JP5057794B2 - Continuous film deposition system - Google Patents

Continuous film deposition system Download PDF

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JP5057794B2
JP5057794B2 JP2007023647A JP2007023647A JP5057794B2 JP 5057794 B2 JP5057794 B2 JP 5057794B2 JP 2007023647 A JP2007023647 A JP 2007023647A JP 2007023647 A JP2007023647 A JP 2007023647A JP 5057794 B2 JP5057794 B2 JP 5057794B2
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roll
unwinding
base material
protective material
winding
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JP2008189957A (en
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浩 玉垣
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Kobe Steel Ltd
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Kobe Steel Ltd
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4409—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber characterised by sealing means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Folding Of Thin Sheet-Like Materials, Special Discharging Devices, And Others (AREA)

Description

本発明は、プラスチックのフィルムやシートなどの帯状基材の表面に機能性皮膜を連続的に成膜する成膜装置に関する。   The present invention relates to a film forming apparatus for continuously forming a functional film on the surface of a belt-like substrate such as a plastic film or sheet.

近年、プラスチックフィルムやシートを基材とするディスプレイ基板が種々提案されており、前記基材には水蒸気や酸素に対するバリア性が要求される。かかるバリア性を付与するために、基材上に透明性のあるＳｉＯｘ皮膜をコーティングすることがあり、生産性の高いコーティング手段が望まれている。前記基材をロールからロールへ搬送する過程でＳｉＯｘ皮膜をコーティングの技術としては、例えば、真空蒸着法，スパッタ法などの物理蒸着法や、プラズマＣＶＤ（Plasma Enhanced-Chemical Vapor Deposition、以下ＰＥ−ＣＶＤと略記する。）法がある。特に、スパッタ法は、緻密な皮膜の形成が可能であり、バリア性の優れた皮膜を形成する手法として好適であり、発明者らの実験によれば、表面状態の良い基板上に、５０〜１００ｎｍのＳｉＯｘ、ＳｉＯＮ皮膜を成膜することにより、モコン法の検出限界である０．０２g/m2・day、０．０２cc/m2・atm・day以下の水準の水蒸気・酸素バリア性能が達成されることが確認された。 In recent years, various display substrates using a plastic film or sheet as a base material have been proposed, and the base material is required to have a barrier property against water vapor or oxygen. In order to provide such a barrier property, a transparent SiOx film may be coated on a substrate, and a coating means with high productivity is desired. As a technique for coating the SiOx film in the process of transporting the base material from roll to roll, for example, physical vapor deposition such as vacuum vapor deposition and sputtering, plasma enhanced chemical vapor deposition (hereinafter referred to as PE-CVD) Abbreviated.) There is a law. In particular, the sputtering method is capable of forming a dense film and is suitable as a technique for forming a film having an excellent barrier property. Water vapor / oxygen barrier performance below 0.02 g / m 2 · day, 0.02 cc / m 2 · atm · day, which is the detection limit of the Mocon method, is achieved by forming a 100 nm SiOx and SiON film. It was confirmed that

さらに、良好なバリア性を実現するには、前記バリア性に優れた皮膜をフィルム基材の両面に形成することが有効である。基材の両面にバリア皮膜を配することにより、水蒸気、酸素ガスの透過をさらに減少させることができ、また片面の皮膜に欠陥が生じた場合でも他面に被覆した皮膜がバリア機能を発揮し、直ちに大きなガス透過が発生しないという利点がある。   Furthermore, in order to realize good barrier properties, it is effective to form films having excellent barrier properties on both surfaces of the film substrate. By providing a barrier coating on both sides of the substrate, the permeation of water vapor and oxygen gas can be further reduced, and even when a defect occurs on one side of the substrate, the coating on the other side exhibits a barrier function. There is an advantage that no large gas permeation occurs immediately.

このような基材の両面に皮膜を形成する成膜装置としては、例えば、特開２００４−１１０２３号公報（特許文献１）や特開２００５−２１３５８２号公報（特許文献２）に記載されているように、一つの成膜ロールを用いて、片面成膜後に成膜ロールに張るフィルムの向きを反転させ、反対面を成膜する装置がある。しかし、基材の一方の面を成膜後、その反対側の面をロールに張った状態で成膜するため、反対側面を成膜する時に成膜中のフィルム基材に成膜に伴う入熱が生じ、ロールに接触した状態でフィルムが熱で膨張する。このため一方の面に形成された皮膜は、ロール表面と擦れ、皮膜に欠陥が生じる。目的とする皮膜がバリア膜のように厳しいバリア性が要求されるものでは、皮膜に生じたわずかな欠陥でも性能に大きく影響する。   Examples of a film forming apparatus that forms a film on both surfaces of a base material are described in Japanese Patent Application Laid-Open No. 2004-11023 (Patent Document 1) and Japanese Patent Application Laid-Open No. 2005-213582 (Patent Document 2). As described above, there is an apparatus that uses one film forming roll to reverse the direction of a film stretched on the film forming roll after film formation on one side and forms the opposite surface. However, after film formation on one side of the substrate, the film is formed with the opposite side stretched on a roll. Heat is generated and the film expands with heat in contact with the roll. For this reason, the film formed on one surface rubs against the roll surface and a defect occurs in the film. If the target film requires a strict barrier property such as a barrier film, even a slight defect generated in the film greatly affects the performance.

一方、特開平６−２８００１７号公報（特許文献３）には、フィルムを一対の支持ロールの間で空中に垂直あるいは水平に張った状態で搬送し、搬送中にフィルムの両面を成膜する装置が記載されている。この装置では、成膜中のフィルムはいずれの面もロール等に接触していないため、成膜中のフィルムに熱膨張があったとしても、擦れるものが無いため、成膜時に皮膜に欠陥が生じ難い。
特開２００４−１１０２３号公報 特開２００５−２１３５８２号公報 特開平６−２８００１７号公報 On the other hand, Japanese Patent Laid-Open No. 6-280017 (Patent Document 3) discloses an apparatus for transporting a film vertically or horizontally between a pair of support rolls and forming both surfaces of the film during transport. Is described. In this apparatus, since the film being formed is not in contact with a roll or the like on either side, there is no rubbing even if the film being formed has thermal expansion. Not likely to occur.
JP 2004-11023 A JP-A-2005-213582 JP-A-6-280017

しかしながら、フィルムを支持ロール間で張った状態で搬送しながら成膜する場合、フィルムが支持ロール間で弛まないようにするため、フィルムを搬送方向に強く引っ張った状態で搬送する必要がある。このため、フィルムに生じた強い張力により、支持ロールの表面粗さを形成する凹凸がこれと接触するフィルム表面に転写され、その凹凸が皮膜欠陥を生む原因となり、特にバリア膜のように表面欠陥を嫌う用途では問題となる。   However, when the film is formed while being transported while being stretched between the support rolls, it is necessary to transport the film while being strongly pulled in the transport direction so that the film does not sag between the support rolls. For this reason, the unevenness that forms the surface roughness of the support roll is transferred to the film surface in contact with the surface due to the strong tension generated in the film, and the unevenness causes a film defect, particularly a surface defect such as a barrier film. It becomes a problem in uses that dislike it.

