JP5505731B2 - イオン源 - Google Patents
イオン源 Download PDFInfo
- Publication number
- JP5505731B2 JP5505731B2 JP2011053396A JP2011053396A JP5505731B2 JP 5505731 B2 JP5505731 B2 JP 5505731B2 JP 2011053396 A JP2011053396 A JP 2011053396A JP 2011053396 A JP2011053396 A JP 2011053396A JP 5505731 B2 JP5505731 B2 JP 5505731B2
- Authority
- JP
- Japan
- Prior art keywords
- plasma generation
- ion source
- plate
- wall surface
- preventing plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000008021 deposition Effects 0.000 claims description 62
- 230000002265 prevention Effects 0.000 claims description 12
- 238000010884 ion-beam technique Methods 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 230000008018 melting Effects 0.000 claims description 5
- 238000002844 melting Methods 0.000 claims description 5
- 230000000903 blocking effect Effects 0.000 claims 1
- 238000000605 extraction Methods 0.000 description 4
- 230000003449 preventive effect Effects 0.000 description 4
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 238000013459 approach Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
- H01J27/14—Other arc discharge ion sources using an applied magnetic field
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/221—Ion beam deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
- H01J2237/022—Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Combustion & Propulsion (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Description
図6には、図3に示した防着板の変形例が描かれている。この例で示される防着板13の構成は図3に示された防着板13の構成とほぼ同一であって、図6の防着板13に形成される凹部14は傾斜部19を有しているのに対して、図3の防着板13に形成される凹部14にはそのような傾斜部19が存在してない点が異なっている。この傾斜部19は、プラズマ生成容器4の壁面に垂直な方向での防着板13の厚みが、プラズマ生成容器4の壁面に沿って、プラズマ生成容器4の壁面を介して永久磁石12と対向する位置に近づくにつれて徐々に薄くなるように構成されている。
4.プラズマ生成容器
12.永久磁石
13.防着板
14.凹部
15.第一の防着板
16.第二の防着板
17.座ぐり部
18.貫通穴
19.傾斜部
Claims (5)
- プラズマ生成容器と、
前記プラズマ生成容器内に配置された少なくとも1つのフィラメントと、
前記プラズマ生成容器に対向配置され、当該プラズマ生成容器よりイオンビームを引き出す少なくとも1つの電極と、
前記プラズマ生成容器の外側に設けられていて、当該プラズマ生成容器の内側領域にカスプ磁場を形成する複数の永久磁石と、
前記プラズマ生成容器の内壁に沿って配置された防着板とを備えたイオン源であって、
前記防着板には、前記プラズマ生成容器の壁面を介して前記永久磁石と対向する位置に凹部が形成されていることを特徴とするイオン源。 - 前記防着板は、前記プラズマ生成容器の壁面を介して前記永久磁石と対向する位置に座ぐり部が形成された第一の防着板と、当該座ぐり部内に配置された第二の防着板とで構成されていることを特徴とする請求項1記載のイオン源。
- 前記防着板は、前記プラズマ生成容器の壁面を介して前記永久磁石と対向する位置に貫通穴が形成された第一の防着板と、当該第一の防着板と前記プラズマ生成容器の壁面との間に配置され、前記貫通穴を塞ぐ第二の防着板とで構成されていることを特徴とする請求項1記載のイオン源。
- 前記第二の防着板は、高融点材料であることを特徴とする請求項2または3記載のイオン源。
- 前記凹部には、前記プラズマ生成容器の壁面に垂直な方向における前記防着板の厚みが連続して変化する傾斜部が形成されていることを特徴とする請求項1記載のイオン源。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011053396A JP5505731B2 (ja) | 2011-03-10 | 2011-03-10 | イオン源 |
US13/416,369 US8604683B2 (en) | 2011-03-10 | 2012-03-09 | Bucket-type ion source for fanning cusped magnetic fields inside a plasma generation chamber |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011053396A JP5505731B2 (ja) | 2011-03-10 | 2011-03-10 | イオン源 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012190658A JP2012190658A (ja) | 2012-10-04 |
JP5505731B2 true JP5505731B2 (ja) | 2014-05-28 |
Family
ID=46794895
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011053396A Expired - Fee Related JP5505731B2 (ja) | 2011-03-10 | 2011-03-10 | イオン源 |
