JP5001637B2 - 高電力密度デバイス用のパッケージ - Google Patents
高電力密度デバイス用のパッケージ Download PDFInfo
- Publication number
- JP5001637B2 JP5001637B2 JP2006344336A JP2006344336A JP5001637B2 JP 5001637 B2 JP5001637 B2 JP 5001637B2 JP 2006344336 A JP2006344336 A JP 2006344336A JP 2006344336 A JP2006344336 A JP 2006344336A JP 5001637 B2 JP5001637 B2 JP 5001637B2
- Authority
- JP
- Japan
- Prior art keywords
- die
- semiconductor device
- device package
- electrode
- package
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000004065 semiconductor Substances 0.000 claims abstract description 61
- 239000002184 metal Substances 0.000 claims description 37
- 229910052751 metal Inorganic materials 0.000 claims description 37
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 32
- 229910052802 copper Inorganic materials 0.000 claims description 32
- 239000010949 copper Substances 0.000 claims description 32
- 239000000463 material Substances 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 17
- 239000000919 ceramic Substances 0.000 claims description 16
- 238000007373 indentation Methods 0.000 claims description 13
- 229910052710 silicon Inorganic materials 0.000 claims description 11
- 239000010703 silicon Substances 0.000 claims description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 9
- 239000002826 coolant Substances 0.000 claims 1
- 239000012530 fluid Substances 0.000 claims 1
- 238000000926 separation method Methods 0.000 claims 1
- 239000004020 conductor Substances 0.000 abstract description 15
- 238000009413 insulation Methods 0.000 abstract description 2
- 238000003491 array Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 75
- 229910000679 solder Inorganic materials 0.000 description 45
- 239000000758 substrate Substances 0.000 description 14
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000005476 soldering Methods 0.000 description 7
- 230000008901 benefit Effects 0.000 description 6
- 238000001816 cooling Methods 0.000 description 6
- 238000012216 screening Methods 0.000 description 6
- 230000008569 process Effects 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 230000001351 cycling effect Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000010354 integration Effects 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000012536 packaging technology Methods 0.000 description 2
- 229910000896 Manganin Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000013100 final test Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- BIXHRBFZLLFBFL-UHFFFAOYSA-N germanium nitride Chemical compound N#[Ge]N([Ge]#N)[Ge]#N BIXHRBFZLLFBFL-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/02—Containers; Seals
- H01L23/04—Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
- H01L23/13—Mountings, e.g. non-detachable insulating substrates characterised by the shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
- H01L23/62—Protection against overvoltage, e.g. fuses, shunts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
- H01L23/14—Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
- H01L23/15—Ceramic or glass substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/367—Cooling facilitated by shape of device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/481—Internal lead connections, e.g. via connections, feedthrough structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49838—Geometry or layout
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/552—Protection against radiation, e.g. light or electromagnetic waves
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/93—Batch processes
- H01L24/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L24/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/07—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00
- H01L25/072—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L29/00 the devices being arranged next to each other
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/16—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/20—Resistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/0401—Bonding areas specifically adapted for bump connectors, e.g. under bump metallisation [UBM]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/06—Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
- H01L2224/0601—Structure
- H01L2224/0603—Bonding areas having different sizes, e.g. different heights or widths
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/14—Structure, shape, material or disposition of the bump connectors prior to the connecting process of a plurality of bump connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/14—Structure, shape, material or disposition of the bump connectors prior to the connecting process of a plurality of bump connectors
- H01L2224/1401—Structure
- H01L2224/1403—Bump connectors having different sizes, e.g. different diameters, heights or widths
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/2612—Auxiliary members for layer connectors, e.g. spacers
- H01L2224/26152—Auxiliary members for layer connectors, e.g. spacers being formed on an item to be connected not being a semiconductor or solid-state body
- H01L2224/26175—Flow barriers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/291—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32135—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/32145—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/325—Material
- H01L2224/32501—Material at the bonding interface
- H01L2224/32503—Material at the bonding interface comprising an intermetallic compound
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48135—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/48145—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/731—Location prior to the connecting process
- H01L2224/73151—Location prior to the connecting process on different surfaces
- H01L2224/73153—Bump and layer connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/831—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector the layer connector being supplied to the parts to be connected in the bonding apparatus
- H01L2224/83101—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector the layer connector being supplied to the parts to be connected in the bonding apparatus as prepeg comprising a layer connector, e.g. provided in an insulating plate member
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8312—Aligning
- H01L2224/83136—Aligning involving guiding structures, e.g. spacers or supporting members
- H01L2224/83138—Aligning involving guiding structures, e.g. spacers or supporting members the guiding structures being at least partially left in the finished device
- H01L2224/83139—Guiding structures on the body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/83801—Soldering or alloying
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/91—Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
- H01L2224/92—Specific sequence of method steps
- H01L2224/922—Connecting different surfaces of the semiconductor or solid-state body with connectors of different types
- H01L2224/9222—Sequential connecting processes
- H01L2224/92242—Sequential connecting processes the first connecting process involving a layer connector
- H01L2224/92247—Sequential connecting processes the first connecting process involving a layer connector the second connecting process involving a wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/93—Batch processes
- H01L2224/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L2224/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01006—Carbon [C]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01013—Aluminum [Al]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01025—Manganese [Mn]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01029—Copper [Cu]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01047—Silver [Ag]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01068—Erbium [Er]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01077—Iridium [Ir]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01082—Lead [Pb]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/0132—Binary Alloys
- H01L2924/01327—Intermediate phases, i.e. intermetallics compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/014—Solder alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/102—Material of the semiconductor or solid state bodies
- H01L2924/1025—Semiconducting materials
- H01L2924/10251—Elemental semiconductors, i.e. Group IV
- H01L2924/10253—Silicon [Si]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1305—Bipolar Junction Transistor [BJT]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1305—Bipolar Junction Transistor [BJT]
- H01L2924/13055—Insulated gate bipolar transistor [IGBT]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1306—Field-effect transistor [FET]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1306—Field-effect transistor [FET]
- H01L2924/13091—Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/156—Material
- H01L2924/157—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2924/15738—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950 C and less than 1550 C
- H01L2924/15747—Copper [Cu] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/156—Material
- H01L2924/15786—Material with a principal constituent of the material being a non metallic, non metalloid inorganic material
- H01L2924/15787—Ceramics, e.g. crystalline carbides, nitrides or oxides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19041—Component type being a capacitor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19043—Component type being a resistor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/30107—Inductance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3025—Electromagnetic shielding
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Geometry (AREA)
- Ceramic Engineering (AREA)
- Health & Medical Sciences (AREA)
- Electromagnetism (AREA)
- Toxicology (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
- Power Conversion In General (AREA)
Description
・ダイ上の追加スペースを必要とし、
・比較的不正確であり、
・特殊なダイ設計/レイアウトを必要とすることである。
a)改善された機械的特性
i)応力を減らされ、両面冷却される半導体デバイスハウジング
ii)シリコンダイと熱的に一致する膨張係数を有する材料の選択
iii)一致する熱膨張係数に起因する高められた信頼性
i)ダイのソース、およびドレイン(またはエミッタ/コレクタ)用の大きい接触面積を提供することによる低いインダクタンス
ii)はんだダイ取付け、および大きい接触面積を使用することによる低い電気抵抗、および熱抵抗に起因する優れた電流電力機能
iii)電気的分離(高電圧応用例、自動車応用例、および他の応用例に必要)
i)簡単なハンドリング、および電力モジュールへの一体化に適する、事前に組み立てられるディスクリート構成要素パッケージ
ii)DBCに関するよりゆるやかな精度要件
i)用途に固有のカスタマイゼーションなしの大量生産(この固有カスタマイゼーションは、エンドカスタマが行える)。
ii)DBC金属製容器のくぼみへのダイ取付けを、ディスクリートダイのハンドリング、および組立ではなく、DBCカード上で行うことができる。
iii)組立後または組立中の電気的/パラメトリック最終テストを、パッケージ化された部品をディスクリートデバイスに分離する前に、DBCカードレベルで行うことができる。
iv)エンドカスタマへの輸送は、DBCカードアセンブリ全体を使用することによって行うことができ、これによって、洗練された追加の輸送パッケージの必要なしで保護が提供される。
i)事前に組み立てられたディスクリート構成要素パッケージは、既知の電力基板の熱膨張係数と一致し、したがって、さまざまな応用例に魅力的である
ii)エンドカスタマが応用例固有回路に簡単に組み合わせることのできるパッケージ化されたディスクリートデバイスの用途上の柔軟性。