また、フィルムを空中に張った状態で搬送しながら成膜する場合、成膜中のフィルムは、温度制御されていないため温度が上昇し、フィルム温度が上昇した状態で、巻き取り側の支持ロールに接触する。このとき、当該ロールはフィルムとは異なる温度となっているため、当該ロール上でフィルムは温度が急速に変化し、この温度変化に伴う基材の寸法変化がロール上で生じる。このため、ロールに接触する側に成膜された皮膜はロール表面と擦れ、皮膜欠陥を引き起こす。さらに、上記のとおり、フィルムには強い張力が掛けられているため、強い張力によって巻取側支持ロール表面の粗さがわずかでも、これに接触する皮膜に欠陥が生じるおそれがある。   In addition, when forming a film while transporting the film stretched in the air, since the temperature of the film being formed is not controlled, the temperature rises, and the support roll on the take-up side with the film temperature raised. To touch. At this time, since the temperature of the roll is different from that of the film, the temperature of the film changes rapidly on the roll, and the dimensional change of the base material accompanying the temperature change occurs on the roll. For this reason, the film formed on the side in contact with the roll rubs against the roll surface and causes film defects. Furthermore, as described above, since a strong tension is applied to the film, even if the surface of the take-up side support roll is slightly rough due to the strong tension, there is a possibility that a film in contact with the film may be defective.

本発明はかかる問題に鑑みなされたもので、プラスチックのフィルムやシートなどの基材に欠陥を与えることなく皮膜を形成することができる連続成膜装置を提供することを目的とする。   The present invention has been made in view of such problems, and an object of the present invention is to provide a continuous film forming apparatus capable of forming a film without giving defects to a substrate such as a plastic film or sheet.

本発明の連続成膜装置は、保護材が積層され、ロール状に巻かれた基材を保持し、前記基材を保護材と共に巻き出す巻き出しロールと、前記巻き出しロールから前記保護材と共に巻き出された基材を前記保護材が接触するように回転自在に支持し、下流側へ搬送する巻出側支持ロールを備えた巻き出し部と、前記巻出側支持ロールに掛け渡された基材を回転自在に支持し、下流側へ搬送する巻取側支持ロールと、前巻取側記支持ロールを介して前記基材を巻き取る巻き取りロールを備えた巻き取り部と、前記巻出側支持ロールから前記巻取側支持ロールへ張力が付加された状態で連続的に搬送される基材の表面に成膜する成膜源を有し、さらに、前記基材が保護材と共に前記巻出側支持ロールを通過する際、前記基材から保護材を分離し、巻き取り側へ搬送する保護材分離搬送手段と、成膜後の基材が前記巻取側支持ロールに支持される際に前記保護材分離搬送手段によって分離搬送された保護材を前記巻取側支持ロールに接触すると共に前記基材に積層するように前記基材に搬送しながら供給する保護材搬送供給手段を備えた保護材分離供給部を有するものである。 The continuous film-forming apparatus of the present invention includes a winding roll that holds a base material that is laminated with a protective material and wound in a roll shape, and that unwinds the base material together with the protective material, together with the protective material from the unwinding roll. The unwound base material is rotatably supported so that the protective material comes into contact with it, and is unwound on the unwinding side support roll, which is provided with an unwinding side support roll that conveys it downstream. A winding-side support roll that rotatably supports the substrate and conveys it downstream; a winding unit that includes a winding roll that winds up the substrate via the preceding winding-side support roll; and the unwinding A film forming source for forming a film on the surface of the substrate that is continuously conveyed in a state where tension is applied from the side support roll to the winding side support roll; When passing through the exit-side support roll, the protective material is separated from the base material and wound. Protective material separating and conveying means for conveying to the take-up side, and protective material separated and conveyed by the protective material separating and conveying means when the substrate after film formation is supported by the take-up-side support roll. It has a protective material separation and supply unit provided with a protective material transport and supply means that contacts the roll and feeds the base material while transporting it to the base material.

この連続成膜装置によれば、基材に強い張力が掛かった状態で巻出側支持ロールと巻取側支持ロールの間を基材が搬送される場合でも、巻出側支持ロールにおいては、基材に積層された保護材が巻出側支持ロールに接触し、基材自体は接触しないため、巻出側支持ロールの表面粗さが基材に転写されず、引いては基材に形成される皮膜に欠陥が生じるのを防止することができ、また巻取側支持ロールと基材とが直接接触することがなくなるため、基材に形成された皮膜と巻取側支持ロール表面との擦れやロール表面粗さとの接触による皮膜の欠陥を防止することができ、高品質の皮膜を形成することができる。しかも、保護材分離搬送手段によって基材から分離した保護材を保護材搬送供給手段に搬送して、前記保護材搬送供給手段によってその保護材を成膜後の基材に供給して積層させることができるため、基材から分離して巻き取った保護材を装置内に蓄えたり、成膜後の基材に保護材を供給するに際して予め装置内に保護材を蓄えておく必要がなく、保護材の取り出し、補給作業を省くことができ、また保護材を有効に利用することができる。 According to the continuous film forming apparatus, even when the substrate between the unwinding side supporting roll and the winding-side support rolls in a state of hanging strong tension on the substrate is conveyed in the unwinding side supporting roll, Since the protective material laminated on the base material comes into contact with the unwinding side support roll and the base material itself does not come in contact, the surface roughness of the unwinding side support roll is not transferred to the base material. The film formed on the substrate can be prevented from being defective, and the winding side support roll and the substrate are not in direct contact with each other. Defects in the film due to rubbing and contact with the roll surface roughness can be prevented, and a high-quality film can be formed. In addition, the protective material separated from the base material by the protective material separating and transporting means is transported to the protective material transport and supply means, and the protective material is supplied to the base material after film formation by the protective material transport and supply means and laminated. Therefore, it is not necessary to store the protective material separated and wound up from the base material in the device, or to store the protective material in the device in advance when supplying the protective material to the base material after film formation. The material can be removed and replenished, and the protective material can be used effectively.

