JP6333693B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
- Publication number
- JP6333693B2 JP6333693B2 JP2014199822A JP2014199822A JP6333693B2 JP 6333693 B2 JP6333693 B2 JP 6333693B2 JP 2014199822 A JP2014199822 A JP 2014199822A JP 2014199822 A JP2014199822 A JP 2014199822A JP 6333693 B2 JP6333693 B2 JP 6333693B2
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- metal pattern
- semiconductor device
- semiconductor chip
- metal
- semiconductor
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Description
本願において、実施の態様の記載は、必要に応じて、便宜上複数のセクション等に分けて記載するが、特にそうでない旨明示した場合を除き、これらは相互に独立別個のものではなく、記載の前後を問わず、単一の例の各部分、一方が他方の一部詳細または一部または全部の変形例等である。また、原則として、同様の部分は繰り返しの説明を省略する。また、実施の態様における各構成要素は、特にそうでない旨明示した場合、理論的にその数に限定される場合および文脈から明らかにそうでない場合を除き、必須のものではない。
以下で図面を用いて詳しく説明する本実施の形態では、セラミック基板上に複数の半導体チップが並べて搭載された半導体装置の例として、入力された直流電力を交流電力に変換して出力する電力変換装置(インバータ装置)を取り上げて説明する。
次に、図1に示すインバータ回路INVを構成する半導体装置PKG1の構成例について説明する。図2は、図1に示す半導体装置の外観を示す斜視図である。また、図3は、図2に示す半導体装置の裏面側を示す平面図である。また、図4は、図3のA−A線に沿った断面図である。また、図5は、図3に示すセラミック基板の上面側のレイアウトを示す平面図である。また、図6は、図5に示す半導体装置が構成する回路を模式的に示す説明図である。また、図7は、図5に示す半導体チップの周辺を拡大して示す拡大平面図である。また、図8は図7のA−A線に沿った拡大断面図である。
次に、図5に示す金属パターンの詳細について説明する。本セクションでは、まず、図6を用いて図5に示す金属パターンのレイアウトの概要について説明した後、各金属パターンMPに形成された窪み部DPの構成について説明する。
上記の通り、セラミック基板CS1の上面CSt側には、平面積が異なる複数の金属パターンが、互いに分離された状態で接合されている。詳しくは、複数の金属パターンMPのそれぞれは、図8に示すように、セラミック基板CS1の上面CStと対向接触する下面MPb、および下面MPbの反対側に位置する上面MPm、を備える。セラミック基板CS1の上面CStと金属パターンMPの下面MPbとは、上記したように、共晶反応を利用して、直接的に接合されている。
次に、図5に示す複数の半導体チップCPのうち、ローサイド側のスイッチング素子である、半導体チップCTLと金属パターンMPの上面MPmの周縁部との最短距離に着目すると、図10および図11に示す半導体装置PKG1と、図12に示す半導体装置PKG2は相違する。
次に、ハイサイド側のスイッチング素子である、半導体チップCTHが搭載される金属パターンMPHに着目すると、ハイサイド側では、上記したローサイド側とは構造が異なる。すなわち、図13に示すように、ハイサイド側のスイッチング素子である半導体チップCTHは、金属パターンMPHに半田SDを介して搭載されている。金属パターンMPHは、上記したように、電位E1(図6参照)を半導体チップCTHに供給する経路を構成する。言い換えれば、半導体チップCTHに電位E1を供給する経路は、金属パターンMPHに搭載される二個の端子LD、金属パターンMPH、および半導体チップCTHの電極PDC(図8参照)に接続される半田SDにより構成される。したがって、ハイサイド側のトランジスタQ1(図1参照)に電位E1を供給する経路中にはワイヤBWは介在していない。したがって、図6に示す電位E1の供給経路のインピーダンスを低減させる観点からは、半導体チップCTHは金属パターンMPH上の任意の位置に搭載することができる。
次に、上記した金属パターンMPとセラミック基板CS1の接合界面における剥離が発生しやすい領域について、説明する。図16〜図18は、それぞれ図9に対する変形例である複数の金属パターンのレイアウトを示す平面図である。
次に、上記した窪み部DPの構造について説明する。図19は、図9に示す複数の窪み部を金属パターンの周縁部に規則的に設けた例を模式的に示す平面図である。また、図20は、図19のA−A線に沿った拡大断面図である。また、図21は、図20に対する変形例を示す拡大断面図である。また、図22は、図19に対する変形例を示す平面図である。