iii)電力基板上、または電力モジュール内で複数のDBC金属製容器に、パッケージされたダイを組み合わせることだけによる最適のロウ側およびハイ側のドライバ構成、またはハーフ/フルブリッジ構成をもたらす、さかさま、またはボトムアップなどのDBC金属製容器の内側でのさまざまなダイ取付可能性に起因する応用例柔軟性。
iv)セラミックタイプのDBC金属製容器を使用条件と一致させる(たとえば、Al2O3、AlN、SiN、および他のセラミック)ことによるコスト効率のよい材料の選択。
i)追加のEMIスクリーニング機能が、DBC金属製容器の最上部銅層を使用することによって使用可能である。
ii)追加のヒートスプレッダをDBC金属製容器の最上部に取り付けることができると同時に、ダイの最下部が、応用例の冷却される電力基板にはんだ付けされ、最高の電力密度に関する非常に効率的な両面冷却が与えられる。
iii)ゲートドライバICなどの「インテリジェントデバイス」のダイパッケージの最上部への直接の簡単な当接、または一体化。
iv)電力リードフレーム、および信号リードフレームなどの外部電気インターフェース用の接点端子の簡単な形成。
i)上で説明した使用の高い柔軟性、および異なる使用可能なオプションに起因して、本発明によると、電力管理市場の応用例の広い帯域幅をカバーすることができる。
ii)主な応用分野は、大電流または高電圧を切り替え、低インダクタンスおよびEMIスクリーニングを必要とする、大電力回路および大電力モジュールである。特に関連するのが、MOSFETおよびIGBTを使用する高電力密度応用例と、自動車もしくは高い信頼性要件を有する安全にクリティカルな機能などの厳しい環境条件、または異なる温度サイクリング要件の下の応用例である。
31 半導体ダイ
32 ハウジング
33 はんだバンプ
34 はんだバンプ
35 はんだプリフォーム
40 最下部導電層
41 絶縁層
43 最上部導電層
43a セグメント
43b セグメント
50 くぼみ
51 最下部表面
51a くぼみ基部
51b くぼみ基部
52 リム
52a リムセグメント
52b リムセグメント
65 舌
66 ギャップ
70 パッケージ
71 スルーホール
72 導電性材料
72a 破線の円
72b 破線の円
72c 破線の円
73 電圧降下
80 ディンプル
90 DBCカード
95 ストリート
110 最下部DBC基板
111 導電層
112 最下部導電層
113 熱伝導セラミック絶縁層
120 ヒートシンク
121 はんだ
130 はんだ層
131 導電ヒートシンクまたは板
140 クラスタ
141 セラミック層
150 端子
151 端子
152 はんだ層
160 ICダイ
161 はんだ
162 ワイヤボンド
163 ワイヤボンド
170 制御ICダイ
171 ボール接点
180 IC
181 IC
190 IC
191 IC端子
192 IC端子
200 IC
201 導体
202 外部インターフェース端子
203 はんだ
210 回路
211 はんだまたは接着剤
212 接点
220 EMIスクリーニングプレート
221 外部電力端子
222 外部電力端子
230 モールドコンパウンド
Claims (50)
- 平坦で平行な第1のおよび第2の表面の上に電極を有する半導体ダイと、前記ダイを支持する金属製容器とを有する半導体デバイスパッケージであって、前記支持金属製容器が、最上部のおよび最下部の平行な表面と、それぞれ前記最上部のおよび最下部の表面上の最上部のおよび最下部の導電層とを有する薄い絶縁本体を含み、前記最上部導電層が、平坦な最下部ウェブ表面を画定するその中のくぼみと、前記平坦な最下部ウェブ表面の周囲の少なくとも一部の回りに延びる直立したリム部分とを有し、前記ダイは、第2表面上の前記電極が前記平坦な最下部ウェブ表面に機械的におよび電気的に固定された状態で、前記くぼみの中に配置され、前記ダイの前記第1表面は、前記リム部分の最上部自由表面と同一面である半導体デバイスパッケージ。
- 前記ダイは、シリコンMOSgatedデバイス、またはIGBTであり、かつ前記電極は、それぞれ、ソース電極およびドレイン電極である、請求項1に記載の半導体デバイスパッケージ。
- 前記第1電極は、前記リムの平面を超えて延びるバンプ接点である、請求項2に記載の半導体デバイスパッケージ。
- 前記第1電極は、はんだ付け可能なパッドである、請求項2に記載の半導体デバイスパッケージ。
- 前記支持金属製容器は、DBCウェハであり、前記絶縁本体は、セラミックであり、前記最上部のおよび最下部の接点は、銅である、請求項1に記載の半導体デバイスパッケージ。
- 前記最下部接点は、約300μmの厚さを有する銅であり、前記くぼみは、前記ダイの厚さと前記ダイの最下部の前記電極の厚さとの合計と等しい深さを有する、請求項1に記載の半導体デバイスパッケージ。
- 前記絶縁本体は、約600μm厚であり、前記最上部のおよび最下部の接点は、ともに約300μm厚である、請求項5に記載の半導体デバイスパッケージ。
- 前記リムは、概ねU字形である、請求項1に記載の半導体デバイスパッケージ。
- 前記ダイの第2表面上の電極は、前記くぼみの表面にはんだ付けされている、請求項1に記載の半導体デバイスパッケージ。
- 前記支持金属製容器は、DBCウェハであり、前記絶縁性本体は、セラミックであり、前記最上部のおよび最下部の接点は、銅である、請求項3に記載の半導体デバイスパッケージ。
- 前記最下部接点は、約300μmの厚さを有する銅であり、前記くぼみは、前記ダイの厚さと前記ダイの最下部の前記電極の厚さとの合計と等しい深さを有する、請求項3に記載の半導体デバイスパッケージ。
- 前記リムは、おおむねU字形である、請求項5に記載の半導体デバイスパッケージ。
- 前記リムの両端は開いている、請求項5に記載の半導体デバイスパッケージ。
- 前記ダイの第2表面上の電極は、前記くぼみの表面にはんだ付けされる、請求項5に記載の半導体デバイスパッケージ。
- 分離ストリートによって分離された、同一の横方向の間隔を有する複数の半導体パッケージを含むウェハスケールDBCカードであって、前記各パッケージは、それぞれ、平坦で平行な第1のおよび第2の表面、および各表面の上に位置する、電極を有する半導体ダイと、前記ダイを支持する支持金属製容器とを有し、前記支持金属製容器は、最上部のおよび最下部の平行な表面と、それぞれ前記最上部のおよび最下部の表面上の最上部のおよび最下部の導電層とを有する薄い絶縁本体を有し、前記最上部導電層は、平坦な最下部ウェブ表面を画定するその中のくぼみと、前記平坦な最下部ウェブ表面の周囲の少なくとも一部の回りに延びる直立したリム部分とを有し、前記ダイは、第2表面上の前記電極が前記平坦な最下部ウェブ表面に機械的におよび電気的に固定された状態で、前記くぼみの中に配置され、前記ダイの前記第1表面は、前記リム部分の最上部自由表面と同一平面であり、前記絶縁本体は、前記カードの面積全体にわたって連続的であり、これにより、前記絶縁本体は、前記パッケージを互いに分離するために、前記ストリートの区域で切断可能となっている、ウェハスケールDBCカード。
- 前記各パッケージにおける前記ダイは、シリコンMOSgatedデバイスであり、前記電極は、それぞれ、ソース電極およびドレイン電極であり、前記第1電極は、前記リムの平面を超えて延びるバンプ接点である、請求項15に記載のウェハスケールDBCカード。
- 前記パッケージのそれぞれにおいて、前記最下部接点は銅であり、前記最下部接点は、約300μmの厚さを有し、前記くぼみは、前記ダイの厚さと前記ダイの最下部の前記電極の厚さとの合計と等しい深さを有する、請求項16に記載のウェハスケールDBCカード。
- 前記パッケージのそれぞれにおいて、前記リムは、おおむねU字形の形状を有する、請求項16に記載のウェハスケールDBCカード。
- 前記パッケージのそれぞれにおいて、前記リムは、前記ダイの両側にある、請求項16に記載のウェハスケールDBCカード。
- 前記パッケージのそれぞれにおいて、前記第2表面上の前記電極は、前記くぼみの表面にはんだ付けされている、請求項16に記載のウェハスケールDBCカード。
- 前記ウェブ表面上の前記ダイを囲み、前記ダイを、前記平坦な最下部ウェブ表面上の所定の位置に位置付ける、ダイ位置位置付け構造体をさらに含む、請求項1に記載の半導体デバイスパッケージ。
- 前記ダイ位置位置付け構造体は、前記ウェブ内に、間隔を有する複数のくぼみを有する、請求項21に記載の半導体デバイスパッケージ。
- 前記ダイの第2表面上の前記電極は、前記くぼみの表面にはんだ付けされている、請求項21に記載の半導体デバイスパッケージ。
- 前記ダイの第2表面上の前記電極は、前記くぼみの表面にはんだ付けされている、請求項22に記載の半導体デバイスパッケージ。
- 前記絶縁本体内の少なくとも1つのビアと、前記ビア内の、前記第2表面上の前記電極と前記最下部導電層との間に電気的に接続された抵抗性シャント材料とをさらに含む、請求項1に記載の半導体デバイスパッケージ。
- 前記絶縁本体内の少なくとも1つのビアと、前記ビア内の、前記第2表面上の電極と前記最下部導電層との間に電気的に接続された抵抗性シャント材料とをさらに含む、請求項2に記載の半導体デバイスパッケージ。
- 前記絶縁本体内の少なくとも1つのビアと、前記ビア内の、前記第2表面上の前記電極と前記最下部導電層との間に電気的に接続された抵抗性シャント材料とをさらに含む、請求項5に記載の半導体デバイスパッケージ。
- 前記絶縁本体内の少なくとも1つのビアと、前記ビア内の、前記第2表面上の前記電極と前記最下部導電層との間に電気的に接続された抵抗性シャント材料とをさらに含む、請求項9に記載の半導体デバイスパッケージ。
- 前記パッケージのうちの少なくとも1つの前記絶縁本体は、前記絶縁本体内の少なくとも1つのビアと、前記ビア内の、前記第2表面上の電極と前記最下部導電層との間に電気的に接続された抵抗性シャント材料とを有する、請求項15に記載のウェハスケールDBCカード。
- 前記パッケージのそれぞれにおいて、前記第2表面上の前記電極は、前記くぼみの表面にはんだ付けされている、請求項29に記載のウェハスケールDBCカード。
- 平坦な表面を有するヒートシンク本体をさらに有し、前記支持金属製容器の最下部表面上の前記導電層は、前記ヒートシンクの平坦な表面に電気的におよび機械的に固定されている、請求項1に記載の半導体デバイスパッケージ。
- 前記ヒートシンク内の流体冷却材チャネルをさらに含む、請求項31に記載の半導体デバイスパッケージ。
- 前記ダイは、シリコンMOSgatedデバイスであり、前記電極は、それぞれソース電極およびドレイン電極である、請求項31に記載の半導体デバイスパッケージ。
- 前記支持体はDBCウェハであり、前記絶縁本体はセラミックであり、前記最上部のおよび最下部の接点は銅である、請求項31に記載の半導体デバイスパッケージ。
- 前記ダイの第2表面上の電極は、前記くぼみの表面にはんだ付けされる、請求項31に記載の半導体デバイスパッケージ。
- 前記絶縁本体内の少なくとも1つのビアと、前記ビア内の第2表面上の電極と、前記最下部導電層との間に電気的に接続された抵抗性シャント材料とをさらに含む、請求項31に記載の半導体デバイスパッケージ。
- 前記ヒートシンクの平坦な表面に固定され、前記パッケージのそれぞれの最上部のおよび最下部の電極が、互いに間隔を置かれた状態で、他のパッケージから横に間隔を置かれた、前記第1パッケージと同一の第2パッケージをさらに含む、請求項31に記載の半導体デバイスパッケージ。
- 前記パッケージのそれぞれの絶縁本体は、前記本体のそれぞれに共通する連続層である、請求項37に記載の半導体デバイスパッケージ。
- 前記パッケージのそれぞれの最上部導電層の最上部に固定され、これを電気的に接続する共通の平坦な導電ヒートシンクをさらに含む、請求項37に記載の半導体デバイスパッケージ。
- 前記パッケージのそれぞれの最上部導電層の最上部に固定され、これを電気的に接続する共通の平坦な導電ヒートシンクをさらに含む、請求項38に記載の半導体デバイスパッケージ。
- 前記絶縁本体内の少なくとも1つのビアと、前記ビア内の、前記第2表面上の前記電極と最下部導電層との間に電気的に接続された抵抗性シャント材料とをさらに含む、請求項37に記載の半導体デバイスパッケージ。
- 前記パッケージのそれぞれの絶縁本体は、前記本体のそれぞれに共通する連続層である、請求項41に記載の半導体デバイスパッケージ。
- 前記パッケージのそれぞれの最上部導電層の最上部に固定され、これを電気的に接続する共通の平坦な導電ヒートシンクをさらに含む、請求項41に記載の半導体デバイスパッケージ。
