JP5396976B2 - 有機el素子及びその製造方法 - Google Patents
有機el素子及びその製造方法 Download PDFInfo
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- JP5396976B2 JP5396976B2 JP2009092798A JP2009092798A JP5396976B2 JP 5396976 B2 JP5396976 B2 JP 5396976B2 JP 2009092798 A JP2009092798 A JP 2009092798A JP 2009092798 A JP2009092798 A JP 2009092798A JP 5396976 B2 JP5396976 B2 JP 5396976B2
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
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- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
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Description
請求項2にかかる発明としては、前記下地層を形成する方法が、凸版印刷法であることを特徴とする請求項1に記載の有機エレクトロルミネッセンス素子の製造方法とした。
請求項3にかかる発明としては、請求項1乃至2に記載の製造方法を用いたことを特徴とする有機エレクトロルミネッセンス素子とした。
請求項4にかかる発明としては、請求項3に記載の有機エレクトロルミネッセンス素
子を用いたことを特徴とする有機エレクトロルミネッセンスディスプレイとした。
次に、本発明の実施例を説明する。本実施例においては、既に画素電極(陽極2)、取り出し電極、TFT回路を保護するためのSiNx膜からなる絶縁層およびポリイミドからなる絶縁層を備え、当該ポリイミドからなる絶縁層は画素を仕切るように形成されており、よって各画素の隔壁7としても機能するようなTFT基板1を用いて、その上に正孔輸送層4、有機発光層6、陰極7を順次形成して、アクティブマトリックス方式の有機ELディスプレイパネルを作成した。
比較例1では、インターレイヤを画素部9のラインにのみ形成し、隔壁上に印刷しなかった。それ以外は実施例1と同様の工程で有機ELディスプレイ用素子パネルを作製した。
表1に実施例1と比較例1のパネル点灯結果を示す。
2:陽極
3:隔壁
4:正孔輸送層
5:インターレイヤ層
6:有機発光層
7:陰極
8:封止体
8a:封止キャップ
8b:接着剤
8c:乾燥剤
9:画素部
10:隔壁が形成された基板(被印刷基板)
11:版胴
12:樹脂凸版
13:アニロックスロール
14:版のストライプ
Claims (4)
- 隔壁によって区画された画素を有する基板上に、有機発光材料を含むインキを印刷法により塗工して有機発光層を形成する有機エレクトロルミネッセンスディスプレイの製造方法であって、
前記有機発光層は下地層の表面に形成されており、前記下地層は前記画素を含むラインをストライプパターンで印刷する工程と、前記隔壁上にストライプパターンで印刷する工程と、を相前後して行い形成することを特徴とする有機エレクトロルミネッセンス素子の製造方法。 - 前記下地層を形成する方法が、凸版印刷法であることを特徴とする請求項1に記載の有機エレクトロルミネッセンス素子の製造方法。
- 請求項1乃至2に記載の製造方法を用いたことを特徴とする有機エレクトロルミネッセンス素子。
- 請求項3に記載の有機エレクトロルミネッセンス素子を用いたことを特徴とする有機エ
レクトロルミネッセンスディスプレイ。
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JP (1) | JP5396976B2 (ja) |
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JP5526610B2 (ja) * | 2009-06-09 | 2014-06-18 | 凸版印刷株式会社 | 有機elディスプレイの構造とその製造方法 |
KR101107180B1 (ko) * | 2009-11-10 | 2012-01-25 | 삼성모바일디스플레이주식회사 | 유기 발광 표시 장치 및 그 제조 방법 |
WO2011103341A1 (en) * | 2010-02-18 | 2011-08-25 | Alliance For Sustainable Energy, Llc | Moisture barrier |
JP5593843B2 (ja) * | 2010-05-31 | 2014-09-24 | 凸版印刷株式会社 | 有機エレクトロルミネッセンス素子及びその製造方法 |
CN102779831B (zh) * | 2012-07-10 | 2015-09-02 | 京东方科技集团股份有限公司 | 一种有机显示器件及制作的方法 |
AU2017221491B2 (en) | 2016-02-19 | 2019-06-27 | Avery Dennison Corporation | Two stage methods for processing adhesives and related compositions |
WO2018081268A1 (en) | 2016-10-25 | 2018-05-03 | Avery Dennison Corporation | Block polymers with photoinitiator groups in backbone and their use in adhesive compositions |
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JP3036436B2 (ja) | 1996-06-19 | 2000-04-24 | セイコーエプソン株式会社 | アクティブマトリックス型有機el表示体の製造方法 |
JP2001093668A (ja) | 1999-09-22 | 2001-04-06 | Canon Inc | 有機発光材料、それを用いた表示体及びその製造方法 |
JP2001155858A (ja) | 1999-11-24 | 2001-06-08 | Sharp Corp | 有機el素子の製造方法 |
JP3879425B2 (ja) | 2001-04-03 | 2007-02-14 | セイコーエプソン株式会社 | 有機el素子の製造方法 |
JP2006073222A (ja) | 2004-08-31 | 2006-03-16 | Asahi Glass Co Ltd | 有機el表示装置及び有機el表示装置の製造方法 |
JP2006286309A (ja) * | 2005-03-31 | 2006-10-19 | Toppan Printing Co Ltd | 有機el表示装置とその製造方法 |
US7485023B2 (en) * | 2005-03-31 | 2009-02-03 | Toppan Printing Co., Ltd. | Organic electroluminescent device having partition wall and a manufacturing method of the same by relief printing method |
JP2007115465A (ja) * | 2005-10-19 | 2007-05-10 | Toppan Printing Co Ltd | 有機エレクトロルミネッセンス素子 |
JP2007288074A (ja) * | 2006-04-19 | 2007-11-01 | Matsushita Electric Ind Co Ltd | 有機エレクトロルミネッセント素子およびその製造方法 |
US20070241665A1 (en) * | 2006-04-12 | 2007-10-18 | Matsushita Electric Industrial Co., Ltd. | Organic electroluminescent element, and manufacturing method thereof, as well as display device and exposure apparatus using the same |
US7977866B2 (en) * | 2006-11-22 | 2011-07-12 | Toppan Printing Co., Ltd | Organic electroluminescence element having partition wall covered by insulating layer |
JP4254856B2 (ja) * | 2006-12-22 | 2009-04-15 | ソニー株式会社 | 有機電界発光素子および表示装置 |
JP5326289B2 (ja) * | 2007-03-23 | 2013-10-30 | 凸版印刷株式会社 | 有機el素子およびそれを備えた表示装置 |
JP2009123618A (ja) * | 2007-11-16 | 2009-06-04 | Toppan Printing Co Ltd | 有機el表示装置及びその製造方法 |
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JP2010103083A (ja) | 2010-05-06 |
US20100079064A1 (en) | 2010-04-01 |
US8040049B2 (en) | 2011-10-18 |
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