JP5227507B2 - 薄膜光学リターダ - Google Patents
薄膜光学リターダ Download PDFInfo
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- JP5227507B2 JP5227507B2 JP2006327831A JP2006327831A JP5227507B2 JP 5227507 B2 JP5227507 B2 JP 5227507B2 JP 2006327831 A JP2006327831 A JP 2006327831A JP 2006327831 A JP2006327831 A JP 2006327831A JP 5227507 B2 JP5227507 B2 JP 5227507B2
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- optical retarder
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Images
Classifications
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N9/00—Details of colour television systems
- H04N9/12—Picture reproducers
- H04N9/31—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM]
- H04N9/3141—Constructional details thereof
- H04N9/315—Modulator illumination systems
- H04N9/3167—Modulator illumination systems for polarizing the light beam
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/14—Details
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/14—Details
- G03B21/20—Lamp housings
- G03B21/2073—Polarisers in the lamp house
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B33/00—Colour photography, other than mere exposure or projection of a colour film
- G03B33/10—Simultaneous recording or projection
- G03B33/12—Simultaneous recording or projection using beam-splitting or beam-combining systems, e.g. dichroic mirrors
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N9/00—Details of colour television systems
- H04N9/12—Picture reproducers
- H04N9/31—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM]
- H04N9/3102—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM] using two-dimensional electronic spatial light modulators
- H04N9/3105—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM] using two-dimensional electronic spatial light modulators for displaying all colours simultaneously, e.g. by using two or more electronic spatial light modulators
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Optics & Photonics (AREA)
- Polarising Elements (AREA)
- Liquid Crystal (AREA)
- Projection Apparatus (AREA)
Description
利用可能ではない。
52a 第1るつぼ
52b 第2るつぼ
54a 第1キャルロッド・ヒータ
54b 第2キャルロッド・ヒータ
56 熱電対
57 光学モニタ
58a 第1結晶率モニタ
58b 第2結晶率モニタ
60 イオン補助堆積(IAD)源
70 基板(または部分)を支持するためのマウント
80 光学180°マスク
Claims (24)
- 斜め角度堆積を使用して形成された少なくとも1つの構造複屈折層を備えた光学リターダであって、前記斜め角度および少なくとも1つの構造複屈折層の全体の厚さが、予め決められたAプレート・リターダンスを提供するように選択され、前記構造複屈折層は実質的に非多孔性であり、明確な柱状体/間隙の微細構造が欠如している、光学リターダ。
- 前記少なくとも1つの構造複屈折層が、実質的にアモルファスである、請求項1に記載の光学リターダ。
- 前記少なくとも1つの構造複屈折層が、誘電体薄膜を備える、請求項1に記載の光学リターダ。
- 前記少なくとも1つの構造複屈折層が、金属酸化物を備える、請求項1に記載の光学リターダ。
- 前記少なくとも1つの構造複屈折層が、Ta2O5からなる、請求項1に記載の光学リターダ。