次に、図1〜図13を用いて説明した半導体装置PKG1の製造工程について、図23に示す工程フローに沿って説明する。図23は、図2に示す半導体装置の組立てフローを示す説明図である。
まず、図23に示す基板準備工程では、図9に示すセラミック基板を準備する。本工程で準備するセラミック基板CS1は、例えばアルミナを主成分とするセラミックであって、上面CStおよび下面CSb(図4参照)に複数の金属パターンMPが接合されている。
次に、図23に示すダイボンド工程では、図5に示すように、セラミック基板CS1の金属パターンMP上に、複数の半導体チップCPを搭載する。
次に、図23に示すワイヤボンド工程では、図5に示すように、半導体チップCPと金属パターンMPとをワイヤ(導電性部材)BWを介して電気的に接続する。
次に、図23に示す端子搭載工程では、図5に示すように、複数の金属パターンMP上に端子LDを搭載する。端子LDは、複数の金属パターンと、図示しない外部機器とを電気的に接続するためのリード端子であって、細長く伸びる一方の端部を金属パターンMPに接続する。図4に示す例では、複数の端子LDのそれぞれは、半田SDを介して金属パターンMP上に搭載される。
次に、図23に示す蓋材取付工程では、図4に示すように、セラミック基板CS1の上面CStを覆うように蓋材CVを接着固定する。セラミック基板CS1の上面CStの周縁部と蓋材CVとは、接着材BD1を介して接着固定される。
次に、図23に示す封止工程では、図4に示すようにセラミック基板CS1と蓋材CVとに囲まれた空間内に封止材MGを供給し、複数の端子LDのそれぞれの一部分、複数の半導体チップCP、および複数のワイヤBWを封止する。封止材MGは、ゲル状の材料であり、蓋材CVの一部に図示しない供給用の貫通孔を形成しておき、貫通孔からゲル状の封止材MGを充填する。
以上、本発明者によってなされた発明を実施の形態に基づき具体的に説明したが、本発明は上記実施の形態に限定されるものではなく、その要旨を逸脱しない範囲で種々変更可能であることはいうまでもない。なお、上記実施の形態中でもいくつかの変形例について説明したが、以下では、上記実施の形態で説明した変形例以外の代表的な変形例について説明する。
例えば、上記実施の形態では、スイッチング素子として、ハイサイド用のトランジスタQ1を3個、およびローサイド用のトランジスタQ1を3個用いて、三相交流電力を出力する電力変換回路について説明したが、スイッチング素子の数には種々の変形例がある。
また、例えば、上記の通り種々の変形例について説明したが、上記で説明した各変形例同士を組み合わせて適用することができる。
BW、BW2、BWG、BWL、BWO、BWT ワイヤ(導電性部材)
CAP1 コンデンサ
CD、CP、CTH、CTL 半導体チップ
CMD 制御回路
CNV コンバータ回路
CPb 下面
CPt 上面
CS1、CS2、CS3、CS4、CS5 セラミック基板
CSb 下面
CSs1、CSs2、CSs3、CSs4 基板辺
CSt 上面
CV 蓋材(キャップ、カバー部材)
CVb 下面
CVs1、CVs2、CVs3、CVs4 辺
CVt 上面
D1 ダイオード
DP、DP1、DP2、DP3、DP4 窪み部
DTC 配電回路
E1、E2 電位
FLG フランジ部
HT、LD、LT 端子
INV インバータ回路
MG 封止材
MHs1、MHs2、MLs1、MLs2、MPs1、MPs2、MPs3、MPs4、MUs1、MUs2、MVs1、MVs2、MWs1、MWs2 辺
MP、MP1、MP2、MP3、MPB、MPH、MPL、MPT、MPU、MPV、MPW 金属パターン
MPb 下面
MPc 角部
MPm 上面
PDA、PDC、PDE、PDG、PDK 電極
PKG1、PKG2、PKG3、PKG4 半導体装置
PKT 収容部(ポケット)
Q1 トランジスタ
SCM 太陽電池モジュール
SD 半田
THH、THL 貫通孔
UT、VT、WT 出力端子
VL1 仮想線(中心線)
Claims (14)
- 第1面、および前記第1面の反対側に位置する第2面を備えるセラミック基板と、
前記セラミック基板の前記第1面と対向接触する第3面、および前記第3面の反対側に位置する第4面、を備える複数の金属パターンと、
前記複数の金属パターンのうちの一部に搭載される複数の半導体チップと、
を有し、
前記複数の金属パターンは、
第1辺を備え、前記複数の半導体チップのうちの第1半導体チップが搭載された第1金属パターンと、
前記第1金属パターンの前記第1辺と対向する第2辺を備え、かつ、前記第1金属パターンとは分離された第2金属パターンと、
を有し、
前記第1半導体チップの第1電極と前記第2金属パターンとは、前記第1辺および前記第2辺と交差するように延びる第1導電性部材を介して電気的に接続され、
前記複数の金属パターンの前記第4面の周縁部には、前記第4面側から前記第3面側に向かって窪んだ複数の窪み部が形成され、
前記複数の窪み部は、前記複数の半導体チップと重なる領域および前記第1半導体チップと前記第1金属パターンの前記第1辺との間の領域には設けられておらず、前記複数の金属パターンのうち、前記セラミック基板の前記第1面の周縁部に最も近い位置に配置された第3金属パターンには設けられている、半導体装置。 - 請求項1に記載の半導体装置において、