上記各連続成膜装置の巻き出し部において、巻き出しロールと巻出側支持ロールとの間に、また巻取側支持ロールと巻き取りロールとの間に保護材が接触するように搬送ロールを設けることができる。これにより、巻き出し部や巻き取り部内における基材の搬送が容易になると共に搬送ロールとの接触による皮膜の欠陥も防止することができる。   In the unwinding part of each of the continuous film forming apparatuses, a transport roll is provided so that the protective material is in contact between the unwinding roll and the unwinding side support roll and between the unwinding side support roll and the windup roll. Can be provided. Thereby, the conveyance of the base material in the unwinding unit and the winding unit is facilitated, and defects of the film due to contact with the conveyance roll can be prevented.

また、前記各連続成膜装置の成膜部において、基材の両表面に対向するように複数の成膜源を設けることができる。これにより、基材の両面に皮膜を形成することができる。   In the film forming unit of each continuous film forming apparatus, a plurality of film forming sources can be provided so as to face both surfaces of the substrate. Thereby, a membrane | film | coat can be formed on both surfaces of a base material.

また、上記各連続成膜装置において、前記巻き出し部と成膜部との間及び前記成膜部と巻き取り部との間に隣接部内の雰囲気が互いに流動しないように前記基材よりわずかに大きな断面を有する開口部を備えた雰囲気流動抑制部を設けることが好ましい。かかる雰囲気流動抑制部を設けることにより、巻き出し部、成膜部、巻き取り部をそれぞれに独立した真空排気系に接続して、各部の内部雰囲気をそれぞれ独立して制御することができるようになる。   Further, in each of the continuous film forming apparatuses described above, the atmosphere in the adjacent portion is slightly smaller than the base material so as not to flow between the unwinding unit and the film forming unit and between the film forming unit and the winding unit. It is preferable to provide an atmospheric flow suppression unit having an opening having a large cross section. By providing such an atmospheric flow suppression unit, the unwinding unit, the film forming unit, and the winding unit are connected to independent evacuation systems so that the internal atmosphere of each unit can be controlled independently. Become.

前記雰囲気流動抑制部には、基材の搬入側及び搬出側に設けられた、前記基材よりわずかに大きな断面を有する開口部と、当該雰囲気流動抑制部内に連通した真空排気口を設けることが好ましい。前記雰囲気変動抑制部内を真空排気口から排気することにより、各部の内部雰囲気の独立性がより向上するようになる。   The atmosphere flow suppression unit is provided with an opening having a slightly larger cross-section than the substrate and a vacuum exhaust port communicating with the atmosphere flow suppression unit provided on the carry-in side and the carry-out side of the substrate. preferable. By evacuating the atmosphere fluctuation suppressing part from the vacuum exhaust port, the independence of the internal atmosphere of each part is further improved.

また、前記雰囲気変動抑制部には、前記搬入側又は搬出側のいずれかの開口部に当該開口部を閉塞する遮断弁を設けることが好ましい。かかる遮断弁を設けることにより、成膜部の内部を略真空ないしに真空に保持したまま、巻き出し部、巻き取り部を大気に解放することができ、これにより巻き出しロール、巻き取りロールに保持された基材を入れ替えることができる。   Moreover, it is preferable that the atmosphere fluctuation suppression unit is provided with a shut-off valve that closes the opening at either the carry-in side or the carry-out side. By providing such a shut-off valve, the unwinding unit and the winding unit can be released to the atmosphere while the inside of the film forming unit is maintained in a substantially vacuum or vacuum, thereby enabling the unwinding roll and the winding roll to The held substrate can be replaced.

また、前記雰囲気流動抑制部には、前記基材の搬入側及び搬出側に設けられた、前記基材よりわずかに大きな断面を有する開口部と、前記搬入側及び搬出側の開口部をそれぞれ閉塞する遮断弁と、当該雰囲気流動抑制部内に連通した真空排気口を設けることが好ましい。かかる構成によれば、遮断弁によって開口部を閉塞した雰囲気流動抑制部の内部を真空にすることができるので、成膜部の内部の真空度をさらに向上させたまま、巻き出し部、巻き取り部を大気に解放することができ、生産性が向上する。   In addition, the atmosphere flow suppression unit is provided with an opening having a slightly larger cross-section than the base, and an opening on the carry-in side and the carry-out side provided on the carry-in side and the carry-out side of the base material, respectively. It is preferable to provide a shut-off valve and a vacuum exhaust port communicating with the atmosphere flow suppression unit. According to such a configuration, since the inside of the atmosphere flow suppression unit whose opening is blocked by the shut-off valve can be evacuated, the unwinding unit and the winding unit can be wound while further improving the degree of vacuum inside the film forming unit. The part can be released to the atmosphere, improving productivity.

本発明の連続成膜装置によれば、保護材が積層された基材が巻出側支持ロールを通過する際に基材に積層した保護材を分離し、巻取り側へ搬送する保護材分離搬送手段及び成膜後の基材が巻取側支持ロールに回転支持される際に分離搬送された保護材を成膜後の基材に積層するように供給する保護材搬送供給手段が設けられるので、基材がこれらの支持ロールに直接接触するのを防止することができ、このため皮膜に支持ロールとの接触に起因した欠陥の発生が抑制され、高品質の皮膜を成膜することができる。しかも、基材から分離して巻き取った保護材を装置内に蓄えたり、成膜後の基材に保護材を供給するに際して予め装置内に保護材を蓄えておく必要がなく、保護材の取り出し、補給作業を省くことができ、また保護材を有効に利用することができる。 According to the continuous film forming apparatus of the present invention, when the base material on which the protective material is laminated passes through the unwinding side support roll, the protective material laminated on the base material is separated and conveyed to the winding side. Protective material conveyance supply means is provided for supplying the protective material separated and conveyed when the conveyance means and the film-formed base material are rotationally supported by the take-up side support roll so as to be laminated on the film-formed base material. Therefore, it is possible to prevent the base material from coming into direct contact with these support rolls, so that the generation of defects due to contact with the support rolls on the film is suppressed, and a high-quality film can be formed. it can. Moreover, there is no need to store the protective material separated from the base material in the apparatus or store the protective material in the apparatus in advance when supplying the protective material to the base material after film formation. The removal and replenishment work can be omitted, and the protective material can be used effectively.

本発明の連続成膜装置は、ロール状に巻いた帯状の基材を巻き出し（巻き戻し）ながら搬送し、搬送中に基材に連続的に成膜を行い、再びロール状に巻き取るロールツーロール式の連続成膜装置である。前記基材としては、プラスチックのフィルムやシート、金属箔、紙など、ロール状に巻き取り可能な帯状材であればいずれのものも用いることができる。また、成膜方法としては、スパッタ法、蒸着法、アークイオンプレーティング法、プラズマＣＶＤ法などの各種の手法を適用することができるが、以下の実施形態においてはスパッタ法によるものを説明する。   The continuous film forming apparatus of the present invention is a roll in which a belt-shaped substrate wound in a roll shape is conveyed while being unwound (rewinded), continuously formed on the substrate during conveyance, and again wound into a roll shape. This is a two-roll type continuous film forming apparatus. As the base material, any material can be used as long as it is a belt-like material that can be wound up into a roll, such as a plastic film or sheet, metal foil, or paper. As a film forming method, various methods such as a sputtering method, a vapor deposition method, an arc ion plating method, a plasma CVD method, and the like can be applied. In the following embodiments, a method using a sputtering method will be described.