- 前記少なくとも1つの構造複屈折層が、反射防止薄膜スタックに組み込まれる、請求項1に記載の光学リターダ。
- 前記Aプレート・リターダンスが、1と30nmの間の範囲にある、請求項1に記載の光学リターダ。
- 光学リターダがトリム・リターダであり、前記斜め角度および前記少なくとも1つの構造複屈折層の前記全体の厚さが、液晶ディスプレイ・パネルの残留面内複屈折を補償するためのAプレート・リターダンスを提供するように選択される、請求項1から7のいずれかに記載の光学リターダ。
- 構造複屈折反射防止スタックを備え、前記構造複屈折反射防止スタックが第1屈折率を有する第1の複数の誘電体層と第2屈折率を有する第2の複数の誘電体層とを含み、前記第1の複数の誘電体層が前記第2の複数の誘電体層に交互に挿入され、前記構造複屈折反射防止スタックが予め決められた−Cプレート・リターダンスを提供するものである、請求項8に記載の光学リターダ。
- 前記少なくとも1つの構造複屈折層および前記構造複屈折反射防止スタックが、基板の対向面に結合される、請求項9に記載の光学リターダ。
- 前記少なくとも1つの構造複屈折層および前記構造複屈折反射防止スタックが、基板の同じ面において縦続結合される、請求項9に記載の光学リターダ。
- 前記少なくとも1つの構造複屈折層および前記構造複屈折反射防止スタックが、前記液晶ディスプレイ・パネルのカバー・プレートに結合される、請求項9に記載の光学リターダ。
- 斜め角度堆積を使用して、少なくとも1つの構造複屈折層を表面上に堆積させる工程を備え、前記斜め角度および前記少なくとも1つの構造複屈折層の全体の厚さが、予め決められたAプレート・リターダンスを提供するように選択され、前記構造複屈折層は実質的に非多孔性であり、明確な柱状体/間隙の微細構造が欠如している、光学リターダを製作する方法。
- 前記斜め角度堆積を使用して、前記少なくとも1つの構造複屈折層を堆積させる工程が、材料を前記表面に向ける工程を含む、請求項13に記載の光学リターダを製作する方法。
- 前記斜め角度堆積を使用して、前記少なくとも1つの構造複屈折層を堆積させる工程が、イオン補助堆積を含む、請求項13に記載の光学リターダを製作する方法。
- 前記斜め角度堆積を使用して、前記少なくとも1つの構造複屈折層を堆積させる工程が、複数の堆積角度を使用して、材料を前記表面に向ける工程を含む、請求項13に記載の光学リターダを製作する方法。
- 平均堆積角度が、40°より小さい、請求項16に記載の光学リターダを製作する方法。
- 最大堆積角度が、40°より小さい、請求項16に記載の光学リターダを製作する方法。
- 前記斜め角度堆積が、最大堆積角度を低減するために基板の上に配置されるマスクを使用する、請求項16に記載の光学リターダを製作する方法。
- 光学リターダがトリム・リターダであり、前記斜め角度および前記少なくとも1つの構造複屈折層の前記全体の厚さが、液晶ディスプレイ・パネルの残留面内複屈折を補償するためのAプレート・リターダンスを提供するように選択される、請求項13に記載の光学リターダを製作する方法。
- 光源と、
前記光源からの光を受光し、第1線形偏光軸を有する第1線形偏光を透過させるための第1偏光子と、
前記第1線形偏光を光学変調させるための、残留複屈折を有する液晶ディスプレイ・パネルと、
前記光学変調光を受光し、第2線形偏光軸を有する第2線形偏光を透過させるための第2偏光子と、
前記第2線形偏光をスクリーン上に投影するための投影レンズと、
前記液晶ディスプレイ・パネルの前記残留複屈折を補償するための請求項1から7のいずれかに記載の光学リターダとを備える、液晶ディスプレイ・ベース投影システム。 - 前記光学リターダが、380nmと800nmの間の波長領域において0nmと−1000nmの間の面外リターダンス、および380nmから800nmの間の波長領域において1nmと30nmの間の面内リターダンスを有する、請求項21に記載の液晶ディスプレイ・ベース投影システム。
- 前記光学リターダが、前記液晶ディスプレイ・パネルのカバー基板上に堆積されたコーティングを含む、請求項21に記載の液晶ディスプレイ・ベース投影システム。
- 前記液晶ディスプレイ・パネルが、VANモードLCoSマイクロディスプレイ・パネルであり、前記第1偏光子および前記第2偏光子が、同じ偏光ビーム・スプリッタである、請求項21に記載の液晶ディスプレイ・ベース投影システム。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US74294005P | 2005-12-06 | 2005-12-06 | |
US60/742,940 | 2005-12-06 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2007188060A JP2007188060A (ja) | 2007-07-26 |
JP2007188060A5 JP2007188060A5 (ja) | 2011-07-28 |
JP5227507B2 true JP5227507B2 (ja) | 2013-07-03 |
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JP2006327831A Expired - Fee Related JP5227507B2 (ja) | 2005-12-06 | 2006-12-05 | 薄膜光学リターダ |
Country Status (6)
Country | Link |
---|---|
US (1) | US8094270B2 (ja) |
EP (1) | EP1796400A1 (ja) |
JP (1) | JP5227507B2 (ja) |
CN (1) | CN1991420B (ja) |
CA (1) | CA2569970C (ja) |