前記第2金属パターンには、前記第2金属パターンと電気的に接続された外部端子が搭載されている、半導体装置。 - 請求項1に記載の半導体装置において、
前記第3金属パターンには、前記複数の半導体チップよりも線膨張係数が大きく、かつ、前記複数の半導体チップのそれぞれの上面よりも高い位置まで延びる部材が半田を介して搭載され、
前記複数の窪み部が前記部材の周囲に設けられている、半導体装置。 - 請求項1に記載の半導体装置において、
前記セラミック基板の前記第1面は、第1方向に沿って延びる第1基板辺、前記第1基板辺の反対側に位置する第2基板辺、前記第1方向に交差する第2方向に沿って延びる第3基板辺、および前記第3基板辺の反対側に位置する第4基板辺を備え、
前記セラミック基板が備える四辺のうち、前記第1基板辺および前記第2基板辺に沿って、それぞれ複数の前記第3金属パターンが設けられ、
前記第1金属パターンの前記第1辺は、前記第1方向に沿って延び、
複数の前記第3金属パターンのそれぞれには、前記セラミック基板の周縁部に相対的に近い辺に前記複数の窪み部が設けられている、半導体装置。 - 請求項1に記載の半導体装置において、
前記セラミック基板の前記第1面は、第1方向に沿って延びる第1基板辺、前記第1基板辺の反対側に位置する第2基板辺、前記第1方向に交差する第2方向に沿って延びる第3基板辺、および前記第3基板辺の反対側に位置する第4基板辺を備え、
前記第1金属パターンの前記第1辺は、前記第1方向に沿って延び、
前記セラミック基板が備える四辺のうち、前記第1基板辺および前記第2基板辺に沿って、それぞれ複数の前記第3金属パターンが設けられ、
前記第1金属パターンは、前記第1辺の反対側に位置する第3辺を備え、
前記複数の金属パターンは、
前記第1金属パターンの前記第3辺と対向する第4辺を備え、かつ、前記第1金属パターンとは分離された第4金属パターンを有し、
前記第4金属パターンには、前記複数の半導体チップのうちの第2半導体チップが搭載され、
前記第2半導体チップの第2電極と前記第1金属パターンとは、前記第3辺および前記第4辺と交差するように延びる第2導電性部材を介して電気的に接続され、
前記第1半導体チップの前記第1電極と前記第2金属パターンとを接続する前記第1導電性部材の延在距離は、前記第2半導体チップの前記第2電極と前記第1金属パターンとを接続する前記第2導電性部材の延在距離よりも短い、半導体装置。 - 請求項5に記載の半導体装置において、
前記第2金属パターンには、前記第2金属パターンと電気的に接続された外部端子が搭載され、
前記第1金属パターンには、前記外部端子が搭載されず、
前記第1金属パターンが、前記第2基板辺および前記第4金属パターンの間に設けられ、かつ、外部端子が搭載された前記第3金属パターンと、第3導電性部材を介して電気的に接続されている、半導体装置。 - 請求項5に記載の半導体装置において、
平面視において、前記第2半導体チップと、前記第4金属パターンの前記第4辺との間には、前記複数の窪み部が形成されている、半導体装置。 - 請求項5に記載の半導体装置において、
前記第1半導体チップおよび前記第2半導体チップは、それぞれトランジスタを備えるスイッチング素子であって、
前記第2金属パターンには、第1電位が供給され、
前記第4金属パターンには、前記第1電位よりも大きい第2電位が供給され、
前記第1金属パターンに供給される第3電位は、前記第1半導体チップおよび前記第2半導体チップのスイッチング動作に応じて変化する、半導体装置。 - 請求項5に記載の半導体装置において、
前記第2金属パターンと前記第4金属パターンの間には、前記第1方向に沿って、複数の前記第1金属パターンが配列され、
複数の前記第1金属パターンのそれぞれには複数の前記第1半導体チップが搭載され、
前記第4金属パターンには、複数の前記第2半導体チップが搭載されている、半導体装置。 - 請求項5に記載の半導体装置において、
前記第1半導体チップの前記第1電極と、前記セラミック基板の前記第1基板辺側に設けられた前記第3金属パターンとが、第1ワイヤを介して電気的に接続され、
前記第1半導体チップから前記第1金属パターンの前記第1辺までの距離は、前記第1半導体チップから前記第1金属パターンの前記第3辺までの距離よりも短い、半導体装置。 - 請求項5に記載の半導体装置において、
前記第2半導体チップの前記第2電極と、前記セラミック基板の前記第2基板辺側に設けられた前記第3金属パターンとが、第2ワイヤを介して電気的に接続され、
前記第4金属パターンは前記第4辺の反対側に位置し、複数の前記第3金属パターンと対向する第5辺を備え、
前記第2半導体チップから前記第4金属パターンの前記第5辺までの距離は、前記第2半導体チップから前記第4金属パターンの前記第4辺までの距離よりも短い、半導体装置。 - 請求項1に記載の半導体装置において、
前記第1半導体チップの第1電極と前記第2金属パターンとを電気的に接続する前記第1導電性部材は、複数のワイヤである、半導体装置。 - 請求項1に記載の半導体装置において、
前記複数の金属パターンのうちの一部には、半田を介して複数の外部端子が搭載され、
前記複数の外部端子のそれぞれの周囲に、前記複数の窪み部が設けられている、半導体装置。 - 請求項13に記載の半導体装置において、
前記複数の外部端子のそれぞれの周囲を連続的に囲むように、前記複数の窪み部が設けられている、半導体装置。