- 前記ダイの最上部表面上の電極に接続された、少なくとも1つの端子を有する集積回路デバイスをさらに含む、請求項1に記載の半導体デバイスパッケージ。
- 前記ダイの最上部表面上の電極に接続された、少なくとも1つの端子を有する集積回路デバイスをさらに含む、請求項14に記載の半導体デバイスパッケージ。
- 前記ダイの最上部表面上の電極に接続された、少なくとも1つの端子を有する集積回路デバイスをさらに含む、請求項25に記載の半導体デバイスパッケージ。
- 前記ダイの最上部表面上の電極に接続された、少なくとも1つの端子を有する集積回路デバイスをさらに含む、請求項30に記載のウェハスケールDBCカード。
- 前記ダイの最上部表面上の電極に接続された、少なくとも1つの端子を有する集積回路デバイスをさらに含む、請求項31に記載の半導体デバイスパッケージ。
- 前記パッケージのうちの1つの上に取り付けられ、前記パッケージのうちの前記1つの最上部電極に接続された、1つの端子を有する集積回路デバイスをさらに含む、請求項37に記載の半導体デバイスパッケージ。
- 前記パッケージのうちの1つの上に取り付けられ、前記パッケージのうちの1つの最上部電極に接続された、1つの端子を有する集積回路デバイスをさらに含む、請求項46に記載の半導体デバイスパッケージ。
Applications Claiming Priority (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US75335305P | 2005-12-21 | 2005-12-21 | |
US60/753,353 | 2005-12-21 | ||
US75698406P | 2006-01-06 | 2006-01-06 | |
US60/756,984 | 2006-01-06 | ||
US76172206P | 2006-01-24 | 2006-01-24 | |
US60/761,722 | 2006-01-24 | ||
US11/641,270 | 2006-12-19 | ||
US11/641,270 US8018056B2 (en) | 2005-12-21 | 2006-12-19 | Package for high power density devices |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007173831A JP2007173831A (ja) | 2007-07-05 |
JP5001637B2 true JP5001637B2 (ja) | 2012-08-15 |
Family
ID=38172518
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006344336A Active JP5001637B2 (ja) | 2005-12-21 | 2006-12-21 | 高電力密度デバイス用のパッケージ |
Country Status (5)
Country | Link |
---|---|
US (7) | US8018056B2 (ja) |
JP (1) | JP5001637B2 (ja) |
KR (1) | KR100852766B1 (ja) |
DE (1) | DE102006060768B4 (ja) |
IT (1) | ITTO20060910A1 (ja) |
Families Citing this family (137)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8018056B2 (en) | 2005-12-21 | 2011-09-13 | International Rectifier Corporation | Package for high power density devices |
US7508012B2 (en) * | 2006-01-18 | 2009-03-24 | Infineon Technologies Ag | Electronic component and method for its assembly |
US7768075B2 (en) * | 2006-04-06 | 2010-08-03 | Fairchild Semiconductor Corporation | Semiconductor die packages using thin dies and metal substrates |
US7687882B2 (en) * | 2006-04-14 | 2010-03-30 | Allegro Microsystems, Inc. | Methods and apparatus for integrated circuit having multiple dies with at least one on chip capacitor |
US7573112B2 (en) * | 2006-04-14 | 2009-08-11 | Allegro Microsystems, Inc. | Methods and apparatus for sensor having capacitor on chip |
US7880283B2 (en) * | 2006-04-25 | 2011-02-01 | International Rectifier Corporation | High reliability power module |
US20080013298A1 (en) | 2006-07-14 | 2008-01-17 | Nirmal Sharma | Methods and apparatus for passive attachment of components for integrated circuits |
US20080266801A1 (en) * | 2007-04-30 | 2008-10-30 | Rockwell Automation Technologies, Inc. | Phase change cooled power electronic module |
US7683477B2 (en) * | 2007-06-26 | 2010-03-23 | Infineon Technologies Ag | Semiconductor device including semiconductor chips having contact elements |
US20090284213A1 (en) * | 2008-05-15 | 2009-11-19 | Gm Global Technology Operations, Inc. | Power module layout for automotive power converters |
US20090243012A1 (en) * | 2008-03-28 | 2009-10-01 | Micron Technology, Inc. | Electromagnetic interference shield structures for semiconductor components |
JP5206102B2 (ja) * | 2008-05-08 | 2013-06-12 | トヨタ自動車株式会社 | 半導体装置 |
US8093670B2 (en) * | 2008-07-24 | 2012-01-10 | Allegro Microsystems, Inc. | Methods and apparatus for integrated circuit having on chip capacitor with eddy current reductions |
US20100052424A1 (en) * | 2008-08-26 | 2010-03-04 | Taylor William P | Methods and apparatus for integrated circuit having integrated energy storage device |
US20110133732A1 (en) * | 2009-12-03 | 2011-06-09 | Allegro Microsystems, Inc. | Methods and apparatus for enhanced frequency response of magnetic sensors |
US9088226B2 (en) | 2010-10-19 | 2015-07-21 | Electronics Motion Systems Holding Limited | Power module for converting DC to AC |
US9252782B2 (en) * | 2011-02-14 | 2016-02-02 | Qualcomm Incorporated | Wireless chipset with a non-temperature compensated crystal reference |
JP5588895B2 (ja) * | 2011-02-28 | 2014-09-10 | 日立オートモティブシステムズ株式会社 | パワー半導体モジュール,パワー半導体モジュールの製造方法及び電力変換装置 |
US9343440B2 (en) * | 2011-04-11 | 2016-05-17 | Infineon Technologies Americas Corp. | Stacked composite device including a group III-V transistor and a group IV vertical transistor |
US8350376B2 (en) | 2011-04-18 | 2013-01-08 | International Rectifier Corporation | Bondwireless power module with three-dimensional current routing |
US9001518B2 (en) | 2011-04-26 | 2015-04-07 | International Rectifier Corporation | Power module with press-fit clamps |
US8804340B2 (en) * | 2011-06-08 | 2014-08-12 | International Rectifier Corporation | Power semiconductor package with double-sided cooling |
ITMI20111214A1 (it) | 2011-06-30 | 2012-12-31 | St Microelectronics Srl | Dispositivo di potenza a spessore ridotto |
ITMI20111216A1 (it) | 2011-06-30 | 2012-12-31 | St Microelectronics Srl | Dispositivo elettronico di potenza ad elevata dissipazione di calore e stabilita? |
ITMI20111218A1 (it) | 2011-06-30 | 2012-12-31 | St Microelectronics Srl | Dispositivo di potenza ad elevata velocita? di commutazione |
US8723311B2 (en) * | 2011-06-30 | 2014-05-13 | Stmicroelectronics S.R.L. | Half-bridge electronic device with common heat sink on mounting surface |
ITMI20111217A1 (it) | 2011-06-30 | 2012-12-31 | St Microelectronics Srl | Sistema contenitore/dissipatore per componente elettronico |
ITMI20111213A1 (it) | 2011-06-30 | 2012-12-31 | St Microelectronics Srl | Dispositivo elettronico a semi-ponte con dissipatore di calore ausiliario comune |
