materials 0.000 description 8
- 229910021417 amorphous silicon Inorganic materials 0.000 description 8
- 229910052731 fluorine Inorganic materials 0.000 description 8
- 239000011737 fluorine Substances 0.000 description 8
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 8
- 229910004205 SiNX Inorganic materials 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 229910052814 silicon oxide Inorganic materials 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 239000002210 silicon-based material Substances 0.000 description 4
- 125000006850 spacer group Chemical group 0.000 description 4
- 238000004381 surface treatment Methods 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- 230000000903 blocking effect Effects 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000007641 inkjet printing Methods 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229910021332 silicide Inorganic materials 0.000 description 2
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 2
- 230000001934 delay Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
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- G02F1/136222—Colour filters incorporated in the active matrix substrate
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- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1248—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition or shape of the interlayer dielectric specially adapted to the circuit arrangement
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- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
- H01L27/1262—Multistep manufacturing methods with a particular formation, treatment or coating of the substrate
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
- B41J2202/01—Embodiments of or processes related to ink-jet heads
- B41J2202/09—Ink jet technology used for manufacturing optical filters
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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Description
110 絶縁基板
121 ゲート線
124 ゲート電極
140 ゲート絶縁膜
154 半導体
171 データ線
173 ソース電極
175 ドレイン電極
180 保護膜
185 コンタクトホール
191 画素電極
215 隔壁
225 有機キャッピング膜
220 遮光部材
230 カラーフィルタ
Claims (10)
- 絶縁基板と、
前記絶縁基板上に形成され、ゲート電極を含むゲート線と、
有機物質で形成される隔壁と、
前記ゲート線に交差して形成され、前記隔壁上に形成されるデータ線と、
前記隔壁によって区画された領域に形成されたカラーフィルタと、
前記ゲート電極、前記ゲート電極上の半導体、前記半導体上のソース電極及びドレイン電極を含み、前記半導体を除いて前記ゲート電極が前記隔壁に覆われ、前記半導体及び前記隔壁上に前記ソース電極及び前記ドレイン電極が形成される薄膜トランジスタと、
を含み、
前記隔壁の縦部は前記データ線に沿って形成されている、薄膜トランジスタ基板。 - 前記隔壁のうち、前記ゲート電極の上部に形成された隔壁は、その厚さを他の部分より薄く形成するか、または前記ゲート電極が露出するように除去される、請求項1に記載の薄膜トランジスタ基板。
- 前記隔壁を形成する有機物質は誘電率3.5以下の有機物質で形成される、請求項1に記載の薄膜トランジスタ基板。
- 前記隔壁上に形成されたゲート絶縁膜と、
前記薄膜トランジスタと前記ゲート絶縁膜上に形成された保護膜をさらに含み、
前記カラーフィルタは前記保護膜上に形成される、請求項1に記載の薄膜トランジスタ基板。 - 前記カラーフィルタと前記保護膜上に形成される有機キャッピング膜と、
前記有機キャッピング膜上に形成された画素電極をさらに含む、請求項4に記載の薄膜トランジスタ基板。 - 前記隔壁上に位置するゲート絶縁膜をさらに含み、
前記カラーフィルタは前記絶縁基板と前記ゲート絶縁膜との間に位置する、請求項1に記載の薄膜トランジスタ基板。 - 前記薄膜トランジスタ及び前記ゲート絶縁膜上に形成された保護膜と、
前記保護膜上に形成された有機キャッピング膜と、
前記有機キャッピング膜上に形成された画素電極と、
をさらに含む請求項6に記載の薄膜トランジスタ基板。 - 前記隔壁の上部に形成されている遮光部材をさらに含む、請求項1に記載の薄膜トランジスタ基板。
- コンタクトホールによって前記薄膜トランジスタと接続される画素電極と、
前記画素電極の一部の上に位置する遮光部材と、
をさらに含み、前記コンタクトホールは前記カラーフィルタまたは前記遮光部材を貫通しない、請求項1に記載の薄膜トランジスタ基板。 - 前記隔壁用有機物質は透明な有機物質である、請求項1に記載の薄膜トランジスタ基板。
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KR1020080083420A KR101448000B1 (ko) | 2008-08-26 | 2008-08-26 | 박막 트랜지스터 기판 및 그 제조 방법 |
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KR101572081B1 (ko) * | 2009-04-22 | 2015-11-26 | 삼성디스플레이 주식회사 | 액정 표시 장치 및 그 제조 방법 |
KR101665529B1 (ko) * | 2010-04-21 | 2016-10-13 | 삼성디스플레이 주식회사 | 액정 표시 장치 및 그 제조 방법 |
TW202414842A (zh) * | 2011-05-05 | 2024-04-01 | 日商半導體能源研究所股份有限公司 | 半導體裝置及其製造方法 |
KR101703985B1 (ko) | 2012-08-22 | 2017-02-08 | 삼성디스플레이 주식회사 | 액정 표시 장치 및 그 제조 방법 |
KR20140048731A (ko) * | 2012-10-16 | 2014-04-24 | 삼성디스플레이 주식회사 | 나노 크리스탈 디스플레이 |
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KR20140110563A (ko) | 2013-03-08 | 2014-09-17 | 삼성디스플레이 주식회사 | 표시 장치 및 그 제조 방법 |
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TWI528074B (zh) * | 2014-03-28 | 2016-04-01 | 群創光電股份有限公司 | 顯示面板 |
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-
2008
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2009
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KR101448000B1 (ko) | 2014-10-14 |
US20100053507A1 (en) | 2010-03-04 |
KR20100024730A (ko) | 2010-03-08 |
JP2010055065A (ja) | 2010-03-11 |
US8218110B2 (en) | 2012-07-10 |
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