まず、連続成膜装置の全体構成および基材搬送過程における基材の保護材を処理するための構成について基本となる参考実施形態について説明する。図１は、参考第一実施形態に係る連続成膜装置の全体構成を示しており、巻き出し部２、成膜部３及び巻き取り部４が水平方向に連成された真空チャンバー１を備えている。前記巻き出し部２と成膜部３、成膜部３と巻き取り部４とは、基材Ｓの搬送を許容する開口を有する区画壁５，６によって仕切られている。前記巻き出し部２、成膜部３、巻き取り部４の内部空間をそれぞれ巻き出し室、成膜室、巻き取り室ということがある。また、真空チャンバー１は、図示省略した真空排気装置に接続され、成膜の際に真空排気される。 First, a reference embodiment that is the basis for the overall configuration of the continuous film forming apparatus and the configuration for processing the protective material for the base material in the base material transport process will be described. Figure 1 shows the overall configuration of the continuous film-forming apparatus according to the reference the first embodiment, comprises a unwinding unit 2, the vacuum chamber 1, film forming unit 3 and the winding portion 4 is formed continuously in the horizontal direction ing. The unwinding unit 2 and the film forming unit 3, and the film forming unit 3 and the winding unit 4 are partitioned by partition walls 5 and 6 having openings that allow the substrate S to be conveyed. The internal spaces of the unwinding unit 2, the film forming unit 3, and the winding unit 4 may be referred to as an unwinding chamber, a film forming chamber, and a winding chamber, respectively. The vacuum chamber 1 is connected to an evacuation apparatus (not shown) and evacuated during film formation.

前記巻き出し部２は、片面に保護材Ｐが積層された基材Ｓがロール状に巻かれた保護材付き基材ロールＲを保持し、前記基材Ｓを保護材Ｐと共に巻き出す巻き出しロール８と、前記成膜部３の直前に配置され、前記巻き出しロール８から前記保護材Ｐと共に巻き出された基材Ｓを前記保護材Ｐが接触するように回転自在に支持し、成膜部側へ搬送する巻出側支持ロール９と、前記基材Ｓが保護材Ｐと共に前記巻出側支持ロール９を通過する際、前記基材Ｓから保護材Ｓを分離して巻き取る保護材分離ロール１０と、前記巻き出しロール８と巻出側支持ロール９との間に前記保護材Ｐが接触するように配置された複数の搬送ロール１１を備える。前記保護材Ｐは、前記巻出側支持ロール９のロール表面に接触するように基材Ｓに積層されるが、図例のように、搬送ロール１１についてもロール表面に保護材が接触するようにロールを配置することが望ましい。なお、前記保護材分離ロール１０は、保護材分離手段を構成するものである。 The unwinding unit 2 holds a base material roll R with a protective material in which a base material S having a protective material P laminated on one side is wound in a roll shape, and unwinds the base material S together with the protective material P. A roll 8 and a substrate S that is disposed immediately before the film forming unit 3 and is unwound together with the protective material P from the unwinding roll 8 are rotatably supported so that the protective material P is in contact with the roll 8. Protection for separating and winding the protective material S from the base material S when the base material S passes through the unwinding side support roll 9 together with the protective material P, and the unwinding side support roll 9 transported to the film part side A plurality of transport rolls 11 are provided between the material separating roll 10 and the protective roll P between the unwinding roll 8 and the unwinding support roll 9. Although the said protective material P is laminated | stacked on the base material S so that the roll surface of the said unwinding side support roll 9 may be contacted, as for the conveyance roll 11, so that a protective material may contact the roll surface It is desirable to place a roll on the surface. The protective material separating roll 10 constitutes protective material separating means.

前記巻き取り部４は、前記巻出側支持ロール９に掛け渡された基材Ｓに張力を付与しながら回転自在に支持し、下流側へ搬送する巻取側支持ロール１４と、前記基材Ｓが前記巻取側支持ロール１４を通過する直前に、前記基材Ｓに積層しかつ前記巻取側支持ロール１４に接触するように、ロール状に巻き取られた保護材Ｐを巻き出して前記基材Ｓに供給する保護材供給ロール１５と、前記巻取側支持ロール１４を介して前記基材Ｓを保護材Ｐと共に巻き取る巻き取りロール１６と、前記巻取側支持ロール１４と巻き取りロール１６との間に前記保護材Ｐが接触するように配置された搬送ロール１７を備える。前記搬送ロール１７は図例では１個であるが、必要により複数個設けてもよい。成膜対象である基材Ｓは、前記巻き出し部２に設けられた巻出側支持ロール９と巻取側支持ロール１４との間に引っ張り状態で掛け渡され、前記巻き取りロール１６の巻き取りにより前記成膜部３内を空中搬送される。前記搬送ロール１７についても、図例のように保護材Ｐと接触するように設けることが好ましい。なお、前記保護材供給ロール１５は、保護材供給手段を構成するものである。 The winding unit 4 is rotatably supported while applying tension to the base material S stretched over the unwinding side support roll 9 and transported downstream, and the base material Immediately before S passes through the winding side support roll 14, the protective material P wound up in a roll shape is unwound so as to be laminated on the substrate S and to be in contact with the winding side support roll 14. The protective material supply roll 15 supplied to the base material S, the winding roll 16 for winding the base material S together with the protective material P via the winding side support roll 14, and the winding side support roll 14 and the winding A transport roll 17 is provided between the take-up roll 16 and the protective material P so as to come into contact therewith. In the illustrated example, the number of the transport rolls 17 is one, but a plurality of transport rolls 17 may be provided if necessary. The base material S that is a film formation target is stretched between the unwinding side support roll 9 and the winding side support roll 14 provided in the unwinding portion 2 in a pulled state, and the winding roll 16 is wound. As a result, the film is transported in the air in the film forming unit 3. The transport roll 17 is also preferably provided so as to be in contact with the protective material P as shown in the figure. In addition, the said protective material supply roll 15 comprises a protective material supply means.