ITMI20111208A1 (it) | 2011-06-30 | 2012-12-31 | St Microelectronics Srl | Sistema con dissipatore di calore stabilizzato |
ITMI20111219A1 (it) | 2011-06-30 | 2012-12-31 | St Microelectronics Srl | Sistema con dissipatore di calore condiviso |
US8987777B2 (en) | 2011-07-11 | 2015-03-24 | International Rectifier Corporation | Stacked half-bridge power module |
US8653635B2 (en) * | 2011-08-16 | 2014-02-18 | General Electric Company | Power overlay structure with leadframe connections |
JP5579928B2 (ja) * | 2011-11-04 | 2014-08-27 | パナソニック株式会社 | 半導体装置およびその製造方法 |
DE112011105802B4 (de) * | 2011-11-04 | 2022-07-21 | Denso Corporation | Leistungsmodul, elektrischer Leistungswandler und Elektrofahrzeug |
DE102011055223B3 (de) * | 2011-11-10 | 2013-05-16 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Unmittelbare Kontaktierung eines Energiespeichers oder einer Last mittels eines elektronischen Lastschalters |
US9209176B2 (en) * | 2011-12-07 | 2015-12-08 | Transphorm Inc. | Semiconductor modules and methods of forming the same |
US8679900B2 (en) * | 2011-12-14 | 2014-03-25 | Stats Chippac Ltd. | Integrated circuit packaging system with heat conduction and method of manufacture thereof |
US8629539B2 (en) | 2012-01-16 | 2014-01-14 | Allegro Microsystems, Llc | Methods and apparatus for magnetic sensor having non-conductive die paddle |
US8648643B2 (en) | 2012-02-24 | 2014-02-11 | Transphorm Inc. | Semiconductor power modules and devices |
US9362267B2 (en) | 2012-03-15 | 2016-06-07 | Infineon Technologies Americas Corp. | Group III-V and group IV composite switch |
US9812588B2 (en) | 2012-03-20 | 2017-11-07 | Allegro Microsystems, Llc | Magnetic field sensor integrated circuit with integral ferromagnetic material |
US9666788B2 (en) | 2012-03-20 | 2017-05-30 | Allegro Microsystems, Llc | Integrated circuit package having a split lead frame |
US9494660B2 (en) | 2012-03-20 | 2016-11-15 | Allegro Microsystems, Llc | Integrated circuit package having a split lead frame |
US10234513B2 (en) | 2012-03-20 | 2019-03-19 | Allegro Microsystems, Llc | Magnetic field sensor integrated circuit with integral ferromagnetic material |
US9128125B2 (en) * | 2012-06-14 | 2015-09-08 | Micrel, Inc. | Current sensing using a metal-on-passivation layer on an integrated circuit die |
US9299630B2 (en) * | 2012-07-30 | 2016-03-29 | General Electric Company | Diffusion barrier for surface mount modules |
US8941208B2 (en) | 2012-07-30 | 2015-01-27 | General Electric Company | Reliable surface mount integrated power module |
US9275938B1 (en) | 2012-08-31 | 2016-03-01 | Cree Fayetteville, Inc. | Low profile high temperature double sided flip chip power packaging |
US9095054B1 (en) * | 2012-10-12 | 2015-07-28 | Arkansas Power Electronics International, Inc. | High temperature equalized electrical parasitic power packaging method for many paralleled semiconductor power devices |
US9407251B1 (en) | 2012-12-07 | 2016-08-02 | Cree Fayetteville, Inc. | Method for reworkable packaging of high speed, low electrical parasitic power electronics modules through gate drive integration |
US8872328B2 (en) | 2012-12-19 | 2014-10-28 | General Electric Company | Integrated power module package |
US8987876B2 (en) | 2013-03-14 | 2015-03-24 | General Electric Company | Power overlay structure and method of making same |
US10269688B2 (en) | 2013-03-14 | 2019-04-23 | General Electric Company | Power overlay structure and method of making same |
US8921989B2 (en) | 2013-03-27 | 2014-12-30 | Toyota Motor Engineering & Manufacturing North, America, Inc. | Power electronics modules with solder layers having reduced thermal stress |
US9411025B2 (en) | 2013-04-26 | 2016-08-09 | Allegro Microsystems, Llc | Integrated circuit package having a split lead frame and a magnet |
US9099861B2 (en) * | 2013-05-23 | 2015-08-04 | Inpaq Technology Co., Ltd. | Over-voltage protection device and method for preparing the same |
AT514085B1 (de) * | 2013-06-11 | 2014-10-15 | Austria Tech & System Tech | Leistungsmodul |
CN103354227B (zh) * | 2013-06-18 | 2016-08-17 | 华进半导体封装先导技术研发中心有限公司 | 堆叠封装器件 |
US9537425B2 (en) | 2013-07-09 | 2017-01-03 | Transphorm Inc. | Multilevel inverters and their components |
DE112014004770B4 (de) | 2013-10-17 | 2022-10-13 | Wolfspeed, Inc. | Hochspannungs-Leistungs-Chipmodul |
US9077335B2 (en) * | 2013-10-29 | 2015-07-07 | Hrl Laboratories, Llc | Reduction of the inductance of power loop and gate loop in a half-bridge converter with vertical current loops |
WO2015079808A1 (ja) * | 2013-11-29 | 2015-06-04 | シャープ株式会社 | 半導体装置 |
US9349709B2 (en) | 2013-12-04 | 2016-05-24 | Infineon Technologies Ag | Electronic component with sheet-like redistribution structure |
US9536800B2 (en) | 2013-12-07 | 2017-01-03 | Fairchild Semiconductor Corporation | Packaged semiconductor devices and methods of manufacturing |
US9653386B2 (en) * | 2014-10-16 | 2017-05-16 | Infineon Technologies Americas Corp. | Compact multi-die power semiconductor package |
US9741635B2 (en) * | 2014-01-21 | 2017-08-22 | Infineon Technologies Austria Ag | Electronic component |
EP3100301B1 (en) | 2014-01-30 | 2019-11-06 | Cree Fayetteville, Inc. | Low profile, highly configurable, current sharing paralleled wide band gap power device power module |
US9426883B2 (en) | 2014-01-30 | 2016-08-23 | Cree Fayetteville, Inc. | Low profile, highly configurable, current sharing paralleled wide band gap power device power module |
