JP5455344B2 - カラーフィルタ及びその製造方法 - Google Patents
カラーフィルタ及びその製造方法 Download PDFInfo
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- JP5455344B2 JP5455344B2 JP2008249522A JP2008249522A JP5455344B2 JP 5455344 B2 JP5455344 B2 JP 5455344B2 JP 2008249522 A JP2008249522 A JP 2008249522A JP 2008249522 A JP2008249522 A JP 2008249522A JP 5455344 B2 JP5455344 B2 JP 5455344B2
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- HNONEKILPDHFOL-UHFFFAOYSA-M tolonium chloride Chemical compound [Cl-].C1=C(C)C(N)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 HNONEKILPDHFOL-UHFFFAOYSA-M 0.000 description 1
- 125000005424 tosyloxy group Chemical group S(=O)(=O)(C1=CC=C(C)C=C1)O* 0.000 description 1
- GTZCVFVGUGFEME-UHFFFAOYSA-N trans-aconitic acid Natural products OC(=O)CC(C(O)=O)=CC(O)=O GTZCVFVGUGFEME-UHFFFAOYSA-N 0.000 description 1
- PWBHRVGYSMBMIO-UHFFFAOYSA-M tributylstannanylium;acetate Chemical compound CCCC[Sn](CCCC)(CCCC)OC(C)=O PWBHRVGYSMBMIO-UHFFFAOYSA-M 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 125000005580 triphenylene group Chemical group 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- 150000003673 urethanes Chemical class 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- ZTWTYVWXUKTLCP-UHFFFAOYSA-N vinylphosphonic acid Chemical class OP(O)(=O)C=C ZTWTYVWXUKTLCP-UHFFFAOYSA-N 0.000 description 1
- 125000001834 xanthenyl group Chemical class C1=CC=CC=2OC3=CC=CC=C3C(C12)* 0.000 description 1
- 150000007964 xanthones Chemical class 0.000 description 1
- 125000006839 xylylene group Chemical group 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Liquid Crystal (AREA)
Priority Applications (1)
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JP2008249522A JP5455344B2 (ja) | 2007-09-28 | 2008-09-29 | カラーフィルタ及びその製造方法 |
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JP2007256118 | 2007-09-28 | ||
JP2007256118 | 2007-09-28 | ||
JP2008249522A JP5455344B2 (ja) | 2007-09-28 | 2008-09-29 | カラーフィルタ及びその製造方法 |
Publications (2)
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JP2009098691A JP2009098691A (ja) | 2009-05-07 |
JP5455344B2 true JP5455344B2 (ja) | 2014-03-26 |
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JP2008249522A Active JP5455344B2 (ja) | 2007-09-28 | 2008-09-29 | カラーフィルタ及びその製造方法 |
Country Status (4)
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JP (1) | JP5455344B2 (ko) |
KR (1) | KR101506229B1 (ko) |
CN (1) | CN101398497B (ko) |
TW (1) | TWI437284B (ko) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN104650281A (zh) * | 2014-12-26 | 2015-05-27 | 北京鼎材科技有限公司 | 一种彩色滤光片用碱溶性树脂聚合物及光敏性树脂组合物 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH085820A (ja) * | 1994-06-21 | 1996-01-12 | Toray Ind Inc | カラーフィルタ |
TW425484B (en) * | 1995-04-28 | 2001-03-11 | Toray Industries | A resin black matrix for liquid crystal display device |
JP3946309B2 (ja) * | 1997-04-10 | 2007-07-18 | 富士フイルム株式会社 | 着色感光性組成物 |
JP4486282B2 (ja) * | 2001-07-17 | 2010-06-23 | 富士フイルム株式会社 | 顔料分散剤、これを含む顔料分散組成物および着色感光性組成物 |
JP3900078B2 (ja) | 2001-12-18 | 2007-04-04 | Jsr株式会社 | カラーフィルタ用感放射線性組成物、カラーフィルタおよびカラー液晶表示装置 |
JP4133137B2 (ja) * | 2002-09-06 | 2008-08-13 | 東洋インキ製造株式会社 | 感光性着色組成物 |
JP4597638B2 (ja) | 2003-11-14 | 2010-12-15 | 富士フイルム株式会社 | 光硬化性組成物の製造方法、カラーフィルター、及び、光硬化性組成物の評価方法 |
JP4378163B2 (ja) * | 2003-12-16 | 2009-12-02 | 東洋インキ製造株式会社 | カラーフィルタ用青色着色組成物およびカラーフィルタ |
JP2006030674A (ja) * | 2004-07-16 | 2006-02-02 | Jsr Corp | カラーフィルタ用感放射線性組成物とその調製法、カラーフィルタおよびカラー液晶表示装置 |
JP5030375B2 (ja) * | 2004-09-29 | 2012-09-19 | 富士フイルム株式会社 | カラーフィルタ、固体撮像素子及びシアン色カラーフィルタ用光硬化性組成物 |
JP4712516B2 (ja) | 2005-10-19 | 2011-06-29 | 富士フイルム株式会社 | 微粒子含有組成物、表示装置用着色膜形成用インク、表示装置用遮光膜、遮光材料、遮光膜付き基板、カラーフィルタ、液晶表示素子、及び液晶表示装置 |
CN100520452C (zh) * | 2006-01-27 | 2009-07-29 | 东洋油墨制造株式会社 | 彩色滤光片用着色组合物及使用该组合物的彩色滤光片 |
-
2008
- 2008-09-24 CN CN2008101610254A patent/CN101398497B/zh not_active Expired - Fee Related
- 2008-09-26 TW TW097137025A patent/TWI437284B/zh not_active IP Right Cessation
- 2008-09-26 KR KR1020080094552A patent/KR101506229B1/ko active IP Right Grant
- 2008-09-29 JP JP2008249522A patent/JP5455344B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
TW200928458A (en) | 2009-07-01 |
JP2009098691A (ja) | 2009-05-07 |
KR101506229B1 (ko) | 2015-03-26 |
CN101398497B (zh) | 2012-06-27 |
KR20090033089A (ko) | 2009-04-01 |
TWI437284B (zh) | 2014-05-11 |
CN101398497A (zh) | 2009-04-01 |
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