TW (1) | TWI420158B (ja) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
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JP4805130B2 (ja) * | 2006-12-27 | 2011-11-02 | 富士フイルム株式会社 | 反射型液晶表示素子及び反射型液晶プロジェクタ |
DE102007004285A1 (de) * | 2007-01-23 | 2008-07-24 | Carl Zeiss Smt Ag | Optisches Element mit aufgedampfter Beschichtung |
JP2009020383A (ja) * | 2007-07-13 | 2009-01-29 | Seiko Epson Corp | 位相差板及び投写型表示装置 |
JP5552728B2 (ja) * | 2007-11-20 | 2014-07-16 | セイコーエプソン株式会社 | 液晶装置、プロジェクタ、液晶装置の光学補償方法及び位相差板 |
US8212947B2 (en) * | 2007-11-20 | 2012-07-03 | Seiko Epson Corporation | Liquid crystal device, projector, and optical compensation method of liquid crystal device |
TWI499835B (zh) * | 2007-11-20 | 2015-09-11 | Seiko Epson Corp | Liquid crystal device, projector and liquid crystal device |
JP5262388B2 (ja) * | 2007-11-20 | 2013-08-14 | セイコーエプソン株式会社 | 液晶装置、プロジェクタ及び液晶装置の光学補償方法 |
JP5262387B2 (ja) * | 2007-11-20 | 2013-08-14 | セイコーエプソン株式会社 | 液晶装置、プロジェクタ及び液晶装置の光学補償方法 |
WO2011148465A1 (ja) * | 2010-05-25 | 2011-12-01 | ソニーケミカル&インフォメーションデバイス株式会社 | 波長板及び波長板の製造方法 |
JP2012163620A (ja) * | 2011-02-03 | 2012-08-30 | Seiko Epson Corp | 投射型表示装置 |
JP5768428B2 (ja) * | 2011-03-23 | 2015-08-26 | セイコーエプソン株式会社 | プロジェクター |
US8941801B2 (en) * | 2011-06-14 | 2015-01-27 | Reald Inc. | In-plane switched active retarder for stereoscopic display systems |
JP6265901B2 (ja) * | 2011-10-07 | 2018-01-24 | ノース・キャロライナ・ステイト・ユニヴァーシティ | 広帯域偏光変換のためのマルチツイストリターダ光学素子および関連製造方法 |
CN103197367B (zh) * | 2013-04-12 | 2015-09-16 | 中国科学院上海光学精密机械研究所 | 各向异性和各向同性混合薄膜反射式位相延迟片 |
JP6732631B2 (ja) * | 2016-10-31 | 2020-07-29 | 株式会社ジャパンディスプレイ | 表示装置 |
JP2019066706A (ja) | 2017-10-02 | 2019-04-25 | ソニー株式会社 | 蛍光顕微鏡装置及び蛍光顕微鏡システム |
US10379043B2 (en) * | 2017-12-29 | 2019-08-13 | Palo Alto Research Center Incorporated | Measuring path delay through a liquid-crystal variable retarder at non-uniform retardance intervals |
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2006
- 2006-11-29 US US11/564,500 patent/US8094270B2/en active Active
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- 2006-12-05 JP JP2006327831A patent/JP5227507B2/ja not_active Expired - Fee Related
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CA2569970C (en) | 2015-03-31 |
TW200741260A (en) | 2007-11-01 |
US8094270B2 (en) | 2012-01-10 |
CN1991420A (zh) | 2007-07-04 |
CA2569970A1 (en) | 2007-06-06 |
TWI420158B (zh) | 2013-12-21 |
JP2007188060A (ja) | 2007-07-26 |
EP1796400A1 (en) | 2007-06-13 |
CN1991420B (zh) | 2011-02-23 |
US20070195272A1 (en) | 2007-08-23 |
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