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JP2014199822A JP6333693B2 (ja) | 2014-09-30 | 2014-09-30 | 半導体装置 |
TW104130364A TW201624659A (zh) | 2014-09-30 | 2015-09-15 | 半導體裝置 |
KR1020150134463A KR20160038770A (ko) | 2014-09-30 | 2015-09-23 | 반도체 장치 |
US14/863,894 US9576885B2 (en) | 2014-09-30 | 2015-09-24 | Semiconductor device |
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HK16111168.5A HK1224080A1 (zh) | 2014-09-30 | 2016-09-22 | 半導體器件 |
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JP6345583B2 (ja) * | 2014-12-03 | 2018-06-20 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
BE1023850B1 (nl) * | 2016-06-29 | 2017-08-14 | C-Mac Electromag Bvba | Verbeterde elektronische schakeling en substraat met identificatiepatroon voor afzonderlijke elektronische schakelingen en werkwijze voor het produceren daarvan |
US10978869B2 (en) * | 2016-08-23 | 2021-04-13 | Alpha And Omega Semiconductor Incorporated | USB type-C load switch ESD protection |
US10283475B2 (en) * | 2016-12-14 | 2019-05-07 | GM Global Technology Operations LLC | Power module assembly with dual substrates and reduced inductance |
JP6743728B2 (ja) * | 2017-03-02 | 2020-08-19 | 三菱電機株式会社 | 半導体パワーモジュール及び電力変換装置 |
WO2018173921A1 (ja) * | 2017-03-23 | 2018-09-27 | 株式会社 東芝 | セラミックス金属回路基板およびそれを用いた半導体装置 |
CN109429529B (zh) * | 2017-06-19 | 2022-06-21 | 新电元工业株式会社 | 半导体装置 |
JP6816691B2 (ja) * | 2017-09-29 | 2021-01-20 | 三菱電機株式会社 | 半導体装置 |
EP3696851B1 (en) * | 2019-02-18 | 2022-10-12 | Infineon Technologies AG | Semiconductor arrangement and method for producing the same |
US10937747B2 (en) | 2019-07-19 | 2021-03-02 | GM Global Technology Operations LLC | Power inverter module with reduced inductance |
JP6896831B2 (ja) * | 2019-12-05 | 2021-06-30 | 三菱電機株式会社 | 半導体モジュールおよび電力変換装置 |
JP2021129046A (ja) | 2020-02-14 | 2021-09-02 | 富士電機株式会社 | 半導体モジュール |
DE112022000361T5 (de) * | 2021-02-03 | 2023-10-12 | Rohm Co., Ltd. | Halbleiterbauelement |
WO2024095712A1 (ja) * | 2022-11-04 | 2024-05-10 | 富士電機株式会社 | 半導体モジュール |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4318241C2 (de) | 1993-06-02 | 1995-06-29 | Schulz Harder Juergen | Metallbeschichtetes Substrat mit verbesserter Widerstandsfähigkeit gegen Temperaturwechselbeanspruchung |
