JP5583266B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP5583266B2 JP5583266B2 JP2013503558A JP2013503558A JP5583266B2 JP 5583266 B2 JP5583266 B2 JP 5583266B2 JP 2013503558 A JP2013503558 A JP 2013503558A JP 2013503558 A JP2013503558 A JP 2013503558A JP 5583266 B2 JP5583266 B2 JP 5583266B2
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- 239000004065 semiconductor Substances 0.000 title claims description 177
- 239000000758 substrate Substances 0.000 claims description 40
- 230000015556 catabolic process Effects 0.000 claims description 32
- 238000009792 diffusion process Methods 0.000 claims description 19
- 239000010949 copper Substances 0.000 claims description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 6
- 229910052802 copper Inorganic materials 0.000 claims description 6
- 230000017525 heat dissipation Effects 0.000 claims description 6
- 239000010410 layer Substances 0.000 description 132
- 239000010408 film Substances 0.000 description 71
- 239000011229 interlayer Substances 0.000 description 16
- 229910052751 metal Inorganic materials 0.000 description 14
- 239000002184 metal Substances 0.000 description 14
- 230000004888 barrier function Effects 0.000 description 12
- 230000002265 prevention Effects 0.000 description 11
- 238000000034 method Methods 0.000 description 10
- 239000010409 thin film Substances 0.000 description 10
- 238000010586 diagram Methods 0.000 description 8
- 230000008901 benefit Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 239000012528 membrane Substances 0.000 description 4
- ORQBXQOJMQIAOY-UHFFFAOYSA-N nobelium Chemical compound [No] ORQBXQOJMQIAOY-UHFFFAOYSA-N 0.000 description 4
- 230000006870 function Effects 0.000 description 3
- 229920003209 poly(hydridosilsesquioxane) Polymers 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- CNQCVBJFEGMYDW-UHFFFAOYSA-N lawrencium atom Chemical compound [Lr] CNQCVBJFEGMYDW-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
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Description
discharge)保護素子を備える半導体装置に関する。
1:半導体基板
2:半導体素子
3:配線層
4:層間絶縁膜
5:配線
6:ビア
7:拡散防止層
8:バリアメタル層
11:ESD保護素子
12:半導体層
13:ゲート電極
14:ハードマスク層
15:ソース電極
16:ドレイン電極
17:接地パッド
18:I/Oパッド
19:抵抗素子
21、22、23:配線
100:半導体装置
101:半導体基板
102:半導体素子
103:配線層
104:配線
105:層間絶縁膜
106:ビア
107:ESD保護素子
108、109:配線
201、202:接地パッド
203:内部回路
204:ESDサージ
206、207:内部回路
Claims (10)
- 半導体素子が形成された半導体基板と、
前記半導体基板の上方に前記半導体素子を覆うように形成された第1絶縁膜と、
前記第1絶縁膜に設けられた溝に埋め込まれた複数の第1配線と、
前記第1絶縁膜と前記複数の第1配線とを被覆するように設けられた第2絶縁膜と、
前記第2絶縁膜の上に形成された半導体層と、