前記保護材Ｐとしては、プラスチックのフィルムやシート、紙などの帯状材が用いられる。保護材Ｐと基材Ｓとは別材質にすることが好ましく、基材を形成する材料より軟らかく柔軟な材料がより好ましい。また、基材Ｓと保護材Ｐとは軽く粘着した状態で付着すること好ましいが、必ずしもこれに限らず各支持ロール９，１４などのロールと基材Ｓとの間に存在してロールから基材Ｓに与える影響、欠陥を防止できればよい。   As the protective material P, a belt-shaped material such as a plastic film, sheet or paper is used. The protective material P and the base material S are preferably made of different materials, more preferably a softer and more flexible material than the material forming the base material. In addition, the base material S and the protective material P are preferably attached in a lightly adhered state, but the present invention is not necessarily limited thereto, and the base material S exists between the rolls such as the support rolls 9 and 14 and the base material S. What is necessary is just to prevent the influence and defects on the material S.

前記成膜部３において、前記基材Ｓはその張力により成膜室を略直線状に水平に保持された状態で搬送されるが、搬送中の基材Ｓの両面に対向するように複数のスパッタ用の成膜源２０が設けられる。図例では隣接した成膜源を１組として、全部で３組の成膜源が準備されている。これらの成膜源２０により、搬送される基材Ｓの両面に連続的に皮膜が形成される。なお、この実施形態では、基材Ｓの両面に対向するように成膜源１９が設けられているが、必要により片面側のみに設けるようにしてもよい。また、成膜部２には、図示省略された真空排気装置のほか、ガス供給装置が付設され、装置稼働時には成膜室内が成膜ガス雰囲気に調整される。また、前記成膜部３には、図示のように、成膜源２０のほか、必要に応じて皮膜形成の高品質化に有効な加熱源やイオン照射源などの前処理源２１を設けることができる。   In the film forming unit 3, the base material S is transported in a state in which the film forming chamber is held in a substantially straight line by the tension, and a plurality of base materials S are opposed to both surfaces of the base material S being transported. A film forming source 20 for sputtering is provided. In the illustrated example, one set of adjacent film forming sources is used, and a total of three film forming sources are prepared. By these film forming sources 20, a film is continuously formed on both surfaces of the substrate S to be conveyed. In this embodiment, the film forming source 19 is provided so as to face both surfaces of the substrate S. However, it may be provided only on one side if necessary. The film forming unit 2 is provided with a gas supply device in addition to an evacuation apparatus (not shown), and the film forming chamber is adjusted to a film forming gas atmosphere when the apparatus is in operation. In addition, as shown in the figure, the film forming unit 3 is provided with a pretreatment source 21 such as a heating source or an ion irradiation source effective for improving the quality of the film formation, if necessary, in addition to the film forming source 20. Can do.

次に、上記参考第一実施形態に係る連続成膜装置の動作について説明する。
巻き出し部２の巻き出しロール８に保持された保護材付き基材ロールＲから基材Ｓが保護材Ｐと共に巻き出され、搬送ロール１１を介して巻出側支持ロール９に搬送され、この巻出側支持ロール９を追加する際に基材Ｓに積層された保護材Ｐが保護材分離ロール１０に巻き取られて基材Ｓから分離される。保護材Ｐは、前記巻出側支持ロール９上では、ロール表面と基材Ｓとの間に挟まれ、ロール表面と基材Ｓが直接接触するのを防ぐ。このため、基材Ｓに強い張力が付加された場合でも、前記巻出側支持ロール９の表面粗さの凹凸が基材Ｓに転写されたり、前記巻出側支持ロール９の表面に付着した異物が基材Ｓに移着するのを防止することができる。このため、前記巻出側支持ロール９から成膜室に入る基材Ｓの表面は、ロール表面の凹凸の転写や異物の付着から守られ、これらが原因となる皮膜欠陥を防止することができる。 Next, the operation of the continuous film forming apparatus according to the first reference embodiment will be described.
The base material S is unwound together with the protective material P from the base material roll R with the protective material held by the unwinding roll 8 of the unwinding section 2, and conveyed to the unwinding side support roll 9 via the conveyance roll 11. When the unwinding side support roll 9 is added, the protective material P laminated on the base material S is wound around the protective material separation roll 10 and separated from the base material S. The protective material P is sandwiched between the roll surface and the base material S on the unwinding side support roll 9 and prevents the roll surface and the base material S from coming into direct contact. For this reason, even when a strong tension is applied to the substrate S, irregularities of the surface roughness of the unwinding side support roll 9 are transferred to the substrate S or attached to the surface of the unwinding side support roll 9. It is possible to prevent foreign matters from being transferred to the substrate S. For this reason, the surface of the base material S that enters the film forming chamber from the unwinding side support roll 9 is protected from the uneven transfer of the roll surface and the adhesion of foreign matter, and can prevent film defects caused by these. .

前記保護材分離ロール１０によって保護材Ｐが分離された基材Ｓは、前記巻出側支持ロール９、巻取側支持ロール１４に掛け渡されて、下流側に引っ張られながら空中搬送され、その搬送中に成膜される。このため、成膜の際には基材と接触するものはなく、たとえ成膜の入熱による寸法変化や変形があったとしても基材自体や基材上に形成された皮膜に欠陥が生じ難い。   The base material S from which the protective material P has been separated by the protective material separating roll 10 is passed over the unwinding side support roll 9 and the winding side support roll 14 and is conveyed in the air while being pulled downstream. A film is formed during transportation. For this reason, there is nothing in contact with the substrate during film formation, and even if there is a dimensional change or deformation due to heat input during film formation, defects occur in the substrate itself or on the film formed on the substrate. hard.

成膜後、巻き取り部４に搬送された基材Ｓが巻取側支持ロール１４に回転支持される際に、保護材Ｐが巻き取られた保護材ロールが保持された保護材供給ロール１５から巻き出された保護材Ｐが成膜後の基材Ｓの巻取側支持ロール側の表面に供給される。前記保護材Ｐは前記巻取側支持ロール１４に支持される際に基材Ｓに密着するように積層され、搬送ロール１７を介して巻き取りロール１６に基材Ｓと共に巻き取られる。前記保護材Ｐは、図示のように、巻取側支持ロール１４上では、ロール表面と基材Ｓの間に挟まれ、ロール表面と基材Ｓが直接接触するのを防ぐ。このため、保護材Ｐが無い場合、前記巻取側支持ロール１４上で基材Ｓが冷却されて収縮する際に生じる基材のすべりを防止することができ、成膜した皮膜が前記巻取側支持ロール１４の表面に擦れることがなく、これによる皮膜の損傷を防止することができる。   After film formation, when the base material S conveyed to the winding unit 4 is rotationally supported by the winding side support roll 14, the protective material supply roll 15 holding the protective material roll on which the protective material P has been wound is retained. The protective material P unwound from is supplied to the surface on the winding side support roll side of the substrate S after film formation. The protective material P is laminated so as to be in close contact with the base material S when supported by the winding-side support roll 14, and is wound around the winding roll 16 together with the base material S via the transport roll 17. As shown in the figure, the protective material P is sandwiched between the roll surface and the substrate S on the winding side support roll 14 to prevent the roll surface and the substrate S from coming into direct contact. For this reason, in the absence of the protective material P, it is possible to prevent the base material from slipping when the base material S is cooled and contracted on the winding side support roll 14, and the film formed is formed into the film. The surface of the side support roll 14 is not rubbed, and damage to the film due to this can be prevented.

次に、参考第二実施形態に係る連続成膜装置を図２を参照して説明する。参考第二実施形態は参考第一実施形態に対して巻き出し部２と成膜部３、成膜部３と巻き取り部４との間にそれぞれ互いに隣接する部内の雰囲気が相互に流通しないように雰囲気流通抑制部３１を設けた構成が異なっているので、これを中心に説明し、参考第一実施形態の装置と同部材は同符号を付してその説明を省略する。 Next, a continuous film forming apparatus according to the second reference embodiment will be described with reference to FIG. The reference second embodiment is different from the reference first embodiment in that the atmosphere in the adjacent portions between the unwinding unit 2 and the film forming unit 3 and between the film forming unit 3 and the winding unit 4 does not circulate between each other. Since the configuration in which the atmosphere circulation suppression unit 31 is provided is different, description will be made mainly on this, and the same members as those in the reference first embodiment are denoted by the same reference numerals, and the description thereof is omitted.

前記雰囲気流通抑制部３１は、成膜部３の直前に設けられた細長い基材搬送通路が内部に設けられた筒状開口部３２で構成されており、この筒状開口部３２の基材搬送通路の断面は、その横幅が基材Ｓの幅よりやや大きく、その縦幅が基材Ｓの厚さよりやや大きい形状、つまり基材Ｓの通過を許容する小さな断面を有するように形成されている。   The atmosphere distribution suppression unit 31 is configured by a cylindrical opening 32 provided inside the elongated base material transport passage provided immediately before the film forming unit 3, and the base material transport of the cylindrical opening 32 is performed. The cross section of the passage is formed to have a shape in which the lateral width is slightly larger than the width of the base material S and the vertical width is slightly larger than the thickness of the base material S, that is, a small cross section that allows passage of the base material S. .

このような筒状開口部３２を設けることにより、隣接部の雰囲気の流通を抑制することができる。このため、巻き出し部２、成膜部３、巻き取り部４をそれぞれ独立の真空排気系に接続することによって、各部を独立して制御することができるようになる。例えば、巻き出し部２で基材Ｓを巻出す際に放出される水蒸気は、主に巻き出し室を真空排気することで、成膜室の雰囲気への影響を抑制することができる。なお、図２では筒状開口部３２が巻き出し部側、巻き取り部側に設けられているが、成膜部側に設けてもよい。また前記筒状開口部３２の代わりに、隣接部を仕切る仕切壁５，６に基材Ｓの通過を許容する小さな断面積のスリットを雰囲気流通抑制部として設けてもよい。   By providing such a cylindrical opening 32, the circulation of the atmosphere in the adjacent portion can be suppressed. For this reason, each part can be independently controlled by connecting the unwinding part 2, the film forming part 3, and the winding part 4 to independent vacuum exhaust systems. For example, the water vapor released when the substrate S is unwound at the unwinding unit 2 can suppress the influence on the atmosphere of the film forming chamber by mainly evacuating the unwinding chamber. In addition, although the cylindrical opening part 32 is provided in the unwinding part side and the winding-up part side in FIG. 2, you may provide in the film-forming part side. Instead of the cylindrical opening 32, a slit having a small cross-sectional area that allows passage of the base material S may be provided in the partition walls 5 and 6 partitioning the adjacent portions as an atmosphere circulation suppressing portion.

雰囲気流通抑制部３１のより好ましい態様としては、巻き出し部２と成膜部３、成膜部３と巻き取り部４との間にそれぞれ図３に示すように、基材Ｓの搬入側及び搬出側にそれぞれ基材Ｓの搬送を許容する断面積の小さい筒状の開口部３５，３６を備えた前壁３７、後壁３８を備えた雰囲気流通抑制ボックス３４を設けるようにするのがよい。さらに、同図に示すように、前記雰囲気流通抑制ボックス３４の内部空間に連通する真空排気口３９を設けることが望ましい。前記真空排気口３９は図示省略した真空排気系に接続され、ボックス内が真空排気される。このような雰囲気流通抑制ボックス３４を設けることにより、巻き出し室、成膜室、巻き取り部室の内部の雰囲気の独立性がより向上する。なお、図３は巻き出し側の雰囲気流通抑制ボックスを示す。雰囲気流通抑制ボックス３４についても前記筒状開口部３２と同様、成膜部側に設けてもよい。   As a more preferable aspect of the atmosphere distribution suppressing unit 31, as shown in FIG. 3 between the unwinding unit 2 and the film forming unit 3, and between the film forming unit 3 and the winding unit 4, respectively, It is preferable to provide an atmosphere distribution restraining box 34 provided with a front wall 37 and a rear wall 38 having cylindrical openings 35 and 36 each having a small cross-sectional area allowing conveyance of the substrate S on the carry-out side. . Furthermore, as shown in the figure, it is desirable to provide a vacuum exhaust port 39 that communicates with the internal space of the atmosphere circulation suppression box 34. The vacuum exhaust port 39 is connected to a vacuum exhaust system (not shown), and the inside of the box is evacuated. By providing such an atmosphere circulation suppression box 34, the independence of the atmosphere inside the unwinding chamber, the film forming chamber, and the winding portion chamber is further improved. FIG. 3 shows the atmosphere distribution suppression box on the unwinding side. Similarly to the cylindrical opening 32, the atmosphere distribution suppression box 34 may be provided on the film forming unit side.

さらにまた、前記雰囲気流通抑制ボックス３４には、図４に示すように、前記搬入側及び搬出側の開口部３５，３６に、基材Ｓを上壁に押し付けた状態で当該開口部３５，３６を閉塞する遮断弁４１を設けることが好ましい。前記遮断弁４１は、電磁弁や流体圧シリンダなどの駆動源４３により昇降自在とされた弁体４２を有し、この弁体４２の上部にシール部材４４が設けられている。かかる遮断弁４１を設けることにより、前記開口部３５，３６を閉塞し、ボックス内を真空排気することで、成膜室を真空に保持することができる。このため、巻き出し部２、巻き取り部４を大気に解放して、処理対象あるいは成膜済みの基材Ｓの入れ替えを行うことができるようになり、作業性が大幅に向上する。なお、図４は巻き出し側の雰囲気流通抑制ボックスにおいて搬入側及び搬出側の開口部をそれぞれ遮断弁４１で閉塞した状態を示すが、いずれか一方のみに遮断弁を設けてもよい。   Furthermore, in the atmosphere circulation suppression box 34, as shown in FIG. 4, the openings 35, 36 in a state where the base material S is pressed against the upper walls 35, 36 on the carry-in side and the carry-out side. It is preferable to provide a shut-off valve 41 that closes the valve. The shut-off valve 41 has a valve body 42 that can be raised and lowered by a drive source 43 such as an electromagnetic valve or a fluid pressure cylinder, and a seal member 44 is provided above the valve body 42. By providing such a shut-off valve 41, the openings 35 and 36 are closed, and the inside of the box is evacuated, whereby the film forming chamber can be kept in a vacuum. For this reason, the unwinding unit 2 and the winding unit 4 can be opened to the atmosphere, and the substrate S to be processed or the film-formed substrate S can be exchanged, and the workability is greatly improved. 4 shows a state in which the opening on the carry-in side and the carry-out side are respectively closed by the shut-off valve 41 in the unwinding-side atmosphere circulation suppression box, but the shut-off valve may be provided on only one of them.

次に、本発明の実施形態に係る連続成膜装置を図５を参照して説明する。本発明の実施形態は参考第一実施形態に対して巻き出し部２において分離した保護材Ｐを巻き取り部４で再使用する保護材分離供給部４５を設けた構成が異なっており、これを中心に説明し、参考第一実施形態の装置と同部材は同符号を付してその説明を省略する。もちろん、本発明の実施形態において参考第二実施形態の装置において示した雰囲気流通抑制部を設けることができる。 Next, a continuous film forming apparatus according to an embodiment of the present invention will be described with reference to FIG. Embodiment of this invention differs in the structure which provided the protective material isolation | separation supply part 45 which reuses the protective material P isolate | separated in the unwinding part 2 in the winding part 4 with respect to reference 1st embodiment, focuses, apparatus of the same member of the reference first embodiment will be omitted with denoted by the same reference numerals. Of course, in the embodiment of the present invention, it is possible to provide the atmosphere circulation suppression unit shown in the apparatus of the reference second embodiment.

前記保護材分離供給部４５は、前記巻き出し部２において巻出側支持ロール９を通過後、成膜前に保護材Ｐを基材Ｓから分離し、巻き取り側に搬送する保護材分離搬送ロール４６と、前記保護材分離搬送ロール４６によって分離され、搬送された保護材Ｐを、成膜後の基材Ｓが前記巻取側支持ロール１４に回転支持される際に供給する保護材搬送供給ロール４７と、前記保護材分離搬送ロール４６により分離された保護材Ｐを前記保護材搬送供給ロール４７へ搬送する搬送通路４８が形成された保護材搬送部４９を備えている。もちろん巻き取り部４において、保護材Ｐは基材Ｓの巻取側支持ロール側の表面に積層するように供給される。前記搬送通路４８は巻き出し室、巻き取り室に連通状に接続されている。なお、図例では、前記保護材分離搬送ロール４６、保護材搬送供給ロール４７は搬送通路４８内に設けられているが、それぞれ巻き出し室、巻き取り室内に設けるようにしてもよい。この実施形態の連続成膜装置によれば、保護材Ｐを単独で巻き取り、巻き出す機構が必要でなく、装置構成を簡単化することができ、また保護材を有効利用することができる。なお、前記保護材分離搬送ロール４６、保護材搬送供給ロール４７はそれぞれ本発明の保護材分搬送離手段、保護材搬送供給手段を構成する。 The protective material separation and supply unit 45 separates the protective material P from the base material S before film formation after passing through the unwinding side support roll 9 in the unwinding unit 2 and transports it to the winding side. Protective material conveyance for supplying the protective material P separated and conveyed by the roll 46 and the protective material separating / conveying roll 46 when the substrate S after film formation is rotationally supported by the winding-side support roll 14 A protective material transport unit 49 is provided in which a supply path 47 for transporting the protective material P separated by the supply roll 47 and the protective material separation and transport roll 46 to the protective material transport and supply roll 47 is formed. Of course, in the winding part 4, the protective material P is supplied so that it may laminate | stack on the surface by the side of the winding side support roll of the base material S. FIG. The transfer passage 48 is connected to the unwinding chamber and the winding chamber in a continuous manner. In the illustrated example, the protective material separating and conveying roll 46 and the protective material conveying and supplying roll 47 are provided in the conveying passage 48, but they may be provided in the unwinding chamber and the winding chamber, respectively. According to the continuous film forming apparatus of this embodiment, there is no need for a mechanism for winding and unwinding the protective material P alone, the apparatus configuration can be simplified, and the protective material can be used effectively. The protective material separating / conveying roll 46 and the protective material conveying / supplying roll 47 constitute protective material separating / conveying means and protective material conveying / supplying means of the present invention, respectively.

上記各実施形態にかかる連続成膜装置では、基材の搬送経路が水平方向となるように連続成膜装置の各部が配置されているが、基材の搬送経路を垂直方向にしてもよい。すなわち、上記各実施形態では、基材をグランドレベルに対して水平に搬送するようにしているが、基材をグランドレベルに対して垂直に搬送するようにしてもよい。この場合、巻き出し部、成膜部、巻き取り部が上から下に配置するのが好ましい。また、上記各実施形態では、真空チャンバーに仕切壁を設けて巻き出し部、成膜部及び巻き取り部を区画形成したが、各部をそれぞれ独立した真空容器で構成し、これらを気密に連接する構造としてもよい。   In the continuous film forming apparatus according to each of the above embodiments, each part of the continuous film forming apparatus is arranged so that the transport path of the base material is in the horizontal direction, but the transport path of the base material may be in the vertical direction. That is, in each of the above embodiments, the base material is transported horizontally with respect to the ground level. However, the base material may be transported perpendicular to the ground level. In this case, it is preferable that the unwinding unit, the film forming unit, and the winding unit are arranged from top to bottom. Further, in each of the above embodiments, the partition wall is provided in the vacuum chamber and the unwinding unit, the film forming unit, and the winding unit are partitioned, but each unit is configured by an independent vacuum container and these are connected in an airtight manner. It is good also as a structure.