DE102014203899B4 (de) | 2014-03-04 | 2024-03-14 | Volkswagen Aktiengesellschaft | Vorrichtung und elektrische Baugruppe zum Wandeln einer Gleichspannung in eine Wechselspannung |
DE102014205958A1 (de) * | 2014-03-31 | 2015-10-01 | Lemförder Electronic GmbH | Halbleiterschaltelementanordnung und Steuergeräteinrichtung für ein Fahrzeug |
JP6312527B2 (ja) * | 2014-05-23 | 2018-04-18 | 新日本無線株式会社 | 放熱板を備えた電子部品の実装構造 |
JP2016012720A (ja) * | 2014-06-03 | 2016-01-21 | 住友ベークライト株式会社 | 金属ベース実装基板および金属ベース実装基板実装部材 |
US9543940B2 (en) | 2014-07-03 | 2017-01-10 | Transphorm Inc. | Switching circuits having ferrite beads |
US9590494B1 (en) | 2014-07-17 | 2017-03-07 | Transphorm Inc. | Bridgeless power factor correction circuits |
JP6333693B2 (ja) * | 2014-09-30 | 2018-05-30 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
DE102014223361A1 (de) * | 2014-11-17 | 2016-05-19 | Robert Bosch Gmbh | Elektromotor mit einem Leistungsmodul |
DE102014118080B4 (de) * | 2014-12-08 | 2020-10-15 | Infineon Technologies Ag | Elektronisches Modul mit einem Wärmespreizer und Verfahren zur Herstellung davon |
US9418921B2 (en) | 2014-12-15 | 2016-08-16 | Industrial Technology Research Institute | Power module |
US9240370B1 (en) | 2014-12-15 | 2016-01-19 | Industrial Technology Research Institute | Power module |
CN104490052A (zh) * | 2014-12-26 | 2015-04-08 | 贵阳康祥浩科技有限公司 | 一种提包 |
JP6019367B2 (ja) * | 2015-01-13 | 2016-11-02 | 株式会社野田スクリーン | 半導体装置 |
CN105990265B (zh) * | 2015-02-26 | 2019-04-05 | 台达电子工业股份有限公司 | 功率转换电路的封装模块及其制造方法 |
EP3065172A1 (en) * | 2015-03-06 | 2016-09-07 | Nxp B.V. | Semiconductor device |
JP6637065B2 (ja) | 2015-03-13 | 2020-01-29 | トランスフォーム インコーポレーテッド | 高電力回路のためのスイッチングデバイスの並列化 |
DE102015208348B3 (de) * | 2015-05-06 | 2016-09-01 | Siemens Aktiengesellschaft | Leistungsmodul sowie Verfahren zum Herstellen eines Leistungsmoduls |
US9941234B2 (en) | 2015-05-28 | 2018-04-10 | Ut-Battelle, Llc | Integrated packaging of multiple double sided cooling planar bond power modules |
US9468087B1 (en) * | 2015-07-13 | 2016-10-11 | Texas Instruments Incorporated | Power module with improved cooling and method for making |
US10128174B2 (en) * | 2015-07-24 | 2018-11-13 | Semiconductor Components Industries, Llc | Semiconductor component and method of manufacture |
WO2017062056A1 (en) | 2015-10-09 | 2017-04-13 | Hrl Laboratories, Llc | GaN-ON-SAPPHIRE MONOLITHICALLY INTEGRATED POWER CONVERTER |
US9839146B2 (en) | 2015-10-20 | 2017-12-05 | Cree, Inc. | High voltage power module |
US10411498B2 (en) | 2015-10-21 | 2019-09-10 | Allegro Microsystems, Llc | Apparatus and methods for extending sensor integrated circuit operation through a power disturbance |
CN106684076B (zh) * | 2015-11-05 | 2019-09-06 | 台达电子企业管理(上海)有限公司 | 封装结构及其制造方法 |
US10002829B2 (en) * | 2015-11-30 | 2018-06-19 | Taiwan Semiconductor Manufacturing Company Ltd. | Semiconductor device and manufacturing method thereof |
US10051742B2 (en) | 2015-12-10 | 2018-08-14 | Industrial Technology Research Institute | Power module and manufacturing method thereof |
JP6928560B2 (ja) * | 2016-02-12 | 2021-09-01 | 古河電気工業株式会社 | サブマウント、半導体素子実装サブマウント、および半導体素子モジュール |
US9589917B1 (en) | 2016-03-21 | 2017-03-07 | Raytheon Company | Microwave monolithic integrated circuit (MMIC) having integrated high power thermal dissipating load |
US10365303B2 (en) | 2016-04-28 | 2019-07-30 | Texas Instruments Incorporated | Shunt strip |
US20170323708A1 (en) | 2016-05-03 | 2017-11-09 | Texas Instruments Incorporated | Component sheet and method of singulating |
US10335875B2 (en) | 2016-05-26 | 2019-07-02 | Texas Instruments Incorporated | Methods and devices for dicing components from a sheet of copper alloy |
US10062636B2 (en) * | 2016-06-27 | 2018-08-28 | Newport Fab, Llc | Integration of thermally conductive but electrically isolating layers with semiconductor devices |
US10256178B2 (en) | 2016-09-06 | 2019-04-09 | Fairchild Semiconductor Corporation | Vertical and horizontal circuit assemblies |
US10319648B2 (en) | 2017-04-17 | 2019-06-11 | Transphorm Inc. | Conditions for burn-in of high power semiconductors |
GB2561921A (en) * | 2017-04-28 | 2018-10-31 | Cirrus Logic Int Semiconductor Ltd | MEMS Device and process |
DE102017208147B4 (de) * | 2017-05-15 | 2021-12-30 | Schweizer Electronic Ag | Elektronisches Bauteil und Leiterplatte mit diesem elektronischen Bauteil |
KR102153159B1 (ko) * | 2017-06-12 | 2020-09-08 | 매그나칩 반도체 유한회사 | 전력 반도체의 멀티칩 패키지 |
US10720380B1 (en) | 2017-06-13 | 2020-07-21 | Starlet R. Glover | Flip-chip wire bondless power device |
US10319670B2 (en) | 2017-10-20 | 2019-06-11 | Semiconductor Components Industries, Llc | Package including multiple semiconductor devices |
US10553517B2 (en) | 2018-01-18 | 2020-02-04 | Semiconductor Components Industries, Llc | High power module semiconductor package with multiple submodules |
US10354979B1 (en) | 2018-02-12 | 2019-07-16 | Raytheon Company | Microcircuit card assembly including dual-sided cooling paths |
CN110246808B (zh) * | 2018-03-09 | 2021-08-10 | 南京银茂微电子制造有限公司 | 具有降低的结温的功率模块及其制造方法 |
US10438877B1 (en) | 2018-03-13 | 2019-10-08 | Semiconductor Components Industries, Llc | Multi-chip packages with stabilized die pads |
DE102018107094B4 (de) | 2018-03-26 | 2021-04-15 | Infineon Technologies Austria Ag | Multi-Package-Oberseitenkühlung und Verfahren zu deren Herstellung |
US11444000B2 (en) * | 2018-04-14 | 2022-09-13 | Alpha And Omega Semiconductor (Cayman) Ltd. | Charger |
TWI789400B (zh) * | 2018-03-29 | 2023-01-11 | 澳門商萬國半導體(澳門)股份有限公司 | 充電器 |