前記第2絶縁膜上及び前記半導体層上に形成された第3絶縁膜と、
前記第3絶縁膜に設けられた溝に埋め込まれた複数の第2配線と、
前記複数の第2配線上に形成された第1及び第2パッドとを具備し、
前記複数の第1配線は、前記半導体層に対向する位置に設けられたゲート電極を含み、
前記複数の第2配線は、前記半導体層に接続されたソース電極、及び、前記半導体層に接続されたドレイン電極を含み、
前記ゲート電極と前記半導体層との間に位置する前記第2絶縁膜はゲート絶縁膜を構成しており、
前記ドレイン電極は前記第1パッドと電気的に接続しており、
前記ソース電極は前記第2パッドと電気的に接続しており、
前記半導体層と前記ソース電極と前記ドレイン電極と前記ゲート電極と前記ゲート絶縁膜とが、前記第1パッドから前記第2パッドにESDサージによる電流を放電するESD保護素子を構成している
半導体装置。 - 請求項1に記載の半導体装置であって、
前記半導体層は、InGaZnO、InZnO、ZnO、ZnAlO又はZnCuOのいずれかで形成されている
半導体装置。 - 請求項1又は2に記載の半導体装置であって、
前記ドレイン電極が前記半導体層と接触する接触面が前記半導体基板に垂直な方向において前記ゲート電極に重ならない
半導体装置。 - 請求項1乃至3のいずれかに記載の半導体装置であって、
前記ゲート電極と前記ドレイン電極との間の耐圧が20V以上である
半導体装置。 - 請求項4に記載の半導体装置であって、
前記第2絶縁膜がSiN膜又はSiCN膜である
半導体装置。 - 請求項5に記載の半導体装置であって、
前記第2絶縁膜の膜厚が20nm以上100nm以下である
半導体装置。 - 請求項5又は6に記載の半導体装置であって、
前記第1配線は銅からなり、
前記第2絶縁膜は、銅の拡散を防止する機能を備える
半導体装置。 - 請求項1乃至7のいずれかに記載の半導体装置であって、
更に、前記ESD保護素子の近傍に設けられた放熱用の配線を備える
半導体装置。 - 請求項8に記載の半導体装置であって、
前記放熱用の配線は、前記複数の第2配線と同一の配線層に形成されている
半導体装置。 - 請求項1乃至9のいずれかに記載の半導体装置であって、
前記ソース電極が前記半導体層と接触する接触面は、平面視において、前記ゲート電極と重なる位置に形成されており、
前記ドレイン電極が前記半導体層と接触する接触面は、平面視において、前記ゲート電極と重ならない位置に形成されている
半導体装置。
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JP6208971B2 (ja) * | 2012-09-14 | 2017-10-04 | ルネサスエレクトロニクス株式会社 | 半導体装置、及び半導体装置の製造方法 |
TWI757837B (zh) * | 2012-11-28 | 2022-03-11 | 日商半導體能源研究所股份有限公司 | 顯示裝置 |
JP2014187181A (ja) * | 2013-03-22 | 2014-10-02 | Toshiba Corp | 半導体装置及びその製造方法 |
KR102078340B1 (ko) * | 2013-07-17 | 2020-02-18 | 삼성디스플레이 주식회사 | 정전기 보호 회로 및 이를 구비한 전자 장치 |
JP2017069513A (ja) | 2015-10-02 | 2017-04-06 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
JP6785563B2 (ja) * | 2016-02-19 | 2020-11-18 | 三菱電機株式会社 | 非線形素子、アレイ基板、およびアレイ基板の製造方法 |
US10658318B2 (en) * | 2016-11-29 | 2020-05-19 | Taiwan Semiconductor Manufacturing Co., Ltd. | Film scheme for bumping |
CN106783842B (zh) | 2017-01-04 | 2019-05-17 | 京东方科技集团股份有限公司 | 一种静电保护电路、阵列基板、显示面板及显示装置 |
JP6877261B2 (ja) * | 2017-06-23 | 2021-05-26 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
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US20130334529A1 (en) | 2013-12-19 |
TW201301475A (zh) | 2013-01-01 |
TWI552301B (zh) | 2016-10-01 |
KR20140047587A (ko) | 2014-04-22 |
US9263399B2 (en) | 2016-02-16 |
JPWO2012121255A1 (ja) | 2014-07-17 |
WO2012121255A1 (ja) | 2012-09-13 |
US9530769B2 (en) | 2016-12-27 |
TW201631732A (zh) | 2016-09-01 |
CN103415920B (zh) | 2016-11-09 |
KR101862900B1 (ko) | 2018-05-30 |
US20160172354A1 (en) | 2016-06-16 |
CN103415920A (zh) | 2013-11-27 |
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