Country Status (2)
Country | Link |
---|---|
US (1) | US8604683B2 (ja) |
JP (1) | JP5505731B2 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014082150A (ja) * | 2012-10-18 | 2014-05-08 | Nissin Ion Equipment Co Ltd | プラズマ源 |
JP6268680B2 (ja) * | 2016-06-14 | 2018-01-31 | 日新イオン機器株式会社 | イオン源の運転方法 |
CN106847661B (zh) * | 2017-01-24 | 2018-11-20 | 北京丹华科技发展有限公司 | 一种等离子体源以及镀膜机 |
US20180308661A1 (en) * | 2017-04-24 | 2018-10-25 | Applied Materials, Inc. | Plasma reactor with electrode filaments |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3032490A (en) * | 1958-04-28 | 1962-05-01 | Simon Albert | Destruction of neutral particles in a device for producing a high density plasma |
JPS63109433U (ja) * | 1987-01-09 | 1988-07-14 | ||
JPH0194753U (ja) * | 1987-12-16 | 1989-06-22 | ||
JPH0712177Y2 (ja) * | 1988-03-17 | 1995-03-22 | 株式会社松山製作所 | 車両用ミラーの弾性カバー取付構造 |
JP2837023B2 (ja) * | 1991-05-14 | 1998-12-14 | アプライド マテリアルズ インコーポレイテッド | イオン源の寿命を向上させたイオン打ち込み装置 |
JPH07262948A (ja) * | 1994-03-24 | 1995-10-13 | Nissin Electric Co Ltd | バケット型イオン源装置 |
JP4345895B2 (ja) | 2005-10-20 | 2009-10-14 | 日新イオン機器株式会社 | イオン源の運転方法およびイオン注入装置 |
-
2011
- 2011-03-10 JP JP2011053396A patent/JP5505731B2/ja not_active Expired - Fee Related
-
2012
- 2012-03-09 US US13/416,369 patent/US8604683B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2012190658A (ja) | 2012-10-04 |
US20120229012A1 (en) | 2012-09-13 |
US8604683B2 (en) | 2013-12-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6893697B2 (ja) | イオン化ツールを有するx線源 | |
EP2293318B1 (en) | Target for X-ray generation, X-ray generator, and method for producing target for X-ray generation | |
JP5505731B2 (ja) | イオン源 | |
JPS6020440A (ja) | イオンビ−ム加工装置 | |
JP6100619B2 (ja) | イオン源およびイオンミリング装置 | |
JP2013533382A (ja) | 定義された電界を有するarc蒸着ソース | |
JP4533112B2 (ja) | ウエハ帯電抑制装置及びこれを備えたイオン注入装置 | |
US10431415B2 (en) | X-ray tube ion barrier | |
JP2006156137A (ja) | ビーム空間電荷中和装置及びこれを備えたイオン注入装置 | |
KR101456218B1 (ko) | 플라즈마원 | |
JP5477868B2 (ja) | マグネトロン型スパッタ装置 | |
JP7029633B2 (ja) | イオン源、イオン注入装置 | |
KR20120060238A (ko) | 전자총용 필라멘트 및 이의 제조 방법 | |
JP5891269B2 (ja) | アノード電極を具備するx線チューブ | |
TWI743879B (zh) | 離子槍及離子銑削裝置 | |
KR101949921B1 (ko) | 전하 캐리어 생성 공간으로부터 전기 전하 캐리어들의 추출을 위한 디바이스 및 그런 디바이스를 동작시키기 위한 방법 | |
JP6296545B2 (ja) | 電子ビーム装置、電子ビーム用フィラメントの製造装置及び製造方法 | |
JP2010525173A (ja) | アーク放電を起こしてプラズマを形成するアノード | |
KR101495424B1 (ko) | 이온 빔 소스 | |
KR100853404B1 (ko) | 텅스텐 코팅 부품을 사용한 이온 주입 장치 및 그 제조방법 | |
JP4790823B2 (ja) | デフレクタ | |
JP2007503691A (ja) | 改善されたイオン・カラム動作のための成形スパッタ・シールド | |
JP2015007269A (ja) | 電子ビーム蒸着用電子銃装置 | |
JP6194178B2 (ja) | 電子銃及び電子ビームの放出方法 | |
JP6460501B2 (ja) | 電子ビーム装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20130829 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20140217 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20140220 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20140305 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5505731 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |