JP5258700B2 - 被膜付き多孔質体 - Google Patents
被膜付き多孔質体 Download PDFInfo
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- JP5258700B2 JP5258700B2 JP2009183886A JP2009183886A JP5258700B2 JP 5258700 B2 JP5258700 B2 JP 5258700B2 JP 2009183886 A JP2009183886 A JP 2009183886A JP 2009183886 A JP2009183886 A JP 2009183886A JP 5258700 B2 JP5258700 B2 JP 5258700B2
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- coating
- polysilazane
- film
- base material
- substrate
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- 238000000576 coating method Methods 0.000 title claims description 59
- 239000011248 coating agent Substances 0.000 title claims description 56
- 239000000463 material Substances 0.000 claims description 99
- 239000000919 ceramic Substances 0.000 claims description 41
- 239000011148 porous material Substances 0.000 claims description 39
- 229920001709 polysilazane Polymers 0.000 claims description 37
- 239000000758 substrate Substances 0.000 claims description 35
- 238000005219 brazing Methods 0.000 claims description 27
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- 229910052575 non-oxide ceramic Inorganic materials 0.000 claims description 8
- 239000011225 non-oxide ceramic Substances 0.000 claims description 8
- 239000000945 filler Substances 0.000 claims 1
- 239000010408 film Substances 0.000 description 58
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 36
- 238000000034 method Methods 0.000 description 35
- 229910052581 Si3N4 Inorganic materials 0.000 description 34
- 238000010438 heat treatment Methods 0.000 description 33
- 238000005304 joining Methods 0.000 description 29
- 239000012528 membrane Substances 0.000 description 26
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 22
- 239000007789 gas Substances 0.000 description 21
- 239000010410 layer Substances 0.000 description 21
- 229910052710 silicon Inorganic materials 0.000 description 21
- 238000000354 decomposition reaction Methods 0.000 description 20
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 19
- 239000012298 atmosphere Substances 0.000 description 19
- 239000010703 silicon Substances 0.000 description 19
- 238000000926 separation method Methods 0.000 description 18
- 238000001035 drying Methods 0.000 description 16
- 230000008569 process Effects 0.000 description 16
- 238000010304 firing Methods 0.000 description 12
- 229910021529 ammonia Inorganic materials 0.000 description 11
- 230000002093 peripheral effect Effects 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 9
- 230000007547 defect Effects 0.000 description 9
- 239000012299 nitrogen atmosphere Substances 0.000 description 9
- 229910045601 alloy Inorganic materials 0.000 description 8
- 239000000956 alloy Substances 0.000 description 8
- 238000000635 electron micrograph Methods 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 7
- 238000002844 melting Methods 0.000 description 7
- 230000008018 melting Effects 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 230000001590 oxidative effect Effects 0.000 description 6
- 230000035699 permeability Effects 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 5
- 238000004132 cross linking Methods 0.000 description 5
- 238000007598 dipping method Methods 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 229910002796 Si–Al Inorganic materials 0.000 description 4
- 230000008901 benefit Effects 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- 239000000470 constituent Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000011812 mixed powder Substances 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000005121 nitriding Methods 0.000 description 4
- 238000010248 power generation Methods 0.000 description 4
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 4
- 230000000903 blocking effect Effects 0.000 description 3
- 239000011575 calcium Substances 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000011224 oxide ceramic Substances 0.000 description 3
- 229910052574 oxide ceramic Inorganic materials 0.000 description 3
- 230000000149 penetrating effect Effects 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 229910010271 silicon carbide Inorganic materials 0.000 description 3
- 239000011863 silicon-based powder Substances 0.000 description 3
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 238000002485 combustion reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229910021426 porous silicon Inorganic materials 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 description 1
- RFEISCHXNDRNLV-UHFFFAOYSA-N aluminum yttrium Chemical compound [Al].[Y] RFEISCHXNDRNLV-UHFFFAOYSA-N 0.000 description 1
- JNDMLEXHDPKVFC-UHFFFAOYSA-N aluminum;oxygen(2-);yttrium(3+) Chemical group [O-2].[O-2].[O-2].[Al+3].[Y+3] JNDMLEXHDPKVFC-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000374 eutectic mixture Substances 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910019655 synthetic inorganic crystalline material Inorganic materials 0.000 description 1
- 229940116411 terpineol Drugs 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000009489 vacuum treatment Methods 0.000 description 1
- 229910019901 yttrium aluminum garnet Inorganic materials 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/50—Fuel cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Fuel Cell (AREA)
- Ceramic Products (AREA)
Description
また、好適には、上記製造方法は、前記塗布工程の後に、ポリシラザン系材料が塗布された基材を非酸化性雰囲気下で乾燥する乾燥工程と、その乾燥後に非酸化性雰囲気下で前記焼成工程よりも低温で熱処理を施す予備熱処理工程とを含み、前記焼成工程は、その予備熱処理工程の後に実施されるものである。塗布工程の後に焼成工程を直ちに或いは乾燥工程を施しただけで実施すると、ポリシラザン系材料から生成された被膜に亀裂等の欠陥が生じる場合があるが、上記のように予備熱処理工程を入れることにより、欠陥の発生を抑制できる。上記乾燥工程は例えば窒素雰囲気下において室温で実施され、上記予備熱処理工程は例えばアンモニア雰囲気下において600〜800(℃)の範囲内の温度、例えば650(℃)で実施される。
Claims (4)
- 外表面に開口する細孔径が0.01〜10(μm)の範囲内の多数の細孔を備えた多孔質の非酸化物系セラミックスから成る基材と、
前記基材の外表面に前記多数の細孔を閉塞することなく且つその外表面近傍ではその基材が露出しないように設けられたポリシラザン系材料由来のセラミックスから成る緻密質の被膜と
を、含むことを特徴とする被膜付き多孔質体。 - 前記ポリシラザン系材料は、オルガノポリシラザンまたはペルヒドロポリシラザンである請求項1の被膜付き多孔質体。
- 前記基材の外表面に前記ポリシラザン系材料を塗布し、1300〜1500(℃)の範囲内の温度で焼成処理を施すことにより前記多数の細孔を閉塞することなく前記基材の外表面を覆うセラミックスから成る被膜を前記ポリシラザン系材料から生成したものである請求項1または請求項2の被膜付き多孔質体。
- セラミックスから成る他の部材が金属ロウ材を介して接合されたものである請求項1乃至請求項3の何れか1項に記載の被膜付き多孔質体。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009183886A JP5258700B2 (ja) | 2009-08-06 | 2009-08-06 | 被膜付き多孔質体 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009183886A JP5258700B2 (ja) | 2009-08-06 | 2009-08-06 | 被膜付き多孔質体 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011037645A JP2011037645A (ja) | 2011-02-24 |
JP5258700B2 true JP5258700B2 (ja) | 2013-08-07 |
Family
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Family Applications (1)
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JP2009183886A Active JP5258700B2 (ja) | 2009-08-06 | 2009-08-06 | 被膜付き多孔質体 |
Country Status (1)
Country | Link |
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JP (1) | JP5258700B2 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102042665B1 (ko) * | 2017-08-21 | 2019-11-08 | 서울시립대학교 산학협력단 | 다공성 부재의 표면 처리 방법 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3770791B2 (ja) * | 2000-12-19 | 2006-04-26 | 株式会社ノリタケカンパニーリミテド | 高温対応型膜型改質器 |
JP4384540B2 (ja) * | 2004-05-07 | 2009-12-16 | 株式会社ノリタケカンパニーリミテド | 水素分離材及びその製造方法 |
JP2007076993A (ja) * | 2005-09-16 | 2007-03-29 | Noritake Co Ltd | 窒化ケイ素多孔質体の製造方法及びガス分離材 |
JP4482016B2 (ja) * | 2007-06-29 | 2010-06-16 | 株式会社ノリタケカンパニーリミテド | 複合セラミックスの製造方法、複合セラミックス、およびセラミックフィルタアセンブリ |
-
2009
- 2009-08-06 JP JP2009183886A patent/JP5258700B2/ja active Active
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Publication number | Publication date |
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JP2011037645A (ja) | 2011-02-24 |
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