JP5319681B2 - カーボン製反応装置 - Google Patents

カーボン製反応装置 Download PDF

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Publication number: JP5319681B2
Authority: JP; Japan
Prior art keywords: carbon; filling member; substantially cylindrical; silicon carbide; cylindrical body
Prior art date: 2008-08-07
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Active

Application number

JP2010523692A

Other languages

English (en)

Japanese (ja)

Other versions

JPWO2010016133A1 (ja

Inventor

和之湯舟

峯登小林

孝夫竹内

裕介和久田

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Denka Co Ltd

Original Assignee

Denki Kagaku Kogyo KK

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2008-08-07

Filing date

2008-08-07

Publication date

2013-10-16

2008-08-07 Application filed by Denki Kagaku Kogyo KK filed Critical Denki Kagaku Kogyo KK

2012-01-12 Publication of JPWO2010016133A1 publication Critical patent/JPWO2010016133A1/ja

2013-10-16 Application granted granted Critical

2013-10-16 Publication of JP5319681B2 publication Critical patent/JP5319681B2/ja

Status Active legal-status Critical Current

2028-08-07 Anticipated expiration legal-status Critical

Links

OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 182
229910052799 carbon Inorganic materials 0.000 title claims abstract description 144
238000006243 chemical reaction Methods 0.000 claims abstract description 81
HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims abstract description 40
229910010271 silicon carbide Inorganic materials 0.000 claims abstract description 39
239000007789 gas Substances 0.000 claims abstract description 36
239000001257 hydrogen Substances 0.000 claims abstract description 22
229910052739 hydrogen Inorganic materials 0.000 claims abstract description 22
239000005046 Chlorosilane Substances 0.000 claims abstract description 17
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 17
KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims abstract description 17
150000002431 hydrogen Chemical class 0.000 claims abstract description 7
238000011049 filling Methods 0.000 claims description 67
239000011248 coating agent Substances 0.000 claims description 22
238000000576 coating method Methods 0.000 claims description 22
229910002804 graphite Inorganic materials 0.000 claims description 10
239000010439 graphite Substances 0.000 claims description 10
238000005229 chemical vapour deposition Methods 0.000 claims description 7
238000000034 method Methods 0.000 claims description 7
238000005192 partition Methods 0.000 claims description 5
230000000149 penetrating effect Effects 0.000 claims description 2
229910000975 Carbon steel Inorganic materials 0.000 claims 1
239000010962 carbon steel Substances 0.000 claims 1
238000012856 packing Methods 0.000 abstract description 4
239000000203 mixture Substances 0.000 abstract description 2
239000012808 vapor phase Substances 0.000 abstract 1
230000002093 peripheral effect Effects 0.000 description 17
VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 10
239000000126 substance Substances 0.000 description 10
230000007797 corrosion Effects 0.000 description 8
238000005260 corrosion Methods 0.000 description 8
230000003628 erosive effect Effects 0.000 description 7
239000000463 material Substances 0.000 description 7
239000006227 byproduct Substances 0.000 description 5
FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 5
238000000605 extraction Methods 0.000 description 4
239000000945 filler Substances 0.000 description 4
150000002430 hydrocarbons Chemical class 0.000 description 4
ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 4
239000005052 trichlorosilane Substances 0.000 description 4
239000004215 Carbon black (E152) Substances 0.000 description 3
229910003902 SiCl 4 Inorganic materials 0.000 description 3
229930195733 hydrocarbon Natural products 0.000 description 3
239000000376 reactant Substances 0.000 description 3
230000035939 shock Effects 0.000 description 3
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical group [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
238000002144 chemical decomposition reaction Methods 0.000 description 2
SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 2
IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
230000000052 comparative effect Effects 0.000 description 2
238000005336 cracking Methods 0.000 description 2
239000010419 fine particle Substances 0.000 description 2
239000007770 graphite material Substances 0.000 description 2
238000004519 manufacturing process Methods 0.000 description 2
JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 2
238000012986 modification Methods 0.000 description 2
230000004048 modification Effects 0.000 description 2
239000003566 sealing material Substances 0.000 description 2
229910052710 silicon Inorganic materials 0.000 description 2
239000010703 silicon Substances 0.000 description 2
-1 silicon halide compound Chemical class 0.000 description 2
238000012546 transfer Methods 0.000 description 2
238000004804 winding Methods 0.000 description 2
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
229910052786 argon Inorganic materials 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
150000001721 carbon Chemical class 0.000 description 1
239000004568 cement Substances 0.000 description 1
239000007795 chemical reaction product Substances 0.000 description 1
MNKYQPOFRKPUAE-UHFFFAOYSA-N chloro(triphenyl)silane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(Cl)C1=CC=CC=C1 MNKYQPOFRKPUAE-UHFFFAOYSA-N 0.000 description 1
238000002485 combustion reaction Methods 0.000 description 1
230000008878 coupling Effects 0.000 description 1
238000010168 coupling process Methods 0.000 description 1
238000005859 coupling reaction Methods 0.000 description 1
238000000151 deposition Methods 0.000 description 1
238000013461 design Methods 0.000 description 1
230000006866 deterioration Effects 0.000 description 1
KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 1
LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
230000000694 effects Effects 0.000 description 1
238000002474 experimental method Methods 0.000 description 1
238000010438 heat treatment Methods 0.000 description 1
238000011068 loading method Methods 0.000 description 1
239000005055 methyl trichlorosilane Substances 0.000 description 1
239000005048 methyldichlorosilane Substances 0.000 description 1
238000002156 mixing Methods 0.000 description 1
239000001294 propane Substances 0.000 description 1
239000002994 raw material Substances 0.000 description 1
239000004065 semiconductor Substances 0.000 description 1
238000004381 surface treatment Methods 0.000 description 1
239000005051 trimethylchlorosilane Substances 0.000 description 1