TW428295B (en) * | 1999-02-24 | 2001-04-01 | Matsushita Electronics Corp | Resin-sealing semiconductor device, the manufacturing method and the lead frame thereof |
JP3062691B1 (ja) * | 1999-02-26 | 2000-07-12 | 株式会社三井ハイテック | 半導体装置 |
JP4649027B2 (ja) * | 1999-09-28 | 2011-03-09 | 株式会社東芝 | セラミックス回路基板 |
JP2003031732A (ja) * | 2001-07-19 | 2003-01-31 | Hitachi Ltd | 絶縁型半導体装置 |
JP2007012857A (ja) * | 2005-06-30 | 2007-01-18 | Renesas Technology Corp | 半導体装置 |
EP1905077B1 (en) * | 2005-07-08 | 2012-05-23 | Nxp B.V. | Semiconductor device |
US8018056B2 (en) * | 2005-12-21 | 2011-09-13 | International Rectifier Corporation | Package for high power density devices |
JP5056325B2 (ja) | 2007-10-04 | 2012-10-24 | 富士電機株式会社 | 半導体装置の製造方法および半田ペースト塗布用のメタルマスク |
JP5550225B2 (ja) * | 2008-09-29 | 2014-07-16 | セミコンダクター・コンポーネンツ・インダストリーズ・リミテッド・ライアビリティ・カンパニー | 回路装置 |
JP5863234B2 (ja) * | 2010-12-01 | 2016-02-16 | デンカ株式会社 | セラミックス回路基板およびこれを用いたモジュール |
JP5796956B2 (ja) * | 2010-12-24 | 2015-10-21 | セミコンダクター・コンポーネンツ・インダストリーズ・リミテッド・ライアビリティ・カンパニー | 回路装置およびその製造方法 |
EP2765600A4 (en) * | 2011-09-30 | 2015-06-10 | Rohm Co Ltd | SEMICONDUCTOR COMPONENT |
JP2013258387A (ja) * | 2012-05-15 | 2013-12-26 | Rohm Co Ltd | パワーモジュール半導体装置 |
US20140110833A1 (en) * | 2012-10-24 | 2014-04-24 | Samsung Electro-Mechanics Co., Ltd. | Power module package |
KR101443985B1 (ko) * | 2012-12-14 | 2014-11-03 | 삼성전기주식회사 | 전력 모듈 패키지 |
JP6183166B2 (ja) * | 2013-01-30 | 2017-08-23 | 三菱マテリアル株式会社 | ヒートシンク付パワーモジュール用基板及びその製造方法 |
JP2014207430A (ja) * | 2013-03-21 | 2014-10-30 | ローム株式会社 | 半導体装置 |
KR102143890B1 (ko) * | 2013-10-15 | 2020-08-12 | 온세미컨덕터코리아 주식회사 | 파워 모듈 패키지 및 이의 제조 방법 |
KR20150078911A (ko) * | 2013-12-31 | 2015-07-08 | 삼성전기주식회사 | 반도체 패키지 및 그 제조방법 |
US9397017B2 (en) * | 2014-11-06 | 2016-07-19 | Semiconductor Components Industries, Llc | Substrate structures and methods of manufacture |
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JP2016072417A (ja) | 2016-05-09 |
US9666518B1 (en) | 2017-05-30 |
KR20160038770A (ko) | 2016-04-07 |
HK1224080A1 (zh) | 2017-08-11 |
US20170141086A1 (en) | 2017-05-18 |
EP3002785B1 (en) | 2020-11-11 |
TW201624659A (zh) | 2016-07-01 |
CN105470226B (zh) | 2020-05-19 |
CN105470226A (zh) | 2016-04-06 |
US20160093594A1 (en) | 2016-03-31 |
CN205081110U (zh) | 2016-03-09 |
US9576885B2 (en) | 2017-02-21 |
EP3002785A1 (en) | 2016-04-06 |
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