参考第一実施形態の連続成膜装置の全体配置説明図である。It is a whole arrangement explanatory view of the continuous film-forming device of a reference 1st embodiment. 参考第二実施形態の連続成膜装置の全体配置説明図である。It is whole layout explanatory drawing of the continuous film-forming apparatus of reference 2nd embodiment. 雰囲気流通抑制部を構成する雰囲気流通抑制ボックスの断面説明図である。It is sectional explanatory drawing of the atmosphere distribution suppression box which comprises an atmosphere distribution suppression part. 遮断弁を備えた雰囲気流通抑制ボックスの断面説明図である。It is sectional explanatory drawing of the atmosphere distribution | circulation suppression box provided with the cutoff valve. 本発明の実施形態の連続成膜装置の全体配置説明図である。 1 is an overall arrangement explanatory view of a continuous film forming apparatus according to an embodiment of the present invention .

符号の説明Explanation of symbols

２ 巻き出し部
３ 成膜部
４ 巻き取り部
８ 巻き出しロール
９ 巻出側支持ロール
１０ 保護材分離ロール（保護材分離手段）
１４ 巻取側支持ロール
１５ 保護材供給ロール（保護材供給手段）
１６ 巻き取りロール
２０ 成膜源
３１ 雰囲気流通抑制部 2 Unwinding section 3 Film forming section 4 Winding section 8 Unwinding roll 9 Unwinding side support roll 10 Protective material separation roll (protective material separating means)
14 Winding side support roll 15 Protective material supply roll (protective material supply means)
16 Winding roll 20 Deposition source 31 Atmosphere distribution control part

Claims (8)

保護材が積層され、ロール状に巻かれた基材を保持し、前記基材を保護材と共に巻き出す巻き出しロールと、前記巻き出しロールから前記保護材と共に巻き出された基材を前記保護材が接触するように回転自在に支持し、下流側へ搬送する巻出側支持ロールを備えた巻き出し部と、
前記巻出側支持ロールに掛け渡された基材を回転自在に支持し、下流側へ搬送する巻取側支持ロールと、前記巻取側支持ロールを介して前記基材を巻き取る巻き取りロールを備えた巻き取り部と、
前記巻出側支持ロールから前記巻取側支持ロールへ張力が付加された状態で連続的に搬送される基材の表面に成膜する成膜源を有し、
さらに、前記基材が保護材と共に前記巻出側支持ロールを通過する際、前記基材から保護材を分離し、巻き取り側へ搬送する保護材分離搬送手段と、成膜後の基材が前記巻取側支持ロールに支持される際に前記保護材分離搬送手段によって分離搬送された保護材を前記巻取側支持ロールに接触すると共に前記基材に積層するように前記基材に搬送しながら供給する保護材搬送供給手段を備えた保護材分離供給部を有する、連続成膜装置。 The protective material is laminated, the base material wound in a roll shape is held, the unwinding roll for unwinding the base material together with the protective material, and the base material unwound together with the protective material from the unwinding roll is protected. An unwinding section that includes a unwinding-side support roll that rotatably supports the material so as to come into contact with the material;
A take-up side support roll that rotatably supports the substrate stretched over the unwinding-side support roll and conveys it downstream, and a take-up roll that winds the base material through the take-up side support roll A winding part with
A film forming source for forming a film on the surface of the substrate that is continuously conveyed in a state where tension is applied from the unwinding side support roll to the winding side support roll;
Furthermore, when the base material passes through the unwinding-side support roll together with the protective material, a protective material separating / conveying means for separating the protective material from the base material and transporting it to the winding side, and a base material after film formation The protective material separated and transported by the protective material separating and transporting means when being supported by the winding side support roll is brought into contact with the winding side support roll and transported to the base material so as to be laminated on the base material. A continuous film forming apparatus having a protective material separating and supplying unit provided with a protective material conveying and supplying means. 前記巻き出し部に前記巻き出しロールと巻出側支持ロールとの間に前記保護材が接触するように搬送ロールが設けられた、請求項１に記載された連続成膜装置。 The continuous film-forming apparatus according to claim 1, wherein a conveying roll is provided in the unwinding portion so that the protective material is in contact between the unwinding roll and the unwinding-side support roll. 前記巻き取り部に前記巻取側支持ロールと巻き取りロールとの間に前記保護材が接触するように搬送ロールが設けられた、請求項１又は２に記載された連続成膜装置。 The continuous film-forming apparatus according to claim 1 or 2 , wherein a conveyance roll is provided in the winding unit so that the protective material is in contact between the winding-side support roll and the winding roll. 前記成膜部は、基材の両表面に対向するように複数の成膜源を備えた、請求項１から３のいずれか１項に記載された連続成膜装置。 The film forming unit, comprising a plurality of deposition source so as to face both surfaces of the substrate, a continuous deposition apparatus according to any one of claims 1 to 3. 前記巻き出し部と成膜部との間及び前記成膜部と巻き取り部との間に前記成膜部の内部雰囲気が流動しないように前記基材よりわずかに大きな断面を有する開口部を備えた雰囲気流動抑制部が設けられた、請求項１から４のいずれか１項に記載された連続成膜装置。 Provided with an opening having a slightly larger cross section than the substrate so that the internal atmosphere of the film forming unit does not flow between the unwinding unit and the film forming unit and between the film forming unit and the winding unit. atmosphere flow suppressing portion is provided, a continuous deposition apparatus according to any one of claims 1 4. 前記雰囲気流動抑制部は、前記基材の搬入側及び搬出側に設けられた、前記基材よりわずかに大きな断面を有する開口部と、当該雰囲気流動抑制部内に連通した真空排気口が設けられた、請求項５に記載された連続成膜装置。 The atmosphere flow suppression unit is provided with an opening having a slightly larger cross-section than the substrate and a vacuum exhaust port communicating with the atmosphere flow suppression unit provided on the carry-in side and the carry-out side of the base material. The continuous film-forming apparatus according to claim 5 . 前記雰囲気変動抑制部は、前記搬入側又は搬出側のいずれかの開口部に当該開口部を閉塞する遮断弁が設けられた、請求項６に記載された連続成膜装置。 The continuous film formation apparatus according to claim 6 , wherein the atmosphere fluctuation suppressing unit is provided with a shut-off valve that closes the opening at either the loading side or the unloading side. 前記雰囲気流動抑制部は、前記基材の搬入側及び搬出側に設けられた、前記基材よりわずかに大きな断面を有する開口部と、前記搬入側及び搬出側の開口部をそれぞれ閉塞する遮断弁と、当該雰囲気流動抑制部内に連通した真空排気口が設けられた、請求項５に記載された連続成膜装置。 The atmosphere flow suppression unit is provided on the carry-in side and the carry-out side of the base material, and has an opening portion having a slightly larger cross-section than the base material, and a shut-off valve that closes the carry-in side and the carry-out side opening portions The continuous film forming apparatus according to claim 5 , wherein a vacuum exhaust port communicating with the atmosphere flow suppression unit is provided.
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