Images

Classifications

- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/02—Apparatus characterised by being constructed of material selected for its chemically-resistant properties
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/0053—Details of the reactor
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/30—Loose or shaped packing elements, e.g. Raschig rings or Berl saddles, for pouring into the apparatus for mass or heat transfer
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/30—Loose or shaped packing elements, e.g. Raschig rings or Berl saddles, for pouring into the apparatus for mass or heat transfer
- B01J19/305—Supporting elements therefor, e.g. grids, perforated plates
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00002—Chemical plants
- B01J2219/00018—Construction aspects
- B01J2219/0002—Plants assembled from modules joined together
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/00074—Controlling the temperature by indirect heating or cooling employing heat exchange fluids
- B01J2219/00076—Controlling the temperature by indirect heating or cooling employing heat exchange fluids with heat exchange elements inside the reactor
- B01J2219/00081—Tubes
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/00074—Controlling the temperature by indirect heating or cooling employing heat exchange fluids
- B01J2219/00087—Controlling the temperature by indirect heating or cooling employing heat exchange fluids with heat exchange elements outside the reactor
- B01J2219/00094—Jackets
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/02—Apparatus characterised by their chemically-resistant properties
- B01J2219/025—Apparatus characterised by their chemically-resistant properties characterised by the construction materials of the reactor vessel proper
- B01J2219/0272—Graphite
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/30—Details relating to random packing elements
- B01J2219/302—Basic shape of the elements
- B01J2219/30219—Disk
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/30—Details relating to random packing elements
- B01J2219/304—Composition or microstructure of the elements
- B01J2219/30416—Ceramic
- B01J2219/30425—Carbon
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/30—Details relating to random packing elements
- B01J2219/308—Details relating to random packing elements filling or discharging the elements into or from packed columns
- B01J2219/3081—Orientation of the packing elements within the column or vessel
- B01J2219/3085—Ordered or stacked packing elements

Landscapes

Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Chemical Kinetics & Catalysis (AREA)
Physics & Mathematics (AREA)
Thermal Sciences (AREA)
Inorganic Chemistry (AREA)
Silicon Compounds (AREA)
Chemical Vapour Deposition (AREA)
Carbon And Carbon Compounds (AREA)

JP2010523692A 2008-08-07 2008-08-07 カーボン製反応装置 Active JP5319681B2 (ja)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
PCT/JP2008/064237 WO2010016133A1 (fr)	2008-08-07	2008-08-07	Réacteur constitué de carbone

Publications (2)

Publication Number	Publication Date
JPWO2010016133A1 JPWO2010016133A1 (ja)	2012-01-12
JP5319681B2 true JP5319681B2 (ja)	2013-10-16

Family

ID=41663363

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP2010523692A Active JP5319681B2 (ja)	2008-08-07	2008-08-07	カーボン製反応装置

Country Status (2)

Country	Link
JP (1)	JP5319681B2 (fr)
WO (1)	WO2010016133A1 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP5553754B2 (ja) *	2008-08-07	2014-07-16	電気化学工業株式会社	カーボン製反応容器
JP5374581B2 (ja) *	2009-04-03	2013-12-25	電気化学工業株式会社	カーボン製反応容器の破損防止方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH09157073A (ja) *	1995-12-01	1997-06-17	Denki Kagaku Kogyo Kk	カーボン製反応容器
WO2005016820A1 (fr) *	2003-08-13	2005-02-24	Tokuyama Corporation	Cuve de reaction tubulaire et procede pour y produire du silicium

2008
- 2008-08-07 WO PCT/JP2008/064237 patent/WO2010016133A1/fr active Application Filing
- 2008-08-07 JP JP2010523692A patent/JP5319681B2/ja active Active

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH09157073A (ja) *	1995-12-01	1997-06-17	Denki Kagaku Kogyo Kk	カーボン製反応容器
WO2005016820A1 (fr) *	2003-08-13	2005-02-24	Tokuyama Corporation	Cuve de reaction tubulaire et procede pour y produire du silicium

Also Published As

Publication number	Publication date
WO2010016133A1 (fr)	2010-02-11
JPWO2010016133A1 (ja)	2012-01-12

Legal Events

Date	Code	Title	Description
2013-04-10	A131	Notification of reasons for refusal	Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130409
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2013-07-03	A01	Written decision to grant a patent or to grant a registration (utility model)	Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20130702
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