US10978897B2 (en) | 2018-04-02 | 2021-04-13 | Allegro Microsystems, Llc | Systems and methods for suppressing undesirable voltage supply artifacts |
IT201800004209A1 (it) * | 2018-04-05 | 2019-10-05 | Dispositivo semiconduttore di potenza con relativo incapsulamento e corrispondente procedimento di fabbricazione | |
US10991670B2 (en) | 2018-09-28 | 2021-04-27 | Semiconductor Components Industries, Llc | Semiconductor device assemblies including spacer with embedded semiconductor die |
US11075137B2 (en) | 2018-05-02 | 2021-07-27 | Semiconductor Components Industries, Llc | High power module package structures |
DE102018207308B4 (de) * | 2018-05-09 | 2020-07-02 | Infineon Technologies Ag | Halbleiterbauteil mit integriertem shunt-widerstand und verfahren zu dessen herstellung |
TW202005020A (zh) * | 2018-05-28 | 2020-01-16 | 艾姆勒車電股份有限公司 | Igbt模組散熱結構 |
USD908632S1 (en) | 2018-09-17 | 2021-01-26 | Cree Fayetteville, Inc. | Power module |
US11107753B2 (en) * | 2018-11-28 | 2021-08-31 | Semiconductor Components Industries, Llc | Packaging structure for gallium nitride devices |
IT201900013743A1 (it) | 2019-08-01 | 2021-02-01 | St Microelectronics Srl | Dispositivo elettronico di potenza incapsulato, in particolare circuito a ponte comprendente transistori di potenza, e relativo procedimento di assemblaggio |
TWI698969B (zh) * | 2019-08-14 | 2020-07-11 | 朋程科技股份有限公司 | 功率元件封裝結構 |
US10991644B2 (en) | 2019-08-22 | 2021-04-27 | Allegro Microsystems, Llc | Integrated circuit package having a low profile |
CN112447614A (zh) * | 2019-08-30 | 2021-03-05 | 朋程科技股份有限公司 | 功率器件封装结构 |
CN110491857A (zh) * | 2019-09-18 | 2019-11-22 | 深圳爱仕特科技有限公司 | 一种适用于高压功率器件模块封装的dbc结构 |
DE102019126623B4 (de) * | 2019-10-02 | 2024-03-14 | Semikron Elektronik Gmbh & Co. Kg Patentabteilung | Leistungselektronische Schalteinrichtung mit einer Vergussmasse |
CN110993507B (zh) * | 2019-11-22 | 2021-05-25 | 江苏富乐德半导体科技有限公司 | 一种减少覆铜陶瓷基板母板翘曲的方法 |
WO2021112590A2 (ko) * | 2019-12-05 | 2021-06-10 | 주식회사 아모센스 | 전력반도체 모듈 |
US11901248B2 (en) | 2020-03-27 | 2024-02-13 | Intel Corporation | Embedded die architecture and method of making |
WO2022005134A1 (ko) * | 2020-07-03 | 2022-01-06 | 주식회사 아모센스 | 파워모듈 |
CN111933604B (zh) * | 2020-07-08 | 2021-07-27 | 南京晟芯半导体有限公司 | 一种提高半导体场效应晶体管芯片短路能力的结构及方法 |
IT202000016840A1 (it) | 2020-07-10 | 2022-01-10 | St Microelectronics Srl | Dispositivo mosfet incapsulato ad alta tensione e dotato di clip di connessione e relativo procedimento di fabbricazione |
KR20220100275A (ko) | 2021-01-08 | 2022-07-15 | 김태완 | 한약재 찌꺼기를 이용한 표층개량제 |
US11211373B1 (en) * | 2021-02-22 | 2021-12-28 | United Silicon Carbide, Inc. | Double-sided chip stack assembly |
KR20240068192A (ko) * | 2022-11-10 | 2024-05-17 | 주식회사 아모그린텍 | 파워모듈용 세라믹 기판 및 그 제조방법 |
Family Cites Families (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3710193A (en) * | 1971-03-04 | 1973-01-09 | Lambda Electronics Corp | Hybrid regulated power supply having individual heat sinks for heat generative and heat sensitive components |
GB2146174B (en) | 1983-09-06 | 1987-04-23 | Gen Electric | Hermetic power chip packages |
JPH04103150A (ja) * | 1990-08-23 | 1992-04-06 | Mitsubishi Materials Corp | Ic実装構造 |
JPH0590444A (ja) | 1991-09-26 | 1993-04-09 | Toshiba Corp | セラミツクス回路基板 |
JP3170005B2 (ja) * | 1991-10-29 | 2001-05-28 | 株式会社東芝 | セラミック回路基板 |
US6828600B2 (en) * | 1997-05-09 | 2004-12-07 | Eupec Europaeische Gesellschaft Fuer Leistungshalbleiter Mbh | Power semiconductor module with ceramic substrate |
US6475747B2 (en) * | 1997-10-28 | 2002-11-05 | The United States Of America As Represented By The Department Of Health And Human Services | Method for detecting Cryptosporidium parvum oocysts |
JP3080049B2 (ja) * | 1997-11-17 | 2000-08-21 | 日本電気株式会社 | 集積回路チップの実装構造および方法 |
US6359331B1 (en) * | 1997-12-23 | 2002-03-19 | Ford Global Technologies, Inc. | High power switching module |
US6072248A (en) | 1998-08-05 | 2000-06-06 | Muise; Christopher Russel | Method of and system for externally and remotely disabling stolen or unauthorized operated vehicles by pursuing police and the like |
US6072240A (en) * | 1998-10-16 | 2000-06-06 | Denso Corporation | Semiconductor chip package |
DE10156626A1 (de) | 2001-11-17 | 2003-06-05 | Bosch Gmbh Robert | Elektronische Anordnung |
US6703703B2 (en) * | 2000-01-12 | 2004-03-09 | International Rectifier Corporation | Low cost power semiconductor module without substrate |
US6624522B2 (en) | 2000-04-04 | 2003-09-23 | International Rectifier Corporation | Chip scale surface mounted device and process of manufacture |
JP3851760B2 (ja) * | 2000-07-04 | 2006-11-29 | 松下電器産業株式会社 | 半導体装置、その実装方法、電子回路装置の製造方法及び該製造方法により製造された電子回路装置 |
US6503780B1 (en) * | 2000-07-05 | 2003-01-07 | Amkor Technology, Inc. | Wafer scale image sensor package fabrication method |
JP2002094192A (ja) * | 2000-09-12 | 2002-03-29 | Denki Kagaku Kogyo Kk | 回路基板の冷却構造 |
US6348726B1 (en) * | 2001-01-18 | 2002-02-19 | National Semiconductor Corporation | Multi row leadless leadframe package |
US6469384B2 (en) | 2001-02-01 | 2002-10-22 | Fairchild Semiconductor Corporation | Unmolded package for a semiconductor device |
JP2002246515A (ja) * | 2001-02-20 | 2002-08-30 | Mitsubishi Electric Corp | 半導体装置 |
FR2822591A1 (fr) | 2001-03-22 | 2002-09-27 | Commissariat Energie Atomique | Assemblage de composants d'epaisseurs diverses |
KR100446277B1 (ko) * | 2001-11-08 | 2004-09-01 | 페어차일드코리아반도체 주식회사 | 반도체 전력용 모듈 및 그 제조방법 |
JP4066644B2 (ja) * | 2001-11-26 | 2008-03-26 | 株式会社豊田自動織機 | 半導体装置、半導体装置の配線方法 |
JP3813098B2 (ja) * | 2002-02-14 | 2006-08-23 | 三菱電機株式会社 | 電力用半導体モジュール |
JP3853263B2 (ja) | 2002-07-08 | 2006-12-06 | Necエレクトロニクス株式会社 | 半導体装置 |
JP4146321B2 (ja) | 2003-09-25 | 2008-09-10 | 株式会社東芝 | セラミックス回路基板 |
US7169248B1 (en) * | 2005-07-19 | 2007-01-30 | Micron Technology, Inc. | Methods for releasably attaching support members to microfeature workpieces and microfeature assemblies formed using such methods |
US8018056B2 (en) | 2005-12-21 | 2011-09-13 | International Rectifier Corporation | Package for high power density devices |
TWI473183B (zh) * | 2007-06-19 | 2015-02-11 | Invensas Corp | 可堆疊的積體電路晶片的晶圓水平表面鈍化 |
US20110210956A1 (en) * | 2010-02-26 | 2011-09-01 | Dev Alok Girdhar | Current sensor for a semiconductor device and system |
EP2613351B1 (en) * | 2010-09-02 | 2019-08-14 | Toyota Jidosha Kabushiki Kaisha | Semiconductor module |
KR101321282B1 (ko) * | 2011-06-17 | 2013-10-28 | 삼성전기주식회사 | 전력 모듈 패키지 및 이를 구비한 시스템 모듈 |
US8963321B2 (en) * | 2011-09-12 | 2015-02-24 | Infineon Technologies Ag | Semiconductor device including cladded base plate |
US8466541B2 (en) * | 2011-10-31 | 2013-06-18 | Infineon Technologies Ag | Low inductance power module |
US8531004B1 (en) * | 2012-06-14 | 2013-09-10 | Micrel, Inc. | Metal-on passivation resistor for current sensing in a chip-scale package |
-
2006
- 2006-12-19 US US11/641,270 patent/US8018056B2/en active Active
- 2006-12-21 JP JP2006344336A patent/JP5001637B2/ja active Active
- 2006-12-21 KR KR1020060132217A patent/KR100852766B1/ko active IP Right Grant
- 2006-12-21 IT IT000910A patent/ITTO20060910A1/it unknown
- 2006-12-21 DE DE102006060768A patent/DE102006060768B4/de not_active Expired - Fee Related
-
2011
- 2011-09-06 US US13/225,987 patent/US8368210B2/en active Active
- 2011-09-09 US US13/229,487 patent/US8569883B2/en active Active
-
2013
- 2013-02-01 US US13/756,963 patent/US8604611B2/en active Active
- 2013-02-01 US US13/757,640 patent/US8928115B2/en active Active
- 2013-10-24 US US14/062,670 patent/US8836112B2/en active Active
-
2014
- 2014-10-21 US US14/520,270 patent/US9559068B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US20130147016A1 (en) | 2013-06-13 |
US8928115B2 (en) | 2015-01-06 |
US20120001316A1 (en) | 2012-01-05 |
KR100852766B1 (ko) | 2008-08-18 |
US20110316086A1 (en) | 2011-12-29 |
DE102006060768B4 (de) | 2013-11-28 |
JP2007173831A (ja) | 2007-07-05 |
US9559068B2 (en) | 2017-01-31 |
ITTO20060910A1 (it) | 2007-06-22 |
US20140048923A1 (en) | 2014-02-20 |
US8604611B2 (en) | 2013-12-10 |
US8569883B2 (en) | 2013-10-29 |
US20150035120A1 (en) | 2015-02-05 |
DE102006060768A1 (de) | 2007-07-26 |
KR20070066970A (ko) | 2007-06-27 |
US8368210B2 (en) | 2013-02-05 |
US8018056B2 (en) | 2011-09-13 |
US20070138651A1 (en) | 2007-06-21 |
US8836112B2 (en) | 2014-09-16 |
US20130140684A1 (en) | 2013-06-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5001637B2 (ja) | 高電力密度デバイス用のパッケージ | |
US7619302B2 (en) | Highly efficient both-side-cooled discrete power package, especially basic element for innovative power modules | |
US8680666B2 (en) | Bond wireless power module with double-sided single device cooling and immersion bath cooling | |
JP4950280B2 (ja) | 高電力密度装置用、特にigbtおよびダイオード用の低インダクタンスのボンドワイヤレス共同パッケージ | |
EP1679745A2 (en) | Package for gallium nitride semiconductor devices | |
US20070008679A1 (en) | Integrated circuit for driving semiconductor device and power converter | |
US10698021B2 (en) | Device including a compound semiconductor chip | |
US6841866B2 (en) | Power semiconductor device | |
JP7286582B2 (ja) | 半導体装置 | |
JP2002208673A (ja) | 半導体装置およびパワーモジュール | |
CN111799250A (zh) | 功率半导体模块及其制造方法 | |
JP2005129826A (ja) | パワー半導体装置 | |
US20230052830A1 (en) | Power circuit module | |
US12027436B2 (en) | Package with clip having through hole accommodating component-related structure | |
US20240105578A1 (en) | Semiconductor device | |
US20220173023A1 (en) | Package with load terminals on which coupled power component and logic component are mounted | |
KR20160093267A (ko) | 전력 반도체 모듈 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20091201 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20091218 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100112 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20100215 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20100218 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100610 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100907 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20100921 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20100927 |
|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20101015 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110107 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110128 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110726 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20110816 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20110819 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20111117 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20111122 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20111222 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20111228 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20120515 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20120518 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5001637 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20150525 Year of fee payment: 3 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |